+ tutorial course roster - thinfilmsolutions.org program problem-solving tutorial courses equipment...

• WEBTECH ROLL-TO-ROLL COATINGS FOR HIGH-END APPLICATIONS • COATINGS FOR ENERGY CONVERSION AND RELATED PROCESSES • PROTECTIVE, TRIBOLOGICAL AND DECORATIVE COATINGS • EMERGING TECHNOLOGIES • HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS) • OPTICAL COATINGS • PLASMA PROCESSING • LARGE AREA COATINGS• COATINGS AND PROCESSES FOR BIOMEDICAL AND ENVIRONMENTAL APPLICATIONS

for more information:[email protected] . 505-856-7188 . www.svc.org

EDUCATION PROGRAM Problem-Solving Tutorial Courses

EQUIPMENT EXHIBIT Dedicated to Vacuum Coating Technologies

INTERACTIVE NETWORKING Forums and Discussion Groups

SPOTLIGHT SESSIONSTechnical Poster Presentations: with 3-Minute Oral PresentationsHeuréka! Post-Deadline Recent Developments: Featuring Late-Breaking TechnologyVendor Innovators Showcase: the Latest Products and Services

TECHNICAL PROGRAM April 27-30, 2015

SOCIETY OF VACUUM COATERS58th Annual Technical ConferenceSanta Clara Convention Center, CA, USA

SAVE THESE DATES APRIL 25-30, 2015

TECHCONSANTA CLARA

Learn from Industry LeadersExpand your Knowledge

Connect and NetworkCollaborate

Featuring the Symposium Coating Technologies for the Interconnected Age

Traditional Technical Sessions:

REGISTER ONLINE AT WWW.SVC.ORG

PRELIMINARY PROGRAM+ TUTORIAL COURSE ROSTER

Contents | Zoom in | Zoom out Search Issue | Next PageFor navigation instructions please click here

Contents | Zoom in | Zoom out Search Issue | Next PageFor navigation instructions please click here

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2 Society of Vacuum Coaters 2015 TECHCON Preliminary Program

TECHCON

This year’s technical conference in Santa Clara, in the heart of California’s Silicon Valley where the latest technologies for the “Internet of Things” are forged, features a Symposium on Coating Technologies for the Interconnected Age. The Symposium will highlight how capabilities within the SVC community relate to advancing mobility, durability and performance of mobile electronics. A Symposium-related Keynote presentation will start every day of the TechCon, and many sessions will connect to the Symposium topic with an invited talk and several contributed presentations.

The Symposium augments our comprehensive TechCon program which includes traditional sessions focused on our core technology topics, highlighting the latest state-of-the-art in the areas of vital importance to the vacuum coating industry, including:

• WebTech Roll-to-Roll Coatings for High-End Applications• Coatings for Energy Conversion and Related Processes• Protective, Tribological and Decorative Coatings• Emerging Technologies• High Power Impulse Magnetron Sputtering (HIPIMS)• Optical Coatings• Plasma Processing• Large Area Coatings• Coatings and Processes for Biomedical and Environmental Applications

For the industrial practitioner, we offer a number of opportunities to attend presentations focused on business-related topics both in the technical and poster sessions and the Vendor Innovators Showcase. As always, our Heuréka! Session focuses on industry topics and new findings that warrant public discussion – in a relaxed evening environment with refreshments provided by our TechCon Gold sponsors. Our Poster Session will be jump-started with a series of brief, oral “executive summaries” to enhance the dialogue with the poster authors.

The technical program is enhanced by our unique networking opportunities, a multi-faceted education program, and the largest technology exhibit of its kind, creating the ideal environment for learning about the latest research, industry trends, and making the right connections to develop your business.

Whether you are contributing to the program with a presentation or attending the conference to discover the latest products and developments in coating technology, we look forward to connecting with you at the 2015 SVC TechCon in Santa Clara!

CHRIS STOESSEL, EASTMAN CHEMICAL CO (650/798-1242; [email protected]) IS THE PROGRAM CHAIR. RALF BANDORF, FRAUNHOFER IST,GERMANY (+49/5312155602, [email protected]) IS THE ASSISTANT PROGRAM CHAIR. SCOTT WALTON, U.S. NAVAL RESEARCH

LABORATORY (202/767-7531, [email protected]) IS THE PAST PROGRAM CHAIR.

SVC Headquarters HotelHyatt Regency Santa Claraattached to the Santa Clara Convention Center (SCCC)$189.00 single/double plus taxes

A limited number of rooms are also available at:Hilton Santa ClaraLess than a 5 minute walk to the Santa Clara Convention Center$189.00 single/double + taxes

Biltmore Hotel & Suites2.5 miles from the Santa Clara Convention Center. Shuttle bus to the SCCC is provided.$149.00 single/double + taxes

After registering for the TechCon, click the “Book Hotel Reservations” link on your on-line registration acknowledgement to make your hotel reservations.

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Why Attend the 2015 SVC TechCon? For the past 57 years, the Society of Vacuum Coaters has delivered stimulating content, mixing basic and applied research along with ideas and tools focusing on transitioning research and development results into production. Each year adds new insights into the latest trends and state-of-the-art developments in the dynamic field of vacuum coating technologies. By attending each element of the TechCon, the Technical Program, Technology Exhibit, Education Program and the unparalleled Networking Opportunities, participants experience the complete benefits of belonging to a global community of vacuum coating professionals.

Who Should Attend?The SVC TechCon is designed for:

» Industry Professionals involved in vacuum equipment manufacturing and distribution, parts and supplies, and coating materials and products

» Engineers and Scientists engaged in the design, development, production (function, stability, yield and throughput) and use of vacuum coatings in various applications

» Technicians responsible for the operation and maintenance of vacuum equipment, supplies and materials

» Technical Consultants providing vacuum coating and processing solutions to clients» Academics wanting to share cutting-edge surface engineering research and build

collaborations with Industry» Students wanting to expand their knowledge and develop their capabilities as presenters and

authors, while networking to advance their careers and build industrial connections

In today’s economic environment, it’s not easy to justify the cost of attending a conference or even to take time off to travel. One of the best ways to get approval to attend a conference is to connect your organization’s goals to your conference experience. This will allow you to demonstrate their return on investment and justify the expenditure.

Abstract SubmissionPresent your latest technical research and results, plus insights into elevating your business in the vacuum coating industry during the SVC Technical Program.

Abstracts will be accepted through March 1, 2015 for:• Technical Poster Presentations (with 3-minute oral summary)• Heuréka! Post-Deadline Recent Developments Session• Vendor Innovators Showcase

Table of Contents

Conference Overview ____________ 2-3

TechCon Networking________________4

Technology Forum Breakfasts _______5

Keynote and Special Presentations 6-7

Technical Program _______________8-15

Poolside Networking Mixer ________12

TechCon Education Program Roster_16

Tutorial Course Instructors ______17-18

Tutorial Course Descriptions ____19-27

On-Location Education Program ____28

TechCon Exhibit ___________________29

SVC Corporate Sponsors___________29

Conference Registration ________30-31

TechCon Sponsors_________________32

Register On-Line Now! www.svc.org

Conference Overview

Submit on-line: www.svc.org/abstract

Silicon Valley CaliforniaBy popular request the SVC TechCon is once again being held in California’s Silicon Valley. This premier high-tech region continues to transform itself with an interesting mix of up-and-coming products, technologies and companies – many of which rely on advanced coatings, chambers and plasmas for their success. The Silicon Valley represents a deep pool of potential new technical and business contacts.


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TECHCON 2015 Tnvaluable Networking Opportunities

SVC’s Invaluable Networking OpportunitiesThe SVC TechCon offers networking events that provide a forum for enriching one-on-one networking experiences in a relaxed environment.

+ Sunday Evening Awards Ceremony and Welcome Reception+ Technology Forum Breakfasts+ Young Members and SVC Mentors Meeting and Reception+ Meet the Experts Corner+ Tuesday Evening Poolside Networking Mixer+ Exhibit Hall Networking: Exhibit Reception, Lunch, Specialty Breaks

and Beer Blast+ SVC Foundation Fundraising Events

• Sunday Afternoon Golf Tournament - $150 includes 18 holes, cart fee, 2 drink tickets

• 5K Fun Run and Walk Fundraiser - $25 includes a t-shirt

Symposium on Coating Technologies for the Interconnected AgeADVANCING MOBILITY, DURABILITY AND PERFORMANCE OF MOBILE ELECTRONICS

The internet companies that made the web accessible to everyone everywhere, now leverage “hardware” as the next step in creating the “Internet of Things” (IoT) – where every aspect of our lives can be sensed, quantified, transmitted, interpreted and displayed. The exceptional success of the smartphone, along with super-fast wireless connections and seemingly limitless data storage, enable extensive device networks that create and deliver more content to more people than ever before - the IoT connects physical objects and “information on demand” to our personal lives.

Thin film coatings are the essential building blocks for the “Internet of Things,” and it is no coincidence that Silicon Valley, the cradle of the semiconductor industry, is once again the nexus that connects data to the physical world. Since our last TechCon in Santa Clara, key advances have been made in phone and pad computing, touch and gesture oriented interfaces, transparent and augmented reality displays. The top 150 Tech companies in the Valley had revenue in excess of $677 billion in 2013, showing considerable growth compared to $265 billion in 2003.

The 2015 TechCon Symposium highlights the contribution of thin film coatings to this new wave of interconnectedness. Whether it is the transparent conductors in a display, thin-film batteries, antennae, abrasion-resistant, touch screen surfaces, optical coatings for cameras, environmental thin film sensors, energy-efficient device lighting, barrier films, flexible electronics, novel semiconductors, advanced coatings in data storage devices and data transmission, photovoltaics and other energy-harvesting devices, evolving printed flexible electronics and emerging technologies such as graphene films, alternative transparent conductors, polymer electronics, and coatings on super-thin glass – thin coatings are the cornerstones that make mobile devices work.


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The SVC TechCon is Available on any Smart DeviceThe SVC TechCon mobile website makes it easy for attendees to access and save event information online. Search the entire technical program and list of presenters, exhibit hall floorplan, exhibitor profiles, and special announcements from show organizers. Create and access your own personalized TechCon program at your convenience. www.chirpe.com/SVC2015

TECHNOLOGY FORUM BREAKFAST

TOPICS AND SPEAKERS

Monday, April 277:00 a.m. – 8:15 a.m.

Coatings for Thin Film Photovoltaics ◉ Wolfgang Diehl and Volker Sittinger, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany

High-Power Impulse Magnetron Sputtering (HIPIMS) ◉ Arutiun Ehiasarian, Sheffield Hallam University, United Kingdom, and Ralf Bandorf, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany

Gas/Moisture Permeation Barrier Layers ◉ Adriana Creatore, Eindhoven University of Technology, The Netherlands

Fabrication and Performance of Optical Coatings ◉ Ludvik Martinu, École Polytechnique de Montréal, Canada, and Bryant Hichwa, Sonoma State University (retired)

Diamond-Like Carbon (DLC) Coatings ◉ George Savva, IHI Ionbond, Inc., Martin Keunecke, Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany, and Thomas Schuelke, Fraunhofer USA, Inc.

Coatings and Surface Engineering for Medical Applications ◉ Hana Baránková, Uppsala University, Sweden, and Aryasomayajula Subrahmanyam, Indian Institute of Technology Madras, Chennai, India

Quartz Crystal Monitors◉ C. Larry Lu, C. Lu Laboratory, and Ric Shimshock, MLD Technologies, LLC

Tuesday, April 287:00 a.m. – 8:15 a.m.

Atmospheric Plasma Technologies◉ Hana Baránková and Ladislav Bárdos, Uppsala University, Sweden

Energy Conversion and Storage◉ Carl M. Lampert, Star Science, and Ric Shimshock, MLD Technologies, LLC

Magnetron Sputtering◉ David Glocker, Isoflux Incorporated

Transparent Conductive Oxides (TCO) for Thin Film Photovoltaics, Displays, Transparent Electronics and More ◉ Clark Bright, Bright Thin Film Solutions (3M, retired)

Tribological Coatings ◉ Allan Matthews, University of Sheffield, United Kingdom, and Bill Sproul, Reactive Sputtering, Inc.

Optical Coating Design◉ H. Angus Macleod, Thin Film Center Inc.

WEEKEND AT A GLANCESaturdayEducation Program• Full Day Tutorials 8:30 a.m. – 4:30 p.m.• Vacuum Systems, Materials and Operation• An Introduction to Physical Vapor Deposition (PVD) Processes• Thin Film Growth and Microstructure Evolution• Practical Design of Optical Thin Films

Sunday Education Program• Sputter Deposition (day 1 of 2) • Practical Production of Optical Thin Films • High Power Impulse Magnetron Sputtering • Transparent Gas Permeation Barriers on Flexible Substrates • ITO and Alternative TCO: From Fundamentals to Controlling

Properties • Mechanical Heart Valve Thrombosis: An Introduction and

Review (PM)

Special EventsSVC Foundation Golf Tournament – 12:00 p.m. Check-InAwards Ceremony and Welcome Reception 6:30 p.m.


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TECHCON 2015

Oxide Based Electronics: A Coming Technology Elvira Fortunato, Universidade Nova de Lisboa, PortugalTransparent electronics are now a reality and are adding new electronic functionalities onto surfaces. High-performance n- and p-type Thin Film Transistors (TFTs), prepared by physical vapor deposition (PVD) techniques have already been developed. PVD processes like rf magnetron sputtering can be performed near room temperature, which makes them compatible with the use of temperature sensitive, low-cost flexible substrates (polymers, cellulose paper, among others). Besides that, tremendous advances are coming through liquid solution-based technologies, which is very exciting for ink-jet printing, where the theoretical limitations are becoming practical limitations. In this presentation, some of the most promising new technologies for n- and p-type thin film transistors based on oxide semiconductors and their current and future applications will be reviewed. Some of the most promising new technologies for n- and p-type thin film transistors are in the form of nano-films or nanoparticles. Special emphasis will be given to solution-processes. A summary of the major milestones already achieved with this emerging and very promising technology will be presented. Monday, April 27, 9:00 a.m.

Sensor Technology: From Automotive to Mobile (Phone) ApplicationsCarsten Herweg, Robert Bosch GmbH, Stuttgart, Germany Sensors are a key element of a modern car. Since 1998 yaw rate sensors produced by silicon micro machining have been used in the Electronic Stabilization Program - ESP®. The technological basis for this was created by the development of the deep reactive ion etching process for silicon wafers. The consequent progress in the field of MEMS based sensors led to flexible and cost-effective Inertial Sensor Cluster, now found in automobiles, mobile phones, tablets, and control units of video game consoles. Reducing the emission of a combustion engine car is a challenging task. The first steps were taken nearly 40 years ago, when the lambda sensor was introduced to control the fuel-air-mixture in the engine. Today, several connected sensors measure and control the emission of CO, CO2, NOx and particles. Whereas silicon based sensors typically utilize vacuum based processes (sputtering, PECVD, PVD and ALD) the modern exhaust sensors need a combination of adjacent techniques like thermal spraying without plasma, printing and casting technologies. With the continued connection of these sensors, interconnection will drive the technology development and the market in the next years. Tuesday, April 28, 8:30 a.m.

Graphene Micro-Webs and Other Things: 3D Nanoscale Connectivity for an Interconnected World Kostya Ostrikov, Commonwealth Scientific and Industrial Research Organization, Lindfield, Australia and Queensland University of Technology, Brisbane, AustraliaEssential electronic, optical, and magneto-optical components of functional elements that will enable the “Internet of Things” are expected to have several highly-unusual properties and features that will meet several requirements, including excellent connectivity, ultra-fast responses, unprecedented data storage and processing capacity, controlled energy harvesting, generation, storage and release, and several others. Here we consider thin films made of graphene micro-webs and other plasma-produced nanomaterials and explore their unique three-dimensional webs and other arrangements that enable nanoscale connectivity, energy storage, sensing and other functionalities. Unique physical and chemical properties of these nanomaterials are discussed and related to the specifics of vacuum coating technologies used to fabricate them. The various “things” enabled by the plasma-specific effects represent very interesting networked microscopic systems both for fundamental studies and advanced applications in the Interconnected Age. Wednesday, April 29, 8:30 a.m.

Roll-to-Roll Processing for Flexible Devices and Components Utilized in Wearable and Mobile Electronics Neil Morrison, Applied Materials, Alzenau, GermanyRoll-to-Roll (R2R) production of flexible electronic devices combines the advantages of the use of inexpensive, lightweight and flexible substrates with high throughput production to enable new form factor products with exceptional robustness and mechanical stability. Significant cost reduction opportunities can also be found in terms of processing tool capital cost, utilized substrate area and process gas flow when compared with batch processing systems. Recently, significant advances have been made in device patterning enabling the mass production of a variety of flexible electronic devices. Significant challenges also exist in terms of the layer deposition technologies used in R2R manufacture of these devices. A variety of different web handling and coating technologies to enable high volume R2R manufacture of both active and passive components utilized in display have been developed. This talk describes the principal challenges inherent in moving from lab/pilot scale manufacturing to high volume manufacturing. Results will be presented for both amorphous silicon and IGZO TFT backplanes, ITO based touch panel devices in addition to high barrier performance layers and stacks for both substrate encapsulation and barrier film for final device encapsulation. Thursday, April 30, 8:30 a.m.

KEYNOTE PRESENTATIONS

IntroducingTechnical Program Keynote and Special Presentations


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DONALD M. MATTOX TUTORIAL PRESENTATIONSAbout the Possibility for a Holistic Toolbox for the Next Generation of Surface and Coating Optimization - Taking the Example of TCOs in Touch ScreensNorbert Schwarzer, Saxonian Institute of Surface Mechanics SIO, Ummanz, GermanyThe next technological revolution, or “Internet of Things,” will demand innovative and sophisticated concepts for products allowing the seamless interaction of a human being with the internet. The author is convinced that without thin film technology, no satisfying interface solutions are possible. In order to succeed however, much more knowledge base and holistic development strategies are necessary. In many applications of thin films, a multitude of physical effects are influencing the lifetime and reliability of the coated parts. Proper characterization and optimization of thin films requires invertible mathematical tools of sufficient holistic character. It is shown within tribological applications that there are ways for some completely analytical tools not only allowing a much better invertibility compared to discrete models but also an extreme (up to 1000 and more) acceleration of forward evaluations even for complex layered systems. This talk will feature the use of these applications and how they can be applied for the development of optimized coating structures. Thereby, we will concentrate on the practical side of the new tools application. Monday, April 27, 12:50 p.m.

Magnetron Sputtering: An Unfinished JourneyAndré Anders, Lawrence Berkeley National Laboratory, Berkeley, CA Cathode disintegration, as sputtering was originally called, has its humble beginnings in the 19th century with ingenious inventions closely related to generating electrical power and establishing “empty space,” vacuum. This historical presentation celebrates the incredible success story that affects everybody’s life today, as magnetron sputter deposition enables a wide range of product developments. Covering developments from as far back as Geissler and his glass chambers, to recent observations of traveling ionization zones or “spokes”, which have profound influence on magnetron operation and particle fluxes to the substrate, this journey in the world of magnetron sputter deposition is far from finished, which becomes abundantly clear when looking at its history in a time-lapse format. Wednesday, April 29, 1:00 p.m.

THURSDAY LUNCHTIME PRESENTATION

Enabling a New Generation of Mobile Devices through Wafer-Level Integration of Optical Filters and ElectronicsFred J. Van Milligen, JDSU, Santa Rosa, CAThe rapid growth in optical sensors in automobiles, cell phones, gaming, and wearable devices has driven the convergence of optics and electronics, and specifically optical coatings and semiconductor processes. This convergence has created an opportunity for the optical coating supplier to think in the terms of consumer electronics: high volumes, high yields, low cost, and rapid turnaround. Often, these coatings are directly deposited on customer-defined areas of active semiconductor devices. This demands that the processes be compatible with semiconductor protocols for temperature, cleanliness, material selection, etc. In such a case, the processing of the optical coating cannot impact the electrical performance or reliability of the underlying sensors. In this talk we will discuss the challenges that must be met, discuss potential approaches and highlight some of the many products that are pushing the technical envelope. Thursday, April 30, 12:40 p.m.



