non-contact sheet resistance testing for thin films and...

Non-Contact Sheet Resistance Testing for Thin Films and Multi-Layer Systems

SURAGUS  GmbH  Maria-­‐Reiche-­‐Str.  1  D-­‐01109  Dresden  Germany  

Office:    +49  351  27  35  98  01  Fax:              +49  351  32  99  20  58  E-­‐Mail:      info@suragus.com  

Cer%fied  Quality  Management  System  for  development,    manufacturing  and  sales  of  non-­‐destruc%ve  tes%ng  

equipment    (NDT)  in  compliance  with  ISO  9001:2008.  

Contactless sheet resistance mapping of TCO layers

Determination of optical transmission

Sheet  Resistance  Ohm

/sq  20  mm   20  mm  

Accuracy in comparison to actual values

LeP:  Four-­‐point  probe  (RM3-­‐AR  Jandel)  with  100  points  manual  measurement  

Right:  Automated  Eddy  Current  C-­‐Scan  with  EddyCus®  TF  map  2020SR  

Inline sheet resistance measurement

Conductivity mapping of thin films on wafer

Thin-Film monitoring of: §  Transparent Conductive Oxides (ITO, ZnO, etc.) §  Metal Nanowires & Meshes §  Graphene §  Carbon Nanotubes §  Metal layers (Al, Mo, Au, etc.)

§  Non-contact sheet resistance measurement §  Simultaneous measurement of anisotropy / optical transmission §  Film thickness measurement and monitoring §  Inline-monitoring (ex-vacuo and in-vacuo) §  Detection of deposition inhomogeneities §  Imaging of conductivity-related characteristics

Characterization of Thin Films

“EddyCus® TF lab” for monitoring sheet resistance and layer thickness of conductive thin films

“EddyCus®  TF  map”  for  automated  high  resolu%on  mapping  of  sheet  resistance  and  layer  thickness  of  conduc%ve  thin  films    

“EddyCus®  TF  inline”  for  inline  monitoring  sheet  resistance  and  layer  thickness  of  conduc%ve  thin  films  

Offers Fields of Application

Sheet  resistance  

Layer  thickness  

Op%cal  transmission  at  2  different  spots  

25  mm  

Eddy current technology

S. Bae et al. Nature Nano. 5, 571 (2010); Daniel Neumaier; Proceedings TCO/TCM WS 2013 (2013)  

A Z O   o n  sapphire  wafer  

G a N   o n   S i -­‐wafer  

G r a p h e n e  o n   S i O ₂ -­‐wafer  

Pt  on  Si-­‐wafer  

I n l i n e   s h e e t   r e s i s t a n c e  monitoring  with   3  measurement  lanes  

Photograph   of  ITO  on  glass  

M a p p i n g   o f  structured   ITO   on  glass  

Supercapacitor foil

Drivers in Research & Development

Sheet  resistance    

vs.    

op%cal  transmission  

25  mm  

25  mm  

25  mm  

Line   Scan  1  

Line   Scan  2  

Line   Scan  3  

Eddy Current Testing Devices for Thin Film and Multi-Layer Systems

Benefits  of  High  Frequency  Tes%ng  up  to  100  Mhz    Signal  Amplitude  

+  Contact-­‐free  

+  High  sample  rate  

+  High  sensi%vity  

+  Measurement  of  encapsulated  layers  

412                                                                                            3.000  

0  

100  

1   4   7  10  13  16  19  22  25  28  

Sheet  

Distance  from  sample  

Line  Scan  1  

New options: + Optical transmission

+ Electrical anisotropy

Sheet  Resistance  (Ω/sq)  

Sheet  Resistance  (Ω/sq)  

Sheet  Resistance  (Ω/sq)  

Sheet  Resistance  (Ω/sq)  

89                                                                                                      163   312                                                                                                468   12                                                                                                        28