circuits multi-projets - mycmp · teledyne dalsa midis platform cmp annual users meeting, 4 feb....
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Circuits Multi-Projets
MPW Services Center for IC / MEMS Prototyping
http://cmp.imag.fr
Grenoble - France
CMP annual users meeting, 4 Feb. 2016, PARIS
MEMS Prototyping
Bulk Micromachining
MUMPs from MEMSCAP
Teledyne DALSA MIDIS
Micralyne MicraGEM-Si
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MEMS Processes at CMP
CMP annual users meeting, 4 Feb. 2016, PARIS
• Compatible with electronics• Front side bulk micromachining• ams 0.35µ CMOS, SiGe, High Voltage
MPW run turnaround : 8/10 Weeks
Post process turnaround : 5 weeks
Suspended passive device
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Bulk micromachining on CMOS
CMP annual users meeting, 4 Feb. 2016, PARIS
• Compatible with electronics• Front side bulk micromachining• ams 0.8µ BiCMOS • Anisotropic Etching without
additional mask
Cross section
Suspended passive device
Suspended beams
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Bulk micromachining on BiCMOS
CMP annual users meeting, 4 Feb. 2016, PARIS
MEMs accelerometer and signal
conditioning
MPW A35C14_5
• Front-end electronics close to MEMS sensor for better signal to noise ratio
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Bulk micromachining designs
CMP annual users meeting, 4 Feb. 2016, PARIS
Test sensor structures
Fondazione Bruno Kessler
MPW A35C11_5
Thermal inertial sensor
LIRMM – MPW A35C11_6
A CMOS Compatible Ultrasonic Transducer Fabricated With Deep Reactive Ion EtchingLibor Rufer, Christian C. Domingues, Salvador Mir, Valérie Petrini, Jean-Claude Jeannot, and Patrick DelobelleJOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 15, NO. 6, DECEMBER 2006
• Applications : piezoresistive devices, pressure sensors, transducers• Discussions ongoing to provide such MEMS process along with ams 0.35 µ CMOS
Backside bulk micromachining
Integration of MEMS sensor and front-end electronics
Membrane and suspend structure on top of cavity
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Backside bulk micromachining
CMP annual users meeting, 4 Feb. 2016, PARIS
Design Kit
• Standard DK for the 0.35µ CMOS process C35B4C3 from ams
• Design Rule Manual and technology files provided for MEMS
structures
• MEMS DK for :
Fabrication schedule
• ams C35B4C3 : next run starts on June 13th
Price list
• 650 €/mm² (4 mm² mini) + 3700 € for 10 chips
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Access to bulk micromachining
CMP annual users meeting, 4 Feb. 2016, PARIS
• Company created in 1997, technology
available through CMP since 1998
• 4 different processes :
PolyMUMPs
SOIMUMPs
MetalMUMPs
PiezoMUMPs
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MEMSCAP
CMP annual users meeting, 4 Feb. 2016, PARIS
Features• 2 mechanical and 1 electrical layer of polysilicon
• 2 sacrificial layers
• 1 electrical conduction layer
• 1 electrical isolation layer
• Optional post process : etching/release, CO2 drying, sawing
POLY 2
Applications• Acoustics
(microphones)
• Accelerometers
• Micro-fluidics
• Display Technologies
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PolyMUMPs
CMP annual users meeting, 4 Feb. 2016, PARIS
Features• Silicon On Insulator substrate • Reactive-Ion Etching (RIE)• 10 to 25 µm structural layer• 2 Metal layers
Si
Substrate
METAL
OXYDE
SOIMUMPs
Applications• Gyros• Optical devices• Display technology
Cross section of RIE etching
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SOIMUMPs
CMP annual users meeting, 4 Feb. 2016, PARIS
Substrate
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MetalMUMPs
CMP annual users meeting, 4 Feb. 2016, PARIS
Features• Thick metal layers : electroplating Nickel
(18-22 µm)
• Surface and Bulk Micromachining
• Metallization on the walls
Applications• Relays
• Microfluidics
• Magnetic Switches
