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TRANSCRIPT
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Silicon Substrate
Add nitride
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Silicon Substrate
Add Poly0
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Silicon Substrate
Patterning through1st level mask (Poly0)using Photolithography
PhotoresistPatterned Photoresist
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Silicon Substrate
Patterned Photoresist
Removal of Unwanted Poly0using Reactive Ion Etching
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Silicon Substrate
1st Oxide Depositionusing LPCVD
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Silicon Substrate
Patterning through2nd level mask (Dimple)using Photolithography...
Photoresist
and Deep RIE
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Silicon Substrate
Patterning through3rd level mask (Anchor)using Photolithography
Photoresist
and Deep RIE
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Silicon Substrate
Blanket un-doped polysilicondeposition(Poly1) using LPCVD...
followed by PSG depositionand annealing
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Silicon Substrate
Patterning through 4th level mask (Poly1)
using Photolithography...
Photoresist
and Deep RIE
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Deposition of 2nd Oxide Layer
Silicon Substrate
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Patterning through 5th level mask using photolithography
and deep RIE
Silicon Substrate
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Patterning through 6th level mask using photolithography
and deep RIE
Silicon Substrate
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Deposition of undoped polysilicon,
Silicon Substrate
followed by PSG hardmask layer,
then anneal
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Patterning through 7th level mask using photolithography
and deep RIE
Silicon Substrate
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Patterning through 8th level mask using photolithography and liftoff,
followed by removal of unwantedresist and metal in solvent bath
Silicon Substrate
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Release of structures using HF
Silicon Substrate