iterative methods for precision motion control with application to a wafer scanner system

59
Iterative Methods for Precision Motion Control with Application to a Wafer Scanner System Hoday Stearns Advisor: Professor Masayoshi Tomizuka PhD Seminar Presentation 2011-05-04 1/42

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Iterative Methods for Precision Motion Control with Application to a Wafer Scanner System. Hoday Stearns Advisor: Professor Masayoshi Tomizuka PhD Seminar Presentation 2011-05-04. 1 /42. Semiconductor manufacturing. Photolithography. Advances in Photolithography. Resolution. - PowerPoint PPT Presentation

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Page 1: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Iterative Methods for Precision Motion Control with Application to

a Wafer Scanner System

Hoday StearnsAdvisor: Professor Masayoshi Tomizuka

PhD Seminar Presentation2011-05-04

1/42

Page 2: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Semiconductor manufacturing

Courtesy of ASML

Photolithography

2/42

Advances in Photolithography

Resolution

Wavelength Numerical aperture

Page 3: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Semiconductor manufacturing

Wafer stage motion control• Ultra-high positioning precision• High velocities• Synchronization

22 nm Half-pitch0.55 nm Inter-atom spacing in silicon

Advanced control schemes

3/42

Courtesy of IEEE Spectrum

Page 4: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Wafer stage test system

4/42

Page 5: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Overall experimental setupPrototype wafer stage

FPGA 7831R RT Target

Linear motorInterferometer

Motor driverPCI axis board

5/42

Page 6: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

0 0.5 1 1.5 2 2.5 3 3.5-1

-0.5

0

0.5

1x 10

-4

Time (s)

Err

or

(m)

tracking error measur

eposition

0 0.5 1 1.5 2 2.5 3 3.50

0.2

0.4

Time (s)

Po

sitio

n (

m)

Challenges in precision tracking

Error while accelerating

disturbances

sensor noise

Reference Command

vibrations

Decreasetrackingerror

6/42

Page 7: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Baseline controller design

• Uses sensor measurements

• Increases robustness• Trajectory independent• Limited to being causal

Feedforward control …• Uses a-priori information• Improves transient

response• Trajectory dependent• a-causal

Feedback control … Feedforward control …

Feedback Controller

FeedforwardController

Plantreference error measurement

+-

++

7/42

Page 8: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Repetitive processeswafer

die

8/42

Page 9: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Repetitive processeswafer

die

Information from past runs is used to improve future runs

Iteratively update a feedforward signal

Iterative learning control (ILC)

Iteratively update a controller parameters

Iterative feedback tuning (IFT)

9/42

Page 10: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

• Improves performance of systems that operate repetitively over a fixed time interval

• Updates a feedforward signal iteratively based on the tracking error signal of previous runs.

)()()()()( 111 dkqLkqQk jj

ILCjILC euu

C Pr(k) e(k) y(k)+

+-

UILC(k)

+

ILC update law

Iterative learning control

L: learning filter

Q: Q filter• Low-pass filter• Zero-phase• Q ≈ 1 : turn learning on• Q ≈ 0: turn learning off

• In P-type ILC, L = scalar

10/42

Page 11: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Iterative learning control

Simple to implement Effective Data-driven method Does not change feedback loop

ILC is effective at reducing error due to :Repetitive disturbancesTrajectory

disturbances

sensor noiseError while accelerating

vibrations

Advantages:

11/42

Page 12: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

ILC example

0 0.5 1 1.5-4

-2

0

2

4x 10

-5

Time (s)

Err

or (

m)

Run 1

Run 3Run 5

0 5 100

0.5

1

1.5

2x 10

-7

IterationR

MS

err

or (

m)

12/42

Page 13: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

ILC considerations

Stability

0 5 100

2

4x 10

-7

IterationR

MS

err

or (

m)

0 5 100

2

4x 10

-7

Iteration

RM

S e

rror

(m

)

Asymptotic performance

Transient performance0 5 10

0

2

4x 10

-7

Iteration

RM

S e

rror

(m

)

Robustness

ILC design should satisfy the following considerations:

13/42

Page 14: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

ILC challenges Vibrations

Nonrepetitive High frequencyILC can only compensate for repetitive disturbances

Difficult to design ILC algorithms with robust performance at high frequencies

ILC design for systems with

vibrations

#1

14/42

Page 15: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

ILC challengesNew Trajectories

When trajectory changes, learning must be restarted from scratch

0 1000 2000 30000

0.05

0.1

0 2000 4000 60000

0.2

0.4

0 1000 2000 3000-5

0

5x 10

-5

Trajectory 1 Tracking error ILC signal

0 1000 2000 3000-5

0

5x 10

-5

Trajectory 2 Tracking error ILC signal

? ?