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MONDAY AT A GLANCEA.M. Technical Sessions

• Keynote Presentation: 9:00 a.m.• Symposium on Coating Technologies for the Interconnected Age• Emerging Technologies• Plasma ProcessingSpecial Events: Technology Forum Breakfast 7:00-8:15 a.m., Annual Business Meeting 8:30 a.m.Education Program• Sputter Deposition (day 2 of 2) • Characterization of Thin Films• Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum Systems• Cathodic Arc Deposition (PM)

P.M. Technical Sessions• Donald M. Mattox Tutorial: 12:50 p.m.• Symposium on Coating Technologies for the Interconnected Age • Coatings for Energy Conversion and Related Processes• Large Area Coatings• High Power Impulse Magnetron Sputtering• Heuréka! Post Deadline Recent DevelopmentsSpecial Events: Young Members Group Meeting, 5:30-7:00 p.m.

Technology Forum Breakfast7:00 a.m. – 8:15 a.m. See page 5 for topics and facilitators.

Annual Business Meeting8:30 a.m. – 9:00 a.m.

Keynote Presentation9:00 a.m. Elvira Fortunato, Oxide Based Electronics: A Coming Technology, see abstract on page 6.

Symposium on Coating Technologies for the Interconnected AgeMODERATORS: CHRIS STOESSEL, EASTMAN CHEMICAL COMPANY AND RALF BANDORF, FRAUNHOFER INSTITUTE

FOR SURFACE ENGINEERING AND THIN FILMS IST, GERMANY

9:50 a.m. IA-1 Dropped Your Phone Down the Toilet? No Worries! - Improving the Reliability of Electronic DevicesINVITED TALK S. Coulson P2i Ltd., Abingdon, United Kingdom

10:30 a.m. IA-2 Doped Molybdenum Oxides for Low-Reflectance Thin Films in Touch Sensor ApplicationsH. Köstenbauer, D. Lorenz, J. Winkler PLANSEE, Reutte, Austria

10:50 A.M. – 11:10 A.M. – BREAK

11:10 a.m. IA-3 Improved Mechanical and Optical Functionality on Transparent Substrates by High Deposition Rate PECVD CoatingsF. Schwarz, S. Kastl, A. Uhl, D. Hrunski, C. Schmidt, R. Bock, A. Rack Manz AG, Karlstein, Germany

11:30 a.m. IA-4 Roll-to-Roll Vacuum Coating and Device Fabrication Using Flexible Glass WebINVITED TALK S. Garner Corning Incorporated, Corning, NY

Emerging TechnologiesMODERATORS: JACOB BERTRAND, MAXIMA SCIENCES LLC AND CLARK BRIGHT, BRIGHT THIN FILM SOLUTIONS

9:50 a.m. E-1 Parylene Coatings for Organic Field Effect TransistorsJ. Ulański1, I. Tszydel1, T. Marszałek1, A. Nosal2, M. Gazicki-Lipman2

1Molecular Physics, Technical University of Lodz, Lodz, Poland 2Institute for Materials Science and Engineering, Technical University of Lodz, Lodz, Poland

Monday PM . April 27The Donald M. Mattox Tutorial Presentation12:50 p.m. Norbert Schwarzer, About the Possibility for a Holistic Toolbox for the Next Generation of Surface and Coating Optimization - Taking the Example of TCOs in Touch Screens, see abstract on page 7.

Symposium on Coating Technologies for the Interconnected AgeMODERATORS: CHRIS STOESSEL, EASTMAN CHEMICAL COMPANY AND SCOTT WALTON, U.S. NAVAL RESEARCH

LABORATORY

1:40 p.m. IA-5 The Emergence of Flexible Electronics: Opportunities for Vacuum Deposition TechnologiesINVITED TALK H. Zervos IDTechEx Inc., Cambridge, MA

2:20 p.m. IA-6 Vacuum Vapor Phase Polymerized Polymeric Materials Having Both Transparent and Metal-Like PropertiesINVITED TALK R. FabrettoMawson Institute, University of South Australia, Mawson Lakes, Australia

Technical ProgramTECHCON 2015

10:10 a.m. IA-8 ALD Coatings for Enhanced Durability of Electronic DevicesSymposium on Coating Technologies for the Interconnected AgeINVITED TALK S. Graham Georgia Institute of Technology, Atlanta, GA

10:50 A.M. – 11:10 A.M. – BREAK

11:10 a.m. E-2 Perspectives of Development of TCO and TOS Thin Films Based on TiO2 CompositesJ. Domaradzki Wroclaw University of Technology, Wroclaw, Poland

11:30 a.m. E-3 Structural Electronics and Structural Super Capacitors in Early Warning Systems in Mechanical Heart Valves: New Concept with Emerging TechnologiesA. Subrahmanyam Department of Physics, IIT Madras, Chennai, India

11:50 a.m. E-4 Laser Induced Transfer of PVD Coatings from a PET Carrier onto Product Surfaces for Decorative and Functional PurposesR. Domnick ARA-Coatings GmbH & Co. KG, Erlangen, Germany

Plasma ProcessingMODERATOR: SCOTT WALTON, U.S. NAVAL RESEARCH LABORATORY

9:50 a.m. P-1 A New Frontier of Plasma Patterning: Atomic Layer EtchINVITED TALK Y. Zhang Applied Materials, Sunnyvale, CA

10:30 a.m. P-2 Application-Oriented Numerical Modeling of Plasma Processes for Material and Biological ApplicationsA. Obrusnik1,2, P. Synek1, Z. Bonaventura2, J.Vorac2, L. Zajickova2

1Department of Physical Electronics at the Faculty of Science, Masaryk University, Brno, Czech Republic2Plasma Technologies at CEITEC, Masaryk University, Brno, Czech Republic

10:50 A.M. – 11:10 A.M. – BREAK

11:10 a.m. P-3 High Transparent Barrier Coatings for Electronic EncapsulationN. Kaabeche1, P. Kelly1, L. Harland2

1Manchester Metropolitan University, Manchester, United Kingdom 2BOBST Manchester Ltd., Heywood, United Kingdom

11:30 a.m. P-4 Thin Film Vacuum Polymerization ApplicationsI. Fernandez1, A. Wennberg1, V. Bellido-Gonzalez2, B. Daniel2, J. Brindley2,H. Li2, D. Monaghan2, F. Papa3

1Nano4Energy SL, Madrid, Spain2Gencoa Ltd, Liverpool, United Kingdom3Gencoa Ltd., Davis, CA

11:50 a.m. P-5 Thin Film Coatings for Particle Accelerators S. Calatroni, P. Chiggiato, P. Costa Pinto, H. Neupert, A. Sublet, M. Taborelli, W. Vollenberg CERN-European Organization for Nuclear Research, Meyrin, Switzerland

10:10 a.m. IA-8 ALD Coatings for Enhanced Durability of Electronic DevicesSymposium on Coating Technologies for the Interconnected AgeINVITED TALK S. Graham Georgia Institute of Technology, Atlanta, GA

Monday AM . April 27

9:50 a.m. IA-1 Dropped Your Phone Down the Toilet? No Worries! -Improving the Reliability of Electronic DevicesINVITED TALK S. Coulson P2i Ltd., Abingdon, United Kingdom

9:50 a.m. P-1 A New Frontier of Plasma Patterning: Atomic Layer EtchINVITED TALK Y. Zhang Applied Materials, Sunnyvale, CA

1:40 p.m. IA-5 The Emergence of Flexible Electronics: Opportunities forVacuum Deposition TechnologiesINVITED TALK H. Zervos IDTechEx Inc., Cambridge, MA

2:20 p.m. IA-6 Vacuum Vapor Phase Polymerized Polymeric MaterialsHaving Both Transparent and Metal-Like PropertiesINVITED TALK R. FabrettoMawson Institute, University of South Australia, Mawson Lakes, Australia


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3:00 p.m. IA-7 μm Coatings for nm PrecisionINVITED TALK M.L.H. ter Heerdt ASML Netherlands B.V., Veldhoven, The Netherlands

3:40 P.M. – 4:00 P.M. - BREAK

Coatings for Energy Conversion and Related ProcessesMODERATORS: VOLKER SITTINGER, FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST,GERMANY AND DAVID SANCHEZ, MATERION ADVANCED CHEMICALS

4:00 p.m. EC-1 Constitution, Microstructure and Electrochemical Behaviour of Magnetron Sputtered Li-Ni-Mn-Co-O Thin Film Cathodes for Lithium-Ion BatteriesS. Ulrich, M. Strafela, J. Fischer, H. Leiste, M. Rinke, T. Bergfeldt, H.J. Seifert Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Eggenstein-Leopoldshafen, Germany

4:20 p.m. EC-2 Thin Film Battery ManufacturingD. Mount Ulvac Technologies, Inc., Methuen, MA

4:40 p.m. EC-3 Designed Nanoparticle Synthesis by Hollow Cathode Sputtering for Surface TreatmentsINVITED TALK U. Helmersson Department of Physics, Linköping University, Sweden

5:20 p.m. EC-4 Fabrication of Rechargeable All-Solid-State Thin-Film Lithium Batteries on Flexible Polymer SubstratesM. Chen, Y. Yan, W.-M. Liu, C. Zhou, Z.-Q. Guo, X.-F. Zhang, Y.-L. Wang, L. Li, G.-L. Zhang Beijing Institute of Aeronautical Materials, Aviation Industry Corporation of China, Beijing, China

Large Area CoatingsMODERATOR: MICHAEL ANDREASEN, VACUUM EDGE

1:40 p.m. L-1 Direct Fabrication of Graphene on SiO2 via Thin Film Stress EngineeringINVITED TALK V. Veerasamy Guardian Industries, Carelton, MI

2:20 p.m. L-2 Effects of Ion Bombardment Pretreatment on Glass Coating Processes and Post TemperingJ.M. Marco1, R. Alonso2, A. Cueva2, V. Bellido-Gonzalez3, H. Li3, A. Azzopardi3

1Ariño-Duglass, Zaragoza, Spain 2Universidad de Zaragoza, Zaragoza, Spain 3Gencoa Ltd, Liverpool, United Kingdom

2:40 p.m. L-3 Substrate Cooling and Tempering during High-Rate Vacuum CoatingJ.-P. Heinss, P. Lang, P. Ruppelt, D. Weiske Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

3:00 p.m. L-4 Process Perfection for Large Area Multi-Layer CoatingsL. Schwab1, J. Ellrich2

1dr. schwab Inspection Technology, Aichach, Germany 2Grenzebach Maschinenbau GmbH, Asbach-Baeumenheim, Germany

3:20 p.m. L-5 Large Area Coating - Achieving Superior Layer UniformityR. Rank, T. Niederhausen, G. Haasemann, J. LoehnertVON ARDENNE GmbH, Dresden, Germany

3:40 P.M. – 4:00 P.M. - BREAK

4:00 p.m. L-6 40 Years of Industrial Magnetron Sputtering in EuropeINVITED TALK U. Seyfert1, J. Struempfel2, U. Heisig3, J. Hartung1

1VON ARDENNE GmbH, Dresden, Germany2Senior Consultant PVD, Dresden, Germany3Research Institute Manfred von Ardenne (retired), Dresden, Germany

4:40 p.m. L-7 Layer Stack Diversity for Different Substrates and ApplicationsC. Köckert, M. Berendt VON ARDENNE GmbH, Dresden, Germany

5:00 p.m. L-8 Tuning of ITO Coating Properties in the Display Industry: Selected TopicsP. Lippens, C. Frei Umicore Thin Film Products AG, Balzers, Liechtenstein

5:20 p.m. L-9 Applying the “Upgraded Berg Model” to Predict Hysteresis Free Reactive SputteringE. Sarhammar, T. Nyberg, S. Berg Solid State Electronics, Uppsala University, Uppsala, Sweden

3:00 p.m. IA-7 μm Coatings for nm PrecisionINVITED TALK M.L.H. ter Heerdt ASML Netherlands B.V., Veldhoven, The Netherlands

High Power Impulse Magnetron Sputtering (HIPIMS)MODERATORS: JOLANTA KLEMBERG-SAPIEHA, ÉCOLE POLYTECHNIQUE DE MONTRÉAL, CANADA AND ARUTIUN

EHIASARIAN, SHEFFIELD HALLAM UNIVERSITY, UNITED KINGDOM

1:40 p.m. HP-1 Thin Films Deposited by Reactive HIPIMS: From Plasma Diagnostics to Improvement of the Solar Cells EfficiencyINVITED TALK P.-Y. Jouan Institut des Matériaux Jean Rouxel, Nantes, France

2:20 p.m. HP-2 Excellent Adhesion on Plastics using HIPIMSR. Bandorf1, S. Waschke2, G. Grundmeier2, G. Bräuer1

1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany, 2Technische und Makromolekulare Chemie, Universität Paderborn, Paderborn, Germany

2:40 p.m. HP-3 Mechanical Bending of the Indium Tin Oxide Films on Polyethylene Terephthalate Deposited by High Power Impulse Magnetron SputteringY.-H. Chen, Y.-C. Chen, J.-L. He Department of Materials Science and Engineering, Feng Chia University, Taichung City, Taiwan

3:00 p.m. HP-4 HIPIMS ITO Films from a Rotating Cylindrical Cathode SPONSORED STUDENT PRESENTATION F.C. Carreri, A. Sabelfeld, H. Gerdes, R. Bandorf, G. Bräuer Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

3:20 p.m. HP-5 Adjustment of Plasma Properties in Magnetron Sputtering by Pulsed Powering in Mixed Unipolar and Bipolar ModeS. Barth, H. Bartzsch, D. Glöss, P. Frach, M. Gittner, R. Labitzke Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

3:40 P.M. – 4:00 P.M. – BREAK

MODERATORS: JOLANTA KLEMBERG-SAPIEHA, ÉCOLE POLYTECHNIQUE DE MONTRÉAL, CANADA AND RALF

BANDORF, FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST, GERMANY

4:00 p.m. HP-6 Controlled Reactive High-Power Impulse Magnetron Sputtering of Dielectric Oxide FilmsJ. Rezek, J. Vlcek, A. Belosludtsev Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Plzen, Czech Republic

4:20 p.m. HP-7 Different Approaches for Controlling a Reactive Sputter Process with MF Superimposed HIPIMSH. Gerdes1, R. Bandorf1, M. Mark2, T. Schütte3, G. Bräuer1

1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany2MELEC GmbH, Baden, Germany 3PLASUS, Kissing, Germany

4:40 p.m. HP-8 Plasma Pretreatment of Tungsten Carbide and Steels by High Power Impulse Magnetron SputteringA.P. Ehiasarian1, A. Oniszczuk1, T.J. Morton1, C.-F. Carlstrom2, M. Ahlgren2

1HIPIMS Technology Centre, Sheffield Hallam University, Sheffield, United Kingdom 2Sandvik Coromant, Stockholm, Sweden

5:00 p.m. HP-9 Higher Ionization and Deposition Rate of High Power Impulse Magnetron Sputtering Assisted by External Magnetic and Electric FieldX. Tian1, J. Hu1, R. Kou1, C. Gong1, P.K. Chu2

1State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin, China2Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China

Young Members Group/Mentors Meeting and Reception5:30 p.m. – 7:00 p.m.

Monday Evening . April 27HEURÉKA! Post Deadline Recent Developments SessionBeginning at 7:00 p.m.MODERATORS: HANA BARÁNKOVÁ AND LADISLAV BÁRDOS, UPPSALA UNIVERSITY, SWEDEN

SVC will continue to accept abstracts for the HEURÉKA! Session through March 1, 2015.

Monday . April 27

1:40 p.m. L-1 Direct Fabrication of Graphene on SiO2 via Thin Film StressEngineeringINVITED TALK V. Veerasamy Guardian Industries, Carelton, MI

4:00 p.m. L-6 40 Years of Industrial Magnetron Sputtering in EuropeINVITED TALK U. Seyfert1, J. Struempfel2, U. Heisig3, J. Hartung1

1VON ARDENNE GmbH, Dresden, Germany2Senior Consultant PVD, Dresden, Germany3Research Institute Manfred von Ardenne (retired), Dresden, Germany

4:40 p.m. EC-3 Designed Nanoparticle Synthesis by Hollow CathodeSputtering for Surface TreatmentsINVITED TALK U. Helmersson Department of Physics, Linköping University, Sweden

1:40 p.m. HP-1 Thin Films Deposited by Reactive HIPIMS: From PlasmaDiagnostics to Improvement of the Solar Cells EfficiencyINVITED TALK P.-Y. Jouan Institut des Matériaux Jean Rouxel, Nantes, France


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MODERATOR: DAVID GLOCKER, ISOFLUX INCORPORATED

10:40 a.m. MED-4 PVD for Medical Device ApplicationsINVITED TALK R. Radhakrishnan Medtronic, Inc., Santa Clara, CA

11:20 a.m. MED-5 Development of Effective QCM Biosensors by Cyclopropylamine Plasma Polymerization and Antibody Immobilization using Cross-Linking ReactionsSPONSORED STUDENT PRESENTATION E. Makhneva1,2, A. Manakhov1, L. Zajíčková12, P. Skládal3

1European Institute of Technology (CEITEC), Masaryk University, Brno, Czech Republic2Faculty of Science, Masaryk University, Brno, Czech Republic, 3RG Nanobiotechnology, Masaryk University, Brno, Czech Republic

11:40 a.m. MED-6 Evaluating True Coating Properties from an Indentation Measurement Series – A New Combination of Calotte Grinding and Indentation TestsN. Bierwisch, N. SchwarzerSaxonian Institute of Surface Mechanics SIO, Ummanz/Rügen, Germany

Large Area CoatingsMODERATOR: HARALD HAGENSTRÖM, VON ARDENNE GMBH, GERMANY

9:20 a.m. L-10 From Lab to Production, Examples for Technology Transfer of PVD-, CVD- and Atmospheric Pressure Plasma ProcessesINVITED TALK V. Sittinger, L. Schäfer, M. Armgardt, M. Höfer, M. Thomas, M. Eichler, A. Laukart, M. Vergöhl, S. Bruns, T. Zickenrott, A. Pflug, C.-P. Klages, G. BräuerFraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

10:00 a.m. L-11 Silver - One of the Last Frontiers for Rotatable Targets: Cold Spray Technology and Economic ConsiderationsA. Seapan1, T. Bruha2

1SAFINA Materials Inc, Conroe, TX 2SAFINA a.s., Vestec, Czech Republic

10:20 A.M. – 10:40 A.M. – BREAK

10:40 a.m. L-12 On-line Adjustable Magnetics in Rotatables for Improved Layer UniformityN. De Wilde, I. Van de Putte, W. De Bosscher Soleras Advanced Coatings, Deinze, Belgium

11:00 a.m. L-13 Large Area Coating: Solutions and Opportunities from High Power PulsingD. Christie, J. Pankratz, B. Kowal, H. Walde Advanced Energy Industries, Inc., Fort Collins, CO

11:20 a.m. L-14 Ensure High Deposition Rate and Excellent Film Quality with Mid-Frequency Power SuppliesU. Richter TRUMPF HUETTINGER GmbH + Co. KG, Freiburg, Germany

11:40 a.m. L-15 Raising the Bar for Oxide Deposition RatesD. Pelleymounter Advanced Energy Industries, Northfield, MN

12:00 p.m. L-16 Achievements with Bipolar Power Supplies in Dual Magnetron ProcessesK. Ruda, P. Ozimek, P. Lesiuk, A. Klimczak TRUMPF Huettinger Sp. z o.o., Zielonka, Poland

Emerging TechnologiesMODERATORS: CHRIS STOESSEL, EASTMAN CHEMICAL COMPANY AND MANUELA JUNGHÄHNEL, FRAUNHOFER

INSTITUTE FOR ELECTRON BEAM AND PLASMA TECHNOLOGY FEP, GERMANY

9:20 a.m. E-5 Thin Film Process Control and Optimization through Predictive ModelingG. Atanasoff, C. Metting AccuStrata, Inc., College Park , MD

9:40 a.m. E-6 Thin Film Coating Process Calibration by Index Dispersion Enhanced MonitoringW.E. Rodgers, L.S. Ring Eddy Company, Apple Valley, CA

10:00 a.m. E-7 Improvement of Optical Coating Properties Deposited by Reactive Electron Beam Evaporation Processes with Closed Loop Reactive Gas ControlF. Papa1, V. Bellido-Gonzalez2, D. Mongahan2

1Gencoa Ltd., Davis, CA 2Gencoa Ltd. Liverpool, United Kingdom

9:20 a.m. L-10 From Lab to Production, Examples for Technology Transferof PVD-, CVD- and Atmospheric Pressure Plasma ProcessesINVITED TALK V. Sittinger, L. Schäfer, M. Armgardt, M. Höfer, M. Thomas, M. Eichler,rrA. Laukart, M. Vergöhl, S. Bruns, T. Zickenrott, A. Pflug, C.-P. Klages, G. BräuerFraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany


Tuesday AM . April 28

TUESDAY AT A GLANCE A.M. Technical Sessions

• Keynote Presentation: 8:30 a.m.• Coatings and Processes for Biomedical and Environmental Applications• Large Area Coatings• Emerging Technologies• Protective, Tribological and Decorative CoatingsSpecial Events • 5K Fun Run and Walk 6:00 a.m.• Technology Forum Breakfast 7:00 a.m. – 8:15 a.m.Education Program• Reactive Sputter Deposition• Practice and Applications of High Power Impulse Magnetron Sputtering (HIPIMS) (AM)• Introduction to Ellipsometry (AM)• Introduction to Plasma Processing Technology (PM)• Plastics Optics - Coatings and Anti-Reflective Structures (PM)

P.M. Technical Sessions• Protective, Tribological and Decorative Coatings• Technology Forum: 12:40 p.m.• Poster Session: Oral Presentations 2:30 p.m.• Poster Session 3:30 p.m. – 6:00 p.m.• Meet the Experts Corner 3:30 p.m.Exhibit 12:00 p.m. – 6:00 p.m.• Reception in the Exhibit Hall 4:45 p.m. – 6:00 p.m.Special Events• Poolside Networking Mixer 6:00 p.m.