• RF Devices
Features• Based on SOIMUMPs process
• 0.5 µm Aluminium Nitride piezoelectric layer
• Active piezoelectric device
• 2 Metal layers
Applications• Energy harvesting
• Ultrasonic transducers
• Microphones
• Actuators
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PiezoMUMPs
CMP annual users meeting, 4 Feb. 2016, PARIS
Design kits and CAD tools• Physical design, DRC :
• Specific MEMS CAD tools :
Fabrication Schedule • PolyMUMPs : 4 runs in 2016 • SOIMUMPs : 3 runs in 2016 • MetalMUMPs : 1 runs in 2016 • PiezoMUMPs : 3 runs in 2016
Price list1
• PolyMUMPs : 3700 $2/4600 $3 (added cost for optional post-process)• SOIMUMPs : 3700 $2/4600 $3
• MetalMUMPs : 3700 $2/4600 $3
• PiezoMUMPs : 3700 $2/4600 $3
1: for 15 identical chips 1cmx1cm fixed size except for SOIMUMPs 0,9x0,9cm2: price for Educational Institutions and Research Laboratories3: price for Industrial Companies
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Access to MUMPs
CMP annual users meeting, 4 Feb. 2016, PARIS
MEMS Integrated Design for Inertial Sensors (MIDIS™)
Features
• Getter-free high-vacuum sealing allows resonator Q factors > 20,000
• Efficient wafer-level packaging minimizes overall die size
• 1.5 μm feature size in a 30 μm thick membrane
• Comb height control allows out-of-plane sensing
• TSV allows compact design ready for co-packaging
Applications
• Accelerometers
• Gyroscopes
• Resonators
• Inertial sensor combos (Sensor fusion)Inertial sensorCourtesy of CMC
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Teledyne DALSA MIDIS platform
CMP annual users meeting, 4 Feb. 2016, PARIS
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Teledyne DALSA MIDIS platform
CMP annual users meeting, 4 Feb. 2016, PARIS
Cross section of Typical MIDIS process
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Teledyne DALSA MIDIS platform
CMP annual users meeting, 4 Feb. 2016, PARIS
Process Design Kit from Teledyne DALSA• Process parameters specifications• Design rules• DRC deck• Technology files for solid model generation• MIDIS solid model generation • Offers a truly representative 3D view of your design• Ready for design review• Multi-physics simulations
Fabrication schedule• 2 runs scheduled for 2016 (1st run March 10th/devices shipment 31st July)
Price list• 9830 $ per 4x4mm minimum for 40 chips
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Access to MIDIS
CMP annual users meeting, 4 Feb. 2016, PARIS
MicraGEM-Si PlatformMicraGEM‐SiTM technology based on a Silicon‐on‐insulator (SOI) MEMS process features two thick SOI structure layers and gold metallization on the top surface, enabling the design of vertical comb drive actuators along with optically flat silicon surface. Target applications include variable optical attenuators (VOA) and wavelength selective switch (WSS) modules as well as resonators and bio sensors. Horizontal comb drives can also be created for use in inertial sensors.
Academic Price : $4,800 (4mm x 4mm) Fixed sizePrice for Industry : $6,000 (4mm x 4mm) Fixed size
Micralyne MicraGEM-Si process
CMP annual users meeting, 4 Feb. 2016, PARIS 18
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MEMS offer overview
CMP annual users meeting, 4 Feb. 2016, PARIS
Leveraging MEMS prototyping platforms for research and commercialization
Tuesday, February 23, 2016
9:00am and 2:00pm EST
Webinar offered at different times for your convenience
Webinar organized by CMC Microsystems
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Webinar MEMS 23rd of February
Presentations:• Development and fabrication of micro-electrostatic actuators using a
piston-tube configuration leading to large force generation
• Ultra-clean wafer-level vacuum encapsulation of MEMS devices
Registration :http://www.cmc.ca/NewsAndEvents/Webinars/MEMSWebinar.aspx
CMP annual users meeting, 4 Feb. 2016, PARIS
Thank you !
CMP annual users meeting, 4 Feb. 2016, PARIS