Kodak NexPress

Digital Production Color Presses

Rochester Institute of Technology

Substrate Qualification Performance Report

Sappi TOP Silk 200Sappi Fine Paper Europe

10/18/10

Qualification Information

Substrate Conditions and Measurements: Performed at RIT

Sample 1 Sample 2 Sample 3 Sample 4 Sample 5 Uniformity Average

Gloss Uniformity (G60)

Maximum Minimum Average

Gloss (G60)

Brightness (Top)

CIELAB (C/2degree ISO 2469 Geometry)

Smoothness Top

Qualification Process

Machine Information Engine Number: Software Version: 11.0.0

Qualification Runs: Evaluations RIT conducts a number of evaluations, to determine the optimum engine dependent settings, for the particular substrate. Selection criteria for the different settings are based on: DryInk adhesion, color density, overall image quality, sufficient discharging, and no artifacts such as excessive curl or blistering.

The Process of Substrate Qualification contains the following steps nDetermination of Fuser Set Points nICC Profile Generation or Assignment nColor Verification nScript File Creation Note that it is important that the paper runs smoothly through all of the evaluation runs. For Custom ICC profiles, color profiles for three screening systems (classic, optimum, and line) with two color separations (UCR and GCR) are created. For Universal

ICC profile assignment the same profile is assigned to all of the screening systems.

2 SubstrateQualification

1009-ZC

9.4 9.9 9 9.5 10.1 9.6

10.1 9 9.6

95.6 95.3 95

94.61 L* 2.10 a* -4.76 b*

1.79 µm

Date qualification started 9/9/10Date qualification completed 10/18/10Manufacturer Sappi Fine Paper EuropeSubstrate Name Sappi TOP Silk 200RIT Substrate ID 6366Grammage (Basis Weight) 200 gsmSubstrate Type MattecoatedSize as Evaluated SRA3Grain Direction Short

Substrate Qualification Settings

Substrate Dependent Engine Settings

Color Gamut Chart

SubstrateQualification 3

DFE 2.0 DFE 3.0 and Higher

Transfer Current K

Transfer Current Y

Transfer Current M

Transfer Current C

Script File Name _Sappi_TOP_Silk_200_xxxx.mtpSubstrate Category PaperSubstrate Type MattecoatedSubstrate Color WhiteThickness 175 µmCreep Value 351 µmWeight 200 gsmSubstrate Default Sizes EUFuser Surface Temperature 161° CNip Width 16500 µmBlower Speed 50 %Discharge Level Side 1 1Discharge Level Side 2 2Energy Flow 2014 WCleaning Paper Stream Length 2100 mmICC Profiles Universal

25µA 18µA

25µA 18µA

25µA 18µA

25µA 18µA

Gamut Chart Not AvailableUniversal Profile Assigned

Notes

Concerns

Release Date

RIT offers this substrate qualification consistent with guidelines agreed to with Kodak.

Rochester Institute of Technology

Printing Applications Laboratory

Rochester Institute of Technology plays a unique role for the printing and publishing industries by educating their future

employees, training their current employees and supporting their applied research activities.

The Printing Applications Laboratory supports academic programming at RIT, providing students with technical expertise,

guidance, and access to a unique, hands-on learning environment.

Leveraging RITís comprehensive collection of full-scale contemporary printing equipment, from conventional processes to state-

of-the-art digital printing technology, the Printing Applications Laboratory provides industry with practical, measurable

information to control and improve the quality of their products.

For nearly 50 years, PAL has provided state-of-the-industry printing platforms and value added services to organizations engaged

in printing materials evaluation and development.

4 SubstrateQualification version:012508 jwv

This product functions as expected under the evaluation conditions and is qualified for the Kodak NexPress 2100 Classicthrough the Kodak NexPress SE3600 platforms with the appropriate Kodak NexStation Digital Front End software.

There are no concerns with this substrate as a result of the qualification process.

The expected release date for the Substrate Script file is Q4 2010.