ApplyILC

Feedforward signalrecalculation method #2

Feedforward controller iterative

tuning #315/42

Page 16: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

ILC design for systems with

vibrations

#1

16/42

Page 17: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Error sources categorization

Repetitive Non-repetitiveLow frequency Force ripple (< 20

Hz)Table vibration (18 Hz)

High frequency Vibration modes of plant (150 Hz)

Sensor noise

DOB

DOB and ILC

Special ILC design

17/42

filtering

Page 18: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

First try: P-type ILCP-type ILC, Q filter with 250 Hz cutoff

Large learning transient

0 0.2 0.4 0.6 0.8 1 1.2 1.4-2

-1

0

1

2x 10

-6 Tracking error after 20 runs

Time

Err

or (

m)

Q filter function:

Learning turned on in frequency bands where Q ≈ 1

Learning turned off in frequency bands where Q ≈ 0

18/42

Page 19: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

First try: P-type ILC

0.2 0.22 0.24 0.26

-1

0

1

2

x 10-6 Tracking error after 20 runs

TimeE

rror

(m

)

100 Hz cutoff

250 Hz cutoff

P-type ILC, Q filter with 250 Hz cutoffP-type ILC, Q filter with 100 Hz cutoff

0 0.2 0.4 0.6 0.8 1 1.2 1.4-4

-2

0

2

4x 10

-6 Tracking error after 20 runs

Time

Err

or (

m)

100 Hz cutoff

250 Hz cutoff

Worse peak error

19/42

Transient eliminated

Page 20: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

0.2 0.22 0.24 0.26 0.28 0.3 0.32

-2

-1

0

1

2

x 10-6 Tracking error after 20 runs

Time

Err

or (

m)

250 Hz cutoff

250 Hz cutoff w notch

P-type ILC, Q filter with 250 Hz cutoffP-type ILC, Q filter with 250 Hz cutoff and notch at 150 Hz

0.2 0.22 0.24 0.26 0.28

-2

-1

0

1

2

x 10-6 Tracking error after 20 runs

Time

Err

or (

m)

250 Hz cutoff w notch

250 Hz cutoff w dynamic notch

P-type ILC, Q filter with 250 Hz cutoff and dynamic notch

P-type ILC with notch Q filter

20/42

Transient eliminated

Page 21: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Notch L filter

0.2 0.22 0.24 0.26 0.28 0.3

-1

-0.5

0

0.5

1

1.5

x 10-6 Tracking error after 20 runs

Time

Err

or (

m)

250 Hz cutoff

notch L filter

P-type ILC, Q filter with 250 Hz cutoffNotch L filter, Q filter with 250 Hz cutoff

0.2 0.21 0.22 0.23 0.24 0.25 0.26 0.27

-1

0

1

2x 10

-6 Tracking error after 20 runs

Time

Err

or (

m)

notch L filter

dynamic notch L

Dynamic notch L filter, Q filter with 250 Hz cutoff

21/42

Page 22: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

0.2 0.22 0.24 0.26 0.28

-1

-0.5

0

0.5

1

x 10-6 Tracking error after 20 runs

Time

Err

or (

m)

250 Hz cutoff

frequency shaped L

P-type ILC, Q filter with 250 Hz cutoffFrequency-shaped L filter, Q filter with 250 Hz cutoff

Frequency shaped L filter

0

10

20

Mag

nitu

de (

dB)

100

101

102

103

-45

0

45

90

135

Pha

se (

deg)

Bode Diagram

Frequency (Hz)

L filter shape

22/42

Notch LFrequency shaped L

Page 23: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

0.56 0.58 0.6 0.62 0.64 0.66

-5

0

5

x 10-6 Tracking error after 20 runs

Time

Err

or (

m)

model inverse L

Model-inverse L, Q filter with 250 Hz cutoff

Model-inverse L filter

23/42

Page 24: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Overall comparison - experiment

24/42

Frequency shaped L filter gives 42.2% improvement over P-type 250 Hz cutoff

2 4 6 8 10 12 14 16 18 200

0.5

1

1.5

2

2.5

x 10-8 RMS tracking error during learning

Iteration number

RM

S e

rror

(m

)

P-type 100 Hz cutoff

P-type 250 Hz cutoffQ notch

Q dynamic notch

L notch

L dynamic notchL frequency shaped

L model inverse

Dynamic notch L filter gives 28.3% improvement over P-type 250 Hz cutoff • Time-varying filters (Q and L) can give better performance than fixed filters• For L, choosing a filter can give better performance than choosing a scalar

