Electrodeposition of Indium Sulfide (In2S3) Films on Molybdenum-coated Glass

Maqsood Ali Mughal

 

2013 Spring Weekly Research MeetingOctober 8th, 2012

Electronics Lab LSW 156Arkansas State University

Factors And Levels

LevelsA, Deposition

Voltage DV (V)

B, Deposition Time DT

(min)

C, Composition of Solution COS

D, Deposition Temperature D

Temp(OC)

1 -0.6 3 0.1M S 150

2 -0.7 60.1 MS, 0.1M Na2S2O3.5H2O

160

3 -0.8 9 0.2M S 170

Experiment No. A B C D Trial 1 Trial 2 Trial 31 1 1 1 1 √ √ √2 1 1 2 2 √ √ √3 1 1 3 3 √ √ √4 1 2 1 2 √ √ √5 1 2 2 3 √ √ √6 1 2 3 1 √ √ √7 1 3 1 3 √ √ √8 1 3 2 1 √ √ √9 1 3 3 2 √ √ √10 2 1 1 2 √ √ √11 2 1 2 3 √ √ √12 2 1 3 1 √ √ √13 2 2 1 3 √ √ √14 2 2 2 1 √ √ √15 2 2 3 2 √ √ √16 2 3 1 1 √ √ √17 2 3 2 2 √ √ √18 2 3 3 3 √ √ √19 3 1 1 3 √ √ √20 3 1 2 1 √ √ √21 3 1 3 2 √ √ √22 3 2 1 1 √ √ √23 3 2 2 2 √ √ √24 3 2 3 3 √ √ √25 3 3 1 2 √ √ √26 3 3 2 3 √ √ √27 3 3 3 1 √ √ √

Total Number of Experiments

*For each experiment, I performed 3 trials in order to achieve precise results

Each sample was characterized to determine the S/In ratio by EDS and crack density by Digital Image Analysis

EDS

•Films were scratched-off and collected in the powder form on an aluminum stub.

Digital Image Analysis

•SEM images from each sample will be uploaded to the program, “Fracture and Buckling Analysis” that is written in MATLAB to calculate the crack density.

Characterization

Spectrum O C S Al In S/I   Atomic%  

Spectrum 1

19.89 0 38.04 0 28.62 1.32914046

Spectrum 2

55.83 40.82 1.36771191

Spectrum 3

5.09 93.42 0.09 0.3 0  

             Mean 8.326 34.6267 31.32 0.1 23.1467 1.3531106Max. 19.89 93.42 55.83 78.35 40.82  Min. 5.09 0 0.09 0 28.62  

E7 (2)SEM image of scratched off

film at 99x

E7 (2) SEM image at 3.0 kx

Energy Dispersive Spectroscopy EDS Analysis

Digital Image Analysis

Analysis of Experimental Data

• Once the experimental design has been determined and the trials have been carried out, the measured performance characteristic from each trial can be used to analyze the relative effect of the different parameters

• Minitab will be used to perform statistical analysis

-0.6-0.7-0.8

0.7440.7320.7200.708

0.6960.6840.6720.660

963

321

0.7440.7320.7200.7080.6960.684

0.6720.660

170160150

Deposition Voltage (V)

Mea

n of

Mea

ns

Deposition Time (min)

Composition of Solution Deposition Temperature (oC)

Main Effects Plot for Means (Crack density & S/In Molar Ratio)Data Means

-0.600-0.625-0.650-0.675-0.700-0.725-0.750-0.775-0.800-0.825

0.105

0.090

0.075

0.060

0.045

0.030

0.015

0.000

-0.015

-0.030

Deposition Voltage (V)

Cra

ck D

ensi

ty (/

µm)

Plot of Crack Density (/µm) vs Deposition Voltage (V) with Fitted Line

-0.600-0.625-0.650-0.675-0.700-0.725-0.750-0.775-0.800-0.825

3.5

3.0

2.5

2.0

1.5

1.0

0.5

0.0

-0.5

-1.0

Deposition Voltage (V)

S/I

n M

olar

Rat

io

Plot of S/In Molar Ratio vs Deposition Voltage (V) with Fitted Line

Response Table for Signal to Noise Ratios

Nominal is best (10*Log10(Ybar**2/s**2))

Deposition Deposition Deposition Composition TemperatureLevel Voltage (V) Time (min) of Solution (oC)1 -2.011 -2.577 -2.466 -2.4612 -2.458 -2.368 -2.319 -2.3523 -2.704 -2.227 -2.387 -2.359Delta 0.693 0.350 0.147 0.108Rank 1 2 3 4