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Page 1: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed
Page 2: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

KYKY ION PUMP目录CONTENTS

I. Application and range ·························································································································02

II. Operating Principal ····························································································································03

III. Main Performance Parameter ···········································································································04

IV. Installation and Usage ······················································································································10

V. Caution and Maintenance ··················································································································12

VI. Machine Parts ···································································································································13

Product Warranty ···································································································································14

Instructions on Warranty Service ···········································································································15

Page 3: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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I. Application and range

Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump.

The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to scientific experiment apparatuses such as high-energy particle accelerator, controlled thermonuclear reaction apparatus, electric vacuum device, semiconductor material, electronic microscope and mass spectrometer, and other industrial equipment requiring ultra-high vacuum.

II. Operating Principal

Principle of sputter-ion pump is as shown in figure 1. Material of anode is stainless steel barrel, and material of cathode is titanium plate. Penning discharge process ionizes gas under the joint action of magnetic field and electric field, thus realizing exhausting of gas. When appropriate high voltage is applied to anode (which is in positive potential compared to cathode), discharge is realized in small anode chamber, so electrons conduct rolling linear motion under the action of magnetic field and reciprocating motion between two cathodes under the action of electric field. A large quantity of restrained electrons form electron cloud in the small anode chamber; such electron cloud easily collides with gas molecules and ionize; electrons generated by ionization are called secondary electrons which compensate those electrons running up to anode due to collision to maintain penning discharge; under the action of electric field, ions fly to titanium cathode plate in an accelerating way, and bombard the titanium plate to sputter titanium and form titanium film on the surfaces of anode and cathode; active gas molecules (such as oxygen and nitrogen) react with the fresh titanium film and are fixed into compounds and then exhausted. With smaller ionization possibility, inert gas such as argon and helium exhaustion is mainly by being buried near sputter region of cathode after ionization and covered by the titanium film on the surface of anode; therefore, common diode ion pump has relatively slow pumping speed for inert gas.

Triode ion pump is improved for increasing the pumping rate for inert gas; ions of inert gas are subjected to grazing incidence into titanium grid of cathode, then neutralized, and reflected to pump wall and anode for being buried with the titanium film. As inert gas buried in the pump wall will not be released due to positive ion bombardment, the pumping speed for inert gas is increased.

Fig. 1 Principal diagram of sputter-ion pump

Magnetic field

Diode pump core Triode pump core

+7KV -7KV

Page 4: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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III. Main Performance Parameter

1. Characteristic parameters of pump

Characteristic parameters and overall dimensions of all types of sputter-ion pump are listed below

Characteristic parameter and dimension of sputter-ion pumps 2L-25 and 3L-25

Model 2L-25 3L-25

Flange on intake port CF35 CF35

Pumping speed for Nitrogen(L/S) 22 21

Pumping speed for Argon(L/S) 0.3 6

Start pressure (Pa) ≤ 5×10-4 ≤ 5×10-4

Ultimate pressure (Pa) ≤ 7×10-8 ≤ 7×10-8

Baking (℃ ) with magnetTemperature without magnet

200 200

300 300

Working voltage (KV) +7 -5

Exhaust unit (piece) 1 1

Weight(kg) 7 7

Heating hood None None

10-7 10-6 10-5 10-4 10-3 10-20

5

10

15

20

25

30

压强(Pa)

抽速

(L/s

)

10-7 10-6 10-5 10-4 10-3 10-20

5

10

15

20

25

30

压强(Pa)

抽速

(L/s

)

Characteristic parameter and dimension of sputter-ion pump 2L-50 and 3L-50

Model 2L-50 3L-50

Flange on intake port CF100 CF100

Pumping speed for Nitrogen(L/S) 65 55

Pumping speed for Argon(L/S) 0.6 12

Start pressure (Pa) ≤ 5×10-4 ≤ 5×10-4

Ultimate pressure (Pa) ≤ 7×10-8 ≤ 7×10-8

Baking (℃ ) with magnetTemperature without magnet

200 200

300 300

Working voltage (KV) +7 -5

Exhaust unit (piece) 2 2

Weight (kg) 22 22

Heating hood None None

Saturation pumping speed of 2L-25 Saturation pumping speed of 3L-25

Saturation pumping speed of 2L-50 for nitrogen Saturation pumping speed of 3L-50 for nitrogen