Conclusions

Page 25: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Stability of designed ILC

25/42

-60

-40

-20

0

Mag

nitu

de (

dB)

100

101

102

103

-360

0

360

720

Pha

se (

deg)

Bode Diagram

Frequency (Hz)

P-type 100 Hz cutoffP-type 250 Hz cutoffFrequency shaped L

Stability condition

The lowest is ILC with frequency-

shaped L

Page 26: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Performance of designed ILC

26/42

100

101

102

103

10-5

100

Mag

nitu

deBode plot

100

101

102

103

-20

0

20

40

60

Pha

se (

deg)

Frequency (Hz)

P-type 100 Hz cutoffP-type 250 Hz cutoffFrequency shaped L

Asymptotic error equation

The lowest is ILC with frequency-

shaped L

Page 27: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Feedforward signal generation

for new trajectories via ILC

#2

27/42

Page 28: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

ILC for feedforward signal generation• A learned ILC signal is limited to a single trajectory.• If trajectory is changed, ILC signal must be relearned.

Develop a method for generalizing ILC results to other scan trajectories

0 1000 2000 30000

0.05

0.1

0 2000 4000 60000

0.2

0.4

0 1000 2000 3000-5

0

5x 10

-5

Trajectory 1 Tracking error ILC signal

0 1000 2000 3000-5

0

5x 10

-5

Trajectory 2 Tracking error ILC signal

? ?

ApplyILC

28/42

Page 29: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Construction of a scan trajectory

0 500 1000 1500 2000 25000

0.02

0.04

0.06

0.08

0.1

sample index

Pos

ition

(m

)

0 500 1000 1500 2000 25000

0.05

0.1

0.15

0.2

Vel

ocity

(m

/s)

0 500 1000 1500 2000 2500-2

-1.5

-1

-0.5

0

0.5

1

1.5

2

Accele

ration (

m/s

/s)

Po

siti

on

Vel

oci

tyA

ccel

erat

ion

Scanning at constant velocity

Constant acceleration

scantacct acct

• Specify • scan length, • velocity limit,• acceleration limit

• Time-optimal trajectory• Polynomial spline

29/42

Page 30: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Construction of a Scan Trajectory

0 500 1000 1500 2000 2500-2

-1

0

1

2

Acc

eler

atio

n (m

/s/s

)

0 500 1000 1500 2000 2500-2

-1

0

1

2

Acc

eler

atio

n (m

/s/s

)

0 500 1000 1500 2000 2500-2

-1

0

1

2

Acc

eler

atio

n (m

/s/s

)

0 500 1000 1500 2000 2500-2

-1

0

1

2

Acc

eler

atio

n (m

/s/s

)

+

Notice that acceleration is superposition of 4 shifted and scaled step signals

30/42

0 0.2 0.4 0.6 0.8 10

0.02

0.04

0.06

0.08

0.1

Time (s)

Po

sitio

n (

m)

Trajectory 1

0 0.2 0.4 0.6 0.8 1-2

-1

0

1

2

Time (s)

Acce

lera

tion

(m

/s2 )

Trajectory 1 Acceleration

Page 31: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Feedforward signal analysisILC feedforward input signal is also a superposition (assume no disturbances)

)()()()()( 4,3,2,1,max ttuttuttuttuatu uILCuILCuILCuILCILC

Base feedforward signal

0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1-2.5

-2

-1.5

-1

-0.5

0

0.5

1

1.5

2

2.5x 10

-5

erro

r (m

)

time (s)

=+

ILC input for Traj 1

31/42

-1 0 1 2 3 4-1

0

1

2x 10

-5

Time (s)

FF

sig

na

l (m

)

Base feedforward signal

acausal part

0 2 40

1

2x 10

-5

0 2 40

1

2x 10

-5

Learned signal decomposition

Page 32: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Then, test it in the system:

Feedforward signal synthesis

32/42

New scan trajectory

0 0.5 1 1.5 20

0.05

0.1

0.15

0.2

Time (s)

Po

sitio

n (

m)

Trajectory 2

Synthesize ILC input

0 0.5 1 1.5 2-4

-2

0

2

4x 10

-5

Time (s)u IL

C (

m)

Synthesized input for traj 2

Page 33: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

• Doesn’t require model• Doesn’t require redoing learning iterations• Achieves low tracking error

Advantages of proposed method

Experimental Results

0.2 0.25 0.3 0.35

-4

-2

0

2

4x 10

-6

Time (s)