Technology Forum Breakfast7:00 a.m. – 8:15 a.m. See page 5 for topics and facilitators.

Keynote Presentation8:30 a.m. Carsten Herweg, Sensor Technology: From Automotive to Mobile (Phone) Applications, see abstract on page 6.

Coatings and Processes for Biomedical and Environmental ApplicationsMODERATOR: HANA BARÁNKOVÁ, UPPSALA UNIVERSITY, SWEDEN

9:20 a.m. MED-1 3D Electrospun Scaffolds for Vascular Graft Applications: Fine Tuning of Properties by Plasma-Assisted Etching and CoatingH. Savoji12,4, M. Maire4, A. Hadjizadeh3, A. Ajji13, S. Lerouge4,5, M.R. Wertheimer1,2

1École Polytechnique de Montréal, Institute of Biomedical Engineering, Montreal, Canada2École Polytechnique de Montréal, Department of Engineering Physics, Montreal, Canada3École Polytechnique de Montréal, Department of Chemical Engineering, Montreal, Canada4Centre Hospitalier de l’Université de Montréal, Laboratory of Endovascular Biomaterials, Research Centre, Montreal, Canada

5École de Technologie Supérieure, Montreal, Canada

9:40 a.m. MED-2 Characterization of Titanium Nitride Thin Films Deposited on Nylon 6 Nanofibers Substrates by High Vacuum Magnetron Sputtering and Titanium Nitride Nanotubes ManufactureD.M. Mihut1, K. Lozano2, C. Hilario2

1Mechanical Engineering Department, Mercer University, Macon, GA 2Department of Mechanical Engineering,University of Texas Pan American, Edinburg, TX

10:00 a.m. MED-3 Development of Nanostructured CrN/NbN Coatings for Medical Prosthesis Using HIPIMSP.Eh. Hovsepian1, A.P. Ehiasarian1, Y. Purandare1, A. Sugumaran1, I. Khan2

1Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield, United Kingdom2Biomet Europe, Swindon, United Kingdom

10:20 A.M. – 10:40 A.M. – BREAK

10:40 a.m. MED-4 PVD for Medical Device ApplicationsINVITED TALK R. Radhakrishnan Medtronic, Inc., Santa Clara, CA


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10:20 A.M. – 10:40 A.M. – BREAK

10:40 a.m. E-8 Operation of a Combined Sputter Deposition and Ion SourceD. Glocker1 and R. Belan2

1Isoflux Incorporated, Rochester, NY 2Kurt J. Lesker Company, Jefferson Hills, PA

11:00 a.m. E-9 Circular Ion Sources for Plasma Enhanced Atomic Layer Deposition Applications V. Bellido-Gonzalez1, D. Monaghan1, H. Li1, F. Papa2

1Gencoa Ltd., Liverpool, United Kingdom 2Gencoa Ltd., Davis, CA

11:20 a.m. E-10 Characterization of a High-Throughput Batch Fixture for Atomic Layer DepositionC.A. Outten, J.R. Abiva, D.W. Konopka Denton Vacuum, Inc., Moorestown, NJ

11:40 a.m. E-11 A New Auto Frequency Tuning AlgorithmC.H. Bock, H. Windisch, F. Freiburger TRUMPF Huettinger GmbH + Co. KG, Freiburg, Germany

Protective, Tribological and Decorative CoatingsMODERATORS: RONGHUA WEI, SOUTHWEST RESEARCH INSTITUTE AND TOBIAS BRÖGELMANN, RWTH AACHEN

UNIVERSITY, GERMANY

9:20 a.m. T-1 From 3D to 2D in MAX Phases as the Natural Ternary NanolaminatesINVITED TALK V. VishnyakovUniversity of Huddersfield, Huddersfield, United Kingdom

10:00 a.m. T-2 Effects of Surface Treatments and Coatings on Tribological Performance of Ti-6Al-4V in the Mixed Fretting and Gross Slip RegimesD. Cressman, B. Tury, G.L. DollTimken Engineered Surfaces Laboratories, The University of Akron, Akron, OH

10:20 A.M. – 10:40 A.M. – BREAK

10:40 a.m. T-3 Protective Hard ZrN-TiN Multilayer and Nanolaminate Coatings A. Raveh1,2, Z. Rożek1,3, T. Poirié1, E. Herrera1, E. Bousser1, L. Martinu1, J.E. Klemberg-Sapieha1

1Department of Engineering Physics, École Polytechnique Montréal, Montreal, Canada2Advanced Coatings Center, Rotem Industries Ltd., Arava, Israel 3Institute for Nanomaterials, Advanced Technologies and Innovation, Technical University of Liberec, Liberec, Czech Republic

11:00 a.m. T-4 Modified Diamond-Like Carbon Coatings (a-C:H:X) for Anti-Fouling ApplicationsM. Keunecke1, I. Bialuch1, M. Weber1, C. Stein1, K. Bewilogua1, G. Bräuer 2

1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany 2Institut für Oberflächentechnik, Technische Universität Braunschweig, Braunschweig, Germany

11:20 a.m. T-5 Influence of Precursor Ratio on the Tribological and Tribochemical Performance of Microwave PECVD Hydrogenated Diamond-like Carbon FilmsH. Zhao1, C. Wang1, D. Scurrb2, T. Liskiewicz1, I. Kolev3, A. Neville1

1University of Leeds, Institute of Functional Surfaces (iFS), School of Mechanical Engineering, Leeds, United Kingdom

2University of Nottingham, School of Pharmacy, Nottingham, United Kingdom 3IHI Hauzer Techno Coatings, Venlo, Netherlands

11:40 a.m. T-6 Industrial Microwave Carbon-Based Coatings on Plastic and Metal SubstratesI. Kolev1, D. Doerwald1, H. Zhao2, A. Nevile2, R. Tietema1, J. Landsbergen1

1IHI Hauzer Techno Coating, Venlo, The Netherlands2School of Mechanical Engineering, University of Leeds, Leeds, United Kingdom

9:20 a.m. T-1 From 3D to 2D in MAX Phases as the Natural TernaryNanolaminatesINVITED TALK V. VishnyakovUniversity of Huddersfield, Huddersfield, United Kingdom

Tuesday PM . April 28SVC Exhibit Opens!12:00 p.m. – 6:00 p.m.

Protective, Tribological and Decorative CoatingsMODERATORS: MICHAEL BURKINSHAW, CUMMINS TURBO TECHNOLOGIES, UNITED KINGDOM AND MARTIN

KEUNECKE, FRAUNHOFER INSTITUTE OF SURFACE ENGINEERING AND THIN FILMS IST, GERMANY

12:30 p.m. T-7 Carbon Based Multifunctional Coatings for Oil-Less Hermetic Compressor ApplicationsINVITED TALK J.D. Biasoli de Mello1,2

1Laboratório de Tribologia e Materiais, Universidade Federal de Uberlândia, Uberlândia, Brazil2Laboratório de Materiais, Florianópolis, Universidade Federal de Santa Catarina, Brazil

1:10 p.m. T-8 Multilayer PVD Coatings with High Corrosion Resistance at High TemperaturesJ.A. García1, S. Mato2, I. Ciarsolo1, F.J. Pérer Trujillo2, J. Barriga1

1IK4-TEKNIKER, Eibar, Spain 2Complutense University of Madrid, Madrid, Spain

1:30 p.m. T-9 Nano-Grained Hard Protective Titanium Carbide Coatings Prepared by PECVDSPONSORED STUDENT PRESENTATION J. Lengaigne1, E. Herrera1, A. Raveh1,2, E. Bousser1,L. Martinu1, J.E. Klemberg-Sapieha1

1École Polytechnique de Montréal, Department of Engineering Physics, Montréal, Canada 2Rotem Industries Ltd., Advanced Coatings Center, Arava, Israel

1:50 p.m. T-10 The Influence of TiC Buffer Layers on the Structure and Mechanical Performance of Diamond Films on Cemented CarbideM. Liu1, T. Zhu1, Y. Chen1, J. DiBattista2, E. Chan2, Y. Yang2

1Department of Electronic Information Materials, Shanghai University, Shanghai, China, 2Darly Photonics Composite Materials (Shanghai) Corp., Shanghai, China

Forum: A View to the Future: Coatings and Materials in the Interconnected Age12:40 p.m. – 2:00 p.m.FORUM MODERATORS: CARL LAMPERT, STAR SCIENCE; RIC SHIMSHOCK, MLD TECHNOLOGIES LLC; CHRIS

STOESSEL, EASTMAN CHEMICAL COMPANY; MICHAEL ANDREASEN, VACUUM EDGE; DAVID SANCHEZ, MATERION

ADVANCED CHEMICALS; HARRY ZERVOS, IDTECHEX

Poster Presentations 2:30 p.m. Oral Presentation Session: Three minute, three PowerPoint slide presentations before Poster Session.

Poster Session 3:30 – 6:00 p.m. in the Exhibit Hall

Poster-1 On-Axis RF-Magnetron Sputtering of a Single Stoichiometric Target for the Preparation BaTiO3 Thin Films: Effect of RF Power and Voltage on the Re-Sputtering and Substrate EtchingR. Thomas1, R. Nouar1, B. Higuera Valle1, F. Ambriz Vargas1, A. Sarkissian2, A. Ruediger2

1INRS-Énergie Matériaux et Télécommunications, Varennes, Canada 2Plasmionique Inc., Varennes, Canada

Poster-2 How to Design Contact Experiments Properly to Test the Adhesion Performance of a Coating Substrate SystemN. Bierwisch, N. Schwarzer Saxonian Institute of Surface Mechanics SIO, Ummanz, Germany

Poster-3 Quantifying Time-Dependent Mechanical Behavior of Visco-Elastic Materials or Materials at Elevated TemperaturesM. Fuchs, N. Bierwisch, N. Schwarzer Saxonian Institute of Surface Mechanics, Ummanz, Germany

Poster-4 Nanocoatings for Corrosion Protection of Titanium Alloy in Aggressive Environment Containing Fluoride Ions M. Grobelny1, M. Kalisz1, M. Sochacki2, J. Szmidt2

1Motor Transport Institute, Warsaw, Poland 2Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland

12:30 p.m. T-7 Carbon Based Multifunctional Coatings for Oil-Less Hermetic Compressor ApplicationsINVITED TALK J.D. Biasoli de Mello1,2

1Laboratório de Tribologia e Materiais, Universidade Federal de Uberlândia, Uberlândia, Brazil2Laboratório de Materiais, Florianópolis, Universidade Federal de Santa Catarina, Brazil

Tuesday . April 28


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Poster-5 Comparison of Structural, Mechanical and Corrosion Properties of Thin Graphene/TiO2 Hybrid Systems Formed on Ti-Al-V Alloy in Biomedical ApplicationsM. Kalisz1, M. Grobelny1, M. Mazur2, D. Wojcieszak2, M. Dominik1,4, M. Świniarski3,J. Domaradzki2, D. Kaczmarek2

1Motor Transport Institute, Centre for Material Testing and Mechatronics, Warsaw, Poland, 2Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Wroclaw, Poland

3Faculty of Physics, Warsaw University of Technology, Warsaw, Poland 4Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland

Poster-6 Characterization and Study of Gas Barrier Property Using PECVD of Silicon Nitride Film by Radio Frequency (40MHz) Plasmas at Low TemperatureJ.S. Lee, K.S. Shin, S.B. Jin, J.G. Han Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon, Korea

Poster-7 Square Wave or Sine Wave: Choice of Power Supply in MF SputteringM. Heintze1, S. Ulrich2

1TRUMPF Hüttinger GmbH + Co. KG, Freiburg, Germany 2Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

Poster-8 Design and Testing of a Coating System to Extend the Use of Commodity Plastics in Engineering ApplicationsS. Carley, A. Neville, H. Zhao Institute of Functional Surfaces (iFS), University of Leeds, Leeds, United Kingdom

Poster-9 Evaluating the Corrosion Behaviour of PVD Al-Based Coatings by Characterising the Relaxation Time of the Open Circuit Potential in (AC)DC/AC Cyclic TestsF. Indeir, A. Matthews and A. Leyland Department of Materials Science and Engineering, University of Sheffield, Sheffield, United Kingdom

Poster-11 High Speed, High Resolution Coating InspectionT.A Potts Dark Field Technologies Inc., Orange, CT

Poster-12 Consequences of Roll-Barrier Contact in Roll-to-Roll Processing of a Permeation BarrierH. Klumbies1, S. Kreher1, J. Fahlteich2, F. Nehm3, L. Mueller-Meskamp3, P. Schlott1,S. Van Eek1, T. Winkler1

1FHR Anlagenbau GmbH, Ottendorf-Okrilla, Germany 2Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany3Institut fuer Angewandte Photophysik, TU Dresden, Dresden, Germany

Meet the Experts Corner3:30 p.m. - 4:30 p.m.

Exhibit Reception4:45 p.m. – 6:00 p.m. All TechCon Conference Registrants and Exhibitors Receive a Complimentary Drink Ticket

Tuesday Evening . April 28Poolside Networking Mixer 6:00 p.m.All are Invited to AttendAfter the Exhibit Reception ends on Tuesday in the Exhibit Hall, everyone is invited to attend a pool-side Networking Mixer at the Terra Courtyard in the Hyatt Regency Santa Clara. Join friends, colleagues, and make new connections in a relaxed atmosphere with light refreshments provided by SVC. When registering for the conference on-line, please indicate your attendance at this event.


Wednesday AM . April 29

WEDNESDAY AT A GLANCE A.M. Technical Sessions

• Keynote Presentation 8:30 a.m.• Coatings for Energy Conversion and Related Processes• Plasma Processing• Optical Coatings• Large Area CoatingsEducation Program• Sputter Deposition in Manufacturing• Troubleshooting for Thin Film Deposition Processes• Properties and Applications of Tribological Coatings (AM)

P.M. Technical Sessions• Donald M. Mattox Tutorial 1:00 p.m.• Meet the Experts Corner 2:00 p.m.Exhibit 10:00 a.m. – 5:00 p.m.• Featured Business Topics Presentation 1:50 p.m.• Vendor Innovators Showcase 2:30 p.m.• Beer Blast 3:30 p.m. – 5:00 p.m.• Best Poster Presentation 4:00 p.m.

Keynote Presentation8:30 a.m. Kostya Ostrikov, Graphene Micro-Webs and Other Things: 3D Nanoscale Connectivity for an Interconnected World, see abstract on page 6.

Coatings for Energy Conversion and Related ProcessesMODERATORS: CARL LAMPERT, STAR SCIENCE AND CLAES GRANQVIST, UPPSALA UNIVERSITY, SWEDEN

9:20 a.m. EC-5 An Economic Analysis of Photovoltaics versus Traditional Energy Sources: Where are we Now and Where Might we be in the Near Future?INVITED TALK M. Woodhouse National Renewable Energy Laboratory, Golden, CO

10:00 a.m. EC-6 Atomic Layer Deposition for Interface Engineering in Dye Sensitized and Perovskite Solar CellsV. Zardetto1, F. Di Giacomo2, T.M. Brown2, A. Di Carlo2, A. D’Epifanio3, S. Licoccia3,E. Kessels1, M. Creatore1

1Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands2Centre for Hybrid and Organic Solar Energy (CHOSE), University of Rome - Tor Vergata, Rome, Italy3Department of Chemical Science and Technologies, University of Rome - Tor Vergata, Rome, Italy

10:20 a.m. EC-7 Enhancement of Electrical and Optical Properties of Reactively Sputtered ITO Films by Flash Lamp AnnealingC. David1, Y. Zhang1, P. Prunici1, B. Tinkham1, A. Panckow1, A. Kastner2, C. Simons2

1Solayer GmbH, Kesselsdorf, Germany 2Heraeus Materials Technology GmbH, Hanau, Germany

10:40 A.M. – 11:00 A.M. – BREAK

11:00 a.m. EC-8 Commercialization of Large Area Dynamic GlazingINVITED TALK S. Kailasam View, Inc., Milpitas, CA

11:40 a.m. EC-9 Electrochromics and Thermochromics: Towards a New Paradigm for Energy Efficient BuildingsC.G. Granqvist The Ångström Laboratory, Uppsala University, Uppsala, Sweden

12:00 p.m. EC-10 Optical Modulation and Characterization of CrNxOy for High Performance Solar Heat Absorbing CoatingsJ. Liu, Z.-Q. Sun, H. Wang China Building Materials Academy, Beijing, China

SVC Exhibit Opens!10:00 a.m. – 5:00 p.m.

9:20 a.m. EC-5 An Economic Analysis of Photovoltaics versus TraditionalEnergy Sources: Where are we Now and Where Might we be in the NearFuture?INVITED TALK M. Woodhouse National Renewable Energy Laboratory, Golden, CO

11:00 a.m. EC-8 Commercialization of Large Area Dynamic GlazingINVITED TALK S. Kailasam View, Inc., Milpitas, CA


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11:40 a.m. O-5 Imaging of Impurities and Imperfections, Micro- and Nanoscaled Pattern on Surfaces and in Films: Microscopic Techniques vs. EllipsometryU. Beck, A. Hertwig, M. Sahre, M. Weise, J.M. Stockmann BAM, Berlin, Germany

12:00 p.m. O-6 Finite-Difference Time-Domain Method for Data Analysis of Spectroscopic Ellipsometry SPONSORED STUDENT PRESENTATION Y. Foo, J.A. Zapien Center of Super Diamond and Advance Films (COSDAF) and Department of Physics and Material Science, City University of Hong Kong, Hong Kong SAR, China

Large Area CoatingsMODERATOR: BRENT BOYCE, GUARDIAN INDUSTRIES CORP.

