Diamond-like Carbon (DLC) is a metastable form of amorphous carbon withsignificant sp3 bonding. DLC coatings are of interest in a wide variety ofapplications to provide low friction and high hardness and wear resistance.

Applications

- Glass: anti-scratch.- Molds: prevent plastic transfer- Engine parts: low friction (a-C).- Space parts: low friction (a-C:H).- Cutting tools: lubricated and dry

conditions.- Oil & gas: super lubricity in pipes.- ….

A. Voevodin, Surf. Coat. Technol. 82 (1996) 199–213.

J. Robertson, Surf. Coat. Technol. 50 (1992) 185–203.

Ion assistance required ~ 100eV

Anode to extend the plasma

Magnetically linked magnetrons

Prof. Wolf-Dieter Munz Galvanotechn.4 (2016) 774

Bias required

Glass?Plastics?

55GPa Micro hardess, comparable to filtered arc

Prof. Wolf-Dieter Munz Galvanotechn.4 (2016) 774

• High level of electron bombardment

• Bias requirements

• Low deposition rates

• Very narrow process window

SOLUTION?

2

V

4

3

5

8b

6

1b10ab

92b

8c

Proprietary technology: Patent application number GB1605162.5 (March 2016)

Ion acceleration period (V+)

Plasma excitation period (V-)

- Positive ion bombardment- No electron bombardment- Reduced thermal load?

Proprietary technology: Patent application number GB1605162.5 (March 2016)

Ion acceleration period (V+)

Plasma excitation period (V-)

Proprietary technology: Patent application number GB1605162.5 (March 2016)

3 energy regimes are measured

Magnetron size 400x100mm2 (industrially relevant) – WC, Graphite targetsOptimized magnetic field configuration to enhance positive ion assisted deposition

Proprietary technology: Patent application number GB1605162.5 (March 2016)

Sample position

Proprietary technology: Patent application number GB1605162.5 (March 2016)

Magnetron size 400x100mm2 (industrially relevant) – WC, Graphite targetsOptimized magnetic field configuration to enhance positive ion assisted deposition

No charge build-up in sharped edges

Biased process: high DLC coating stress N4E process: low DLC coating stress

+485V

Current to floating potential (10mV/A)

8006004002000

8

7

6

5

4

3

2

1

0

X[nm]

Z[n

m]

8006004002000

12

10

8

6

4

2

0

X[nm]

Z[n

m]

Untreated glass substrate

Oxygen treated glass substrate

RMS roughness: 2.6 nm

RMS roughness: 1.4 nm

DLC Coating description Total light transmission Taber test result

15 min O2 plasma cleaning + 60 sec DLC (aprox. 6nm) 89.2 ≤20 times NG

30 min O2 plasma cleaning + 30 sec DLC (aprox. 3nm) 89 ≤20 times NG

5 min O2 plasma cleaning + 30 sec DLC (aprox. 3nm) 91.2 ≤10 times NG

DLC coated

Uncoated

Tape to hold broken glass together

DLC coated

Uncoated

500mN critical load – 5 micron tip radius

Film thickness 10nm

Hysitron TI950 TriboindenterBerkovich tip indenter BKL4

Hardness = 32 GPa

Young modulus = 220 GPa

500nm thick DLC

Si substrate

SEM cross section

of WC/DLC coating

Bias required

15GPa Microhardess with -75V Bias!

Prof. Wolf-Dieter Munz Galvanotechn.4 (2016) 774

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Thank you for your attention!

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