8/22/01marina artuso - pixel sensor meeting - aug 2001 1 sensor r&d at syracuse university...
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8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Sensor R&D at Syracuse University
Marina Artuso
Chaouki Boulahouache
Brian Gantz
Paul Gelling
JC Wang
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Outline
• Review of the Syracuse R&D activities and facilities– Simulation work
– Sensor characterization – wafer measurements
– Sensor characterization – measurements on sensors bump bonded to readout electronics
• Planned upgrades• Some thoughts on sensor R&D strategy
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Simulation activities
• Standalone program to model charge collection properties of generic pixel sensor & front end electronics definition of cell size & useful input for the front end electronics requirement document
(JC Wang)• Optimization of the geometry of the individual pixel cell
and fine tuning of the sensor technology requires a more complex simulation tool (ISE-TCAD)
(Chaouki Boulahouache)• P-spice simulation of fpix2 (starting) to
understand the details of the sensor formation and capacitive coupling between channels. (Brian Gantz)
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Why undertake the sensor simulation effort?
• Lot of progress has been made to identify silicon pixel detector technologies suitable for high radiation environments
• The preferred technology is quite complex and involves several processing steps. Understanding the implication of the various process parameters will enable us to perform a choice that will optimize yields and radiation resistance
• We are using a professional CAD program (ISE-TCAD) to develop a deeper understanding of the various steps in this process
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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ISE-TCAD fundamentals
• What can be studied:– Electric field profile on the sensor (before and after
irradiation) identification of the high field regions that may lead to break-down.
– Equivalent capacitance of the chosen geometry potential effects on intrinsic noise of the pixel cell
– Time development of the signal in the electrodes in the cluster refined modeling of the charge sharing including time dependent effects
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Simulation tools overview
Algorithms explored
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Steps in the electrostatic single cell simulation
Sensor description (Detailed description of the fabrication steps)
Mesh generation (define a grid Of space-points to do the calculation)
Diffusion and recombination + Solution of Poisson equation
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Lateral Field distribution for P-stop and P-spray before Irradiation…
P-stop P-spray
Lateral Field Distribution from the edge of the n+ strips to the middle of the p+ implant region.Distance(m) Distance(m)
Pixel Boundary
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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A typical example of p-stop and p-spray sensors for ATLAS DESIGN
Max-Lateral Field in(kV/cm)
Our Result Atlas’s paper result
P-stop P-spray P-stop P-spray
Unirradiated 134 340 120 380
Low Fluence
Nox=1.5*1012
295 225 140 172
High Fluence
(Irradiated case)
349 54 480 192
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Experimental activities at SU
• The pixel sensor lab (clean room) is now equipped to perform wafer-level measurements of:– I-V response
– C-V response
• Planned upgrade:– Laser test-stand to measure
signal properties of instrumented sensors
– Thermally controlled chuck to test radiation damage devices at desired temperature (?? If funds become available)
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Experimental activities at SU - the electronics lab
• VME based test stand to perform FPIX0 and FPIX1 instrumented sensor characterization
• PCI test stand compatible with new PIXEL test stand under development
• Will be adapted to RICH test stand for HPD characterization and future test beam
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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The SU pixel test program
• We want to be a full partner with Fermilab in the initial sensor design and characterization
• Now: – Define measurements on a set of chosen sensors and
test structure to cross-calibrate test benches and optimize characterization techniques
– Interplay between measurement and simulation to achieve full understanding of sensor properties
• 2nd step: define quality control criteria & measurements that can be performed at SU
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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SENSOR DEVELOPMENT STAGES
• 1st test beam has proven that the needed resolution can be achieved with a variety of sensors
• A variety of p-stop and p-spray sensors are now in our hand to refine the choice on the basis of performance in the beam, reliability and expected yields, radiation resilience.
• Next important submission should include one or two more promising solutions (determined with the measurements and studies proposed before) and a variety of test structures to diagnose possible failure modes:– Vulnerability to breakdown– Depletion voltage – Factors affecting inter-pixel capacitance and resistance
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Additional goals
• Identify 2 or 3 vendors capable to produce our sensors with good yields
• Develop a good understanding of their process and the parameters that can be optimized for our needs
• Define the quality control
production stage
8/22/01 Marina Artuso - Pixel Sensor Meeting - Aug 2001
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Conclusions
• We have taken several steps to contribute to the sensor design and testing for the BTeV pixel detector
• We have gained good experience with the various front end devices of the FPIXn family
• We consider the next submission to foundry a key milestone in our project and we would like to be active participants in this effort.