9:20 a.m. L-17 Holistic Approach of Plasma, Transport and Film Growth SimulationT. Melzig1, A. Pflug1, M. Siemers1, S. Lucas2, P. Moskovkin2, A. Daniel3, M. Jupé4, M. Turowski4

1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany 2Université de Namur, Namur, Belgium 3Centre de Recherches Métallurgiques (CRM), Liège, Belgium 4Laser Zentrum Hannover e.V. (LZH), Hannover, Germany

9:40 a.m. L-18 Multi-Scale Mechanical Behaviour of Plasma Electrolytic Oxide (PEO) Coatings on Aluminium AlloysA. Jarvis1, A. Yerokhin1, N. Schwarzer2

1Department of Materials Science and Engineering, University of Sheffield, Sheffield, United Kingdom 2Saxonian Institute of Surface Mechanics, Ummanz, Germany

10:00 a.m. L-19 Deposition of a Release Coatings via an RF Low Pressure Plasma Process and Comparison to the Plasma Deposition at Atmospheric PressureK. Vissing, M. Ott, P. Bitomsky, U. LommatzschFraunhofer Institute for Manufacturing Technology and Advanced Materials IFAM, Bremen, Germany

10:20 a.m. L-20 Optical and Mechanical Properties of Ti-, Si-, and Zr-Based Top LayersJ. Oberste-Berghaus, R. Van Nuffel, K. De Jaeger, A. Das, W. De BosscherSoleras Advanced Coatings, Deinze, Belgium

Plasma ProcessingMODERATOR: LENKA ZAJICKOVA, MASARYK UNIVERSITY, CZECH REPUBLIC

9:20 a.m. P-6 A Novel Magnetron Sputtering ECR Ion Source - An Emerging Tool for the Production of High Current Metal Ion Beams and Large Area Surface ProcessingT. Weichsel1, U. Hartung1, T. Kopte1, M. Kreller2, A. Silze2, G. Zschornack3,4

1Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany 2DREEBIT GmbH, Grossroehrsdorf, Germany 3Institute of Solid State Physics, Dresden University of Technology, Dresden, Germany 4Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden- Rossendorf e.V., Dresden, Germany

9:40 a.m. P-7 Aspects of RF Power on Rotary CathodesJ. German, R. Lovro, T. Strait Sputtering Components, Inc., Owatonna, MN

10:00 a.m. P-8 Drift Waves in Magnetron Sputtering PlasmasM. Siemers, A. Pflug, T. Melzig Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

10:20 A.M. – 11:00 A.M. – BREAK

MODERATOR: MARIADRIANA CREATORE, EINDHOVEN UNIVERSITY OF TECHNOLOGY, THE NETHERLANDS

11:00 a.m. P-9 Carboxyl-Rich Films Prepared by Maleic Anhydride – Acetylene Copolymerization Using Atmospheric Pressure Dielectric Barrier DischargeL. Zajickova1, A. Manakhov1, M. Michlicek1, M. Elias1, E. Makhneva1, J. Cechal2, D. Pavlinak1

1Masaryk University, Brno, Czech Republic 2Brno University of Technology, Brno, Czech Republic

11:20 a.m. P-10 Crystalline AZO Film Synthesis of High Conductivity at Low Temperature by Particle Energy Control with Diagnostics in Remote Magnetron SputteringS.B. Jin, B.B. Sahu, J.B. Kim, M. Kumar, J.G. Han Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Korea

11:40 a.m. P-11 Hydrogen Radical Generation and Optimization in a Remote Plasma SourceS. Polak1, D. Carter1, A. Bhoj2, A. Roy2

1Advanced Energy Industries, Fort Collins, CO 2ESI US R&D Inc., Huntsville, AL

12:00 p.m. P-12 Controlling the Flux of Reactive Species in Electron Beam Generated Plasmas S.G. Walton, D.R. Boris, S.C. Hernández, Tz.B. Petrova, G.M. Petrov Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC

Optical CoatingsMODERATORS: ANGUS MACLEOD, THIN FILM CENTER INC. AND ROBERT SARGENT, JDSU

9:20 a.m. O-1 Mixed Oxides for Optical Functional Coatings Prepared by Magnetron SputteringS. Bruns, T. Zickenrott, M. Vergöhl Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany

9:40 a.m. O-2 Nanostructured ZNO Films Prepared by Hydro-Thermal Chemical Deposition and Microwave-Activated Reactive SputteringY. Alajlani1,2, C. Zhao1, S. Moh1, D. Gibson1, Y.Q. Fu1, F. Placido1

1Thin Film Centre, Scottish Universities Physics Alliance (SUPA), University of the West of Scotland, Paisley, United Kingdom 2Department of Physics, Jazan University, Jazan, Saudi Arabia

10:00 a.m. O-3 Metrology of Optical Coatings: The R&T Direct Absorption Method for the Determination of Low Absorption Levels in Dielectric Films R. Vernhes and L. MartinuDepartment of Engineering Physics, École Polytechnique de Montréal, Montréal, Canada

10:20 A.M. – 11:00 A.M. – BREAK

11:00 a.m. O-4 Infrared Spectroscopic Analysis of Thin FilmsINVITED TALK H. Tompkins1,2,3

1Consultant, Chandler, AZ, 2Physics Department, New Mexico State University, Las Cruces, NM, 3Physics Department, University of Missouri, Columbia, MO

Tuesday - Wednesday . April 28-29

11:00 a.m. O-4 Infrared Spectroscopic Analysis of Thin FilmsINVITED TALK H. Tompkins1,2,3

1Consultant, Chandler, AZ, 2Physics Department, New Mexico State University, Las Cruces, NM, 3Physics Department, University of Missouri, Columbia, MO

Wednesday PM . April 29The Donald M. Mattox Tutorial Program1:00 p.m. André Anders, Magnetron Sputtering: An Unfinished Journey, see abstract on page 7.

Business Topics Feature Presentation

1:50 p.m. BT-1 Winning Business in the Federal Marketplace – A Proven Process for SuccessINVITED TALK M. Summers, W. Freeland Organizational Communications Inc., Orlando, FL

Vendor Innovators Showcase10-minute oral presentations will begin at 2:30 p.m. Presentation dates and times will be announced in the Final Program. SVC will continue to accept abstracts for the Vendor Innovators Showcase through March 1, 2015.

Ultrafast Arc Management for High Deposition Rates in Reactive Magnetron SputteringP. Wiedemuth, M. Heintze HÜTTINGER Elektronik GmbH + Co. KG, Freiburg, Germany

CODE Software Generation 4 – Easy, Enhanced and Elegant Optical Thin Film Analysis and DesignW. Theiss W. Theiss Hard- and Software, Aachen, Germany

Meet the Experts Corner2:00 – 3:00 p.m.

SVC Exhibit Beer Blast!3:30 p.m. – 5:00 p.m.

1:50 p.m. BT-1 Winning Business in the Federal Marketplace – A Proven Process for SuccessINVITED TALK M. Summers, W. Freeland Organizational Communications Inc., Orlando, FL


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TECHCON 2015 Technical ProgramWebTech Roll-to-Roll Coatings for High-End ApplicationsMODERATOR: ALBERTO ARGOITIA, JDSU

9:20 a.m. IA-9 Flexible OLEDs for Display and Lighting ApplicationsSymposium on Coating Technologies for the Interconnected AgeINVITED TALK T. van Mol Holst Centre, TNO, Eindhoven, The Netherlands

10:00 a.m. W-1 Ultra-High Multi-Layer Barriers on Weathering Stable Substrates for Outdoor ApplicationJ. Fahlteich1, C. Steiner1, O. Miesbauer2, S. Amberg-Schwab3, K. Noller2, N. Schiller1

1Fraunhofer Institute for Electron Beam and Plasma Technology and COMEDD - FEP Dresden, Germany

2Fraunhofer Institute for Process Engineering and Packaging IVV, Freising, Germany 3Fraunhofer Institute for Silicate Research ISC, Würzburg, Germany

10:20 a.m. W-2 Roll-to-Roll Vacuum Coating System for Development of Flexible Substrates for OLED LightingH. Tamagaki1, K. Tanaka1, A. Oishi1, T. Furukawa2

1Kobe Steel, Ltd., Takasago, Japan 2Innovation Center for Organic Electronics, Yamagata University, Yonezawa, Japan

10:40 A.M. – 11:00 A.M. - BREAK

11:00 a.m. W-3 Ultra-High Moisture Barriers from PVD and ALD at a Wide Range of Climate ConditionsSPONSORED STUDENT PRESENTATION F. Nehm1, H. Klumbies1, J. Fahlteich2, L. Müller-Meskamp1, K. Leo1

1Institut für Angewandte Photophysik, TU Dresden, Dresden, Germany 2Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

11:20 a.m. W-4 Low Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation BarriersA.-M. Andringa, A.Perrotta, K. de Peuter, H. Knoops, E. Kessels, M. CreatoreDepartment of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands

11:40 a.m. W-5 Recent Advances in Vacuum Deposited Hard Coats on PET FilmJ. DiBattista, E. Chan, Y. Yang Darly Custom Technology, Inc. Windsor, CT

12:00 p.m. W-6 Mechanical Properties of Thin Barrier Coatings Deposited by PE-ALD on Polymer FilmsP. Fayet1, E.R. Dickey2

1Tetra Pak (Suisse) SA, Romont, Switzerland 2Lotus Applied Technology, Hillsboro, OR

Optical CoatingsMODERATORS: JAMES HILFIKER, J.A. WOOLLAM CO. INC. AND ULRIKE SCHULZ, FRAUNHOFER INSTITUTE FOR

APPLIED OPTICS AND PRECISION ENGINEERING IOF, GERMANY

9:20 a.m. O-7 The Reversed Admittance LocusA. Macleod, C. Clark Thin Film Center Inc., Tucson, AZ

9:40 a.m. O-8 Do it Yourself – Automated Thin Film Design using Genetic AlgorithmsW. Theiss W. Theiss Hard- and Software, Aachen, Germany

10:00 a.m. O-9 From Design through Manufacture with Direct Monochromatic MonitoringA. Zoeller, M. Boos, D. Arhilger, H. Hagedorn Leybold Optics GmbH, Alzenau, Germany

10:20 a.m. O-10 A New Generation of Optical Monitoring Techniques for Optical Thin FilmsB. Barney Telemark, Battle Ground, WA

10:40 A.M. – 11:00 A.M. - BREAK

11:00 a.m. IA-11 Complex Optical Coatings for Sensor Applications and on Zeonex Substrates for Light Weight Mobile ApplicationsSymposium on Coating Technologies for the Interconnected AgeINVITED TALK T. Geldhauser Optics Balzers AG, Balzers, Principality of Liechtenstein

Thursday AM . April 30

THURSDAY AT A GLANCE A.M. Technical Sessions

• Keynote Presentation 8:30 a.m.• Protective, Tribological and Decorative Coatings• WebTech Roll-to-Roll Coatings for High-End Applications• Optical CoatingsEducation Program• Diamond Like Carbon Coatings – from Basics to Industrial Realization (AM)• Atmospheric Plasma Technologies (AM)• Manufacture of Precision Evaporative Coatings (AM)• Introduction to Atomic Layer Deposition (ALD) Processes, Chemistries and Applications (AM)

P.M. Technical Sessions• Special Presentation with SVC Sponsored Lunch 12:40 p.m.• Protective, Tribological and Decorative Coatings• WebTech Roll-to-Roll Coatings for High-End Applications• Optical CoatingsSpecial Events• Special Presentation with SVC Sponsored Lunch 12:40 p.m.

Keynote Presentation8:30 a.m. Neil Morrison, Roll-to-Roll Processing for Flexible Devices and Components Utilized in Wearable and Mobile Electronics, see abstract on page 6.

Protective, Tribological and Decorative CoatingsMODERATORS: AVI RAVEH, ROTEM INDUSTRIES LTD., ISRAEL AND GARY DOLL, UNIVERSITY OF AKRON

9:20 a.m. T-11 Surface Engineering of Turbomachinery Components to Meet Future Industry TrendsINVITED TALK M. Burkinshaw Cummins Turbo Technologies, Huddersfield, United Kingdom

10:00 a.m. T-12 Wear Mechanism of Mo-W Doped Carbon-Based Coating during Boundary Lubricated Sliding SPONSORED STUDENT PRESENTATION P. Mandal, A.P. Ehiasarian, P.Eh. Hovsepian Nanotechnology Centre for PVD Research, Sheffield Hallam University, Sheffield, United Kingdom

10:20 a.m. T-13 DLC Films on Glass and Plastic by In-Line PECVDJ. Madocks, P. Ngo General Plasma, Inc., Tucson, AZ

10:40 A.M. – 11:00 A.M. - BREAK

11:00 a.m. T-14 Studies of Porosity in Ceramic Titanium Nitride Oxide PVD Coatings Z. Wang, J. Crowshaw, M. Akkaoui Tanury Industries, Lincoln, RI

11:20 a.m. T-15 Plasma Immersion Ion Deposition (PIID) of Diamond-Like Carbon (DLC) Coatings for Automotive and Petroleum ApplicationsR. Wei, C. Ellis-Terrell, C. Rincon, and J. Lin Southwest Research Institute, San Antonio, TX

11:40 a.m. T-16 Minimizing Mechanical Losses of Rolling-Sliding Contacts in Automobile Power Train by Diamond-Like Carbon Coatings under Elasto-Hydrodynamic LubricationK. Bobzin1, T. Brögelmann1, K. Stahl2, K. Michaelis2, J. Mayer2, M. Hinterstoisser2

1Surface Engineering Institute, RWTH Aachen University, Aachen, Germany2Institute for Machine Elements, TU Munich, Garching, Germany

12:00 p.m. T-17 New and Most Recent Ultra-Hardness Findings – Real or Nonsense?M. Fuchs, N. Schwarzer Saxonian Institute of Surface Mechanics, Ummanz, Germany

9:20 a.m. T-11 Surface Engineering of Turbomachinery Components to Meet Future Industry TrendsINVITED TALK M. Burkinshaw Cummins Turbo Technologies, Huddersfield, United Kingdom

9:20 a.m. IA-9 Flexible OLEDs for Display and Lighting ApplicationsSymposium on Coating Technologies for the Interconnected AgeINVITED TALK T. van Mol Holst Centre, TNO, Eindhoven, The Netherlands

11:00 a.m. IA-11 Complex Optical Coatings for Sensor Applications and onZeonex Substrates for Light Weight Mobile ApplicationsSymposium on Coating Technologies for the Interconnected AgeINVITED TALK T. Geldhauser Optics Balzers AG, Balzers, Principality of Liechtenstein


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3:20 p.m. T-24 On the Physicochemical Structure of the Silicon-Containing Adhesion Interlayer in DLC Deposited on AISI 4140SPONSORED STUDENT PRESENTATION E.R. Petry1, F. Cemin1, L.T. Bim1, C.M. Menezes1,M.E.H. Maia da Costa2, I.J.R. Baumvol3, C. Aguzzoli1, S.S. Tomiello4, and C.A. Figueroa14

1Universidade de Caxias do Sul, Centro de Ciências Exatas e Tecnologia, Caxias do Sul-RS, Brazil

2PUC-Rio, Departamento de Física, Rio de Janeiro, Brazil 3Universidade Federal do Rio Grande do Sul, Instituto de Física, Porto Alegre, Brazil4Plasmar Tecnologia Ltda., Caxias do Sul, Brazil

WebTech Roll-to-Roll Coatings for High-End ApplicationsMODERATOR: JOHN FAHLTEICH, FRAUNHOFER INSTITUTE FOR ELECTRON BEAM AND PLASMA TECHNOLOGY FEP, GERMANY

1:20 p.m. IA-10 Roll to Roll Processing of Thin Flexible Energy DevicesSymposium on Coating Technologies for the Interconnected AgeINVITED TALK B. Berland, ITN Energy Systems, Inc., Littleton, CO

2:00 p.m. W-7 Tailoring Roll to Roll ALD Barrier Processes for OLED, Thin Film PV, and Commercial Packaging ApplicationsW.A. Barrow, B.L. Danforth, E.R. Dickey Lotus Applied Technology, Hillsboro, OR

2:20 p.m. W-8 Nanostructuring of Ethylene Tetrafluoroethylene Films by a Low Pressure Plasma Treatment ProcessSPONSORED STUDENT PRESENTATION C. Steiner1,2, J. Fahlteich1, E. Rädlein2

1Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany 2Technische Universität Ilmenau, Ilmenau, Germany

2:40 p.m. W-9 Roll to Roll Sputtered Titanium and TiO2 from a Dual Rotatable Cathode, using Open and Closed Loop Process Control and Comparing AC and Square Wave Bipolar Power DeliveryD. Wickens, N. Butcher Bobst Manchester Ltd., Heywood, United Kingdom

3:00 p.m. W-10 Applying Co-Sputtering to Increase DDR during Deposition of Titanium Oxides and Silicon OxidesV. Kozlov, J. Kazuss, E. Machevskis SIDRABE Inc., Riga, Latvia

3:20 p.m. W-11 Real Time Color Measurement System with Calibrated Output for Process ControlM. Eberhardt m-u-t GmbH, Neu-Ulm, Germany

Optical CoatingsMODERATOR: BRYANT HICHWA, SONOMA STATE UNIVERSITY (RETIRED)

1:20 p.m. O-13 Broadband and Wide-Angle Antireflection Coatings Containing Plasma-Etched Organic Layers U. Schulz, F. Rickelt, P. Munzert, H. Ludwig, N. Kaiser Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany

1:40 p.m. O-14 Antireflection Coating Production Process Without an EBeam Source and Without ScatteringR.R. Willey1, K. Patel2

1Willey Optical, Consultants, Charlevoix, MI 2Luma Optics Pvt Ltd, Mumbai, India

2:00 p.m. O-15 Advanced Deposition Technology for Astronomical and Space Applications, Part II: Ion-Assisted Filtered Cathodic Arc Deposition (IFCAD)M.L. Fulton, R.S. Dummer, M. Zimmerman Surface Optics Corporation, San Diego, CA

Thursday PM . April 30Special Presentation with SVC Sponsored Lunch12:40 p.m. Fred Van Milligen, Enabling a New Generation of Mobile Devices through Wafer-Level Integration of Optical Filters and Electronics, see abstract on page 7.

