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    CST Advanced Training 2004CST Advanced Training 2004@@ DaedeokDaedeok Convention Town (2004.03.24)Convention Town (2004.03.24)

    CSTCST EMEM StudioStudioTMTM

    :: ExamplesExamples

    Chang-Kyun PARK(Ph. D. St.)

    Thin Films & Devices (TFD) Lab.Thin Films & Devices (TFD) Lab.

    Dept. of Electrical Engineering,Dept. of Electrical Engineering,

    Hanyang University @Hanyang University @AnsanAnsan Campus, KOREACampus, KOREA

    E-mail:[email protected]

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    OOUTLINEUTLINE

    Introduction

    Example

    E-static

    Electrometer

    CST EMCST EM StudioStudioTMTM v.2.0v.2.0

    M-staticRotary Encoder

    J-static

    Circuit Breaker

    Tracking

    Electron gun

    RJ 45 LAN connectorVariable capacitor

    Floating Potential

    Field EmitterTapered-type gated FEA

    LFEddy current sensor

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    TFD Lab.TFD Lab.Hanyang UniversityHanyang UniversityProfessor: JinProfessor: Jin--SeokSeok ParkPark

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    TFD Lab.TFD Lab.

    TFD Lab.Thin films and devices lab. for electronic displays and communications

    http://tfd.hanyang.ac.kr

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    CSTCST

    EM StudioEM Studio

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    MAFIAMAFIA

    CSTMAFIA

    MAFIA (Maxwells Equations by the Finite Integration Algorithm)

    MAFIA is an interactive program package for the computation ofelectromagnetic fields. It is based directly on the fundamental equationsof electromagnetic fields, Maxwells equations.

    MAFIA is a modular program, it isdivided in preprocessor,postprocessor and solvers fordifferent special cases of Maxwells

    equations

    MAFIA includes an optimizer, it runsinteractively as well as in batch orsemi interactive using predefined

    command sequences. It has apowerful command language forautomation and optimizingpurposes and an advanced

    interactive graphical output withthousands of display options

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    MAFIA ModuleMAFIA Module

    MAFIA Module

    CSTMAFIA

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    MAFIAMAFIA

    The Following modules are available (I)

    CSTMAFIA

    M :Preprocessor, includes solid modeler, CAD import, 3D graphics

    P:Postprocessor, includes 3D graphics and calculation of deduced

    quantities like far field and impedance

    S:Static field module, solves electrostatics, magnetostatics, heat flowproblems, stationary current flow problems and electro-quasistaticproblems

    T3 :Time domain module, simulates time dependent wavepropagation, most general and versatile in application. Uses Cartesiancoordinates

    TS3

    :Time domain module, simulates charged particle movement intime dependent fields including the interaction of particles and fields.Uses Cartesian coordinates only

    TS2 :Time domain module, simulates charged particle movement in

    time dependent fields including the interaction of particles and fieldsin cylinder symmetrical structures

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    MAFIAMAFIA

    The Following modules are available (II)

    CSTMAFIA

    E:Frequency domain eigenmode module, finds modes in resonators

    and waveguidesW3 :Frequency domain module, covers the whole frequency range

    H3 :Thermodynamic module, solving thermodynamic problems in timedomain in either Cartesian or polar coordinate system

    T2 :Time domain module, simulates time dependent wave propagationwithin cylinder symmetrical structures. Not yet available under GUI

    OO :Optimizer with many built in strategies. Optimizing capabilitiesnot

    yet completely available under GUIA3 :Time domain acoustic solver. Not yet available under GUI

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    The Simulation MethodThe Simulation Method

    Background of the Simulation Method

    CSTEM Studio

    CST EM STUDIO is a general-purpose electromagnetic simulator basedon the Finite Integration Technique (FIT), first purposed by Weiland in1976/1977.

