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A Fab-Wide Chamber Matching Solution for High- Mix Semiconductor Manufacturing Based on Equipment Fingerprinting Rick Good Ramin Madani Elfido Coss Lei Yang

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Page 1: A Fab-Wide Chamber Matching Solution for High- Mix ...semieurope.omnibooksonline.com/2012/semicon_europa/SEMICON... · A Fab-Wide Chamber Matching Solution for High-Mix Semiconductor

A Fab-Wide Chamber Matching Solution for High-

Mix Semiconductor Manufacturing Based on

Equipment Fingerprinting

Rick Good

Ramin Madani

Elfido Coss

Lei Yang

Page 2: A Fab-Wide Chamber Matching Solution for High- Mix ...semieurope.omnibooksonline.com/2012/semicon_europa/SEMICON... · A Fab-Wide Chamber Matching Solution for High-Mix Semiconductor

The Tool Matching Problem

Over the last couple years GLOBALFOUNDRIES has transitioned from a high-volume/ low-mix IDM to a high-mix foundry

As an IDM GLOBALFOUNDRIES (AMD): Relied heavily on APC to compensate for tool differences

High product volume allowed us to leverage electrical data to easily identify rogue tools

Had fewer low-volume, high-value parts

Now as a Foundry GLOBALFOUNDRIES: Must ensure that the low-volume, high-value products yield on our entire fleet of

tools

Does not have the product volume to easily “dial in” tool differences with APC

Cannot easily rely on electrical data to identify rogue tools

To be the best foundry in the world we must have the best matched equipment

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Tool Matching at GLOBALFOUNDRIES

As a part of an overall manufacturing quality initiative,

GLOBALFOUNDRIES is committed to tool matching

Chamber matching at GLOBALFOUNDRIES includes:

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Electrical

Matching

Inline

Matching

Tool Sensor

Matching

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time (s)

Sensor

Measure

ment

time (s)

Sensor

Measure

ment

Trace Chamber Matching Approach

A reference “Fingerprint” is created using trace sensor data ARMA time series model represents the expected sensor trace signal

Confidence interval constructed around the ARMA model

The distance between the reference Fingerprint and the new

data is scored according to the ARMA confidence limits

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time (s)

Sensor

Measure

ment

Page 5: A Fab-Wide Chamber Matching Solution for High- Mix ...semieurope.omnibooksonline.com/2012/semicon_europa/SEMICON... · A Fab-Wide Chamber Matching Solution for High-Mix Semiconductor

Applications of Trace Chamber Matching

1. New Tool Qualification When new tools are qualified, they

must match the fleet of existing

chambers at the sensor level

Example: New metal deposition

tool (pressure sensor)

2. Tool Validation after PM After a major PM does the tool

match the fleet of tools?

Example: CVD tool following PM

(electrical bias)

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Page 6: A Fab-Wide Chamber Matching Solution for High- Mix ...semieurope.omnibooksonline.com/2012/semicon_europa/SEMICON... · A Fab-Wide Chamber Matching Solution for High-Mix Semiconductor

Applications of Trace Chamber Matching

3. Yield Analysis What is different about a poorly

yielding tool or group of tools?

Example: EPI temperature causing

yield signature

4. Line Monitoring Fab-wide sensor level tool

matching

Regular, automated reporting to

process and equipment engineers

Business processes and action

item tracking

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Tool Cross Validation

Line monitoring is accomplished through leave-one-out cross

validation A Fingerprint is constructed using all tools except one

The missing tool is scored against the Fingerprint

Repeated for all tools

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Chambers

One

Chamber

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Line Monitoring Approach

Matching is owned by module engineers (process and equipment engineers) Engineers specify tool matching families

Tools with identical hardware and software

Expected to run identically

Engineers specify “Golden Recipes” to be used to monitor the tools

Qual or production recipes

Recipes running on multiple tools

Recipes that run on key process steps and exercise the tool sensors

Software enables regular notification of tool/sensor mismatches

Business processes to assign ownership, track actions, and review mismatches

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Regular Notification of Tool Matching

Module engineers configure

regular monitoring

Regular reports highlight

sensor mismatches

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Page 10: A Fab-Wide Chamber Matching Solution for High- Mix ...semieurope.omnibooksonline.com/2012/semicon_europa/SEMICON... · A Fab-Wide Chamber Matching Solution for High-Mix Semiconductor

Business Process to Drive Sensor Matching

Regular updates and Case Tracking System Create chamber matching case for mismatched sensors

Assign ownership, actions, and review date

Case is closed when chamber matching is validated

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Line Monitoring Reports

Case Tracking

Validation

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Sensor Matching Line Monitoring

GLOBALFOUNDRIES has deployed our sensor matching line

monitoring solution throughout Fab1 and are ramping

coverage in our other fabs

Coverage: Etch, CVD, SNK, Implant, EPI, RTA, Metal deposition, Litho Tracks, Polish,

Metal plating, Plasma Stripping, Furnace, …

Dozens of tool platforms

Hundreds of tools

Thousands of chambers

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Examples

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FDC and Trace Chamber Matching

Category FDC Trace Chamber Matching

Goal Looking for sudden changes in

chambers’ trace data

Looking for consistent differences

between chambers’ trace data

Alarm action Inhibit tool immediately Typically maintenance at next PM

Model Data Typically compare with data from

tool itself

Compare with data only from other tools

Analysis Frequency After every run Regular scheduled job

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We are often asked the difference between trace chamber

matching and fault detection (FDC)

FDC and Trace chamber matching complement each other

Analogous to how SPC complements Inline Chamber

Matching

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FDC/ Chamber Matching Alarms

Detected by FDC

Single wafer had a bad temperature measurement

Flagged by FDC

Not a systematic, consistent tool difference

Not Flagged by Trace CM

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Detected by Trace CM

Consistent, systematic difference between tools

Flagged by Trace CM

No sudden change in tool operation

Not Flagged by FDC

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Chamber Specific FDC Models vs. Trace CM

FDC models are typically tool/chamber specific Each tool is within historical operating range

No FDC signal

FDC looks great! 15

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Summary

GLOBALFOUNDRIES is committed to chamber matching: Yield, Inline (SPC), and Trace Sensor Data

Implemented a chamber matching solution based on trace sensor data New tool qualification

Maintenance validation

Yield analysis

Fab-wide line monitoring

Solution involves introducing business process that is driving continuous improvement in fleet matching

Currently deployed on 100s of tools and 1000s of chambers

Continuing to add both breadth and depth to our fleet matching coverage

Continuous improvement in inherent in our approach

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Trademark Attribution

GLOBALFOUNDRIES, the GLOBALFOUNDRIES logo and combinations thereof are trademarks of GLOBALFOUNDRIES Inc. in the

United States and/or other jurisdictions. Other names used in this presentation are for identification purposes only and may be trademarks

of their respective owners.

©2012 GLOBALFOUNDRIES Inc. All rights reserved.

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