Protective, Tribological and Decorative CoatingsMODERATORS: JOSE DANIEL BIASOLI DE MELLO, UNIVERSIDADE FEDERAL DE UBERLANDIA AND UNIVERSIDADE

FEDERAL DE SANTA CATARINA, BRAZIL AND PAPKEN HOVSEPIAN, SHEFFIELD HALLAM UNIVERSITY, UNITED

KINGDOM

1:20 p.m. T-18 Mechanical, Tribological and Corrosion Properties of Aluminium-Toughened PVD Nitrogen-Doped Chromium Coatings J. Kavanagh, C. Iamvasant, A. Leyland, A. Matthews Department of Materials Science and Engineering, University of Sheffield, Sheffield, United Kingdom

1:40 p.m. T-19 Sliding Wear Behaviour of Graphene against Ti-6Al-4V: A Comparison with Polycrystalline Diamond and Hydrogenated Diamond-Like Carbon CoatingsS. Bhowmick, A. Banerji, M.Z.U. Khan, A.T. Alpas Mechanical Automotive and Materials Engineering Department, University of Windsor, Windsor, Canada

2:00 p.m. T-20 The Effect of Growth Conditions on the Surface Energy, Optical Properties and Saline Corrosion Resistance of Amorphous Chromium Oxide Thin Films Prepared by Reactive Magnetron SputteringJ. Kavanagh1, A.M. Oje2, A.A. Ogwu2

1Department of Materials Science and Engineering, Sheffield University, Sheffield, United Kingdom

2Thin Film Centre, School of Engineering, University of the West of Scotland, Paisely, United Kingdom

2:20 p.m. T-21 PVD Chromium Coatings Replacing Decorative Chromium Electroplated Coatings on PlasticsG. Vergason1, M. Fitch1, R. Smith1, T. Jochum2

1Vergason Technology, Inc., Van Etten, NY 2jobaTEC GmbH, Sankt Wendel, Germany

2:40 p.m. T-22 A New Energetic Approach to Ion Plating Plasma Assisted IPPA and its Innovative use in a Roll-to-Roll Configuration for Chains TreatmentC. Misiano1, P. Matarazzo1, M. Pezzilli1, E. Bemporad2

1Romana Film Sottili Anzio, Italy2University of Roma 3, Rome, Italy

3:00 p.m. T-23 Tribological Properties of Titanium Doped Tungsten Disulphide/Titanium Multilayers Applied as Superficial Protection during Limit Layer Lubrication SPONSORED STUDENT PRESENTATION J.M. González1, C. Ortega1, H. Mohseni2, T.W. Scharf2

F. Sequeda1

1Universidad del Valle, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales RDAI, Cali, Colombia

2University of North Texas, Laboratory for Moving Mechanical Assemblies LaMMA, Denton, TX

1:20 p.m. IA-10 Roll to Roll Processing of Thin Flexible Energy DevicesSymposium on Coating Technologies for the Interconnected AgeINVITED TALK B. Berland, ITN Energy Systems, Inc., Littleton, CO

11:40 a.m. O-11 Deposition of Complex Optical Interference Filters on Polymer Substrates by Magnetron Sputtering and PECVD ProcessesT. Neubert1, M. Vergöhl1, K. Rohwer2, A. Simon2

1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany 2INFITEC GmbH, Ulm, Germany

12:00 p.m. O-12 Optical Coatings by High Speed Rotary Spatial ALDE.R. Dickey1, W.A. Barrow1, B. Aitchison2

1Lotus Applied Technology, Hillsboro, OR 2MLD Technologies, Eugene, OR

Thursday . April 30


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SVC TECHCON 2015 Tutorial Schedule

TechCon Education Solves Vacuum Coating ProblemsThe TechCon Tutorial Program,offering 25 full-day and half-day problem-solving tutorial courses, increases your practical knowledge of vacuum coatings and processes. Return to work with solutions to your everyday vacuum coating troubles.

You do not have to register for the TechCon or be a member of SVC to attend the Tutorial Courses. Tutorial fees are the same for SVC Members and Non-Members. Tutorial course fees include entrance to the Exhibit Hall.

SVC is offering a 25% discount on each Tutorial registration for the second or more employee in a company who enrolls in the same tutorial as the first employee. The discount does not apply to the Student rate.

A topical outline, detailed syllabus and instructor bio for all tutorial courses in the 2015 TechCon roster is available online atwww.svc.org/TechConEducation

Individual tutorial course fees increase by $100 after March 25, 2015 (this does not apply to students or the Young Members Group).

Tutorial cancellations received on or before March 25, 2015, will be refunded. Refunds will be made upon receipt of a written notice, less a $25 service fee for each individual tutorial. No refunds will be made for cancellations received after March 25, 2015.

Saturday, April 25V-204 Vacuum Systems, Materials and Operation John O’Hanlon

C-103 An Introduction to Physical Vapor Deposition (PVD) Processes S. Ismat Shah

C-311 Thin Film Growth and Microstructure Evolution Joe Greene

C-216 Practical Design of Optical Thin Films Ron Willey

Sunday, April 26C-203 Sputter Deposition 2-Day Tutorial (Sunday and Monday) Joe Greene

C-217 Practical Production of Optical Thin Films Ron Willey

C-323 High Power Impulse Magnetron Sputtering Arutuin Ehiasarian & André Anders

C-336 Transparent Gas Permeation Barriers on Flexible Substrates PM John Fahlteich

C-337 ITO and Alternative TCO: From Fundamentals to Controlling Properties Clark Bright

C-339 NEW! Mechanical Heart Valve Thrombosis: An Introduction and Review PM Aryasomayajula Subrahmanyam

Monday, April 27C-322 Characterization of Thin Films Tom Christensen

V-207 Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum Systems Robert Langley

C-309 NEW! Cathodic Arc Deposition PM André Anders

Tuesday, April 28C-315 Reactive Sputter Deposition Joe Greene

C-333 Practice and Applications of HIPIMS AM Ralf Bandorf & Arutiun Ehiasarian

M-102 Introduction to Ellipsometry AM James Hilfiker

C-210 Introduction to Plasma Processing Technology PM Hana Baránková & Ladislav Bárdos

C-340 NEW! Plastics Optics - Coatings and Anti-Reflective Structures PM Ulrike Schulz

Wednesday, April 29C-208 Sputter Deposition in Manufacturing David Glocker

C-212 Troubleshooting for Thin Film Deposition Processes Gary Ash

C-328 Properties and Applications of Tribological Coatings AM Allan Matthews

Thursday, April 30C-320 Diamond Like Carbon Coatings – from Basics to Industrial Realization AM

Thomas Schuelke, George Savva, & Martin Keunecke

C-324 Atmospheric Plasma Technologies AM Hana Baránková & Ladislav Bárdos

C-326 Manufacture of Precision Evaporative Coatings AM Jim Oliver

C-316 Introduction to Atomic Layer Deposition (ALD) Processes, Chemistries, and Applications AM Brian Willis

All tutorial courses are full-day 8:30 a.m. - 4:30 p.m. unless specified AM – 8:30 a.m. - noon or | PM – 1:00 p.m. - 4:30 p.m.


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André Anders is a Senior Scientist and Group Leader at Lawrence Berkeley National Laboratory, Berkeley, California. He grew up in East Germany and obtained his PhD in physics from Humboldt University, Berlin, in 1987. Since 1992 at Berkeley Lab, he has worked on plasma technologies for materials. He has also been the Editor-

in-Chief of Journal of Applied Physics since July 2014. André is a Fellow of APS, AVS, IEEE and IoP, and has received several awards, including the SVC Mentor Award.

Aryasomayajula Subrahmanyam (graduated in 1980) is a Professor in Physics, Indian Institute of Technology Madras, Chennai, India. He has been working on sputtering of metal oxide thin films for over 30 years. Has developed metal oxide and metal nitride technologies for the industry. His present work is in metal oxide coatings

for biomedical engineering: developing lung assist devices and early warning for mechanical heart valves. He is Associate Editor for the Elsevier journal: Solar Energy Materials and Solar Cells.

Gary S. Ash is President of Castle Brook Corporation, Dartmouth, MA. The company provides technical and management consulting services for the vacuum and cryogenics industry. He has had more than 40 years of experience in vacuum systems, pumps and other components, deposition processes ranging

from evaporation to sputtering to molecular beam epitaxy. Engineering experience includes equipment and process design, manufacturing process development, materials and failure analysis, and applications support.

Ralf Bandorf received his PhD in Mechanical Engineering in 2002 from Fraunhofer IST / Carolo-Wilhelmina Technical University Braunschweig, Germany. Ralf continued at Fraunhofer IST as a scientist, specifically as Project Leader in Group Micro and Sensor Technology with a focus on PVD and PACVD coatings. In 2007, he became Head of

Group “Sensoric Functional Coatings” and is now Head of Group “PACVD and Hybrid Processes.” His focus is on PACVD with different excitation, plasma sources, hollow cathode processes, especially gas flow sputtering, and HIPIMS.

Hana Baránková is Professor at the Angstrom Laboratory, Uppsala University, Sweden and Director of the interdisciplinary program/center on energy and environmental applications of plasma. She received her PhD from the Czech Academy of Science. Her primary interests are innovation in coating technology,

development of plasma sources, plasma processing and plasma treatment of surfaces, gases and liquids. She is an inventor of metastable-assisted deposition and co-inventor of the Linear Arc Discharge (LAD) source, the Magnets-in-Motion concept in plasma sources and Fused Hollow Cathode and Hybrid Hollow Electrode Activated Discharge (H-HEAD) cold atmospheric plasma sources.

Ladislav Bárdos is Professor at Uppsala University in Sweden and Research leader of the Plasma group at the Angstrom Laboratory, Sweden. He received his PhD from the Czech Academy of Science and a Doctor of Science degree from Charles University in Prague. His research interests are microwave plasmas, including downstream

ECR and surface-wave generations, and hollow cathodes and hybrid sources at both low and atmospheric pressures. He has published over 200 scientific papers and conference contributions, designed several plasma sources for industry and has 15 Czech, 7 Swedish and several international patents. He runs a consulting company in plasma sources and processing technology.

Clark Bright formed a consulting practice – Bright Thin Film Solutions in December 2012 when he retired as Senior Staff Scientist and Group Technical Leader from 3M Corporate Research Laboratory. He has more than 35 years of experience in thin film research, development, and manufacturing. He has taken multiple new processes/

products from invention through successful production. His work has emphasized vacuum deposited transparent conductive metals and oxides, e.g., ITO, AZO, GZO, SnO2, but included optical coatings such as low emissivity and solar control coatings, multilayer antireflection coatings and thin film barriers. He has 27 U.S. patents and has presented and authored numerous research papers.

Tom Christensen is a Professor in the Department of Physics at the University of Colorado at Colorado Springs. He received his M.S. and Ph.D. degrees in Applied Physics from Cornell University. After several years as a member of the technical staff at Sandia National Laboratories in Albuquerque he joined the University of Colorado faculty

in 1989. He has worked with vacuum technology, thin film technology and surface characterization since 1980.

Arutiun P. Ehiasarian joined Sheffield Hallam University, UK in 1998 where he obtained his PhD in Plasma Science and Surface Engineering. He is currently heading the National HIPIMS Technology Centre dedicated to working with industry. His research has concentrated on development of plasma PVD technologies for substrate

pretreatment prior to coating deposition to improve adhesion, deposition of coatings with dense microstructure, low-pressure plasma nitriding and hybrid processes of nitriding/coating deposition. Arutiun is one of the pioneers of high power impulse magnetron sputtering (HIPIMS) technology.

John Fahlteich graduated from the University of Leipzig with a diploma in physics in 2005. In 2010, he earned a PhD from the Technical University of Chemnitz with a thesis about a detailed characterization of vacuum deposited permeation barrier layers. In total he has now 10 years of experience in the field of permeation barriers

and encapsulation of flexible electronics. John is currently working as senior scientist and expert for permeation barriers at Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Germany.

David Glocker is Chief Technology Officer for Isoflux Incorporated, a manufacturer of magnetron equipment, which he founded in 1993. He has more than 30 years’ experience in thin film research, development, and manufacturing and has taken a number of new processes from laboratory-scale feasibility studies through

successful production. He is an inventor or co-inventor of 32 U.S. patents and has authored numerous papers in the areas of sputter source design, plasmas and plasma characteristics, sources of substrate heating in sputtering, and the control of sputtering processes and sputtered film properties.

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Joe Greene is the D.B. Willett Professor of Materials Science and Physics, the Tage Erlander Professor of Materials Physics at Linkoping University, Sweden a Chaired Professor at the National Taiwan University of Science and Technology, and Past Director of the Frederick Seitz Materials Research Laboratory at the

University of Illinois. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during vapor-phase film growth in order to controllably manipulate microchemistry, microstructure, and physical properties. His work has involved film growth by all forms of sputter deposition (MBE, CVD, MOCVD, and ALE).

James N. Hilfiker graduated from the Electrical Engineering Department of the University of Nebraska in 1995. He joined the J.A. Woollam Company upon graduation and has worked in their Applications Lab for almost 20 years. His research at the company has focused on new applications of ellipsometry, including

characterization of anisotropic materials, liquid crystal films, thin film photovoltaics, and optical multilayer stacks.

Martin Keunecke joined the Fraunhofer Institute for Surface Engineering and Thin Films (IST) in Braunschweig, Germany in 1998, after university studies in physics and mechanical engineering. He is responsible for new coatings and process development with PVD and PECVD technologies in the field of friction reduction, hard and

wear resistant coatings for tools and components, especially diamond-like carbon coatings. Since February 2012 Martin Keunecke is head of the department “New Tribological Coatings” at the Fraunhofer IST.

Robert (Bob) A. Langley retired from Oak Ridge National Laboratory in 1994 and Sandia National Laboratories in 1999. He has performed research in the fields of atomic and molecular physics, solid state physics, material science, vacuum science and technology, upper atmospheric phenomena, fusion power research, and

high-energy accelerators, published over 130 scientific papers and is a Fellow of the American Vacuum Society. He obtained his BS, MS and PhD in physics at Georgia Tech. He consults on vacuum science and technology, and microwave material processing.

Allan Matthews is Professor of Surface Engineering in the Department of Materials Science and Engineering at the University of Sheffield, UK. He has been working on plasma-assisted PVD processes for about 30 years. He spent his early career in the aerospace industry and subsequently carried out research into enhanced plasma-

based coating and treatment processes as well as test and evaluation methods. He is a member and past Chair of the British Vacuum Council and Editor-in-Chief of the Elsevier journal, Surface and Coatings Technology.

John F. O’Hanlon is Professor Emeritus of Electrical and Computer Engineering, the University of Arizona. He retired from IBM Research Division in 1987, where he was involved in thin-film deposition, vacuum processing, and display technology. He retired from UA in 2002, where he directed the NSF Ind./Univ. Center for Microcontamination

Control. His research focused on particles in plasmas, cleanrooms, and ultrapure water contamination.

Jim Oliver is founder and owner of Vacuum Innovations, LLC and is a research engineer at the University of Rochester’s Laboratory for Laser Energetics. A graduate of the University of Rochester’s Institute of Optics, his work has focused on process design and modeling for precision evaporated coatings. Thin-film uniformity control is of

particular interest, having developed advanced distribution models and planetary rotation systems.

George Savva obtained his Ph.D. from McMaster University, Canada where he studied ceramic/metal interface structures and diffusion paths related to high temperature oxidation. He has also worked in the area of materials for electrical vehicle batteries. His present position is Engineering Manager for Ionbond North America.

Thomas Schuelke is the Director of Fraunhofer USA’s Center for Coatings and Diamond Technologies at Michigan State University in East Lansing, Michigan. He received his M.S. (1992) and Ph.D. (1996) degrees in physics from Technical University Dresden, Germany. His team performs applied R&D projects for industry and

government with a focus on diamond materials and thin film coatings.

Ulrike Schulz is senior scientist and head of a research group at Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena, Germany. Ulrike graduated in physical chemistry in 1986 and earned her PhD in 1993 from the University of Jena. She has more than 20 years of experience in vacuum deposition of optical coatings, thin film design and characterization. Her

present work is focused on nanostructures and coating on plastics.

S. Ismat Shah graduated from the University of Illinois at Urbana-Champaign in 1986 from the Department of Materials Science and Engineering. He worked for the DuPont Company as senior Staff Scientist for 12 years before joining the University of Delaware in 1999, where he has a joint appointment in the Department of Materials Science and Engineering and the Department of

Physics and Astronomy. He has been involved in the field of thin films and nanostructured materials for 22 years.

Ronald R. Willey graduated from the MIT in optical instrumentation, has an M.S. from FIT, and over 35 years of experience in optical system and coating development and production. He is very experienced in practical thin films design, process development, and the application of industrial Design Of Experiments methodology. He is the

inventor of a robust plasma/ion source for optical coating applications. He worked in optical instrument development and production at Perkin-Elmer and Block Associates. He developed automatic lens design programs at United Aircraft Research Laboratories. He formed Willey Corporation in 1964 and served a wide variety of clients with consulting, development, prototypes, and production.

Brian Willis is a professor of Chemical Engineering in the Chemical and Biomolecular Engineering Department at the University of Connecticut. He received his PhD in Chemical Engineering from the MIT and has worked as a member of the technical staff at Bell Laboratories prior to entering academia. He has been teaching for 10 years in areas including reactor design, reaction kinetics, surface

science, electronic materials and heterogeneous catalysts. His research is in the area of atomic layer deposition (ALD) applied to nanotechnology.

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V-204 Vacuum Systems, Materials and OperationSaturday, April 25 8:30 a.m. - 4:30 p.m.Tutorial fee: $640 (includes text book) Student fee: $145

+ This tutorial course is intended for those who wish to learn how diffusion and cryo pump systems operate, how to choose materials for vacuum use, and how to pump water vapor properly during the rough pumping cycle. At the end of this tutorial, a participant should be able to explain the operation of diffusion, and cryo pumped systems; understand how materials are chosen for use in vacuum, and how to rough pump water vapor without producing condensation.

Topical Outline: • Introduction

• Rotary mechanical pumps • Diffusion pumps and systems • Cryogenic pumps and systems • Materials suitable for vacuum use • Methods for rough pumping water vaporAttendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003) Instructor: John F. O’Hanlon, University of Arizona

C-103 An Introduction to Physical Vapor Deposition (PVD) Processes

Saturday, April 25 8:30 a.m. - 4:30 p.m.Tutorial fee: $670 (includes text book) Student fee: $190

+ Physical vapor deposition (PVD) processes are atomistic deposition processes in which material vaporized from a source is transported in the form of a vapor through a vacuum or low-pressure gaseous environment to the substrate, where it condenses and film growth takes place. PVD processes can be used to deposit films of compound materials by the reaction of depositing material with the ambient gas environment or with a co-deposited material. This tutorial will discuss and compare the four basic PVD techniques: vacuum evaporation, sputter deposition, arc vapor deposition, and ion plating. Vacuum evaporation uses thermal vaporization as a source of depositing atoms; sputter deposition uses physical sputtering as the vaporizing source; arc vapor deposition uses a high-current, low-voltage arc for vaporization; and ion plating uses concurrent or periodic energetic particle bombardment to modify the film growth. The parameters used for each technique will be discussed along with their advantages, disadvantages, and applications. This is an entry-level tutorial to acquaint the students with various PVD processes used for “surface engineering.”

Topical Outline: • Introduction: deposition environments (vacuum and plasma),

film formation, film structures, reactive deposition, factors affecting film properties

• Vacuum evaporation and vaporization, evaporation and sublimation, deposition chambers, vaporization sources (resistive and e-beam), evaporation materials, fixture design, process parameters, monitoring and control, advantages and

disadvantages, applications• Sputter deposition and physical sputtering, plasmas (dc, rf,

magnetron, and pulsed dc), sputtering target configurations, reactive sputter deposition, sputtering materials, process parameters, monitoring and control, advantages and

disadvantages, applications• Arc vapor deposition and vacuum and plasma arcs, properties of

arcs, generation and “steering” of arcs, arc sources, reactive arc deposition, process parameters, monitoring and control, advantages and disadvantages, applications

• Ion plating and bombardment effects, bombardment configurations, reactive ion plating, ion plating vaporization sources and evaporation, sputtering and arc process parameters, monitoring and control, advantages and disadvantages, applications

• PVD deposition systems and configurations (batch, load-lock, and in-line), pumping options

The tutorial fee includes the text, Handbook of Physical Vapor Deposition (PVD) Processing, 2nd edition, Donald M. Mattox (Elsevier Publishing, 2010).Instructor: S. Ismat Shah, University of Delaware

C-311 Thin Film Growth and Microstructure EvolutionSaturday, April 25 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

+ This tutorial is intended for engineers, technicians, and others involved with the vapor deposition of thin films by sputtering, evaporation, MBE, CVD, GS-MBE, etc., and who need to obtain a better understanding of the effects of operating parameters on the properties of metal, semiconductor, and dielectric films and alloys. The tutorial is concentrated on the development of a detailed atomic-scale understanding of the primary experimental variables and surface reaction paths controlling nucleation/growth kinetics and microstructural evolution during vapor-phase deposition of thin films. The goal is to develop an appreciation of the advantages and disadvantages of competing growth techniques and to learn how to design better and more efficient film growth processes to achieve required properties.

Thin-film technology is pervasive in many advanced fields of modern technology including microelectronics, optics, magnetics, hard and corrosion-resistant coatings, micromechanics, etc. Progress in each of these areas depends upon the ability to selectively and controllably deposit thin films (thickness ranging from tens of Ångstroms to micrometers) with specified physical properties. This, in turn, requires control—often at the atomic level—of film microstructure and microchemistry.

