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Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel (Alkoxide – based) MOD Inorganic routes Stages of CSD Ink-jet printing: parameters to control Solutions for ink-jet-printing

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Page 1: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Outline

Introduction

Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films

Solutions for CSD: overview of synthetic approaches

Sol-gel (Alkoxide – based)

MOD

Inorganic routes

Stages of CSD

Ink-jet printing: parameters to control

Solutions for ink-jet-printing

Page 2: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Introduction

- History

Optical coatings on glass

TiO2/Pd, SiO2/TiO2

-Schott: Geffcken, Berger (1939)

Dislich (1971)

Electronic ceramic films

PT/PZT/PLZT

- S. R. Gurkovich, J. B. Blum, (1984).- K. D. Budd, S. K. Dey, D. A. Payne, (1985).

1985

Page 3: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Applications of Films and Coatings

Optical (antireflective, absorbing, ...)

SiO2, SiO2/TiO2, TiO2/Pd (IROX)

Protective (corrosion or abbrasion resistance, adhesion passivation, planarization,..)

SiO2, ... ORMOSIL (Schmidt, 1986)⇨

Electronic

Dielectric: (Ba,Sr)TiO3 - BST

Ferroelectric: (Pb(Zr,Ti)O3-PZT, SrBi2Ta2O9 - SBT)

Piezoelectric: ZnO, PZT

Pyroelectric: PbTiO3, Ti-rich PZT

Sensors: TiO2

HTSC: YBa2Cu3O7 - YBCO

Conductive / semiconductive : LaNiO3, (La,Sr)CoO3, La-ruthentates, RuO2,

ITO (90% In2O3, 10% SnO2 by weight), In2O3–ZnO, …

...

• Chemical homogeneity• Crystallinity (if

crystalline: phase and orientation

• Microstructure • Functional response

Page 4: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Chemical Solution Deposition (CSD) routes

⇨Organic routes

⇨Sol-gel (pure) alkoxide-based

alkoxide + salt/oxide

⇨Metalloorganic decomposition (MOD)

⇨Routes involving polymers: in-situ polymerisation (‘Pechini’), polymer precursor route

Metal ions are homogeneously distributed in the organic network and coordinatively bonded by polymer’s functional groups.

⇨ Inorganic routes (nitrates, citrates, peroxo- compounds)

Stability of water based solutions of different metal ions.

REACTIVE

NON-REACTIVE

Page 5: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

CSD processing steps:

Synthesis ofprecursor solution (‘Sol’)

Coating

‘Gel’ film

Drying, pyrolysis

Amorphous oxide film

Crystallization

Crystalline film

20 30 40 500

20

40

60

80

100

120

Int.

(p

.e.)

2-theta(o)

substrate

substrate

substrate

Page 6: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Alkoxide based sol-gel route

Precursors:

• Metal alkoxides M(OR)n

For M = transition metal

• High reactivity of TM(OR)n towards water

• Tendency to increase the coordination number oligomerization⇨

• Metal - acetates - nitrates - oxides (problem of solubility)

Ti(OR)4, R: n-Pr, n-Bu

Z = 4

N = 5

Babbonneau et al., 1988.

Page 7: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Reactive solvents:

alkyl-alcohols (R-OH)

ether-alcohols: R-O-(CH2)n-OH

poly-alcohols (diols, triols): 1,3 propanediol

methanol/acetic acid

CH2-OH

CH2

CH2-OH

CH3-O-C2H4-OH

Turova, Turevskaya, Kessler, Yanovskaya, 2002.

2-methoxyethanol

Page 8: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Two major reactions (shown for one alkoxide group):

Hydrolysis: M-OR + HOH M-OH + ROH

Polycondensation: M-OR + M-OH M-O-M + ROH

M-OH + M-OH M-O-M + HOH

Building blocks of the inorganic network.

Oxo-bridge

Heterometallic systems:

Reaction between: two alkoxides

TM alkoxide and a metal salt (acetate, nitrate).

Ester elimination:

-[Pb-CH3COO] + [RO-TM] -[Pb-O-TM] + R-OOC-CH3

oxo bridge

PZT: S. R. Gurkovich, J. B. Blum, 1984. K. D. Budd, S. K. Dey, D. A. Payne, 1985.

Page 9: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Alkoxide based sol-gel route

+: starting compounds for a wide range of metals

possibility to tailor the reactivity of the starting compounds

effective solvents

easy synthesis of different heterometallic solutions

solutions are suitable for film deposition (viscosity, wettability)

-: reactive starting materials

inert atmosphere (dry-box, Schlenk glassware)

toxic solvents

syntheses require some knowledge of chemistry

sometimes products with stoichiometries ≠ target material

Page 10: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

MOD route

Precursors: large metal carboxylates R-COO- or b-diketonates R-CO-CH2-CO-R’

Ba, Pb ethylhexanoate (CH3-(CH2)6-COO-)

Zr neodecanoate (CH3-(CH2)8-COO-), Zr acetylacetonate (CH3COCHCOCH3-)

Ti di-methoxydineodecanoate (Ti(CH3C2H4O)2(CH3-(CH2)6-COO)2

Zn naphtenate (= salt of cyclic carboxylic acid obtained from petroleum, MW ~200)

Solvents: Non-polar: toluene (methyl-benzene), xylene (di-methyl-benzene),...