10-7 10-6 10-5 10-4 10-3 10-20

20

40

60

80

100

压强(Pa)

抽速

(L/s

)

10-7 10-6 10-5 10-4 10-3 10-20

20

40

60

80

100

压强(Pa)

抽速

(L/s

)

Page 5: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C

Model 2L-200B 2L-200C

Flange on intake port CF150 CF150

Pumping speed for Nitrogen(L/S) 230 230

Pumping speed for Argon(L/S) 2.4 2.4

Start pressure (Pa) ≤ 5×10-4 ≤ 5×10-4

Ultimate pressure (Pa) ≤ 2.7×10-8 ≤ 1×10-8

Baking (℃ ) with magnetTemperature without magnet

200 200

300 300

Working voltage (KV) +7 +7

Exhaust unit (piece) 4 4

Weight (kg) 100 100

Heating hood Yes Yes

Saturation speed of 2L-200B and 2L-200C for nitrogen

Characteristic parameter and dimension of sputter-ion pumps 2L-100 and 3L-100

Model 2L-100 3L-100

Flange on intake port CF150 CF150

Pumping speed for Nitrogen(L/S) 120 110

Pumping speed for Argon(L/S) 1.2 24

Start pressure (Pa) ≤ 5×10-4 ≤ 5×10-4

Ultimate pressure (Pa) ≤ 7×10-8 ≤ 7×10-8

Baking (℃ ) with magnetTemperature without magnet

200 200

300 300

Working voltage (KV) +7 -5

Exhaust unit (piece) 4 4

Weight (kg) 38 38

Heating hood None None

Saturation pumping speed of 2L-100 for nitrogen Saturation pumping speed of 3L-100 for nitrogen

10-7 10-6 10-5 10-4 10-3 10-20

30

60

90

120

150

压强(Pa)

抽速

(L/s

)

10-7 10-6 10-5 10-4 10-3 10-20

30

60

90

120

150

压强(Pa)

抽速

(L/s

)

10-7 10-6 10-5 10-4 10-3 10-20

50

100

150

200

250

300

压强(Pa)

抽速

(L/s

)

10-7 10-6 10-5 10-4 10-3 10-20

50

100

150

200

250

300

压强(Pa)

抽速

(L/s

)

Page 6: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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Characteristic parameter and dimension of sputter-ion pumps 2L-400, 2L-400C, 3L-400 and 3L-400C

Model 2L-400 3L-400 2L-400C 3L-400C

Flange on intake port CF150 CF150 CF150 CF150

Pumping speed for Nitrogen(L/S) 450 420 450 420

Pumping speed for Argon(L/S) 4.5 85 4.5 85

Start pressure (Pa) ≤ 5×10-4 ≤ 5×10-4 ≤ 5×10-4 ≤ 5×10-4

Ultimate pressure (Pa) ≤ 2.7×10-8 ≤ 2.7×10-8 ≤ 1.0×10-8 ≤ 1.0×10-8

Baking (℃ ) with magnetTemperature without magnet

200 200 200 200

300 300 300 300

Working voltage (KV) +5 -5 +5 -5

Exhaust unit (piece) 4 4 4 4

Weight (kg) 220 220 220 220

Heating hood Yes Yes Yes Yes

10-8 10-7 10-6 10-5 10-4 10-3 10-20

100

200

300

400

500

压强(Pa)

抽速

(L/s

)

10-8 10-7 10-6 10-5 10-4 10-3 10-20

100

200

300

400

500

压强(Pa)

抽速

(L/s

)

Saturation pumping speed of 2L-400 and 2L-400C for nitrogen

Saturation pumping speed of 3L-400 and 3L-400C for nitrogen

Caution!

