第三章 经典合成方法

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第三章 经典合成方法. 常规 合成方法: 指普通的常用的成熟的合成方法 包括: 化学气相沉积( CVD ),高温,高压,低温,低压 等条件下的合成方法. 热力学在无机化合物制备中的应用. 无机化合物制备反应的判据. △ r G m =△ r H m - T △ r S m 对于封闭体系恒温恒压过程,其 制备反应方向判据: (△ r G m ) T , p < 0 制备反应能够进行 (△ r G m ) T , p = 0 制备反应达平衡态 (△ r G m ) T , p > 0 制备反应不能进行. - PowerPoint PPT Presentation

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  • CVD

  • rGmrHm -TrSm rGmTp0 rGmTp0 rGmTp0

  • 3.1CVDChemical Vapor DepositionCVD (GaAs)(GaAs1-xPx)

  • CVD()CVD

  • HgS 1000500 2060John M. Blocher Jr.( Sir CVD) CVD

  • CVD

  • /CVDCVD

  • CVD(HP-CVD)(LP-CVD) (P-CVD) (L-CVD) (MO-CVD)(HT-CVD) (MT-CVD) (LT-CVD)CVD

  • 3.1.1 CVD M-H

  • CVD M-CC-C[E(M-C)E(C-C)]E(MO)E(OC)MOCVD (Metal-Organic CVD)(M-C)(M-C)---

  • MOCVD

  • CVD

  • CVD ()

  • Fe2O3

  • CVD

  • 3.1.2 CVD .

  • (99)

  • -GaN

  • 7:2:170%2006180001000500-700

  • 50-51(MCVD)(OVPO)(VAD)(PCVD)

  • 3.1.3 CVD ,() 53 ZnSe

  • CVD (T2)()ZnSI2ZnI2(T1)()ZnS

  • CVDCVD1234

  • CVD1 5001200

  • CVD2 5001200

  • CVD31200

  • CVD4500

  • CVD5 1000

  • CVD laser-assisted CVD CVDCVDCVDCVD

  • CVD SiSiCSiNTiNGaNGaAsTiO2TaO5

  • CVD (catalytic CVD) catalytic cracking reaction SiCSiC< 300

  • ECVD ECVD< 1kPa> 1000

  • 1CVD

  • 2EVDH2O

  • MW-PCVD MW-PCVDSOD

  • Fabrication of well-aligned CdS nanotubes byCVD-template methodXiao-Ping Shena, Ai-Hua Yuanb, Fei Wanga, Jian-Ming Hongc, Zheng Xua,*a State Key Laboratory of Coordination Chemistry, Laboratory of Solid State Microstructure, Nanjing University, Nanjing 210093, P. R. Chinab School of Material Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang 212003, P. R. Chinac Center for Materials Analysis, Nanjing University, Nanjing 210093, P. R. ChinaSolid State Communications 133 (2005) 1922

  • Abstract:Well-aligned CdS nanotubes have been synthesized within the nanochannels of the porous anodic alumina (PAA) membranes by pyrolyzing cadmium bis(diethyldithiocarbamate) [Cd(S2CNEt2)2] at 400 oC. The nanotubes are composed of pure hexagonal phase polycrystalline CdS. The synthetic route can, in principle, be extended to fabricate other nanotubes of a wide range of semiconductors.Solid State Communications 133 (2005) 1922

  • Typical experimental:The Commercially available PAA membranes (Whatman Ltd., Anodisc 13) with a nominal pore diameter of 20 nm and thickness of 60 mm were used as templates. The synthesis of CdS nanotubes was carried out in a quartz tube mounted inside a horizontal tube furnace.Solid State Communications 133 (2005) 1922

  • In a typical experiment, the organometallic precursor (~300 mg) in a ceramic boat was placed at upstream end and the PAA template was placed vertically at the central high-temperature zone of the quartz tube. After evacuating the quartz tube to ~2 Torr, a carrier gas of high-purity N2 flowed via the precursor area toward the template to carry precursor into reaction zone.Solid State Communications 133 (2005) 1922

  • The gas flow rate and pressure inside the tube were kept respectively at 30 sccm and 20 Torr during the CVD. The system was then heated to 400 oC at the central region of the furnace at a rate of 20 oC min-1 and held at that temperature for 1 h for CVD. The precursor was situated in advance according to the temperature gradient from the center to the ends of the furnace so that its temperature could be held at about 220 oC.Solid State Communications 133 (2005) 1922

  • After deposition, the temperature of the template was raised to 500 oC at a rate of 2 oC min-1 and maintained for 4 h for annealing. The resulting template was collected after the furnace was cooled to room temperature. The cover layer on the surface of the resulting templates was removed by polishing with 1500 grid sand paper for further characterization.Solid State Communications 133 (2005) 1922

  • (a) Top-view of well-aligned CdS nanotubes after removing the surface cover layer. (b) Lateral view of CdS nanotube arrays.Solid State Communications 133 (2005) 1922