Download - Anh Huong Cua O2 Va Nhiet Do U_2
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
1/16
Quang ph Laser
DNG PH RAMAN V PH QUANGPHT QUANG
NGHIN CU NH HNG CA T LKH OXY V S NHIT I VI
MNG TIO2 CH TO BNG PP PHNX MAGNETON PHN NG
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
2/16
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
3/16
Quang ph Laser
MC CH:
Nghin cu s nh hng ca t l dng oxy avo trong h phn x trong vic ch to mng
Nghin cu s nh hng ca nhit trongqu trnh hnh thnh cu trc ca mng
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
4/16
Quang ph Laser
GiI THIU:
Ch to mng TiOx bng phng php phn xmagneton trc tip nhit phng vi t l dngoxy a vo khong 3-15%
Sau em nhit 350-750oC
Dng ph nhiu x tia X, quang pht quang vph Raman nghin cu tnh cht ca mng
2
22
FOFO % 100%FO FAr
! v
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
5/16
Quang ph Laser
TH NGHIM:
Dng p-Si(100), lm sch bi H2SO4 v H2O
Target Ti tinh khit 99.99%, ng knh 2in v cp vo ngun DC 100W
c p in th -150V
Khong cch gia v bia l 100mm
p sut nn 2.7*10-4 Pa, p sut lm vic 2.7*10-4
Pa
Thi gian phn x 40 pht
dy ca mng t 50-200nm
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
6/16
Quang ph Laser
Cu trc mng, thng tin phase (anatase hay rutile) o bi quang ph k tia X s dng bc x Cu K(0.1542nm). Made in Japan
Cc lin kt c o bi ph Raman. Made in rancePh PL dng laser He-Cd 325nm 50mW, cch t vCCD
O TNH CHT MNG:
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
7/16
Quang ph Lazer
LabRAM HRUV/Vis/NIR
+ Ar ion CW Laser (514.5nm, 488nm) upto 40mW at sample.+ He-Cd CW Laser (325nm) -Auto motor controlled XY mapping stage
Anatase Rutile
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
8/16
Quang ph Laser
Anatase
APPLICATION1- Paints, and Coating , emulsioninterior Paints, Enamels2- Road-Marking Paints3- Filler , Primers, and undercoat4- Paper Industry5- Plastic Industry6- Rubber Industry7- Cement Industry.
widely used in painting, printing oilpaper makingPlasticRubberartificial fiber (si quang nhn to)welding electric (hn in)Enamel (trng men)electric appliances and constructionmaterial etc
Rutile
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
9/16
GIXRD patterns of titanium oxide lms
formed at: 3, 6, 10 and 15 FO2% and
post-annealing at 750 C for 2 min in air
RESULTSAND DISCUSSION_ The deposition time was
xed at 40 min._ The crystalline (101)anatase peak denoted as
(101) at 25,3._ The (110) rutile peak
denoted as R(110) at 27.4can be easily observed fromthe TiOx thin lm formed at 3
O2%.
_ The intensity of anatasepeaks at 3 O2% is strongerthan rutile peaks.
_ As O2% is higher than6%, the rutile peaks cannot
be detected.
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
10/16
GIXRD patterns of titanium oxide lms
formed at: 3 FO2% and post-annealed
at RT, 350C , 550C , and 750C for 2
min in air.
RESULTSAND DISCUSSION
_ TiOx lm annealed at350C is still an amorphouslm because of no distinctdiffraction peak.
_ The mixed crystallineanatase and rutile lms areobtained after 550C and750C annealing.
_ The intensity of bothanatase and rutile peaksincreases with increasingtemperature.
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
11/16
Raman spectra of titanium oxide
lms formed at 3, 6, 10 and 15
FO2% and post-annealed at 750
C for 2 min in air.
RESULTSAND DISCUSSION
_ The lm at 3 O2% showsseveral anatase peaks at 396and 639 cm 1 and rutile peaksat 449 and 612 cm 1.
_ The rutile peaks decreasewith increasing oxygen owratio.
_ The intensity of anatase
peak decreaseswith increasingoxygen ow ratio due to thereduction of lm thickness.
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
12/16
Raman spectra of titaniumoxide
lms at 3 FO2% and post-
annealed at RT, 350 C , 550 C ,
and 750 C for 2 min in air.
RESULTSAND DISCUSSION
_ The intensity of anatasepeaks at 396 and 639 cm 1
and rutile peaks at 449 and612cm 1 increases withannealing temperature fromRT to 750C, especially foranatase peaks.
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
13/16
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
14/16
The Gaussian tted curve ofPL
spectra of the 3 FO2% lm at
750 C annealed for 2 min in
air.
RESULTSAND DISCUSSION
_ The wide peak is mergedfrom two different TiOx peaks.
_ The curve can be tted into
two Gaussian peaks at 486 nm(2,55eV) and 588 nm(2,11eV).
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
15/16
PL spectra of titanium oxide lms
at 3 FO2% and post-annealed at
RT, 350 C , 550 C , and 750 C
for 2 min in air.
RESULTSAND DISCUSSION
_ Luminescence shift caused by the mixed anatase andrutile phase.
_ The intensity of PL peaksincreases with annealingtemperature because ofenhancement of the crystalline
phase._ For the as-deposited and 350
C annealed samples, the PLsignal is very weak due to thepoor crystallinity.
-
8/8/2019 Anh Huong Cua O2 Va Nhiet Do U_2
16/16
The oxygen ow ratios during deposition and post-annealedtemperatures result in the evolution of phase formation of the lms
CONCLUSION
The XRD and Raman results indicate that the 3 FO2% lm isformed of a mixed phase of anatase and rutile, and the specimensof 10 FO2%, and 15 FO2% are the single-phase anatase after550750 C annealing
The as-deposited TiOx lms and those annealed at 350 C are all
amorphous because of no distinct diffraction peak.
The minimum thermal annealing temperature necessary tostimulate the crystallization of lm is between 350 C and 550C.