1 structure-related changes in magnetoresistance of co 90 fe 10 /cu and co 90 fe 10 /cu 85 ag 10 au...
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1
Structure-related changes in magnetoresistance of Co90Fe10/Cu and Co90Fe10/Cu85Ag10Au5 multilayers
D. RafajaInst. of Physical Metallurgy, TU Bergakademie
FreibergJ. Ebert, G. Miehe, N. Martz, M. Knapp, B. Stahl, M. Ghafari, H. Hahn and H. Fuess
Inst. of Materials Science, TU DarmstadtP. Schmollengruber, P. Farber and H.Siegle
Robert Bosch GmbH, Stuttgart
2
GMR multilayers Co90Fe10/(Cu,Ag,Au)
Si (111)
SiO2 (750 m)
Fe (4.4 nm)
Co90Fe10 (1.1 nm)
Cu (2.2 nm)20x
Si (111)
SiO2 (750 m)
Fe (4.4 nm)
Co90Fe10 (1.1 nm)
Cu85Ag10Au5 (2.2 nm)
Co90Fe10/Cu Co90Fe10/Cu85Ag10Au5
Soft annealing: 1 hour at 220-360°C
substrate
buffer
3
Magnetoresistance
-100 -50 0 50 100
0
5
10
15
20
25
B (mT)
-100 -50 0 50 1000
5
10
15
20
25
GM
R (
%)
B (mT)
Co90Fe10/Cu Co90Fe10/Cu85Ag10Au5
200 250 300 3505
10
15
20
25
GM
R (
%)
T (°C)
Co90Fe10/Cu
Co90Fe10/ Cu85Ag10Au5
4
Anomalous X-ray scattering
iii
iii
e
fcffcf
fffr
n
;
21 0
2
T.Bigault, F.Bocquet, S.Labat, O.Thomas and H.Renevier, Phys.Rev.B 64 (2001) 125414.
26Fe 27Co 28Ni 29Cu
47Ag
79Au
1.0 1.1 1.2 1.3 1.4 1.5 1.6 1.7
1.0
1.5
2.0
2.5
3.0
Cu
Co 90Fe 10
Cu
Cu 85Ag10Au5
Re
al(
1-n
)*1
05
1.0 1.1 1.2 1.3 1.4 1.5 1.6 1.7
0.0
0.5
1.0
1.5
2.0
2.5
3.0
3.5
4.0
4.5
Co 90Fe 10
Cu 85Ag10Au5
Ima
g(n
)*1
06
Wavelength (Å)
5
Experimental set-up (conventional)
X-ray tubeCuK
Göbel mirror
Sample
Secondary graphite monochromator
Detector
Slit 0.1mm
Slit 0.05 mm
= 1.5418 Å
Seifert – PTS
6
Experimental set-up (HASYLAB)
Mirror
Sample
Secondary graphite monochromator
Detector
Slit 0.1mm
Slit 0.05 mmBeamline B2
2xGe(111)
PETRA
= 1.13 Å = 1.37 Å = 1.39 Å
Huber – Eulerian cradle
7
Virgin multilayer (Co90Fe10/Cu)20
0.0 0.1 0.2 0.3 0.4 0.5100
101
102
103
104
105
106
107
108
109
1010
-4 -2 0 2 410
1
102
103
104
Inte
nsi
ty (
a.u
.)
qx (10
-3Å
-1)
Inte
nsi
ty (
a.u
.)
qz = 4 sin (1 /Å)
0 10 20 30 40
0.2
0.4
0.6
0.8
1.0
1.2
Ele
ctro
n d
en
sity
Number of layer (from top)
0 10 20 30 40
5
10
15
20
25
Th
ickn
ess
(Å
)
0 10 20 30 40
0
5
10
15
20
25
30
35 J415, 1 .37Å
J415, 1 .39Å
J415, 1 .54Å
Ro
ug
hn
ess
(Å
)
-4 -2 0 2 410
1
102
103
104
Inte
nsi
ty (
a.u
.)
qx (10-3Å-1)
[Å]
1.5418
1.39
1.37
1.13
8
TEM and SAED
TEM at a strong overfocus
SAED(diameter 250 nm)
9
Annealed multilayer (Co90Fe10/Cu)20
t (CoFe) [nm] t (Cu) [nm]
20°C (1.16±0.12) (2.06±0.11)235°C (1.16±0.12) (2.04±0.15)340°C (1.19±0.13) (2.02±0.20)
(CoFe) [nm] (Cu) [nm]
20°C (0.73±0.21) (0.88±0.20)235°C (0.83±0.27) (1.03±0.20)340°C (0.87±0.30) (1.15±0.30)
Refined parameters
0 1 2 3 4 510
0
101
102
103
104
105
106
107
108
109
1010
-4 -2 0 2 4
101
102
103
104
Inte
nsi
ty (
a.u
.)