Polar: alcohols, alcohol/carboxylic acid, ...

Mixing at RT.

No reaction between the starting chemicals.

No reactive reagents (no need for protective atmosphere).

Variables: chemicals, solution concentration.

R. W. Vest, J. Xu, 1988 Hoffman, Klee, Waser, 1995

Page 11: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Water – based solutions for CSD

Heterometallic systems: problems with common solubility of different metal species.

To overcome such problems, water-based heterometallic solutions often contain coordinating ligands, such as:

-acetato

-nitrato

-carboxylato

-peroxo.

Page 12: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Depending on the pH of the solution the equilibrium between three types of solvated species is established (hydrolysis of metal ions – shown for one group):

[M-(OH2)] z+ [M-(OH)] (z-1)+ + H+ [M=O] (z-2)+ + 2H+

Aquo- Hydroxo- Oxo- ligands

The type of the complex depends on:

Z

CN

pH

Z = 4

(Ti, Zr)

0 2 4 6 8 10 12 140

2

4

6

8

O2-

H2O

Z

pH

OH-Z = 4

(Ti, Zr)

0 2 4 6 8 10 12 140

2

4

6

8

O2-

H2O

Z

pH

OH-

Transition metal ions (La3+, Ti4+, Zr4+, Nb5+, etc.) in water are solvated by water molecules:

H H z+

Mz+ + :O M O

H H

H H z+

Mz+ + :O M O

H H

Aquo-ligand

(H2O)n-1 - (H2O)n-1- Z: oxidation number

CN: coordination number

Page 13: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Thin film deposition methods:

Dip coating Spin coating Spray coating

Substrates:• Single crystals: sapphire (A, C, R), SrTiO3 (100), ...• Ceramics (Al2O3)

• Pt (/TiO2)/SiO2/Si -

Pt typically strongly (111) oriented • Metal foils (Cu)• Glass

Variables:• Solution concentration• Viscosity• Volatility• Surface tension• Wetting

• Deposition• Spin-up• Spin-off• Evaporation

Four stages:

Page 14: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Processes/reactions taking place in the as-deposited ‘gel’ film

Solvent evaporation strong ⇨concentration of solute species ⇨viscosity increases.

‘Physical’ aggregation: = concentrating of solute species. (MOD)

‘Chemical’ aggregation: Promoted polymerisation or polycondensation (= more cross-linking) leads to a gel. (Alkoxide sol-gel)

Viscosity increases

Efficiency of ‘packing’ depends on branching of solute species (linear or branched).

Thickness of a deposited film depends on solution properties and deposition conditions. Typically it is in the range a few 10 nm - 100 nm.

Page 15: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Processes taking place upon heating

Drying Pyrolysis Crystallization

100- 200 oC 350 – 450 oC 400 – 800 oC

Evaporation of the trapped solvents

Dehydroxylation: removal of –OH groups from the network (continued polycondensation – alkoxide route)

Thermolysis/pyrolysis: decomposition/oxidation of functional (organic/carbonate) groups

Structural rearrangement: - film shrinkage- change of coordination environment- long-range ordering

Two-step:

One-step:

Page 16: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

(Ba,Sr)TiO3 (BST): Pb(Zr,Ti)O3 (PZT) Homogeneous nucleation Heterogeneous nucleation- Granular micorstructure - Columnar microstructure

Crystallization and evolution of microstructure:

Nucleation and growth from the amorphous phase

100 nmAl2O3

BST

100 nmAl2O3

BST

Page 17: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

DIMATIX ink-jet printer

http://www.dimatix.com

Requirements for the ink (given by the producer):

• Viscosity = 10 to 12 m Pas• Surface tension = 28 to 32 mN/m

How to adapt the CSD-solution for ink-jet printing?How to adapt the CSD-solution for ink-jet printing?

Page 18: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

To realise the ink-jet printing and to obtain uniform and

crack-free 1D/2D structure.

Ink stability

Viscosity

Surface tension

Concentration of the solution

Wettability on the substrate

Deposition parameters

- Temperature of the cartridge

- Temperature of the substrate

- Drop spacing

- Cleaning of the substrate

Heating

Des

ign

of t

he in

kP

rintin

g pr

oced

ure

Parameters to controlParameters to control

Page 19: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

In2O3/ZnO(IZO) CSD-solutionIn2O3/ZnO(IZO) CSD-solution

2MOE

Dissolution

In isopropoxide

Zn acetate

dissolution

Clear and stable solution

C=0.25M

Alkoxide and acetate based solution in 2-methoxyethanol

J. Tellier et al., submitted.

Polymer

IZO, 4 deposited layers, 1h at 150°C in air after each deposition

0.5 mm

Silicon

Page 20: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Printing the CSD-solutionPrinting the CSD-solution

OMInk-jet printing of IZO designed for spin coating1 layer, annealing at 150oC 10 minutes

Low viscosityBad coverageCracks (too thick)

Solution of IZO in 2-methoxyethanol, C=0.25M

How to modify the solution ?