Tra

ckin

g e

rro

r (m

)Tracking error for Traj 2

Before ILCAfter 5 iters ILCUsing the synthesized FF inputUsing FF controller

The proposed method achieves performance that is:• Similar to ILC, but without need to repeat learning iterations• Better than feedforward controller

33/42

RMS error is 33.5% lower than with FF controller

Page 34: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Iterative tuning of feedforward

controllers

#3

34/42

Page 35: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Feedforward signal vs. controller

Feedback Controller

FeedforwardController

Plantreference error measurement

+-

++

Feedback Controller

Plantreference error measurement

+-

++

ILC feedforwardsignal

Inverse plant structureDisturbance model structure

35/42

Page 36: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Iterative Controller Tuning

No model of the plant is needed for optimization

IFT is an iterative method of tuning controller parameters Minimizes a cost functionDescent algorithm searchGradient direction estimated from experimental data

0

0.5

1

0

0.5

10

2

4

6

8

x 10-7

p1

p2

Obj

ectiv

e fu

nctio

n

Iterative Feedback Tuning

36/42

k

JRkk

11= scalar to control step size

ρ= controller parameters to be tuned

k = iteration #R = positive definite matrix

Page 37: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

0 0.5 1 1.5 2 2.5 3 3.5-1

0

1

0.5

-0.5

x 10-4

Time (s)

Err

or

(m)

The effect of IFT on error profile

Feedforward controller 1

Peak error decreased 95%

0 0.5 1 1.5 2 2.5 3 3.5-1

0

1

0.5

-0.5

x 10-4

Time (s)

Err

or

(m)

The effect of IFT on error profile

First trialAfter 10 cycles

Inverse model structure

For reducing error due to trajectory

37/42

Page 38: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Force ripple

0 1 2 3-1

-0.5

0

0.5

1x 10

-4

Time (s)

Err

or

(m)

Effect of FF tuning on error profile

First trialAfter 10 cycles

0.4 0.6 0.8 1 1.2 1.4

-3

-2.5

-2

-1.5

-1

-0.5

0

0.5

x 10-6

Time (s)

Err

or

(m)

Force Ripple

Force Ripple is a periodic disturbance that arises in linear permanent magnet motors due to imperfections

38/42

N

kkkripple ykbykayuyF

100 )cos()sin()()(

Page 39: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Feedforward controller 2

Feedforward signals

N

kkkfr trkbtrkatvtF

100 ))(cos(ˆ))(sin(ˆ)()(

Force ripple compensator

For reducing error due to force ripple disturbance

39/420 0.5 1 1.5

-3

-2

-1

0

1

2

3x 10

-6

Time (s)

Err

or

(m)

The effect of tuning on error profile

First TrialAfter 10 Cyclestune tune

Page 40: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Comparison of ILC and IFT

0 0.5 1 1.5 2 2.5 3 3.5

-2

0

2

x 10-6 Time plot of error

Time (s)

Po

siti

on

Err

or

(m)

IFT

0 0.5 1 1.5 2 2.5 3 3.5

-2

0

2

x 10-6 Time plot of error

Time (s)

Po

siti

on

Err

or

(m)

ILC

Time plot of error

IFT:• Applicable for new

trajectories• Performance can be

improved by increasing controller complexity

ILC:• Most effective• Simpler computation• No assumptions of

model structures

40/42

Page 41: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Iterative methods for high precision position control

• ILC design for systems with vibration• ILC feedforward computation for scan

trajectories• Iterative feedforward controller tuning

41/42

Conclusion

Page 42: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

42/22

Thank youProfessor Tomizuka

MSC Lab

Precision motion control group

Page 43: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Repetitive Processes

Silicon wafer 300mm diameter

Die

Changing every year 43/22

Page 44: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Repetitive Processes

Silicon wafer 300mm diameter

Die

• Translates to: • high tracking precision (error

<1nm)• high repeatability• high scanning speeds

International Technology Roadmap for Semiconductors

Changing every year 44/22

Page 45: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Modelling

bsms

ksP

2)(

45/22

m

Fx

b

Page 46: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Trajectory Design

46/22

Page 47: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Construction of a scan trajectory

0 500 1000 1500 2000 25000

0.02

0.04

0.06

0.08

0.1

sample index

Pos

ition

(m

)

0 500 1000 1500 2000 25000

0.05

0.1

0.15

0.2

Vel

ocity

(m

/s)

0 500 1000 1500 2000 2500-2

-1.5

-1

-0.5

0

0.5

1

1.5

2

Accele

ration (

m/s

/s)

Po

siti

on

Vel

oci

ty

Acc

eler

ati

on

Scanning at constant velocity

Constant acceleration

scantacct acct

• Specify • scan length, • velocity limit,• acceleration limit

• Time-optimal trajectory is unique

• It is polynomial spline• The continuous-time

trajectory is determined analytically then sampled

Page 48: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Thesis contributions

• Applying ILC for high precision control of systems with vibrations

• Making ILC tuning results applicable to multiple trajectories

• Compensating for force ripple disturbance through IFT.

