november 29, 2002 nikhef-1 hans de vries status rf foil rf/vacuum foil purpose production methods...

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November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil • RF/vacuum foil Purpose Production methods used Deformations: static - overpressure Electrical properties Coating Cables Interference Silicons

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Page 1: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-1 Hans de Vries

Status RF foil

• RF/vacuum foil Purpose

Production methods used

Deformations: static - overpressure

Electrical properties

Coating

Cables

Interference Silicons

Page 2: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-2 Hans de Vries

RF and vacuum separation foil(1)

• Protect against RF effectsWakefields in Vertex vesselEMI in detectors

• Good conductivity

Why?• Separation extreme-high-vacuum of LHC from

Detector vacuum– (outgassing electronics, cables, NEG coating,…!)

• Stiffness

Physics requirement:• Restrict amount of material

– preferably low-Z (small radiation length)• Thin

• Detectors should overlap– Alignment– Stereo angle

• Complicated shape

Page 3: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-3 Hans de Vries

RF and vacuum separation foil(2)

Production from foil:Requirements for:• Stiffness• Welding• Thickness• Shape

•Choice of material•Methods to be used

Page 4: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-4 Hans de Vries

VELO Overview

Page 5: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-5 Hans de Vries

Secondary vacuum box

Page 6: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-6 Hans de Vries

Secondary vacuum box (detail)

Page 7: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-7 Hans de Vries

Material data:

Material: AlMg3Young's modulus: 70.000 MPaPoisons ratio: 0.33Shear Modulus: 27.3 GPaYield Strength: 80-180 MPaUltimate Strength: 180-260 MPaElectrical conductivity: 1.9x107 ohm-1 m-1

(almost 50% of pure Al)Weldable!

Page 8: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-8 Hans de Vries

Production of RF foil

– Hot gas forming• Deform at 350° Formation speed

– Superplastic deformation• Deform at 520°

– One cycle, p 10 bar Crystal growth, melting,Vacuum leaks

• Methods investigated:– Cold formation

• Press- anneal at 420° (or 350 °) - cool- press …– More than 15 cycles, 2 – 100 bar– Two or more molds Time consuming

– Explosive formation Uncontrolled

Page 9: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-9 Hans de Vries

Full size foil

Full size rf foil with reinforcement ribs

Page 10: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-10 Hans de Vries

3D measurement set-up

Mesh for 3D machine

-1000

-950

-900

-850

-800

-750

-700

-650

-600

-1600 -1400 -1200 -1000 -800 -600 -400 -200 0

Exploded view

Page 11: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-11 Hans de Vries

Measurement of one slot

-900

-890

-880

-870

-860

-850

-840

-830

-820

-810

-702 -701 -700 -699 -698 -697 -696 -695 -694 -693

20 x 5 measurement points

Page 12: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-12 Hans de Vries

3D result for one slot

-818

-830

-841

-852

-864

-875

-887

-694 -697 -701

-84

-83.5

-83

-82.5

-82

-81.5

-81

-81.5--81

-82--81.5

-82.5--82

-83--82.5

-83.5--83

-84--83.5

Page 13: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-13 Hans de Vries

Projection for one slot

-84.2

-84

-83.8

-83.6

-83.4

-83.2

-83

-82.8

-82.6

-82.4

-82.2

-82

-702 -701 -700 -699 -698 -697 -696 -695 -694 -693

Variation in depth of one slot ± 0.1 mm

Page 14: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-14 Hans de Vries

Minimum depth along foil

-85

-83

-81

-79

-77

-75

-73

-71

-69

-67

-65

-1600 -1400 -1200 -1000 -800 -600 -400 -200 0

Page 15: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-15 Hans de Vries

Minima enlarged

-84.4

-84.2

-84

-83.8

-83.6

-83.4

-83.2

-83

-1400 -1200 -1000 -800 -600 -400 -200

Variation in depth for all slots: ± 0.2 mm

Page 16: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-16 Hans de Vries

Close-up minima

-85

-83

-81

-79

-77

-75

-73

-1000 -950 -900 -850 -800

Position of slots along foil: 0.1 mm

Page 17: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-17 Hans de Vries

Thickness measurements

Along central beam line: 0.28 0.29 0.27 mm

0.24 0.27 0.25 0.26 0.30 0.27 0.24 0.27 mm

Largest curvature point: 0.15 mm

Page 18: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-18 Hans de Vries

FEM analysis: input

Input model for the FEMcalculations

Page 19: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-19 Hans de Vries

FEM analysis: down

10 mbar over pressure in primary vacuum

Maximum deflection 0.88 mmin “floppy part” of foil

Page 20: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-20 Hans de Vries

FEM analysis: up

10 mbar over pressure in secundary vacuum

Maximum deflection 1.04 mmin “floppy part” of foil

Page 21: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-21 Hans de Vries

Deflection measurement

Page 22: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-22 Hans de Vries

FEA for full box (1)

Page 23: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-23 Hans de Vries

FEA for full box (2)

Page 24: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-24 Hans de Vries

FEA for full box (3)

Page 25: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-25 Hans de Vries

FEA for full box (4)

Page 26: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-26 Hans de Vries

RF pick-up (1)

Foil thickness 30 m Al;Power level in the 50 ohm coaxial line:10 Watts at 40MHz. The Si detector was 5 mm from the foil outside conductor of the coax.