The curves above are saturation pumping speed of the pump for nitrogen (or dry air). If pumping speed for other types of gas are needed, shall perform other pumping rate test.

2. Lifetime of pump

Lifetime of sputter-ion pump is related to parameters such as thickness of cathode plate and discharge intensity. Meanwhile, working pressure and gas type have more significant influence on the lifetime. Generally, ion pump is expired under the following conditions:

Cathode material is used up. Under pressure of 1x10-4 Pa, after diode pump exhausts nitrogen for 30,000-60,000 hours, sputter area of the titanium cathode plate will be perforated in center.

Titanium compound at anode falls off. The titanium compound layer at anode will be thickened and fall off after pump works for a long time. At that time, pressure will be dramatically fluctuated, and pump cannot work normally. The lifetime of ion pump will be greatly different under different working conditions. Generally, pump shall be cleaned after working under the pressure of 1x10-4

Pa for about 10,000-50,000 hours.Gas is saturated. Long-time exhausting for small-molecular gas such as hydrogen helium for generally 10,000-50,000 hours will

saturate cathode, which makes pump fail to be used due to cracks formed by such saturation.

Caution!

Due to different working pressures and different types of pumped gas, sputter-ion pump is greatly different in its lifetime. The list above only shows the service life of ion pump under a general status, and cannot be used as a lifetime standard for ion pump. It is for reference only.

Page 7: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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IV. Installation and Usage

1. Installation● Unpack checkingEach ion pump has passed pressure test before delivery with good performance. But during transportation, it might be

damaged. So before installation, please check high voltage lead. Check whether there is short circuit between high voltage lead and pump housing or between heating hood and pump housing by Megger. Normally, the insulation resistance should be larger than 1000MΩ and 100MΩ.

● Installation position and flange connectionThe pump can be installed in any direction. When installed in vertical position, for small pump (pumping speed is lower than

100), the pump can be supported directly by flange. For the other directions or other types of pump, the additional support should be added.

The knife-edge of connected flange should be the same as pump flange and the edges shall not have deep scratch. The copper sealing washer used for installation shall not have deep radical scratch. The bolt should be coated by high-temperature lubricant (Such as MoS2 ect.) for easy removal.

● Connect power supplyThe housing of the power supply and the pump should be connected to the same earth wire. Connect high voltage plug and

high voltage lead of the pump.

Caution!

Do not place power supply and ion pump in humidity environment

After installation, check whether there is short circuit between high voltage lead and pump housing or between heating hood

and pump housing by Megger. Normally, the insulation resistance should larger than 1000MΩ and 100MΩ.

2.Use

When system air pressure is pre-pumped to 5×10-4Pa or lower, please follow operations below:● Switch range switch to “KV” position and protection switch to “OFF” position● Connect external power (~220V) and press “ON” button on power supply. The indicator above the switch would light up at

the moment, which means the power supply is working normally. Voltage is increasing gradually as shown on voltmeter (ammeter).● When ion pump works smoothly, pre-pump valve can be closed. If system intakes plenty of air during work, vacuum level

would fall rapidly, the voltage of ion pump will drop and the ion flow will increase. Under such circumstances, pre-pump valve should be open for a while until the pump voltage increases to normal level then close the valve.

● When ion pump works smoothly and system vacuum level is higher than 1×10-3Pa, protection switch can be turned to “ON” position. If system vacuum level is lower than 1×10-3Pa, the power will be cut off within 10 seconds, in order to avoid burning out when no one is on site.

● In order to get ultra high vacuum level above 10-6Pa, baking is necessary for pump and system, especially when system or pump is exposed to air.

For the pump with heating hood, it only needs to connect the heating hood to external power (~220V). For those without heating hood, heating belt should be winded to the pump before baking. Baking temperature should be around 150 ℃ .