Essential fundamental aspects, as well as the technology of thin-film nucleation and growth from the vapor phase (evaporation, MBE, sputtering, and CVD) are discussed in detail and highlighted with “real” examples. The tutorial begins with an introduction on substrate surfaces: structure, reconstruction, and adsorption/desorption kinetics. Nucleation processes are treated in detail using insights obtained from both in situ (RHEED, LEED, STM, AES, EELS, etc.) and post-deposition (TEM and AFM) analyses. The primary modes of nucleation include two-dimensional (step flow, layer-by-layer, and two-dimensional multilayer), three-dimensional, and Stranski-Krastanov. The fundamental limits of epitaxy will be discussed.

Experimental results and simulations will be used to illustrate processes controlling three-dimensional nucleation kinetics, island coalescence, clustering, secondary nucleation, column formation, preferred orientation, and microstructure evolution. The effects of low-energy ion-irradiation during deposition, as used in sputtering and plasma-CVD, will be discussed with examples. The Tutorial course concludes with a detailed discussion of the origins, mechanisms, and control strategies, of intrinsic and extrinsic stresses in thin films.

Topical Outline: • The role of the substrate in mediating growth kinetics• The nucleation process• Film growth modes• Epitaxy• The development and control of film stress (strain engineering)

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• Nucleation and growth of strain-mediated self-organized structures

• Polycrystalline film growth, texture, and microstructure evolution

• Structure-zone models of film microstructure• The role of low-energy ion/surface interactions during film

growth• The relationship between film growth parameters and film

propertiesInstructor: Joe Greene, University of Illinois

C-216 Practical Design of Optical Thin FilmsSaturday, April 25 8:30 a.m. - 4:30 p.m.Tutorial fee: $640 Student fee: $145

+ The course is intended to be valuable to new coating engineers, scientists, technicians, and technical managers as well as seasoned thin film scientists who are involved in design, development, and production of optical thin films. Basic principles are laid out from the beginning for those new to the field, but the evolution of the topics then moves into material and techniques useful to even the more experienced practitioners. No extensive background in mathematics or physics is required; extensive graphical illustrations are used. This course deals with optical thin film coating design. It is a companion to, but not a requirement for, the course on optical thin film coating production on the following day with another book by the author. Advanced optical thin films are being used increasingly in communications, optical systems, and light control and collection applications. The sophistication of the optical coating industry is advancing rapidly to meet ever-increasing demands for performance and production capability. New viewpoints, equipment, and processes are available to support advanced capability and efficiency. Objectives of this course include: to provide increased knowledge and understanding of the many practical aspects of optical coating design, to discuss the techniques and principles discussed, and to elucidate techniques and processes that are commonly successful in meeting optical coating needs.

Topical Outline: • Firmly grasp, visualize, and use optical thin film design

principles. • Use graphical methods in thin film design.• Estimate what can be achieved before starting a design. • Obtaining good indexes from processes before final designs by

good measurement techniques and avoiding pitfalls.• Understand Fourier thin film synthesis and compare

rugate and discrete layer designs.• Solve practical coating design problems.

Attendees in this tutorial receive the text, Practical Design of Optical Thin Films, 4th edition, Ronald R. Willey (Willey Optical, Consultants, 2014) [printed by Lulu.com Press]Instructor: Ronald R. Willey, Consultant, Willey Optical, Consultants

Tutorial CoursesTECHCON 2015TECHCON 2015

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Upcoming Live Webinars

W-309 Cathodic Arc Deposition Presented by André Anders, Lawrence Berkeley National Lab Date: February 12, 2015 • 9 a.m. - Noon MT

W-212 Troubleshooting for Thin Film Deposition Processes Presented by Gary S. Ash Castle Brook Corporation

Date: March 26, 2015 • 9 a.m. – 12 noon MT

Cost: 3-Hour Live On-Line Webinar + Webinar NotesMember $325 | Non-member $400 | Full-Time Student $200

On-Demand (Recorded) WebinarsW-105 Evaporation for Thin Film Deposition

W-110 Advanced Social Media for B2B Strategies and Success

W-204 Basics of Vacuum Web Coating

W-207 Production Vacuum Systems: Operation and Maintenance

W-208 Sputter Deposition

W-212 Troubleshooting for Thin Film Deposition Processes

W-218 Optical Thin Film Monitoring and Control

W-219 Optical Thin Film Materials and Process Know-How

W-309 Cathodic Arc Deposition

W-314 Practical Aspects of Plasma Modification of Polymer Materials and Plasma Web Treatment

W-317 The Practice of Reactive Sputtering

W-326 Manufacture of Precision Evaporative CoatingsW-337 Introduction to Transparent Conductive Oxides (TCO)

Cost: 3-Hour On-Demand Webinar + Webinar NotesMember $195 | Non-member $270 | Full-time Student $135

For Webinar descriptions and to register go to: www.svc.org/Education/Webinars.cfm or phone 505-856-7188 for details on Group discounts.

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C-203 Sputter Deposition (two-day tutorial) Sunday and Monday, April 26-27 8:30 a.m. - 4:30 p.m.Tutorial fee: $895 Student fee: $190

+ This tutorial covers fundamental mechanisms associated with generation of glow discharges, sputtering, and energetics of target and substrate processes. Operation and system design will be discussed for dc, rf, magnetron (both magnetically balanced and unbalanced), pulsed dc, and ion beam sputtering. The advantages and disadvantages of these different modes of operation will be examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of sputter deposition to provide direction in designing new processes. Present and future trends in sputter deposition also will be addressed.

Topical Outline: • Processes controlling film growth and properties• The role of energetic particles in controllably modifying these

processes• Target sputtering effects• Nature and energy of sputtered atoms• Diode, triode, magnetron, and ion beam systems• dc, HIPIMS, pulsed dc, mid-frequency ac, and rf power for targets

and substrates• Reactive sputtering of conducting and dielectric layers• Alloy sputtering

Instructor: Joe Greene, University of Illinois

C-217 Practical Production of Optical Thin FilmsSunday, April 26 8:30 a.m. - 4:30 p.m.Tutorial fee: $640 Student fee: $145

+ The course is intended to be valuable to new coating engineers, scientists, technicians, and technical managers as well as seasoned thin film scientists who are involved in design, development, and production of optical thin films. Basic principles are laid out from the beginning for those new to the field, but the evolution of the topics then moves into material and techniques useful to even the more experienced practitioners. No extensive background in mathematics or physics is required. This course deals with optical thin film coating production. It is a companion to, but not a requirement for, the course on optical thin film coating design on the previous day with another book by the author. Advanced optical thin films are being used increasingly in communications, optical systems, and light control and collection applications. The sophistication of the optical coating industry is advancing rapidly to meet ever-increasing demands for performance and production capability. New viewpoints, equipment, and processes are available to support advanced capability and efficiency. Objectives of this course include: to provide increased knowledge and understanding of the many practical aspects of optical coating production, to discuss the techniques and principles discussed, and to elucidate techniques and processes that are commonly successful in meeting optical coating needs.

Topical Outline: • Select appropriate optical coating equipment to support the

needed processes.• Be aware of the importance of pumping effects and

measurement accuracy and how to avoid pitfalls.• Be familiar with the properties and process know-how for

common optical coating materials.• Further understand the use of energetic processes such as

sputtering, plasma, and ion assist.• Understand various monitoring and control strategies and their

advantages and limitations.Attendees in this tutorial receive the text, Practical Production of Optical Thin Films, 2nd edition, Ronald R. Willey (Willey Optical,

Consultants, 2012) [printed by Lulu.com Press].Instructor: Ronald R. Willey, Consultants, Willey Optical, Consultants

C-323 High Power Impulse Magnetron SputteringSunday, April 26 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

+ This tutorial is intended for engineers, technicians, students, and others interested in high power impulse magnetron sputtering (HIPIMS). With HIPIMS we mean a pulsed sputtering process where the power density on the sputtering target is greatly enhanced (about two orders of magnitude) over the average power density. Hence, the word “impulse” is adopted to signify a low duty cycle of operation.

Some basic understanding or experience with plasmas and materials is desirable but not required. The tutorial starts with a brief introduction to basic plasma and sheath physics. The operation of dc magnetrons is explained to provide the foundation for the understanding of the time-dependent processes in pulsed systems, and especially those of HIPIMS discharges.

High power density leads to significant ionization of the sputtered material, enabling effective surface modification via ion etching and ion assistance to film growth. The interface to the substrate can be engineered and the film texture can be influenced using the HIPIMS plasma in combination with an appropriate bias.

Topical Outline: • HIPIMS - An introduction• Stationary plasmas, sheaths, discharge• The dc magnetron processes• Ion surface modification: etching and film growth, energetic

condensation• Pulsed plasmas and sheaths• High Power Impulse Magnetron Sputtering: the discharge• Plasma characterization and plasma diagnostics• Substrate biasing: etching / growth assist• Interface engineering by using HIPIMS plasmas• Deposition and coatings by HIPIMS• Hardware• Applications

Instructors: André Anders, Lawrence Berkeley National Laboratory; and Arutiun P. Ehiasarian, Sheffield Hallam University, United Kingdom

C-336 Transparent Gas Permeation Barriers on Flexible Substrates

Sunday, April 26 8:30 a.m. - 4:30 p.m. Tutorial fee: $570 Student fee: $95

+ Thin transparent layers on polymer films are being used to drastically enhance the permeation barrier properties of polymer films while at the same time maintaining the flexibility and optical transparency of the polymer film. Applications range from food packaging films to encapsulation films for solar cells or flexible electronics.

This full-day tutorial gives a comprehensive overview about the state-of-the-art in the field of transparent thin film permeation barriers. It covers a short overview about the scientific and technological fundamentals and their consequences for applications. Different permeation measurement principles and methods will be compared briefly. Single and multi-layer materials and technologies for the fabrication of thin film permeation barriers will be reviewed and evaluated regarding their suitability for different applications. Not only gas permeability but also optical properties, mechanical robustness and processing aspects will be discussed. Products and application examples will be discussed and an outlook about the current hot-topics in the field will be given.

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Topical Outline: • The need for barriers – products and requirements• How to apply a barrier to your product - types of

encapsulation • Thin-film permeation physics and consequences for

application - Permeation in polymers and solids - Models and mechanisms for permeation in thin films – the role of layer defects - Influence of measurement conditions (temperature, gas

concentration, time) - Permeation in multi-layer stacks

• Overview about measurement-methods for barrier properties - Measurement concepts and methods - Typical measurement conditions

• Materials and Technologies for thin film barriers - Single and graded layer technologies

• Evaporation techniques • Sputtering • Plasma-enhanced chemical vapor deposition (PECVD) • Atomic layer deposition (ALD) • Short note on other methods

- Influence of substrate quality and processing on barrier performance

- Multilayer technologies - Techniques for interlayer deposition

• Properties of multi-layer stacks compared to single layers • Application examples and outlook

- Devices and their performance - Functional films and substrates for flexible electronics - Direct encapsulation versus barrier film lamination - Economic aspectsThis course was developed by John Fahlteich, Steffen Günther, Nicolas Schiller, and Matthias Fahland, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, GermanyInstructor: John Fahlteich, Fraunhofer FEP, Germany

C-337 ITO and Alternative TCO: From Fundamentals to Controlling Properties

Sunday, April 26 8:30 a.m. - 4:30 p.m. Tutorial fee: $570 Student fee: $95

+ This tutorial explains doping and conductivity in Transparent Conductive Oxides (TCO) including, indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), zinc oxide with various dopants, particularly aluminum (AZO) and gallium (GZO), and other alternatives, e.g., SnO2:F, TiO2:Nb. TCO deposition by magnetron sputtering is emphasized, although other methods, e.g., evaporation, CVD/pyrolysis and Pulsed Laser Deposition (PLD) are described. Specific examples of the TCO Optical/Electrical (O/E) properties achieved with various processes are shown. Developing a robust deposition process for TCO is explained. The importance of substrate temperature and the effect of post-deposition processing also are discussed. TCO properties achieved with high temperature processes, e.g., on glass substrates, and low temperature processes, e.g., roll-to-roll on flexible plastic substrates, are compared and explained. Designing desired TCO O/E properties for specific applications and engineering of TCO film properties by controlling deposition process parameters are explained. Many application examples are presented. This new tutorial is a combination of courses C-304 (ITO) and C-332 (ZnO-based), plus revisions, updates and new material. It is intended for scientists, engineers, technicians, operators and others, interested in understanding the fundamentals, materials, deposition, manufacturing, properties and applications of TCO.

Topical Outline: • Introduction; history and review • Conductivity in transparent metal oxides • Doping• TCO Performance expectations; Theory and ITO baseline • ZnO-based and other TCO host materials and dopants • Performance of TCO grown by major deposition methods • Control of TCO film properties • Developing a robust deposition process; “Resistivity Well”• Designing and engineering TCO Optical/Electrical (O/E)

properties for applications • Examples of TCO applications • Appendix I; Thin film optics • Appendix II; Advanced doping techniques

Instructor: Clark Bright, Bright Thin Film Solutions (3M retired)

C-339 Mechanical Heart Valve Thrombosis: An Introduction and Review (half day) NEW!

Sunday, April 26 1:00 p.m. - 4:30 p.m. Tutorial fee: $395 Student fee: $70

+ The course is addressed to: biotechnologists, medical professionals, biomedical engineers, physicists, surface engineers, mechanical engineers, thin film specialists, electronics engineers, and sensor developers. Participants should possess a basic minimum knowledge of the functions of the human heart and lungs. This is a comprehensive course on mechanical heart valves. Over the past fifty years, more than 100 different mechanical heart valves have been designed and implanted. A large number of mechanical heart valves are being implanted worldwide; a large number of them are failing after implant. There are many challenges in the materials, design and surface engineering of mechanical heart valves. The primary aim of the course is to introduce the basic functions of heart valves; the course also aims at a review of the present status of the mechanical valves. The opportunities (in terms of design) and challenges of mechanical heart valves will be summarized.

Topical Outline: • Introduction to Heart valves and valve functions • Basics of Haemodynamics • Basic understanding of thrombosis and embolism (coagulation

cascade is beyond the course content) • Basics of prosthetic heart valves: problems and management • Mechanical heart valves: designs and evolution • Mechanical heart valves: basic working principles • Mechanical heart valves: problems and management • Comparison of performance of contemporary mechanical heart

valves • Mechanical versus prosthetic valves: advantages and

disadvantages • Criteria for mechanical valve replacement • Valve dysfunctions: Obstructive thrombosis, Pannus (over

growth of fibrous tissue and impairment in leaflet movement) and diagnostic techniques

• Engineers’ perspective of surface and surface engineering of mechanical valves

• Thin film coatings for next generation mechanical heart valves: management of thrombosis and incorporation of sensor

technology • Diagnostic techniques for heart valve monitoring: existing and

emerging sensors and techniques• Concept of early warning (eWAR) of mechanical heart valve

failureInstructor: Aryasomayajula Subrahmanyam (Manu), Indian Institute of Technology Madras, Chennai, India

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C-322 Characterization of Thin FilmsMonday, April 27 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

+ This tutorial examines the broad range of techniques available to characterize thin film materials. We examine the range of properties of interest and how thin film properties may differ from bulk properties. Generic differences between counting and spectroscopic techniques are presented. Available “probes” are identified.

The main emphasis of the tutorial is an overview of a wide range of characterization techniques. We examine imaging techniques such as optical microscopy, scanning electron microscopy (SEM), transmission electron microscopy (TEM), and scanning probe microscopies (STM, AFM …). We also explore techniques, which provide information about structural properties including X-ray diffraction (XRD), stylus profilometry, quartz crystal monitors (QCM) and density measurements.

The tutorial examines techniques, which explore chemical properties such as Auger electron spectroscopy (AES), Energy Dispersive Analysis of X-rays (EDAX), X-ray Photoelectron Spectroscopy (XPS, ESCA), Secondary Ion Mass Spectrometry (SIMS), and Rutherford Backscattering (RBS). AES is used as a prototype to examine quantitative analysis of spectroscopic data. Characterization techniques for optical properties such as ellipsometry and optical scattering are also considered. Many of these chemical and optical techniques can also provide information about structural properties.

Techniques for determining electrical and magnetic properties are also discussed. These include resistance/four point probe, Hall effect, magneto-optical Kerr effect and ferromagnetic resonance. The emphasis here is on materials characterization as opposed to device characterization.

The tutorial concludes with an examination of techniques used to explore mechanical properties such as stress-curvature measurements, friction testing, micro/nano indentation and adhesion tests.

Topical Outline: • Overview of wide range of characterization techniques for

thin films including: − Mechanical properties (stress, friction, micro/nano

indentation, adhesion) − Imaging (microscopies: optical, SEM, TEM, AFM) − Structural properties (XRD, profilometry, QCM) − Chemical properties (AES, EDAX, XPS, SIMS) − Electrical/magnetic properties (resistance, Hall effect,

Kerr effect)Instructor: Tom Christensen, University of Colorado, Colorado Springs

V-207 Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum Systems

Monday, April 27 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

+ This tutorial is designed to teach the basic fundamentals of vacuum technology to technicians, equipment operators, line process operators, and maintenance personnel. This tutorial will address how to use and maintain an existing vacuum effectively, not how to design a system. The introduction will consist of a very basic explanation of what a vacuum is and how it is attained and proceeds to an explanation of the three gas flow regimes (i.e., viscous, transition, and molecular flow). This is followed by a description of the types of pumps used in the viscous flow region (e.g., mechanical displacement pumps, venturi/suction pumps, and sorption pumps). Types of high vacuum pumps are next discussed; these include diffusion pumps, turbopumps, and cryopumps. Presented next is a guide for selecting a pressure gauge which includes a description of various types of gauges and details their useful pressure range and measurement precision.

The next section deals with the care and maintenance of pumps

and vacuum systems, including both compressible “rubber” gasket and metal gasket systems. The unique role that water plays in both pumpdown from atmosphere and in outgassing is addressed, and techniques to ameliorate its harmful effects will be presented. The effects of other unique “bad actors” are also discussed. Many useful charts and tables will be presented and explained.

Participants are requested to present any problems or difficulty that they may be experiencing with their vacuum systems for discussion. This makes for very interesting examples, and the problem might actually be solved.

Topical Outline: • Introduction to vacuum• Explanation of the three gas flow regimes• Viscous flow pumps• High vacuum pumps• Guide for selecting a pressure gauge• Care and maintenance of pumps and vacuum systems, including

both compressible “rubber” gasket and metal gasket systems• Evaluating system performance: pumpdown rate and leak-up rate• Leak detection and correction• Cleaning and conditioning of vacuum components and system• Operation of vacuum systems: crossover pressure, interlocks, & safety• Applications of vacuum systems for vacuum coating• Pumpdown and outgassing• Descriptions of other vacuum related tutorials presented by SVC

Instructor: Robert A. Langley, Oak Ridge Scientific Consultants

C-309 Cathodic Arc Deposition (half day) NEW!Monday, April 27 1:00 p.m. – 4:30 p.mTutorial fee: $395 Student fee: $70

+ Cathodic arc deposition is a high rate deposition process well established for some applications such as hard, protective, and decorative coatings. The rather unusual properties of cathodic arc plasmas are discussed, including their consequences for film properties such as high film density and stress. Cathodic arc deposition is put in context of other PVD coating techniques such as sputter and evaporation. Of special concern is the infamous macroparticle problem, which can be addressed with filters other strategies. This course is intended for engineers, technicians, and students interested in understanding the underlying physics of cathodic arc plasmas and energetic film growth processes, and practical aspects of deposition from the vapor/plasma phase.