qx (10
-3Å
-1)
Inte
nsi
ty (
a.u
.)
qz = 4 sin (1 /nm)
-4 -2 0 2 4
101
102
103
104
Inte
nsity
(a
.u.)
qx (10-3Å
-1)
XRR: = 1.37Å ; : = 1.39 Å
Interface discontinuity at 340°C
10
Annealed multilayer (Co90Fe10/Cu)20
35 40 45 50
50
100
150
200
250
300
Inte
ns
ity (
arb
.un
its)
Diffraction angle (o2)
As prepared
235°C
340°C
111 Cu
1 hour
= 1.5418Å
11
Virgin multilayer (Co90Fe10/Cu85Ag10Au5)20
0.0 0.1 0.2 0.3 0.4 0.510
0
101
102
103
104
105
106
107
108
109
Inte
nsi
ty (
a.u
.)
q = 4 sin (1/Å)
0.0 0.1 0.2 0.3 0.4 0.5100
101
102
103
104
105
106
107
108
109
1010
-4 -2 0 2 410
1
102
103
104
Inte
nsi
ty (
a.u
.)
qx (10
-3Å
-1)
Inte
nsi
ty (
a.u
.)
qz = 4 sin (1 /Å)
[Å]
1.5418
1.39
1.37
Co90Fe10/Cu
12
Virgin multilayer (Co90Fe10/Cu85Ag10Au5)20
0 10 20 30 40
0.2
0.4
0.6
0.8
1.0
1.2
Ele
ctro
n d
en
sity
Layer number (from top)
0 10 20 30 40
0
5
10
15
20
25
30
35
Th
ickn
es
s (Å
)
0 10 20 30 40
0
5
10
15
20
25
30
J327 , 1.37Å
J327 , 1.39Å
J327 , 1.54Å
Ro
ug
hn
es
s (Å
)
0 10 20 30 40
0.2
0.4
0.6
0.8
1.0
1.2
Ele
ctro
n d
en
sity
Number of layer (from top)
0 10 20 30 40
5
10
15
20
25
Th
ickn
ess
(Å
)
0 10 20 30 40
0
5
10
15
20
25
30
35 J415, 1 .37Å
J415, 1 .39Å
J415, 1 .54Å
Ro
ug
hn
ess
(Å
)
Co90Fe10/CuCo90Fe10/Cu85Ag10Au5
13
Annealed multilayer (Co90Fe10/Cu85Ag10Au5)20
Refined parameters
0 1 2 3 4 510
0
101
102
103
104
105
106
107
108
109
1010
-4 -2 0 2 410
0
101
102
103
104
105
Inte
ns
ity
(a.u
.)
qx (10
-3Å
-1)
Inte
nsi
ty (
a.u
.)
qz = 4 sin (1 /nm)
t (CoFe) [nm] t (CuAgAu) [nm] 20°C (1.14±0.13) (2.09±0.11)235°C (1.13±0.12) (2.08±0.12)340°C (1.09±0.14) (2.11±0.14)
(CoFe) [nm] (CuAgAu) [nm] 20°C (0.75±0.28) (0.89±0.20)235°C (0.75±0.30) (0.93±0.25)340°C (0.83±0.34) (1.07±0.23)
-4 -2 0 2 410
0
101
102
103
104
105
Inte
nsi
ty (
a.u
.)
qx (10
-3Å
-1)
No interface discontinuity at 340°C
14
Annealed multilayer (Co90Fe10/Cu85Ag10Au5)20
35 40 45 50
50
100
150
200
250
300
Inte
nsi
ty (
arb
.un
its)
Diffraction angle (o2)
As prepared
235°C
340°C
111 Cu
1 hour
15
Structure model for Co90Fe10/Cu
Cu
CoFe
Cu
CoFe
annealing
Cu
CoFe
Cu
Increase of interface roughness. Onset of interface discontinuity.
16
Structure model for Co90Fe10/Cu85Ag10Au5
Cu(Au)
CoFe
annealing
Cu
Ag Ag
Increase of interface roughness. Separation of gold and silver.
Au
17
Conclusions
Annealing at 235°C initiated out-diffusion of Co and Cu and an increase of the interface roughness in both systems still, the GMG effect was improved
Annealing at higher temperatures led to degradation of the multilayer structure and to the decrease of GMR:– Co90Fe10/Cu – discontinuity of interfaces
– Co90Fe10/Cu85Ag10Au5 – precipitation of Ag and Au at the surface (Ag) and within the layers (Au)