• Increase of the viscosity by adding a viscous solvent in the right proportion (1,3

propanediol) and also modify the surface tension• Decrease the thickness by diluting• Keep the stability of the original solution

Page 21: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Fluid parametersFluid parameters

R. Noguera et al, Journal of the European Ceramic Society (2005)

Range 5-20 mPas and 35-40 mJ/NWeber numberAdimentional number, related to surface tension

v: speedr: distancer: volume weights: surface tension

Reynolds numberAdimentional number, related to viscosity

v: speedr: distancer: volume weightn: cinematic viscosityh: dynamic viscosity

rv

We** 2

rrv ***

Re

r

We

**Re

r: nozzle diameterr: ink densityh: dynamic viscositys: surface tension

Proper formation of drops

Page 22: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Increase of viscosityIncrease of viscosity

0

5

10

15

20

25

30

35

40

45

0 0,2 0,4 0,6 0,8 1

1,3-propanediol

Vis

cosi

ty (

mP

as)

2022242628303234363840

0 0,2 0,4 0,6 0,8 1

1,3-propanediol

Su

rfac

e te

nsi

on

(m

N/m

)

Properties of the solvent have a strong influence on the ink properties

Different 2-metoxyethanol

(2MOE) / 1,3-propanediol

(13PD) volume ratios

Stalagmometer

Room temperature measurements

Page 23: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Design of IZO ink viscosityDesign of IZO ink viscosity

Optimum : 2MOE / 13PD: 45 / 55

(x) 13PD - (1-x) 2MOE

25

20

15

10

0 0.2 0.4 0.6 0.8 1

Vis

cosi

ty (

mP

as)

0

5S

urf

ace

tens

ion

(mN

/m)

(x) 13PD - (1-x) 2MOE

40

36

32

28

0 0.2 0.4 0.6 0.8 120

24

Solvent Viscosity (mPas)2MOE 3.413PD 41.5

Solvent system: 2-methoxyethanol (2MOE) / 1,3-propanediol (13PD)

Page 24: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Printing the modified solution (ink)Printing the modified solution (ink)

C=0.5M t=150 nm C=0.25M t=50 nm

Decrease of concentration

C=0.25M t=400 nm C=0.05M t=50 nm

PZT thin films obtained by spin coating

500µm

• Cracks (measured thickness 400 nm)• Random nozzles clog• Film not continuous

150°C

Possibility to form a single drop

Solution of IZO in 2-methoxyethanol + 1,3-propanediol (45/55), C=0.25M

Decrease concentration

IZO thin films obtained by ink jet printing

Decrease of concentration

Page 25: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

Wettability of IZO inkWettability of IZO ink

Contact angle:

Glass = 42.5°

SiOx/Si = 27.6°

PEN = 24.1°

Viscosity h = 9.6 mPas

Surface tension g = 34.5 mN/m

Solution of IZO in 2-methoxyethanol

+ 1,3-propanediol

Contact angle : high enough to ensure a good resolutionContact angle : high enough to ensure a good resolution

ImageJ software: drop_analysis (Drop Snake)

Page 26: Outline Introduction Basics of Chemical Solution Deposition (CSD) of functional–oxide thin films Solutions for CSD: overview of synthetic approaches Sol-gel

References (and source of the majority of figures): :

C. J. Brinker, G. W. Scherer, Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing, Academic Press, San Diego, 1990.

M. Ohring, Materials Science of Thin Films, 2nd ed., Academic Press, San Diego, 2002.

R. Waser (Ed.), Nanoelectronics and Information Technology, Wiley-VCH, Weinheim, 2003, P. Erhart, Film Deposition Methods, pp. 201 – 221.

R.C. Buchanan (Ed.), Ceramic Materials for Electronics, 3rd ed. Marcel Dekker, New York, 2004, A. I. Kingon, P. Muralt, N. Setter and R. Waser, Electroceramic Thin Films for Microelectronics and Microsystems, pp. 465 – 526.

G. Cao, Nanostructures and Nanomaterials, Imperial College Press, London, 2004.

C. N. R. Rao, A. Mueller, A. K. Cheetham, The Chemistry of Nanomaterials (Vol. 1), Wiley, Weinheim, 2004.

Acknowledgements

Colleagues from Electronic Ceramics Department, Jožef Stefan Institute.

Slovenian Research Agency (P2-0105)

EU 6FP project MULTIFLEXIOXIDES (NMP3-CT-2006-032231).