Topical Outline: • Motivation: Why would one use cathodic arcs for coatings? • Some plasma basics: plasma versus sheath • The physics of cathodic arc discharge

- Explosive electron emission and fractal nature of cathode spot - spot types - plasma properties - macroparticle generation

• Plasma Guiding and Filtered Arcs • Deposition of films

- Film growth mechanisms - Energetic condensation / biasing -Nitrides, Oxides incl. TCOs, ta-C (DLC)

• Deposition equipment -DC versus pulsed -arc triggering -anodes -power supplies -filter integration -system integration

Instructor: André Anders, Plasma Applications Group, Lawrence Berkeley National Laboratory

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C-315 Reactive Sputter DepositionTuesday, April 28 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

+ This tutorial covers the fundamental mechanisms and technology of high rate reactive sputter deposition of conducting and insulating thin films. Following a brief introduction to reactive sputtering, including discussion of basic issues, target choices, and system configurations, we examine the effects of reactive gas addition on target surface and glow discharge processes that control film growth rates. Deposition approaches used in reactive sputtering – dc, rf, magnetron, pulsed dc, and ion beam – are discussed and compared. Process control strategies (e.g.: flow, partial pressure, and target voltage, and multi-loop control) and their implementation are described in detail using numerous examples. The advantages and disadvantages of these different modes of operation are examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of reactive sputter deposition to provide direction in designing new processes. The effects of energetic particle irradiation (positive and negative ions and fast neutrals) on film properties are also discussed. Present and future trends in reactive sputter deposition are addressed.

Topical Outline: • Introduction to reactive sputter deposition of conducting and

insulating thin films• Target processes during reactive sputtering• Glow discharge volume processes during reactive sputtering• Deposition technologies used in reactive sputtering (dc, rf,

magnetron, pulsed dc, ion beam)• Process control strategies• Particle irradiation effects during film growth• Film properties• Computer-based modeling

Instructor: Joe Greene, University of Illinois

C-333 Practice and Applications of High Power Impulse Magnetron Sputtering (HIPIMS) (half-day)

Tuesday, April 28 8:30 a.m. - 12:00 p.m.Tutorial fee: $395 Student fee: $70

+ HIPIMS is a highly ionized pulsed sputtering process that produces significant ionization of the sputtered materials that, in turn, enables effective surface modification by ion etching and energetic deposition. Energetic deposition allows the formation of coatings with unique or superior properties compared to other deposition processes. Presently HIPIMS is undergoing the transition from academic research to being a major industrial process. This half-day tutorial is intended for decision makers, engineers, technician and students interested in equipment availability, applications and process requirements of HIPIMS.

Basic understanding or experience with plasma and materials is desirable but not required. The tutorial starts with a short introduction in the basics of HIPIMS technology. An extended treatment of HIPIMS is provided by the full-day tutorial C-323 “High Power Impulse Magnetron Sputtering.” The main focus of this tutorial is on commercially available equipment and its specifications as well as the general processing principles. Finally industrial (or close to industrial) applications will be presented.

Topical Outline: • Introduction to HIPIMS Technology• Industrial Equipment

a. HIPIMS pulse generationb. Process control (reactive HIPIMS)c. HIPIMS diagnosticsd. HIPIMS coating systems

• HIPIMS Applicationsa. HIPIMS etchingb. Trench filling, through via connectionc. TCOs

d. Hard coatings - nitrides - carbides

e. Optical coatingsInstructors: Ralf Bandorf, Fraunhofer IST, Germany and Arutiun P. Ehiasarian, Sheffield Hallam University, United Kingdom

M-102 Introduction to Ellipsometry (half-day)Tuesday, April 28 8:30 a.m. - 12:00 p.m.Tutorial fee: $395 Student fee: $70

+ Ellipsometry is an important characterization technique for optical coatings. This tutorial will build an understanding of ellipsometry fundamentals. We start with basic theory behind optical measurements and discuss how ellipsometry extracts thin film properties such as single and multi-layer film thickness, complex refractive index, porosity, conductivity, and composition. A wide range of ellipsometry applications will be surveyed, with emphasis toward optical coatings.

The level of this tutorial is suitable for those new to the field of optical characterization but also contains worthwhile information for current ellipsometry users. It will benefit anyone interested in exploring the potential of ellipsometry measurements.

Topical Outline: • Principles of ellipsometry• Optical constants and light-matter interaction• Using ellipsometry to measure material properties

− Film thickness, complex refractive index, etc.• Survey of applications:

− What can ellipsometry measure?− Ex-situ, in-situ, and in-line examples.

Instructor: James N. Hilfiker, J.A. Woollam Co. Inc.

C-210 Introduction to Plasma Processing Technology (half day)

Tuesday, April 28 1:00 p.m. - 4:30 p.m.Tutorial fee: $395 Student fee: $70

+ The goal of the tutorial is to show the link and provide understanding of relations between coating application, coating (or modified surface) properties, selection criteria on process characteristics, selection criteria on plasma parameters, and method design. It is possible to predict how the process parameters will be reflected in the coating and in the opposite direction, requirements on the coating properties can imply how the process should be designed.

Topical Outline: • Plasma-assisted technologies, general attributes• Useful criteria, basic relations and limits for plasma,

classification of plasmas• Generation of gas discharge plasma, plasma diagnostics• Generation of vapor species, transport through medium,

diffusion, condensation at the surface• Consequences of the deposition process on film properties• Fundamentals of radical and ion-assisted plasma chemistry• Homogeneous and heterogeneous plasma-assisted reaction

in deposition of films• Examples of novel plasma processes• Limits and new trends• Hybrid plasma processes

Instructors: Hana Baránková and Ladislav Bárdos, Angstrom Laboratory, Uppsala University, Sweden

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C-340 Plastics Optics - Coatings and Anti-Reflective Structures (half day) NEW!

Tuesday, April 28 1:00 p.m. – 4:30 p.m.Tutorial fee: $395 Student fee: $70

+ Modern optical applications need solutions for the antireflective equipment of polymer surfaces. The problems for coating comprise thermal limitations, incompatible mechanical properties of coating and substrate materials and the interaction between polymers and plasma. This course provides attendees with a basic knowledge of transparent polymer materials for optical applications. The course concentrates on polymer material properties, coating processes suitable for polymers, interactions between polymers and plasma, adhesion, stress, interference layers for polymers, hard coatings, top-layers to control the wettability and evaluation and testing procedures.

The course especially concentrates on antireflection coatings and antireflective sub-wavelength structures. The potential to produce antireflective interference coatings is shown for plasma-assisted

vacuum deposition techniques as well as for sol-gel wet chemical processes. In addition, various procedures to obtain antireflective structures on polymers will be explained. Special solutions are discussed for acrylic, polycarbonate and cycloolefine polymers.

This course is of use for anyone who would like to get an overview about the problems connected with coating plastics. It is addressed to newcomers and experts on technical and high school level and to engineer and science students of higher terms.

Topical Outline:This course should enable you to: • Specify the best suitable polymer materials for your application; • Understand the special behavior of polymers during vacuum

coating processes; • Evaluate different techniques for antireflection of polymer

surfaces; and • Define suitable characterization tools and testing procedure for

your plastic optics.Instructor: Ulrike Schulz, Fraunhofer IOF, Germany

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Digital LibraryThe SVC Digital Library contains the complete collection of papers published in the Society of Vacuum Coaters Annual Technical Conference Proceedings from 2000–Present.

>> SEARCH with intuitive features

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>> SHARE abstracts via email

>> DOWNLOAD manuscripts FREE for Members

NEW! FREE for Everyone

>> DOWNLOAD Bulletin Original Contributed Technical Articles

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C-208 Sputter Deposition in ManufacturingWednesday, April 29 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

This tutorial emphasizes issues of practical importance to those using sputtering as a manufacturing process. It is intended for engineers, scientists, and technicians who would like an understanding of the factors that influence product throughput, coating quality, and process robustness and reliability. The primary focus will be on the use of planar magnetrons of various shapes, but other sources will be covered as well. The relationships between the sputtering conditions and important film properties—such as microstructure, composition, stress, adhesion and the resulting mechanical, electrical, and optical characteristics—will be discussed. New developments that are finding their way into practical applications also will be highlighted. No prior formal training in sputtering is required to appreciate the tutorial content.

Topical Outline: • A brief introduction to basic vacuum technology• Sputtering plasmas and the nature of the sputtering process• Estimating deposition rates and rate limiting factors• Cathode geometries and associated film thickness profiles• Film composition and compositional uniformity• Film nucleation and growth• Effects of substrate temperature and energetic particle

bombardment• Biased sputtering and the use of unbalanced magnetrons• Sources of substrate heating• rf sputtering of dielectrics from insulating targets• The dc, pulsed dc, and ac reactive sputtering of dielectrics• Process control methods for reactive sputtering• Arcing, disappearing anodes, and other process stability issues• Ion beam sputtering• High Power Pulsed Magnetron Sputtering (HPPMS or HIPIMS)

Instructor: David Glocker, Isoflux Incorporated

C-212 Troubleshooting for Thin Film Deposition Processes

Wednesday, April 29 8:30 a.m. - 4:30 p.m.Tutorial fee: $570 Student fee: $95

Vacuum deposited thin films are used for optical coatings, electrically-conductive coatings, semiconductor wafer fabrication, and a wide variety of other uses. They may be deposited on glass, plastic, semiconductors, and other materials. Usually, a vacuum deposition process produces durable, adherent films of good quality. But what do you do when things go wrong? Not all films can be deposited on all substrate materials. Sometimes films peel off or crack. Other times they are cloudy, absorbing, scattering, or have other unacceptable properties.

This tutorial will teach you about techniques and tools that can be used to identify the source of the problems, correct the process, and get back into production. It will also help in learning how to develop new processes and products. The tutorial is designed for process engineers and technicians, quality control personnel, thin film designers, and maintenance staff.

Topical Outline: • Mechanical, electrical, and optical properties of thin films• Process parameters that affect film properties• Gauge and instrument calibration• Properties of substrate surfaces• Measurement of film stress• Detection of contamination• Introduction to surface analysis techniques (Auger, ESCA, SIMS, FTIR)• Substrate preparation and cleaning

Instructor: Gary S. Ash, Castle Brook Corporation

C-328 Properties and Applications of Tribological Coatings (half-day)

Wednesday, April 29 8:30 a.m. - 12:00 p.m.Tutorial fee: $395 Student fee: $70

This tutorial is intended for design engineers, materials scientists, and coatings developers who have a need to specify and develop coatings for tribological applications (i.e., those in which wear must be reduced or prevented and/or friction minimized). The coatings also may need to have corrosion-resistant properties to operate in arduous conditions. The tutorial begins with a description of the mechanics of friction and wear and discusses the problems of selecting coatings for optimal tribological performance. An overview of the main processes for producing tribological coatings is given, emphasizing plasma assisted vacuum deposition methods. Tribological test methods also are overviewed, including tests for adhesion and mechanical properties. Coatings developed for enhanced tribological properties are described, and information is provided on some applications for these coatings.

Topical Outline: • Wear mechanisms and theories (adhesion, abrasion, erosion,

fatigue, corrosion, etc.) • Tribological and mechanical test methods (e.g., pin on disc,

abrasive wheel, scratch adhesion, microhardness, etc.) • Coating processes and selection • Benefits of ceramic coatings by PVD methods • Information on tribological coatings (e.g., metal nitrides,

carbides, oxides, superlattices, multilayers, nanocomposites, DLC, etc., plus hybrid and duplex processes)

• Applications information (e.g., metal cutting and forming, molding, bearings, pumps, auto parts, etc.)

Instructor: Allan Matthews, University of Sheffield, United Kingdom

C-320 Diamond Like Carbon Coatings – from Basics to Industrial Realization (half-day)

Thursday, April 30 8:30 a.m. - 12:00 p.m.Tutorial fee: $395 Student fee: $70

This tutorial is recommended for engineers and R&D staff members, who are involved in specifying new designs and surface treatments for components and tools. The application of Diamond Like Carbon, often in combination with pre-treatments like plasma nitriding and polishing, allows much improved wear resistance (abrasive, adhesive, fatigue) and to reduction of friction forces. Under the umbrella name of DLC, various classes of coatings have been developed, where each class of coatings has its own deposition technology and coating characteristics. The industrial applications are presently mainly in components for e.g. automotive, aerospace, general machine building.

Topical Outline: • Basics and standardization

- Classification of different DLC’s - DLC’s in comparison to diamond films - Structure of hydrogen free and hydrogenated DLC’s

- Mechanical properties of DLC’s- Tribological behavior of DLC’s

- Carbon based coating systems• Technology and processes

- PVD processes for deposition of hydrogen free DLC films - Plasma assisted CVD processes for preparation of a-C:H

and modified a-C:H:X coatings - Hybrid processes

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- Duplex processes - Sputter deposition of metal containing a-C:H:Me coatings - Sputter deposition of metal free a-C:H coatings - Improved coating adhesion by interlayer systems

• Industrial applications - Contact modes and wear mechanisms - Coating design for specific wear mechanisms - Industrial DLC applications - Industrial deposition methods - Representative industrial examples - Near future expectations

Instructors: Thomas Schuelke, Fraunhofer USA; George Savva, Ionbond North America; and Martin Keunecke, Fraunhofer IST, Germany

C-324 Atmospheric Plasma Technologies (half-day)Thursday, April 30 8:30 a.m. - 12:00 p.m.Tutorial fee: $395 Student fee: $70

Atmospheric plasma technologies are a rapidly growing area in plasma-assisted technologies. However, the atmospheric plasma requires a special design of plasma sources to ensure non-equilibrium, i.e. non-thermal plasma in a number of applications in coating and surface treatment. Technologies using the atmospheric pressure plasma sources bring about fast processes, but it is important to be aware of limits given by atmospheric plasma properties and plasma chemical reactions. This introduction tutorial course addresses the most important principles and applications of non-thermal atmospheric plasma.

Topical Outline: • Cold atmospheric plasma sources - principles, problems to

solve• Corona and Dielectric Barrier Discharges (DBD)• Atmospheric pressure plasma jets• Fused hollow cathodes• Microwave atmospheric plasmas• Atmospheric plasma with/in liquids• Applications of the atmospheric plasma• Advantages and limits of the atmospheric plasma sources

Instructors: Hana Baránková and Ladislav Bárdos, Angstrom Laboratory, Uppsala University, Sweden

C-326 Manufacture of Precision Evaporative Coatings (half-day)


This tutorial provides detailed information on how to establish and improve evaporative coating processes for precision optical coatings. Design considerations for coating chambers, such as source placement, substrate fixturing, control of film thickness uniformity, and thickness monitors will be discussed. Trade-offs in the selection of source materials, means of controlling film structure, and the influence on the performance of the coated component will be considered. Process details will be approached with a focus on practicality; film properties must be measurable and system designs must be practical and cost-effective. These process concepts are readily implemented in standard evaporation systems, providing significant improvements in existing coating facilities.

Topical Outline• Chamber components for an evaporation system• Deposition monitoring and control

- Optical monitoring - Advanced methods for quartz crystal monitoring

• Thin-film uniformity concepts and calculations - Source placement

- Substrate rotation and fixturing - Analysis and selection of system gearing - Design of uniformity masks to correct film thickness

variations• Stress in optical coatings

- Theoretical basis for film stress• Measurements of stress in thin films

- Process design to minimize stresses in optical coatings Instructor: Jim Oliver, Vacuum Innovations, LLC and University of Rochester LLE

C-316 Introduction to Atomic Layer Deposition (ALD) (half-day)


Atomic Layer Deposition (ALD) is a powerful and enabling thin film deposition technology with a growing range of applications including semiconductors, energy, catalysis, and emerging areas of nanotechnology. ALD fills a unique niche in thin film deposition technology where exceptional control is required for thickness, stoichiometry, and other film properties at an industrially relevant scale. New chemistries specifically designed for ALD are enhancing the repertoire of materials that can be grown, encompassing the whole range from insulating to conductive layers. New chemistries and developments in the area of in situ tools for monitoring ALD growth are also enhancing the properties of films grown with ALD. Although generally limited to relatively thin layers, there is a growing interest to scale ALD to larger size substrates for new and emerging applications, and the field will continue to grow in size and application while demanding new solutions specific to ALD.

This introductory course will cover the essentials of ALD including discussion of practical issues such as reactor operation and in situ growth monitoring, as well as providing insight into the molecular scale phenomena that dictate the final product. We will also cover new developments in materials and ALD chemistries as well as emerging applications in non-traditional thin film areas. Potential students are encouraged to contact the instructor to highlight their background and specific goals.

Topical Outline: • Introduction: basic concepts and fundamentals of Atomic

Layer Deposition, ideal and non-ideal aspects.• Overview of materials and chemistries for ALD• Specific examples and case studies• ALD reactor designs and operation• In situ analytical tools for ALD• Non-traditional applications and emerging areas of ALD

Instructor: Brian Willis, University of Connecticut

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SVC—Your Best Resource for On-Location Education on Vacuum Coating TechnologiesA strong commitment to education is part of SVC’s Charter. When you decide to bring tutorials to your facility, you can be assured of high-quality, practical tutorials taught by recognized industry experts. Tutorials are designed for the novice as well as for the seasoned professional. Go to www.svc.org/OnLocation for details on each tutorial course.

The SVC On-Location Education Program—Bring the Experts to Your Facility and Educate Your Team at a Reasonable Cost!This program provides cost-effective training by eliminating time away from work, travel expenses, and individual tutorial attendance fees. The SVC offers tutorials to organizations subject to instructor availability and certain other conditions. Contact SVC for tutorial availability, pricing information and to schedule one or more tutorials at your location. It is a great bargain in this economic climate. Existing half-day tutorials can often be expanded for a full-day presentation.

C-102: Introduction to Evaporation and SputteringC-103: Introduction to Physical Vapor Deposition (PVD) ProcessesC-203: Sputter DepositionC-204: Basics of Vacuum Web CoatingC-207: Evaporation as a Deposition ProcessC-208: Sputter Deposition in ManufacturingC-210: Introduction to Plasma Processing TechnologyC-211: Sputter Deposition onto Flexible SubstratesC-212: Troubleshooting for Thin Film Deposition ProcessesC-213: Introduction to Smart MaterialsC-214: Pulsed Plasma ProcessingC-304: ITO and Other Transparent Conductive Coatings:

Fundamentals, Deposition, Properties, and ApplicationsC-306: Nonconventional Plasma Sources and Methods in

Processing TechnologyC-307: Cathodic Arc Plasma DepositionC-308: Tribological CoatingsC-310: Plasma Immersion Techniques for Surface EngineeringC-311: Thin Film Growth and Microstructure EvolutionC-314: Plasma Modification of Polymer Materials and Plasma Web

TreatmentC-315: Reactive Sputter DepositionC-316: Introduction to Atomic Layer Deposition (ALD)C-317: The Practice of Reactive SputteringC-318: Nanostructures: Strategies for Self-Organized GrowthC-319: Introduction to Energy Conversion Materials and

TechnologyC-322: Characterization of Thin FilmsC-323: High Power Impulse Magnetron SputteringC-324: Atmospheric Plasma TechnologiesC-326: Manufacture of Precision Evaporative CoatingsC-328: Properties and Applications of Tribological CoatingsC-330: Introduction to Thin Film Photovoltaic TechnologiesC-332: Zinc Oxide-Based and Other TCO Alternatives to ITO:

Materials, Deposition, Properties and Applications

C-333: Practice and Applications of High Power Impulse Magnetron Sputtering (HIPIMS)

C-336: Transparent Gas Permeation Barriers on Flexible Substrates

C-337: ITO and Alternative TCO: From Fundamentals to Controlling Properties

V-201: High Vacuum System OperationV-202: Vacuum System Gas AnalysisV-203: Vacuum Materials and Large System PerformanceV-204: Vacuum Systems, Materials and OperationV-206: Helium Leak Detection Theory and TechnologyV-207: Practical Aspects of Vacuum Technology: Operation and

Maintenance of Production Vacuum SystemsV-304: Cryogenic High Vacuum PumpsM-101: Basic Principles of Color MeasurementM-102: Introduction to Ellipsometry

Tutorial Classification SystemThe tutorial codes are intended to provide the prospective attendee with some guidance as to whether the emphasis in the tutorial is primarily on vacuum technology (V code), or vacuum deposition coating processes and technology (C code), or other miscellaneous topics (M code). The tutorial number is intended to indicate the level of tutorial specialization—the lower numbers refer to tutorials that are basic or introductory in nature, and the higher numbers refer to tutorials that offer a more specialized treatment of a specific topic.

