cmos transistor theoryeng.staff.alexu.edu.eg/.../pdfs/lectures/2017/lect3-transistors_mod.… ·...

Lecture 3: CMOS Transistor Theory

CMOS VLSI DesignCMOS VLSI Design 4th Ed.3: CMOS Transistor Theory 2

Outline Introduction MOS Capacitor nMOS I-V Characteristics pMOS I-V Characteristics Gate and Diffusion Capacitance


Introduction So far, we have treated transistors as ideal switches An ON transistor passes a finite amount of current

– Depends on terminal voltages– Derive current-voltage (I-V) relationships

Transistor gate, source, drain all have capacitance– I = C (V/t) -> t = (C/I) V– Capacitance and current determine speed


polysilicon gate

(a)

silicon dioxide insulator

p-type body+-

Vg < 0

MOS Capacitor Gate and body form MOS

capacitor Operating modes

– Accumulation– Depletion– Inversion


Terminal Voltages Mode of operation depends on Vg, Vd, Vs

– Vgs = Vg – Vs

– Vgd = Vg – Vd

– Vds = Vd – Vs = Vgs - Vgd

Source and drain are symmetric diffusion terminals– By convention, source is terminal at lower voltage– Hence Vds 0

nMOS body is grounded. First assume source is 0 too. Three regions of operation

– Cutoff– Linear– Saturation

Vg

Vs Vd

VgdVgs

Vds+-

+

-

+

-


nMOS Cutoff No channel Ids ≈ 0

+-

Vgs = 0

n+ n+

+-

Vgd

p-type bodyb

g

s d


nMOS Linear Channel forms Current flows from d to s

– e- from s to d Ids increases with Vds

Similar to linear resistor

+-

Vgs > Vt

n+ n+

+-

Vgd = Vgs

+-

Vgs > Vt

n+ n+

+-

Vgs > Vgd > Vt

Vds = 0

0 < Vds < Vgs-Vt

p-type body

p-type bodyb

g

s d

b

g

s d Ids


nMOS Saturation Channel pinches off Ids independent of Vds

We say current saturates Similar to current source

+-

Vgs > Vt

n+ n+

+-

Vgd < Vt

Vds > Vgs-Vt

p-type bodyb

g

s d Ids


I-V Characteristics In Linear region, Ids depends on

– How much charge is in the channel?– How fast is the charge moving?


Channel Charge MOS structure looks like parallel plate capacitor

while operating in inversions– Gate – oxide – channel

Qchannel = CV C = Cg = oxWL/tox = CoxWL V = Vgc – Vt = (Vgs – Vds/2) – Vt

n+ n+

p-type body

+

Vgd

gate

+ +source

-

Vgs-

drain

Vds

channel-

Vg

Vs Vd

Cg

n+ n+

p-type body

W

L

tox

SiO2 gate oxide(good insulator, ox = 3.9)

polysilicongate

Cox = ox / tox


Carrier velocity Charge is carried by e- Electrons are propelled by the lateral electric field

between source and drain– E = Vds/L

Carrier velocity v proportional to lateral E-field – v = E called mobility

Time for carrier to cross channel:– t = L / v


nMOS Linear I-V Now we know

– How much charge Qchannel is in the channel– How much time t each carrier takes to cross

channel

ox 2

2

ds

dsgs t ds

dsgs t ds

QIt

W VC V V VL

VV V V

ox = WCL


nMOS Saturation I-V If Vgd < Vt, channel pinches off near drain

– When Vds > Vdsat = Vgs – Vt

Now drain voltage no longer increases current

2

2

2

dsatds gs t dsat

gs t

VI V V V

V V


nMOS I-V Summary

2

cutoff

linear

saturatio

0

2

2n

gs t

dsds gs t ds ds dsat

gs t ds dsat

V VVI V V V V V

V V V V

Shockley 1st order transistor models


Example We will be using a 0.6 m process for your project

– From AMI Semiconductor– tox = 100 Å– = 350 cm2/V*s– Vt = 0.7 V

Plot Ids vs. Vds

– Vgs = 0, 1, 2, 3, 4, 5– Use W/L = 4/2

14

28

3.9 8.85 10350 120 μA/V100 10ox

W W WCL L L

0 1 2 3 4 50

0.5

1

1.5

2

2.5

Vds

I ds (m

A)

Vgs = 5

Vgs = 4

Vgs = 3

Vgs = 2Vgs = 1


pMOS I-V All dopings and voltages are inverted for pMOS

– Source is the more positive terminal Mobility p is determined by holes

– Typically 2-3x lower than that of electrons n

– 120 cm2/V•s in AMI 0.6 m process Thus pMOS must be wider to

provide same current– In this class, assume n / p = 2

-5 -4 -3 -2 -1 0-0.8

-0.6

-0.4

-0.2

0

I ds(m

A)Vgs = -5

Vgs = -4

Vgs = -3

Vgs = -2Vgs = -1

Vds


Capacitance Any two conductors separated by an insulator have

capacitance Gate to channel capacitor is very important

– Creates channel charge necessary for operation Source and drain have capacitance to body

– Across reverse-biased diodes– Called diffusion capacitance because it is

associated with source/drain diffusion– These are parasitic capacitances


Gate Capacitance Approximate channel as connected to source Cgs = oxWL/tox = CoxWL = CpermicronW Cpermicron is typically about 2 fF/m

n+ n+

p-type body

W

L

tox

SiO2 gate oxide(good insulator, ox = 3.90)

polysilicongate


Diffusion Capacitance Csb, Cdb

Undesirable, called parasitic capacitance Capacitance depends on area and perimeter

– Use small diffusion nodes– Comparable to Cg

for contacted diff– ½ Cg for uncontacted– Varies with process

CMOS VLSI DesignCMOS VLSI Design 4th Ed.

MOS Capacitance Model The intrinsic capacitance has 3

components: Cgb, Cgs, and Cgd Cut-off: -Accumulation(Vgs<0) :Cgb=Co

-Depletion (Vgs<Vt): 1/Cgb=1/Co+1/Cdep (series cap)

Linear (Inversion Vgs>Vt): channel is connected to S and DCgb=0– For Vds=0 Cgs=Cds=Co/2- For Vds>0: drain becomes less

inverted and Cds decreases Saturation (Vds>Vsat): channel pinches

off and all capacitance is to the source.– For ideal transistor Cgs=2/3Co

3: CMOS Transistor Theory 20

CMOS VLSI DesignCMOS VLSI Design 4th Ed.

MOS Diffusion Capacitance The p–n junction between the source

diffusion and the body contributes parasitic capacitance across the depletion region

The capacitance depends on both the area AS and sidewall perimeter PS of the source diffusion region

Parasitic capacitance also depends on the bias conditions and the fabrication technology parameters

A MOS transistor can be viewed as a four-terminal device with capacitances between each terminal pair

3: CMOS Transistor Theory 21

cmos transistor theoryeng.staff.alexu.edu.eg/.../pdfs/lectures/2017/lect3-transistors_mod.… ·...

Documents