    Finite Integration + PBA(Statics to THz)

    Maxwell Grid Equations

    E-static

    0=

    ti

    ta

    0

    t

    M-static

    J-static

    Tracking

    Frequency Domain (j>0)

    Eigenvalue Problem (j=0)

    Implicit

    ExplicitTime

    Domain

    PIC

    MAFIA

    EMS MWS

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    CSTCST EM StudioEM Studio

    Example: EExample: E--staticstatic

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    SS--static 1: Electrometerstatic 1: Electrometer

    Introduction

    CSTEM Studio

    PEC

    This Example deals with the simulation of a simple electrometer device, whichcan be used for voltage measurements. The model used for the electrometerconsists of three parts: the electrometers scale, the ground, and the pointer.

    Results of interest: the capacitance and the torque for different angles of thepointer

    The main dimensions of theelectrometer device (unit: cm)

    Pointer(PEC, 1,000V)

    Scale(Dielectric,=10)

    Ground

    (PEC, 0V)

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    SS--static 1: Electrometerstatic 1: Electrometer

    Summary

    CSTEM Studio

    Meshcells: 294,528

    48min, 10secTotal solver

    time

    Angle

    From 20 to 70 (11steps)

    Parametersweep

    294,528Meshcells

    ElectrostaticSolver

    Mesh generation

    i l

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    SS--static 1: Electrometerstatic 1: Electrometer

    Potential

    CSTEM Studio

    E-Field

    S i li 1 El

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    SS--static 1: Electrometerstatic 1: Electrometer

    CSTEM Studio

    Torque vsangle

    SS i 2 RJ 45 Ct ti 2 RJ 45 C t

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    SS--static 2: RJ 45 Connectorstatic 2: RJ 45 Connector

    Introduction

    CSTEM Studio

    This example shows the calculation of the capacitance matrix of a RJ45connection. The model consists of the connector and the corresponding socket,each containing eight wires for the signal transmission. The wires of the socketare fixed to a substrate plate, every other of them additionally connected to a

    metallic ground plane. This provides some kind of shielding effect for thetransmission of the wire signals.

    Results of interest:capacitance Matrix

    SS t ti 2 RJ 45 C tt ti 2 RJ 45 C t

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    SS--static 2: RJ 45 Connectorstatic 2: RJ 45 Connector

    Define Potential

    CSTEM Studio

    Potential 1(PCB PEC, 0V)

    Potential 2(PCB PEC, 1V)

    Potential 3(PCB PEC, 1V)

    Potential 4

    (PCB PEC, 1V) Potential 5(PCB PEC, 1V)

    SS t ti 2 RJ 45 C tt ti 2 RJ 45 C t

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    SS--static 2: RJ 45 Connectorstatic 2: RJ 45 Connector

    Potential

    CSTEM Studio

    E-Field

    SS t ti 2 RJ 45 C tt ti 2 RJ 45 C t

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    SS--static 2: RJ 45 Connectorstatic 2: RJ 45 Connector

    Capacitance Matrix

    CSTEM Studio

    SS t ti 3 V i bl C itstatic 3: Variable Capacitor

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    SS--static 3: Variable Capacitorstatic 3: Variable Capacitor

    Introduction

    CSTEM Studio

    The variable capacitor example demonstrates the parameter sweep feature incombination with the capacitance calculation.

    Plate(PCB PEC, 0V)

    Plate

    (PCB PEC, 1V)

    Epsilon

    (Dielectric,=100)

    Parameter Sweep

    SS static 3: Variable Capacitorstatic 3: Variable Capacitor

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    Capacitance Vs Alpha

    CSTEM Studio

    SS--static 3: Variable Capacitorstatic 3: Variable Capacitor

    SS static 4: Floating Potentialstatic 4: Floating Potential

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    SS--static 4: Floating Potentialstatic 4: Floating Potential

    Introduction

    CSTEM Studio

    This examples demonstrates how to consider floating potentials in anelectrostatic calculation. It consists of four metallic plates and two plates ofhigh dielectric material (relative permittivity 10000). On the two larger metallicplates a potential is defined, the other two metallic plates carry a charge of 0C.