For an up-to-date list of tutorial descriptions and instructor biographical sketches, visit www.svc.org and explore the “Education” button on the main page.

For technical questions regarding the tutorial content,contact the SVC Administrative Office at [email protected],or 505-856-7188.

Improve Skills • Broaden Knowledge • Increase Productivity

Society of Vacuum Coaters • 505-856-7188 • fax 505-856-6716 • [email protected] • www.svc.org

SVC On-Location Education Tutorial Roster

On-Location Education Program

“Fantastic job! This tutorial very much related to the real world. This class was excellent and gave many ideas to implement on the plant floor.” — Toma Ljulj, Emrick Plastics (V-207)

“There was a wonderful balance between various industry uses as well as new ideas which could be used across various process types.” — Kevin Moreau, Elcan Optical Technologies (C-306)


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FREE Exhibit Admission for All VisitorsFREE Wireless Internet in the Exhibit Hall

Meet the People who Make DecisionsIn 2014, the SVC Technology Exhibit welcomed 172 exhibiting companies from across the globe. Exhibiting at the SVC TechCon in Santa Clara, by far the most popular venue for attracting exhibit visitors, is essential to businesses wanting to be face-to-face with industry decision makers. The TechCon is an international conference, attracting industry professionals, engineers, academics and scientists from around the world.

Networking Beyond Your Booth The SVC TechCon combines a business-friendly environment with opportunities to learn, network and conduct business during the two-day Exhibit and beyond.• Network at the Awards Ceremony and Welcome Reception on Sunday evening• Technical Poster Presentations in the Exhibit Hall• Vendor Innovators Showcase Presentations• Tuesday Afternoon Exhibit Reception• Tuesday Evening Poolside Networking Mixer• Lunch and Specialty Breaks in the Exhibit Hall• Beer Blast Exhibit Grand Finale on Wednesday afternoon

Vendor Innovators ShowcaseThis session features 10-minute talks designed to introduce new products and services to the vacuum coating community. Abstracts are being accepted for this session through March 1, 2015.

SVC CORPORATE SPONSORS

3M CompanyAdvanced Energy Industries, Inc.Agilent Technologies, Vacuum Products DivisionAngstrom Sciences, Inc.ARi Industries, Inc.*BOBST ManchesterBrooks Automation, Inc.Darly Custom Technology, Inc.Denton Vacuum, LLCDynaVac Eastman Chemical CompanyEbara Technologies, Inc.*EdwardsFerrotec (USA) CorporationFil-Tech, Inc.General Plasma, Inc.Gfe Metalle und Materialien GmbH Goodfellow CorporationHauzer Techno Coating - IHI GroupHeraeus Materials TechnologyLHI MetalsHiden Analytical, Inc.Indium CorporationINFICONIntellivation, LLCIntlvac Thin Film*IonBond LLC - IHI GroupIzovac Ltd.*JDSU Advanced Optical Technologies GroupKurt J. Lesker CompanyLeybold Optics USA, Inc.LHI MetalsMaterials Science, Inc.Materials Science International, Inc.Materion CorporationMDC Vacuum Products LLCMidwest Tungsten Service , Inc.MKS Instruments, Inc.Mustang Vacuum System LLCNor-Cal Products, Inc.Oerlikon Leybold VacuumOxford Instruments AustinOxford Instruments Plasma Technology*Pfeiffer Vacuum, Inc.Plasmaterials, Inc.Process Materials, Inc.Providence Metallizing Company, Inc.PVT, Plasma and Vacuum Technologies LLCR.D. Mathis CompanyReliable Silver Corporation*RF VII Inc.*Soleras Advanced CoatingsSputtering Components, Inc.Sumitomo (SHI) Cryogenics of AmericaTEL Mechantronics AG*TelemarkThermionics Vacuum ProductsThin Film Center, Inc.Toray Plastics (America), Inc.UC Components, Inc.Umicore Thin Film ProductsVacuCoat Technologies, Inc.Vacuum Engineering & Materials Company, Inc.Vacuum Process Technology LLCVacuum Technology & Coating*VAT, Inc.Vergason Technology, Inc.VON ARDENNEYeagle Technology, Inc.

Bold indicates Charter Corporate Sponsor* indicates new 2012/2013/2014 Corporate Sponsors

A&N CorporationAdvanced Energy Industries, Inc.Advanced Technology & Materials Co., LTDAgilent Technologies, Vacuum Products DivisionAMETEK Process InstrumentsAngstrom Sciences, Inc.ARi Industries, Inc.Atlas Technologies, Inc.AVACO, Inc.Bay Seal CompanyBdiscomBellowsTech, LLCBeneqBobst Manchester LtdBrooks Automation, Inc.Brooks InstrumentBurkert Fluid Control SystemsCoastal Instruments, Inc.Comet Technologies USA, Inc.COSMOTEC CorporationDarly Custom Technology, Inc.Delcom InstrumentsDenton Vacuum, LLCDHF Technical ProductsDillon Gage MetalsDuniway Stockroom CorporationDynavacEB Sources, Inc.EbatcoEDDY CompanyEdwards VacuumEnergetiq Technology, Inc.Evans Analytical GroupFerrotec (USA) CorporationFHR Anlagenbau GmbHFil-Tech, Inc.Filmetrics, Inc.Fischer Technology, Inc.FMG Enterprises, Inc.Fraunhofer FEPFraunhofer ISTFujian Nory New Material Technology Co. Ltd.Gamma ScientificGE Hitachi Nuclear Energy CanadaGencoa Ltd.General Plasma, Inc.

GfE Materials Technology, Inc.GNB CorporationGrenzebach Maschinenbau GmbHHauzer Techno Coating - IHI GroupHeraeus Materials Technology N.A. LLCHine Automation LLCHORIBA Jobin Yvon, Inc.HVA, LLCImpedans Ltd.Indium CorporationINFICONInland Vacuum Industries, Inc.InstruTech, Inc.Intellivation, LLCIntevac, Inc.Intlvac Thin FiilmIonauticsIonbond-IHI Group Instrutech, Inc.J.A. Woollam Co. Inc.Kaufman & Robinson, Inc.KDFKurdex CorporationKurt J. Lesker CompanyLeybold Optics USA, Inc.LOT Vacuum America Inc.Manitou Systems, Inc.Mantis Deposition, Inc.Manz USA, Inc.Materials Science, Inc.Materion CorporationMC Power Systems LLCMcVac Manufacturing Co., Inc.MDC Vacuum Products, LLCMeivac IncMetallix RefiningMidwest Tungsten Service, Inc.MKS Instruments, Inc.MOCON, Inc.MTI CorporationMustang Vacuum Systems, LLCm-u-t GmbHNGL Cleaning Technology SANiles Electronics, Inc.Nor-Cal Products, Inc.Nordmeccanica NA Ltd - Vacuum DivisionOerlikon Leybold Vacuum USA Inc.

Osaka Vacuum USA, Inc.Oxford Instruments AustinPfeiffer VacuumPlansee USA, LLCPlasmaterials, Inc.PLASMIONIC TechnologiesPLASUSProcess Materials, Inc.ProTech Materials, Inc.PVT Plasma and Vakuum Technik GmbHR.D. Mathis CompanyReldan Metals, Co.Reliable Silver CorporationRF VII Inc.Rigaku Vacuum ProductsRocky Brook Associates, Inc.Roth & Rau AG-Business Unit MicroSystemsSAFINASaint-Gobain Coating SolutionsSaxonian Institute of Surface MechanicsSchaeffer Technologies GmbH & Co KGSCI Engineered Materials, Inc.Semicore Equipment, Inc.Shimadzu Precision InstrumentsSidrabe, Inc.Sierra Applied Sciences, Inc.Soleras Advanced CoatingsSputtering Components, Inc.Super Conductor Materials, Inc.tec5USATeknipureTelemarkTestbourne LimitedTRIBOtechnicTRUMPF Huettinger, Inc.UC Components, Inc.Ulvac Technologies, Inc.Umicore Thin Film ProductsVacuum Engineering & Materials Co. Inc.Vacuum Plus Manufacturing, Inc.Vacuum Products CorpVacuum Research CorporationVapor Technologies, Inc.VAT, Inc.Vergason Technology, Inc.VON ARDENNE

EXHIBITING COMPANIES as of December 20, 2014

EXHIBIT OPEN Hours:


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30 Society of Vacuum Coaters 2015 TECHCON Preliminary Program30 Society of Vacuum Coaters 2015 TECHCON Preliminary Program

Registration for Tutorial Courses Use the On-Line TechCon registration system to register for tutorial courses.

You do not have to register for the Technical Conference or be a member of SVC to attend the Tutorial Courses. Fees are the same for SVC Members and Non-Members. Full-time students receive lower fees (Student ID card required).

Visit www.svc.org/TechConEducation to review tutorial titles and descriptions, topical outlines, detailed syllabus, dates, fees and biographical sketch of each instructor.

Register Early! Fees increase by $100 each after March 25, 2015 (this does not apply to students).

Discounts Offered to Multiple Registrants from one organizationSVC is offering a 25% discount on each tutorial registration for the second or more employee in a company who enrolls in the same tutorial as

the first employee (this discount does not apply to the Student rate). Note: For the multiple registrant discount to apply, pay the full tutorial registration fees through the On-line Registration system, then send an E-mail to [email protected] and request the discounted fee. Discounts will be refunded after the TechCon.

Discounts Offered to Exhibiting Companies SVC is offering special incentives to exhibiting companies who promote the SVC Technical Conference, Exhibit and Education Program. Contact Vivienne Mattox at [email protected] for details.

Cancellation Policy Tutorial course cancellations received on or before March 25, 2015 will be refunded. Refunds will be made after receipt of written notice, less a $25 service fee for each individual tutorial course. No refunds will be made after March 25, 2015.

SVC reserves the right to cancel any Tutorial. If a Tutorial is cancelled, registrants will be notified and a full refund of the tuition will be made.

Tutorial Courses Offered at the 2015 TECHCON

Who should use On-Line Registration?Everyone attending the TechCon for any reason must register for a badge

• Full Conference Registrants• All Exhibitor Booth Personnel • Manufacturer’s Reps• Media Personnel• All Presenters • Exhibit Visitors• Tutorial Course Registrants• Students and Young Members

General Conference Information • Special reduced TechCon registration fees apply to students,

Young Members and Member/Non-Member presenters. • Register early! Individual tutorial fees and conference

registration fees are higher than the fees in this Preliminary Program after March 25, 2015 (this does not apply to students or the Young Members Group).

Cancellation Policy Only Conference registration cancellations received on or before March 25, 2015 will be refunded. Refunds will be made upon receipt of a written notice, less a $25 service fee. No refunds will be made for cancellations received after March 25, 2015.

Membership Issues—Please Note! You must pay your 2015 Membership Dues before you can register at the “Member Rate” for the 2015 TechCon. Visit www.svc.org to become a new member or renew your membership.

Special Needs If you have disability or dietary needs, please contact SVC with the details.

On-Site RegistrationMain Lobby of the Santa Clara Convention Center

• Saturday, April 25 7:15 a.m. - 10:00 a.m. • Sunday, April 26 7:15 a.m. - 6:00 p.m.• Monday, April 27 7:15 a.m. - 6:00 p.m.• Tuesday, April 28 7:15 a.m. - 6:00 p.m. • Wednesday, April 29 7:15 a.m. - 5:00 p.m. • Thursday, April 30 7:30 a.m. - 3:00 p.m.

Included in Full-Conference Registration Fees: Social and networking events throughout the week:

• The Awards Ceremony and Welcome Reception on Sunday, April 26 at 6:30 p.m. at the Santa Clara Convention Center.

• Poolside Networking Mixer on Tuesday, April 28 at 6:00 p.m.• Reception in the Exhibit Hall on Wednesday, April 29 at 4:45 p.m. • Lunch in the Exhibit Hall on Wednesday, April 29 at 12:00 p.m. • Beer Blast in the Exhibit Hall on Wednesday, April 29 at 3:30 p.m.• Technology Forum Breakfasts on Monday, April 27 and

Tuesday, April 28 at 7:00 a.m. • Lunch during the Thursday Afternoon Special Presentation

at 12:40 p.m.SVC membership in 2015 is provided to those paying the Non-Member Conference fee. All Conference registrants receive full access to the SVC Digital Library, containing all Proceedings manuscripts published since 2000.

2015 TechCon VenueVi s i t w w w. s v c . o r g t o r e g i s t e r n o w !

Santa Clara Convention Center5001 Great America Parkway

Santa Clara, CA 95054

The On-line TechCon Registration is Now Open at www.svc.org


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› Renew Your Membership for 2015 or Join SVC On-Line Member‡ Non-MemberExhibitor Registration (through 3-25-15/after 3-25-15) (through 3-25-15/after 3-25-15)

Exhibitor Booth Personnel and Manufacturer’s Representative $0.00 $0.00

Exhibitor with Full Conference Registration $595.00/$700.00 $725.00/$825.00 Exhibitor Presenter in Technical Sessions* $470.00/$585.00 $570.00/$680.00

*Presenter Rate does not apply to co-authors ‡Member Fee applies only to those who have paid their 2015 Membership Dues

› Renew Your Membership for 2015 or Join SVC On-Line Member‡ Non-MemberAttendee Registration (through 3-25-15/after 3-25-15) (through 3-25-15/after 3-25-15)

Full Conference $595.00/$700.00 $725.00/$825.00

Invited Presenter $0.00 $0.00

Presenter in Technical Sessions* $470.00/$585.00 $570.00/$680.00

Media Personnel $0.00 $0.00

Student Conference $75.00 $135.00

Student Presenter in Technical Sessions* $50.00 $115.00

Young Members Group Conference $250.00 $310.00

Young Members Group Presenter in Technical Sessions* $165.00 $230.00

Tutorial Course(s) Only See Fees Below See Fees Below

Exhibit Visitor Only FREE FREE


Special Events at the TechConSVC Foundation Golf Tournament (Sunday 12:00 p.m. check-in) . . . . . . . . $150.00

SVC Foundation 5K Run (Tuesday Morning) includes a T-shirt . . . . . . . . . . . . . $25.00

Awards Ceremony and Welcome Reception (Sunday evening) . . . . . . . . . . . . .No Fee

Poolside Networking Mixer (Tuesday evening) . . . . . . . . . . . . . . . . . . . . . . . . . . .No Fee

SVC Foundation 5K Run

If you are unable to use the on-line registration, please contact SVC at [email protected] to request a registration form.

Saturday, April 25 Reg/Student V-204* Vacuum Systems, Materials and Operation . . . . . . . . . . . . . . . . . . . . . $640/$145 C-103* An Introduction to Physical Vapor Deposition (PVD) Processes . . . . . . . $670/$190 C-311 Thin Film Growth and Microstructure Evolution . . . . . . . . . . . . . . . . . . $570/$95 C-216* Practical Design of Optical Thin Films . . . . . . . . . . . . . . . . . . . . . . . . . $640/$145

Sunday, April 26 Reg/Student C-203 Sputter Deposition (Day 1 of 2-Day Tutorial) . . . . . . . . . . . . . . . . . . . . $895/$190 C-217* Practical Production of Optical Thin Films . . . . . . . . . . . . . . . . . . . . . . $640/$145 C-323 High Power Impulse Magnetron Sputtering . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95 C-336 Transparent Gas Permeation Barriers on Flexible Subtrates . . . . . . . . . . . $570/$95 C-337 ITO and Alternative TCO: From Fundamentals to Controlling

Properties . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95 C-339 NEW! Mechanical Heart Valve Thrombosis: An Introduction

and Review (PM) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $395/$70

Monday, April 27 Reg/Student C-203 Sputter Deposition (Day 2 of 2-Day Tutorial) . . . . . . . . . . . . . . . . . . . . see above C-322 Characterization of Thin Films . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95 V-207 Practical Aspects of Vacuum Technology: Operation and

Maintenance of Production Vacuum Systems . . . . . . . . . . . . . . . . . . . . $570/$95 C-309 NEW! Cathodic Arc Deposition (PM) . . . . . . . . . . . . . . . . . . . . . . . . . . . $395/$70

* Indicates that a textbook is included with these courses.

Tuesday, April 28 Reg/Student C-315 Reactive Sputter Deposition . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95 C-333 Practice and Applications of High Power Impulse Magnetron

Sputtering (HIPIMS) (AM) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $395/$70 M-102 Introduction to Ellipsometry (AM) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $395/$70 C-210 Introduction to Plasma Processing Technology . . . . . . . . . . . . . . . . . . . $395/$70 C-340 NEW! Plastics Optics - Coatings and Anti-Reflective Structures (PM) . . . $395/$70

Wednesday, April 29 Reg/Student C-208 Sputter Deposition in Manufacturing . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95 C-212 Troubleshooting for Thin Film Deposition Processes . . . . . . . . . . . . . . . $570/$95 C-328 Properties and Applications of Tribological Coatings (AM) . . . . . . . . . . . $395/$70

Thursday, April 30 Reg/Student C-320 Diamond Like Carbon Coatings – Basics to Industrial Realization (AM) . $395/$70 C-324 Atmospheric Plasma Technologies (AM) . . . . . . . . . . . . . . . . . . . . . . . . $395/$70 C-326 Manufacture of Precision Evaporative Coatings (AM) . . . . . . . . . . . . . . . . . $395/$70 C-316 Introduction to Atomic Layer Deposition (ALD) Processes, Chemistries,

and Applications (AM) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $395/$70


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TechCon sponsors are recognized as key players in the vacuum coating community, and every sponsor is acknowledged during their sponsored event with prominent signage, on the SVC Web Site and in all SVC publications throughout the year. Participate in our Sponsor Program to reinforce your name recognition and demonstrate your commitment to the industry. Choose the sponsorship that fits your budget from the list below.

Networking Lounge › Materion

Beer Blast › VON ARDENNE

USB Flash Drive › Agilent Technologies

Notepad › Korea Vac Tec

Badge Lanyards › Telemark

Bottled Water › DHF Technical Products

Exhibitor Lounge › Physics Today

Frozen Treats in the Exhibit Hall› Vacuum Research Corporation

Conference Tote Bags › Brooks Automation, Inc.

› Denton Vacuum, LLC › Nordmeccanica Group

› INFICON› Reliable Silver Corporation

Registration Splash Page › IonBond - IHI Group

Hotel Splash Page › ZPulser, LLC

Awards Ceremony & Welcome Reception - $2,900

› AVAILABLE

Specialty Coffee Station - $2,800› Two more sponsorships AVAILABLE

› PLANSEE

Exhibit Reception Drink Ticket - $3,400 › AVAILABLE

Gold - $2,800 › Soleras Advanced Coatings

› Vergason Technology, Inc.

Silver - $1,900 › Advanced Energy Industries, Inc.

› Bürkert Fluid Control Systems

› GfE Metalle und Materialien GmbH

› Hauzer Techno Coating - IHI Group

› Heraeus Materials Technology

› Indium Corporation

› SAFINA

› Umicore Thin Film Products

Bronze - $950› BellowsTech, LLC

› BOBST Manchester Limited › Dillon Gage Metals

› Fraunhofer USA › Gencoa Ltd.

› J.A. Woollam Co. Inc.› MDC Vacuum Products, LLC

www.physicst day.orgwww.physicst day.org

for more [email protected] . 856 . 7188

www.svc.org

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SponsorsBenefits of sponsorship start when you sign up and last until long after the TechCon!

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+ tutorial course roster - thinfilmsolutions.org program problem-solving tutorial courses equipment...

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