Page 49: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Experiment

• One complication: force ripple• Force ripple is NOT LTI so it cannot be scaled and time-shifted.• Nor is force ripple disturbance always the same : it depends on the

reference trajectory

0 500 1000 1500 2000-1

-0.5

0

0.5

1x 10

-6

0 500 1000 1500 2000-1

-0.5

0

0.5

1x 10

-6

)2

sin()2

cos()(1

kyP

BkyP

AuyF k

N

kkrip

Page 50: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

DOB Design

PC

10P

Q

dr

ILCu

Solution:

Use a disturbance observer

DOB compensates the force ripple

And ILC feedforward signal compensates error due to the trajectory

0 500 1000 1500 2000 2500

-2

0

2

x 10-5

Err

or

(m)

no DOBDOB

1000 1200 1400 1600 1800

-3

-2

-1

0

1x 10

-6

Err

or

(m)

Page 51: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Gradient estimate

22

1

])[(])[()( nuneJN

n

)(][

][)(][

][)(1

nunu

nene

J N

n

][

1

)(

)(][

][)()(1

1][

2

11

nrPC

CP

ne

nrqCqP

ne

][11

1)(1nr

PC

PC

PC

C

C

Cost function:

The relation of error to the controller is known, so

Cost function gradient:

C Pe[n]r[n]

-

51/22

Assume SISO

Page 52: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Controller Tuning Algorithm

k

JRkk

11

22

1

])[(])[()( nuneJN

n

Minimize a cost function:

Using a gradient-based iterative search

k = iteration #

= scalar to control step size

R = positive definite matrix

ρ= controller parameters to be tuned

e = tracking error

u = control effort

52/22

Page 53: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Gradient estimate][

11

1)(1][nr

PC

PC

PC

C

C

ne

Although are known,

)(,

1 C

C PC

PC

PC 1,

1

1are unknown/uncertain because involves plant

Gradient can be obtained by passing reference through system twice

C Pe[n]r[n]

- C P

C

1

)(C

][ne

][1

nrPC

PC

][11

1nr

PC

PC

PC

53/22

-

Page 54: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Experiment Results

0 0.5 1 1.5-3

-2

-1

0

1

2

3x 10

-6

Time (s)

Err

or

(m)

The effect of tuning on error profile

First TrialAfter 10 Cycles

2 4 6 8 100

1

2

3

4

5

6x 10

-10

Iteration number

Co

st fu

nct

ion

(su

m o

f sq

ua

red

err

or) Minimization of sum of squared error

N

kkkfr trkbtrkatvtF

100 ))(cos(ˆ))(sin(ˆ)()(

tune

2 4 6 8 10-1.5

-1

-0.5

0

0.5

1

Iteration number

Convergence of parameters ak, b

k over iterations

a1b1a2b2a3b3a4b4

tune

54/42

Page 55: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Experiment Results

0 0.5 1 1.5-3

-2

-1

0

1

2

3x 10

-6

Time (s)

Err

or

(m)

The effect of tuning on error profile

First TrialAfter 10 Cycles

N

kkkfr trkbtrkatvtF

100 ))(cos(ˆ))(sin(ˆ)()(

tune tune

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Page 56: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Tuning Results

0 0.2 0.4 0.60

0.1

0.2

0.3

0.4

0.5

0.6

1

2

Evolution of 1 and

2

Expected value

2 4 6 8 100

0.5

1

1.5

2x 10

-6

Iteration number

Co

st fu

nct

ion

(su

m o

f sq

ua

red

err

or)

Minimization of squared error Norm of error Evolution of ρ1, ρ2

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Page 57: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Semiconductor manufacturingMoore’s law

Transistor dimension vs. yearCourtesy of Intel

Courtesy of ASML

Photolithography

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Page 58: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Semiconductor manufacturingAdvances in Photolithography

Resolution

Wavelength Numerical aperture

Photolithography

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Page 59: Iterative  Methods for Precision Motion Control with Application to a Wafer Scanner System

Semiconductor manufacturing

Wafer stage motion control• Ultra-high positioning precision• High velocities• Synchronization

Advances in Photolithography

Resolution

Wavelength Numerical aperture 22 nm Half-pitch

0.55 nm Inter-atom spacing in silicon

Advanced control schemes

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