    Plate(PCB PEC, -1V)

    Plate(PCB PEC, 1V)

    PEC

    Floating Potential

    High dielectric material(relative permittivity 10000)

    Applied charge value: 0C

    SS static 4: Floating Potentialstatic 4: Floating Potential

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    Result: Electric Field Distributions

    CSTEM Studio

    1V

    -1V

    0.469V

    -0.469V

    0.467V

    -0.467V

    SS--static 4: Floating Potentialstatic 4: Floating Potential

    SS static 4: Floating Potentialstatic 4: Floating Potential

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    Result: Electric Field Distributions

    CSTEM Studio

    SS--static 4: Floating Potentialstatic 4: Floating Potential

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    SS--static 4: Floating Potentialstatic 4: Floating Potential

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    Result: Potential Distributions

    CSTEM Studio

    1V

    -1V

    0.469V

    0V

    0V

    -0.469V

    SS--static 4: Floating Potentialstatic 4: Floating Potential

    SS--static 4: Floating Potentialstatic 4: Floating Potential

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    Result: Electric Field Distributions

    CSTEM Studio

    SS--static 4: Floating Potentialstatic 4: Floating Potential

    SS--static 5: Field emitterstatic 5: Field emitter

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    X-cut Plane

    Cathode(0V)

    Isolated ElectrodeBallast layer, a-Si

    Insulator, SiO2

    Gate (30V)

    CNT

    Anode (50V)

    10m

    SS-static 5: Field emitterstatic 5: Field emitter

    SS--static 5: Field emitterstatic 5: Field emitter

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    Material PropertyUnit: m

    CNT(PEC)

    Diameter: 0.040

    Height: 1Tip radius: 0.020

    Base: a-Si

    Height: 2

    Diameter: 0.040

    SS static 5: Field emitterstatic 5: Field emitter

    SS--static 5: Field emitterstatic 5: Field emitter

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    Potential

    Unit: m

    Cathode(0V)

    Gate(30V)

    Anode(50V)

    SS static 5: Field emitterstatic 5: Field emitter

    SS--static 5: Field emitterstatic 5: Field emitter

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    Floating PotentialUnit: m

    Isolated Electrode

    CNT

    SS static 5: Field emitterstatic 5: Field emitter

    SS--static 5: Field emitterstatic 5: Field emitter

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    Results: Potential Distribution

    Isolated Electrode: 26V

    Tip Region: 27V

    SS static 5: Field emitterstatic 5: Field emitter

    SS--static 5: Field emitterstatic 5: Field emitter

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    Results: Electric Field Distribution

    S static 5: Field emitter

    SS--static 5: Field emitterstatic 5: Field emitter

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    Results: 1D Plot

    SS--static 6: Taperedstatic 6: Tapered--type Gatedtype Gated--FEAFEA

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    Geometry

    Cathode(0V) Inter-dielectric

    Ballast layer, a-Si

    Insulator, SiO2

    Gate (50V)

    Parameter Sweep

    CNT-Floating Potential (0C)

    Monitoring Point

    pp ypyp

    SS--static 6: Taperedstatic 6: Tapered--type Gatedtype Gated--FEAFEA

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    45o

    68o

    90o

    Parameter Sweep (Pierce Electrode angle: 90o~12.5o)

    Result: Potential Distributions

    pp ypyp

    SS--static 6: Taperedstatic 6: Tapered--type Gatedtype Gated--FEAFEA

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    Parameter Sweep (Pierce Electrode angle: 90o~12.5o)

    45o

    68o

    90o

    Result: Electric Field Distributions

    pp ypyp

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    SS--static 7: ICPstatic 7: ICP--ReactorReactor

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    Simulation of ICP Reactor under DC Bias Conditions

    System summary

    OS: MS Windows XP V.5.1 SP1 Model: Intel Zeon (SE7505VB2) 2CPU Process: Genuine Intel ~2790Mhz

