the plasma physics and radiation technology master programme is

The Plasma Physics and Radiation Technology master programme is managed by three groups organizing the four main themes:

o Equilibrium and Transport in Plasmas(Prof. M.C.M. van de Sanden)

o Elementary processes in Gasdischarges(Prof. G.M.W. Kroesen)

o Coherence and Quantum Technology (Prof. K.A.H. van Leeuwen)

The master track Plasma Physics and Radiation Technology

The track embraces subjects such as:

o the generation of plasma’s (including Nuclear Fusion),

o plasma-surface interaction (e.g. plasma deposition, plasma etching, etc.),

o plasma-accelerators,

o laser cooling techniques and atomic optics

o ion beam applications.

An important characteristic of the master track is the fundamental approach of the themes as well as the research into new applications of this broad field of research.

General outline of the Master programme

1st year60 ECTS

11 optional courses33 ECTS

Multidisciplinary project8 ECTS

ExternalAssignment19 ECTS

2nd year60 ECTS

Graduation project60 ECTS

optional courses: each student has to choose a well-balanced set of courses to a total of at least 33 ECTS points (about 11 courses);

interdisciplinary project of 8 ECTS points (6 weeks);external assignment project of 19 ECTS points (12

weeks) usually outside TU/e;

graduation project of 60 ECTS points (1 year).

3P230 Nuclear Fusion N.J. Lopes Cardozo

3P160 Advanced Plasma Physics M.C.M. van de Sanden

3N260 Physics of High Temperature Plasmas T.J. Schep

3P100 Molecular collisons H.C.W. Beijerinck

3P140 Lasers in physical experiments H.C.W. Beijerinck

3P190 Laser cooling: theory and experiment E.J.D. Vredenbregt

  Numerical Simulation of Plasmas J.J.A.M. van der Mullen

3P200 Ellipsometry G.M.W. Kroesen

  Gas discharges M. Haverlag

  Kosmophyisics J.J.A.M. van der Mullen

3P110 Introduction to Plasma Physics R.A.H. Engeln

  Plasma processing: science and applications W.M.M. Kessels

3P220 Molecuul-oppervlak-interactie en vacuümtechniek M.C.M. van de Sanden

3K100 Optics of charge particles J. Botman

3K110 Physics of Particle accelerators J. Botman

3K120 Nuclear Analysis techniques L. van Ijzendoorn

3K140 Radio-isotopes and ionizing radiation P. Mutsaerts

  Conversion of electron energy to radiation M. van der Wiel

Master track courses:

The three research programmes :

Equilibrium and Transport in Plasmas (Prof. M.C.M. van de Sanden/Prof. D.C. Schram)Expanding plasmas and molecule formation Plasma surface interaction and atomistic simulationsPlasma synthesis of thin films, nanostructures, and devicesNuclear Fusion (Rijnhuizen)

Elementary processes in Plasmas (Prof. G.M.W. Kroesen)Non-equilibrium effectsPlasma modelling and Self-organisation in plasmasLighting, environmental applicationsBiomedical Applications

Coherence and Quantum Technology (Prof. K.A.H. van Leeuwen)Ultrahigh-gradient electron accelerator concepts Nanostructure fabrication by laser manipulationAtom optics/atom interferometry with ultracold atomsAtom traps: ultracold plasmas and BEC’s

Coherence & Quantum Technology (CQT)

Ultra-Cold Electron & Ion Beams:

• Laser cooling & trapping;• Femtosecond (10-15 s) laser physics;• Ultra-low temperature (0.001 - 10 kelvin) plasmas;• Femtosecond electron microscopy;• Sub-nanometer ion beam drilling & milling.

Edgar Vredenbregt, Jom Luiten, Peter Mutsaers

• Extreme states of matter: Ultra-cold & ultra-hot, plasmas & gases;• Laser Manipulation of atoms, electrons and ions;• Atom, electron & ion beams for femto-nano science & engineering.

Theory of Quantum Gases:

• Atoms trapped in an optical lattice;• Superfluidity of ultra-cold (nano-kelvin) Fermi and Bose gases;• Quantum Plasmas & Beams.

Servaas Kokkelmans

Plasma Laser Wakefield Acceleration:

• Tera-watt “light bullet” laser physics;• Extreme high-energy-density plasmas;• Giga-electron-volt acceleration in a few cm.

Seth Brussaard

Standinglight wave

Atom beam

Substrate

Nano Brush:

• Manipulation of atomic beams with light;• Atom lithography;• Deposition of magnetic nano-structures.

Ton van leeuwen

EPG

• Elementary Processes in Gas Discharges

• Staff:– Prof.dr.ir. G.M.W. Kroesen– Prof.dr. J.J.A.M. van der Mullen– Dr.ir. W.W. Stoffels– Dr.ir. E.M. van Veldhuizen– Prof.dr. U. Ebert– Prof.dr. M. Haverlag

Elementary Processes in Gas Discharges (EPG)

• Light and photons: Efficient lamps and EUV sources• Environmental technology: using plasmas for air / water cleaning• Biomedical technology: sterilisation; new medical treatments• New energy sources: hydrogen technology; dusty plasmas

Plasmas:Plasmas:Heaven and earthHeaven and earth

Plasmas in lab and industry (1)Plasmas in lab and industry (1)

Plasmas in lab and industry (2)Plasmas in lab and industry (2)

Prof. dr.ir. Richard van de Sanden Dr. Richard Engeln

Dr.ir. Erwin Kessels Dr. Adriana Creatore

(8 postdocs; 15 PhD students; 8-12 BSc/MSc students; 5 technicians)

Science & Technology of Plasma & Materials

Processinghttp://www.phys.tue.nl/pmp

Research activities Physics and chemistry of

plasma & materials processing

Micro- and nano-engineering of functional

materials

Advanced plasma and surface diagnostics

Plasma chemistryIon/radical densities/fluxesEnergy distribution fcts.Plasma surface interaction

Plasma enhanced CVD

Dry etchingPlasma-assisted ALDThin films & devices

EllipsometryNonlinear surface spectroscopyNovel surface diagnostics(Laser) based gas phase

diagnostics

PMT

H2

LN2

VUV mono

L W

BS

MM

plasma

W

S

WM

M

Nd:YAGTHG

Dye (C440)

BBO

M

M

220 nm

to pump

to pump

440 nm

PMT

NO cell

Research issues: Plasma-materials processing

Low temperatures

More freedom and larger parameter spaceo Precursors, Material

propertieso Plasma-assisted ALD

(conformal TiN diffusion barriers, tunnel barriers)

Reactive species created in gas phaseo Higher reactivity o Process independent of

substrateo High throughput/large area processing (e.g. solar cells)

o Compatibility with substrates/devices

o Organic and polymer devices (encapsulation of OLEDs)

rf plasma

Self-bias/Ion bombardment

o Manipulation of ion energy distribution function

o Novel synergistic effects

o Etching of high-aspectratio structures: ion/neutral synergism