● When ion pump finish the task, press stop button; then indictor turns off; and ion pump stops

Caution!

Sputter-ion pump shall be started when air pressure is lower than 1×10-2Pa. If vacuum chamber and pump working carrier gas is small then ion pump would quickly pass high pressure period and reach vacuum level at 5×10-4Pa. At such situation, ion pump can be started in high pressure environment (lower than 1×10-2Pa). If vacuum chamber and pump working carrier gas is big, then ion pump will stay much longer under high voltage period. Frequent starting under such circumstance will affect the service life of ion pump as well as its ultimate pressure. So, for big vacuum chamber, molecular pump unit is suggested to be used as backing pump.

Page 8: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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V. Caution and Maintenance

1. Caution

Caution!

Power and ion pump are not allowed working in humidity environment. Or the high voltage lead of ion pump will be easily breakdown.

Plug in or pull out high voltage plug during working is forbidden. Or there will be life risk. If high voltage plug needs to be pulled

out, the power should be cutt off for more than 5 minutes, until high voltage capacitor fully discharged.

● If ion pump needs to be taken down from machine during maintenance, it's suggested to fill in nitrogen in ion pump. The entrance of the pump should be sealed by plastic cover and tied up tightly by tape to avoid dust or other impurities get in. And it shall not exposed in air for too long.

● If ion pump is taken down and idle for a long time, it should be pumped to vacuum and sealed.● If ion pump works in low vacuum environment for too long, the pump body will be heated even hard to start. So long-term

working in low vacuum environment should be avoided.● When installing, taking down or moving ion pump, do not damage high voltage lead.

2. Pump maintenance

Normally when the pump requires maintenance in below situations,: ●Ion flow fluctuates greatly. This is usually because that the titanium compound on anode falls off after long-term working. The

pump needs to be cleaned.● Hard to start. It happens when pump works in vapor or other organic vapor environment for a long-term or exposed in air. If

it’s still hard to start after baking, the pump needs be cleaned.● Cathode is used up. After long-term working, the cathode titanium plate of the pump core will be breakthrough. And the

cathode titanium strip of the triode pump will be broke. At this moment, cathode needs to be replaced.● Short circuits. Short circuits may happens due to titanium compound falls off or arc strike occurred in extreme low vacuum

level (lower than 133Pa). High voltage arc melts pump core shield that causes insulator coated with mental film. At this time, pump core needs to be repaired.

VI. Machine Parts

SN Name Unit number

1 Inspection certificate piece 1

2 Operation Manual piece 1

3 Ion pump set 1

Page 9: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed

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Product Name: Product Code: Release date: User:

Date Repair Contents Repaired By

………………………………………………Cut ………………………………………………Seal Here………………………………………………

Please fill into the detailed information as follow and post it to our companyProduct Name: Contact Person: Product Model: Phone Number: Product Code: Postal Code: Date of Purchasing: Company Address: Company Name:

Product Warranty

2LD/3LD- 400B Ion Pump Controller

Instructions on Warranty Service

Ion pump bought from our factory will be guaranteed for one year since the purchase date based on warranty bill and one more month for users in other area. The repair fee is free of charge during the warranty period, for replace the accessories, half fee will be charged, free of charge if it is less than half a year.

The pump should not enjoy warranty service for one of the following reasons:1.Disassemble pump by itself or retrofit to pump body or pump core structure.2.User uses incorrectly (such as damage high voltage lead).3.Users’ vacuum system is not clean, such as existing plenty of vapor or other organic gas which causes pump dirty quickly.4.Users let ion pump work in low vacuum environment for long time (lower than 1×10-4Pa for long time), causing cathode used

up quickly.

Page 10: CONTENTS06 07 IO PUMP IO PUMP Characteristic parameter and dimension of sputter-ion pumps 2L-200B and 2L-200C Model 2L-200B 2L-200C Flange on intake port CF150 CF150 Pumping speed