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NAND Reliability Improvement with Controller Assisted Algorithms in SSD Sunghoon Cho Flash Tech Development Division SK hynix Santa Clara, CA August 2013 1

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NAND Reliability Improvement with

Controller Assisted Algorithms in SSD

Sunghoon Cho Flash Tech Development Division

SK hynix

Santa Clara, CA August 2013

1

Introduction Program Operation -. Controller assisted ISPP algorithms

Erase Operation -. Erase Pulse Control

-. Intelligent ISPE

Read Operation -. Selected W/L Gr. / Unselected W/L Gr.

-. Read Refresh

Conclusions

Contents

Santa Clara, CA August 2013

2

Santa Clara, CA August 2013

3

Introduction

Controller Application -. FTL

Using wear- leveling Information

Variable Program /Erase /Read Condition

Best Performance and Reliability Products

Si Process Optimization -. Cell Architecture.

-. Junction Engineering.

-. Process control.

3

Scaling Barriers in NAND Flash

[ NAND Flash Structure ]

Isol

atio

n Geometry Small Coupling Ratio, Small On Current

Narrow Operating Window Interference, Disturbance, P/E cycling Stress

Process Sensitivity Less Tolerance in Process Variation

Gat

e

Santa Clara, CA August 2013

4

Santa Clara, CA August 2013

ISPP Operation

-. Controller assisted ISPP algorithms as P/E cycles proceeds.

Program Operation

5

Santa Clara, CA August 2013

Programming time is decreased

Performance and Reliability Characteristics as P/E Proceeds.

After P/E cycling, cell Vth is rapidly increased and Vth distribution is widened, which means that performance of NAND flash is enhanced but reliability is degraded. We could transfer sufficient program performance margin to insufficient reliability margin as P/E cycle proceeds. Consequently, we have devised a method that can improve reliability by utilizing such characteristics.

6

Programming Time RBER

0.0

0.2

0.4

0.6

0.8

1.0

0.0

0.2

0.4

0.6

0.8

1.0

RBERt P

ROG

[a.u

.]

P/E cycles

Santa Clara, CA August 2013

New Algorithms ISPP Reliability Results

By using the controller assisted new ISPP operation which modify the program condition, tracking the cell program, we improved cycle and retention characteristics in new ISPP than that of conventional ISPP operation.

7

Coventional ISPP New Algorithm ISPP

0

2

4

6

8

10

cycle cycle + retention

Avai

labl

e P/E

cycle

s [a.

u.]

Santa Clara, CA August 2013

Erase Pulse Control

Intelligent ISPE

Variable Erase Verify

Erase Operation

8

Era

se B

ias [

V]

1st pulse 2nd pulse 3rd pulse

Time [us] Santa Clara, CA August 2013

Erase Pulse Control Erase pulse shapes have been changed to enhance reliability and satisfy erase time requirement in erase pulse steps Steep erase pulse slope could satisfy erase time requirement but it could be tunnel oxide degradation.

Erase pulse shapes have been changed to enhance reliability and satisfy erase time requirement in erase pulse steps. Lowering rising erase pulse slope could reduce tunnel oxide stress but longer erase time is inevitable.

Era

se B

ias [

V]

1st pulse 2nd pulse 3rd pulse

Time [us]

Erase pulse shapes have been changed to enhance reliability and satisfy erase time requirement in erase pulse steps. We could implement new erase operation that can reduce the FN stress and

achieve fast erase operation simultaneously. The 1st erase pulse has graded slope and 2nd erase pulse has steep slope as in figure

Era

se B

ias [

V]

1st pulse 2nd pulse 3rd pulse

Time [us] 9

Santa Clara, CA August 2013

Erase Pulse and FN Current Larger FN current flows during 1st ISPE pulse step and its graded erase pulse slope relieve the FN stress in tunnel oxide. Since potential of floating gate rise after 1st ISPE pulse step, FN current decrease in low potential region of 2nd ISPE pulse. Even if 2nd step pulse slope is changed into steep, it does not affect cell

reliability.