In this condition there was no influence on the noise background.

Page 27: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-27 Hans de Vries

RF pick-up (2)

Cut a hole in the foil and put the silicon strip just 5 mm in front of this hole.

The power level in this coax line was still 10 watt at 40MHz.

The fieldlevels from this radiator are much higher then we can obtain with the beam through the RF foil.The result was that we do not see influence on the working of the silicon in combination with theelectronics of the test setup at NIKHEF in febr. 2002.

Page 28: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-28 Hans de Vries

RF shielding

Frans Kroes has produced a note on

Attenuation of an EM field by AlMg4 screen of 0.2 mm

Conclusion:

Assuming a conductivity of 0.33 of pure Al:

At 1 mm distance to the rf screen:

1.415 x 10-3 V/m

Page 29: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-29 Hans de Vries

Conductivity

Pure Al = 37 x 106 Ohm-1 m-1

• Measured (10%) conductivity of 1 m long 1 cm wide strips of AlMg3:

undeformed = 17 x 106 Ohm-1 m-1

deformed = 11 x 106 Ohm-1 m-1

• 45% for undeformed• 30% for deformed material

Page 30: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-30 Hans de Vries

Coating

• The extreme deformation might result in tiny leaks in the material.

• Also a protective layer might be used at the inside of the detector box.

• Apply poly-amide-imide coating– Solution in N-Methyl-2-Pyrrolidone (NMP)– Drying and polymerization at 60º, 150º, 260º and

315º C– Properties like Kapton and Torlon – Good electric insulation– Radiation resistant 30 MGy, strength not changed

• Outgassing properties have been studied

Page 31: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-31 Hans de Vries

Final solution

A thin layer of poly-amide-imide is air brushed on the inside of the foil for electrical protection and to increase vacuum tightness

Effect of the layer:

Leak detectionWith Helium

Before After1.2e-3 3.2e-71.2e-5 7.2e-73.6e-5 5.2e-73.8e-5 2.4e-61.2e-6 3.2e-7

Page 32: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-32 Hans de Vries

Cabling

Cables inside vacuum:• Heat production• Signal shielding

Kapton with 3 Cu layers:• = 25 micron kapton outside layer•--- 17 micron Cu (foil)•= 75 micron kapton•--- 17 micron lines (100 micron width)•= 75 micron kapton •---17 micron Cu (foil)•= 25 micron kapton outside layer

Page 33: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-33 Hans de Vries

Outgassing (1)

Massspectra of outgassing after 48 hour

0.0E+00

5.0E-13

1.0E-12

1.5E-12

2.0E-12

0 5 10 15 20 25 30 35 40 45 50

Mass [amu]

Ion

Crr

ent

[A.l/

s.cm

^2]

Coated

Aluminum

Outgassing after 48 hour - Coated-Aluminum = 2.6E-09 mbar.l/s.cm 2̂ - Aluminum = 6.5E-10 mbar.l/s.cm 2̂

Outgassing poly-amide-imide coating

Page 34: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-34 Hans de Vries

Outgassing (2)Contribution in the pressure of the secondary vacuum by out gassing

Seff=500l/s

1.E-08

1.E-07

1.E-06

1.E-05

1.E-04

1.E-03

0 1 2 3 4 5 6 7 8 9 10

time [day]

P [

mb

ar]

Coating

Flat Cable

Poly-amide-imide coating: 1.5 m2

Kapton cables: 20 m2

Page 35: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-35 Hans de Vries

RF foil and Silicons

Page 36: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-36 Hans de Vries

RF foil and Silicons-reinforcements

Page 37: November 29, 2002 NIKHEF-1 Hans de Vries Status RF foil RF/vacuum foil  Purpose  Production methods used  Deformations: static - overpressure  Electrical

November 29, 2002 NIKHEF-37 Hans de Vries

Summary

• Full size RF/vacuum foil has been obtained– Material: 300 m Al with 3% Mg– Minimal radius 8 mm – Deviations measured: ± 0.3 mm– FEM analysis has been performed– Variations measured for 10 mbar

overpressure– Electrical properties measured– Application of poly-amide-imide– Kapton cables with 3 Cu layers