    Memory: 1,024.00MB Graphic Adapter: Quadro4 980XGL

    Simulation summary

    Tool: CST EM Studio TM v 1.3 (CST

    GmbH) Simulation field: Electrostatic Solver Number of nodes: 1,074,480 Mesh generation time: 130 s Solver time: 13 s

    Modeling of ICP Reactor Simulation

    SS--static 7: ICPstatic 7: ICP--ReactorReactor

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    Conditions Simulation Results Under 300 V Conditions

    Potential distribution Electric Field distribution

    SS--static 7: ICPstatic 7: ICP--ReactorReactor

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    Conditions Simulation Results Under -450 V Conditions

    Potential distribution Electric Field distribution

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    CSTCST EM StudioEM Studio

    Example: MExample: M--staticstatic

    MM--static 1: Rotary Encoderstatic 1: Rotary Encoder

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    Introduction

    CSTEM Studio

    In this tutorial a rotary encoder consisting of two iron yokes, a permanentmagnet and two hall sensorsis analyzed.

    Both yokes form a magnetic circuit, which is driven by a cylindrical permanentmagnet. Two hall sensors are placed in the air gap between the yokes tomeasure the flux density in the gap. By twisting the yokes the B-field changeslinear with the rotation angle.

    Upper Yoke(Iron 1000)

    Bottom Yoke(Iron 1000)

    Magnet

    Hall Sensor

    0.2 T| z

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    MM--static 1: Rotary Encoderstatic 1: Rotary Encoder

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    Parameter Sweep

    CSTEM Studio

    Field Watch Position

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    LF: Eddy Current SensorLF: Eddy Current Sensor

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    Introduction

    CSTEM Studio

    In this example and eddy current sensor is modeled to simulate non-destructivematerial test. You will analyze an eddy current sensor driven by a low frequencycoil generating eddy currents in an aluminum probe plate.

    The structure depicted above consists of the sensor, represented by anexcitation current coil embedded in iron material. Below this sensor the probeplate is given as a lossy aluminum material, allowing the flow of eddy current.Inside this plate a material defect is modeled as a gap, which should bedetected by the changing voltage at the coil.

    LF: Eddy Current SensorLF: Eddy Current Sensor

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    CSTEM Studio

    B-Field (0o) Eddy Current (90o)

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    SC: Circuit BreakerSC: Circuit Breaker

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    Introduction

    CSTEM Studio

    In this example, you will analyze a circuit breaker consisting of two contactspringsconnected by a bridge.

    One matter of concern is the current flow from one contact over the bridge tothe other contact. Therefore two current port are defined for the stationarycurrent solver. After the solver run the fields are visualized and then used as asource field for a subsequent carried out magnetostatic calculation.

    Cupper(J-port, -0.05V)

    Cupper(J-port, 0.05V)

    Contact pad(PEC)

    Bridge(PEC)

    SC: Circuit BreakerSC: Circuit Breaker

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    CSTEM Studio

    Current Density

    Loss Power (P):6.856485e+001 [W]R= V2/P=0.1*0.1/P = 1.458473e-4I = P/V = V/R = 685.65 [A]

    SC: Circuit BreakerSC: Circuit Breaker

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    CSTEM Studio

    H-Field

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    CSTCST EM StudioEM StudioExample: TrackingExample: Tracking

    SolverSolver

    Tracking 1: Electron GunTracking 1: Electron Gun

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    Introduction

    CSTEM Studio

    This example demonstrated how a particle tracking can be performed. Twotypes of field results were used here, an electrostaic field is used to accelerateelectrons being emitted from a cathode and a magnetostatic field which iscaused by a helmholzcoil in order to focus the electron beam.

    Anode(PEC, 1000V)

    Cathode(PEC, 0V)

    Focus coil(0.4A)

    Tracking 1: Electron GunTracking 1: Electron Gun

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    Particle Source

    CSTEM Studio

    Emission Site(electron)

    Particle Tracking