< Erase Pulse and FN current using HSPICE >

VF.G

VTox

VC.C

Volta

ge [a

.u.]

Cur

rent

[a.u

.]

Time [a.u.] 10

Santa Clara, CA August 2013

Intelligent ISPE ; eliminating the redundant erase stress by using and applying the ISPE bias of previous EW cycles Erase operation can be finished within only one or two pulses even after P/E cycles.

Intelligent ISPE Control (B.J. Park , 2012 FMS)

(A) Schematics Diagram (B) State-Machine (C) Vt shift comparison between conventional ISPE and I-ISPE

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0.4

0.6

0.8

1.0

Vt S

hift

[a.u

.]

P/E cycles

ISPE Intelligent ISPE

Santa Clara, CA August 2013

Variable Erase/Program Verify Level in P/E Cycle Nodes

▪ NAND Cell degradation characteristics can be beneficially used because erase verify, program verify and read level can be manipulated as P/E cycles. Especially, erase verify level should be delicately controlled since erase stress is the major factor for cell degradation.

12

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

Cell

Vth

[a.u

.]

P/E cycle

Program Vth Erase Vth

Santa Clara, CA August 2013

Read Operation

Selected W/L Group Read

Unselected W/L Group Read

Read Scrub / Read Refresh

13

0 10 20 30 40 50 60 W/L position

Normal Read WL Group Read

0

2

4

6

8

10

Num

ber o

f fai

l bit

[a.u

.]

Santa Clara, CA August 2013

W/L Group Operation : Selected W/L

As scale down, cell uniformity within a block is being worsened continuously. To overcome these ones, W/Ls are divided into several groups and different operation biases are applied for each W/L groups with controller assistance or NAND itself.

Gr. A Gr. C Gr. D Gr. B

14

Santa Clara, CA August 2013

DSL

D

SSL

WL Group A

With increasing string size, series resistance of cells are also increased. As a result, string current is varied with W/L positions. We could use each different biases for each “W/L Groups” to compensate the variation of the string resistance.

W/L Group Operation : Unselected W/L

B

C

15

W/L Gr.D Conventional W/L Gr.A

0.0 0.2 0.4 0.6 0.8 1.00.0

0.2

0.4

0.6

0.8

1.0

Cell

Curr

ent [

a.u.

]

Gate Bias [a.u.]

Santa Clara, CA August 2013

Selected W/L Unselected W/L Value

W/L Group A VPASS_A VPASS_D + α

W/L Group D VPASS_D VPASS_D

W/L Group Operation : Cell Current By using the W/L group scheme, we can make the cell current of “Gr. A”similar to that of “Gr. D”.

16

W/L Gr.D Conventional W/L Gr.A New Scheme W/L Gr.A

0.0 0.2 0.4 0.6 0.8 1.00.0

0.2

0.4

0.6

0.8

1.0

Cell

Curr

ent [

a.u.

]

Gate Bias [a.u.]

Santa Clara, CA August 2013

Read Scrub / Read Refresh

Start 1’st Block

Read Cycle >*N?

Processing ECC N

Y

Updating Information of PGM Date

-.R.R.M ( Read Refresh Management )

-. *N : Read cycle criteria ( ~3k Read )

-. n : error bits per chunk

Ending Data RePGM

Last Block ?

Y

N

R.R.M.

Re PGM the data into other BLK

N

**n > 80% of ECC? Y

▪ Read Scrub is used for detecting retention and read disturbance. ▪ Controller could trace read count using R.R.M., which re-program the block if the number of fail bits is more than 80% of ECC coverage.

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Santa Clara, CA August 2013

Conclusions

We introduced the controller assisted algorithms that can improve the reliability by utilizing the cell characteristics change.

In program operation, controller assisted algorithms ISPP was proposed to

improve reliability with proper performance.

In erase operation, Erase pulse control and intelligent ISPE are proposed to reduce the erase stress and enhance erase performance.

In read operation, bias conditions for each W/L groups are separately controlled to overcome cell uniformity within a block.

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