introducing adtek photomask · 2004. 9. 28. · adtek photomask – 09/04 introducing adtek...
TRANSCRIPT
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Introducing ADTEK Photomask
ADTEK Photomask is the sole merchant photomask manufacturer in Canada. We have been supplying a full range of optical, e-beam andlaserwrite photomasks to the semiconductor and related industries for over 25 years.
Our clients include multinational corporations, but mainly smaller companies and leading university research centres. Our photomasks are used in various fields such as:
• Photonics / Optoelectronics• Microelectronics• Micro-Electro-Mechanical-Systems (MEMS)• Bio-medical systems• Nanotechnology
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Process Flow
CustomerService QuotationDesign
PatternGenerator
Laser/E-beamsystem
Shipping
Optical
Laser/E-beam
Plot Approval
PurchaseOrder
DataPreparation
ProductionControl
Layout + Spec
(GDSII, dxf, dwg)(Job Information Form)
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Typical mask layout
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Example of a 5x reticle
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Mask Fiducials
Please let us know:- the model number- the body number of your stepper.
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Mask Field
Digitized data = clear Digitized data = dark
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5” mask
4” write area
Digitized data
E-beam mask design (1)
Critical dimension CD:Minimum feature orminimum spacing(whichever is smaller)
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E-beam mask design (2)Design
Dark field mask Clear field mask (please define reversing border)
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‘Pizza’ mask:
Separate layer mark-ing dark field area
Separate layer mark-ing light field area
Dense pattern
Will be used asreversing border
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Using AutoCAD as a layout tool (1)
• Use a new layer for each mask (e.g. ‘mask 1’, ‘mask 2’)
• Put construction lines on a different layer
• Put mask outline, reversing borders, etc on a different layer
• Use closed polylines to draw structures (command polyline, ‘c’ to close).
The circle, rectangle,… command creates a polyline automatically.
• Do not self-intersect polylines
• You can use text and define the height (we will determine font and width)
• If possible define a hierarchy by using blocks
• Do not use the hatch command
• Avoid double-digitizing or structures covering others
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Using AutoCAD as a layout tool (2)
What you want on the final mask:
Drawn incorrectly:
Correct:
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Reading
Right Reading Chrome Down (RRCD)- A text can be read properly while looking through theglass side of the mask. This is the standard reading.
Right Reading Chrome Up (RRCU):- A text can be read properly while looking at the chromeside of the mask.
Chrome
RRCD
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Quartz or Soda Lime?
Thermal expansion: Soda Lime: α = 9.3 ⋅10-6 /°C Quartz: α = 0.5 ⋅10-6 /°C
193
nm s
tepp
ers
Gra
ph su
pplie
d by
Hoy
a
Composition: Quartz = 100% SiO2 , SoLi = 70% SiO2, 8% Na2O, 9% K2O, 13% RO
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Blanks for Optical Pattern Generators
Thickness:Resist AZ 1518: 530 nmAR Chrome Oxide: 20 nmChrome: 80 nm
Reflectivity at 436 nm:Chrome: 48 %AR Chrome: 11 %Iron Oxide: 25 %
Thickness:Resist AZ 1518: 530 nmIron Oxide: 200 nm
Resist is baked for ½ hour at 103°
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Maskshop Process Flow
NaOH & H2SO4 + H2O2
Exposure Development Etching Resist stripping
Defect inspection
?
Defect repairCD measurementRegistrationmeasurement
hν
Laser
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Optical Pattern Generator (PG)
hν
Quartz / Soda Lime blank
ChromePositive Photoresist Flash size on the mask:
Min: 3 µm Max: 1500 µm
Variable rectangularshutters
10x reduction lens
λ = 436 nm (g-line of a mercury short arc lamp)
Rotation possible in 0.1 degree increments
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Optical Pattern Generator Format
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Image Repeater (IR)
5” reticle
hν
10x reduction lens
Max. die size = 9.4 mm x 9.6 mm
λ = 436 nm
Quartz / Soda Lime blank
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1x 10x & S&RMaximum plate size 10“ x 10“ 10“ x 10“Maximum write area 6“ x 9“ 6“ x 9“Maximum die size N/A 9.4 mmMinimum feature size 10 µm 2.0 µmFeature size tolerance + 0.75 µm + 0.5 µmRegistration + 0.75 µm + 0.5 µmDefect density 2 defects/square inch > 5.0 µm (but < 10.0 µm) Coatings:Anti reflective chrome Yes YesBright chrome Yes YesIron oxide Yes YesGlass types:Soda Lime Yes YesQuartz Yes Yes
Optical Pattern Generation Specifications
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ALTA 3000 Laserwrite System
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ETEC CORE 2564, ALTA 3000 & MEBES 5500 Specifications2564 3000 5500
Placement accuracy 0.08 µm 0.04 µm 0.03 µmCD uniformity 0.04 µm 0.03 µm 0.025 µmStripe butting 0.05 µm 0.02 µm 0.018 µmMinimum address size 0.025 µm 0.0083 µm 0.00125 µm Minimum resolution 0.6 µm 0.5 µm 0.360 µmGlass types:Soda Lime Yes Yes NoQuartz Yes Yes YesPlate sizes:4” x 4” x 0.06”/0.09” Yes No No5” x 5” x 0.09” Yes Yes No6” x 6” x 0.12” Yes Yes No6” x 6” x 0.25” Quartz only Yes Yes Yes7” x 7” x 0.12” Yes Yes No
Equipment manufacturer’s specifications
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The critical dimension CD
• Please let us know where the minimum feature is
(indicate x- and y-coordinates or position on separate
layer in your data file)
• Up to 5 CD measurements per mask are included
(ideally centre + each quadrant of the mask)
• CD can be measured on features up to 20 µm
• CD cannot be measured on circles, waveguides, …
=> please place tuning forks on the mask
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LEICA IPRO Registration System
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Registration
ACTUAL MASKDESIGN
Comparing the size, distortion & rotation of the die on the mask to
the design grid
Comparing the size, distortion & rotation of
the array on the mask to the design grid
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Examples of typical defects
Created by a hole in the resist
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Auto Inspection Reference Marks
Written by the manufacturer
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Die to Die Inspection
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Image divided into pixels
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Die-to-database inspection
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Comparison of database image and real image
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How to contact us?
Peter ErhartAdtek Photomask4950 Fisher StreetMontreal, Qc, Canada H4T 1J6
Tel.: (514) 737-7030Fax: (514) 737-9893
E-mail: [email protected]: www.adtekphotomask.com