plasmonic imaging for optical lithography x-ray wavelengths at optical frequencies
DESCRIPTION
Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies Experiments: Progress and Plans Yunping Yang Josh Conway Eli Yablonovitch. The Problem. Classically the resolution limit is determined by the Rayleigh Criterion: - PowerPoint PPT PresentationTRANSCRIPT
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Plasmonic Imaging for Optical Lithography
X-ray Wavelengths at Optical Frequencies
Experiments: Progress and Plans
Yunping YangJosh Conway
Eli Yablonovitch
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The Problem
Classically the resolution limit is determined by the Rayleigh Criterion:
Various schemes have been developed to push this to finer resolution than the wavelength itself, but the scale will always be set by wavelength
dSin
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Constant Energy CurvesBy adiabatically tapering the thin film thickness,
very small (<50nm) plasmon wavelengths are attainable for in plane imaging.
0 20 40 60 80 1000
100
200
300
400 1.5 eV
2.0 eV
2.5 eV
0
100
200
300
20 40
400
60 80
Plas
mon
Wav
elen
gth
in n
m
Silver Film Thickness in nm
Silver Film on Sapphire
t
p
SapphireAg Air
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0 0 . 0 2 0 . 0 4 0 . 0 6 0 . 0 8 0 . 1 0 . 1 2 0 . 1 4 0 . 1 6 0 . 1 8 0 . 2 0 . 2 2 0 . 2 4 0 . 2 6 0 . 2 8 0 . 3 0 . 3 2 0 . 3 4 0 . 3 6 0 . 3 8 0 . 4 0 . 4 2 0 . 4 4 0 . 4 6 0 . 4 8 0 . 5 0 . 5 2 0 . 5 4 0 . 5 6 0 . 5 8 0 . 6 0 . 6 2 0 . 6 4W a v e n u m b e r ( r a d / n m )0
0 . 5
1
1 . 5
2
2 . 5
3
3 . 5
4
w(eV)
t=1nm
t=20nm t=5nmt=2nm
0 0.1 0.2 0.3 0.4 0.50
1
2
3
4 200 100 50 20 15 30 40 10
0.6
Plasmon Wavelength in nm
Plasmon Wave-Vector (2/wavelength in nm)
Plas
mon
Ene
rgy
in e
Vh
k
t=thickness of metal film
Optical frequencies, but with X-ray wavelengths!
SapphireAg Air
Dispersion Relation: Constant Thickness Curves
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Grating Coupler
Silver
Glass
Grating
• Design and fabricate gratings to maximize the coupling efficiency;• Verify the DR with constant thickness;• Find some material parameters
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Launching of Surface Plasmons: ATR Coupler
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Optical Setup for ATR Coupler
Laser/2
PBS
BeamExpander
Iris Mirror
Detector Lens LensLens
Lens
4f
4f
SapphireHemisphere
Ag Thin Film
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Optical Setup for ATR Coupler
• Characterize thin film, such as roughness, thickness;• Experimentally verify the dispersion relation;• Launching a standing wave for Plasmon Wavelength Measurement
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A Possible Solution
This permits X-ray wavelengths at optical frequencies
photoresistsilicon
light h=2.5eV
plas
mon
wav
epl
asm
on w
ave
sapphire plas
mon
wav
e+
++
+-
--
-
sapphire plas
mon
wav
e+
++
+-
--
-
grat
ing
coup
ler
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Plasmon Wavelength Measurement
Antonello Nesci, Rene Dandliker, Hans Peter Herzig, “Quantitative amplitude and phase measurement by use of a heterodyne scanning near-field optical microscope,” Optics Letters, Volume 26, Issue 4, 208-210.
Resolution: 1.6 nm
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Taper Motivation
dimple lens
out-coupling slot
far-field fromconventional lens
taper
Taper design will be a trade
between absorption
(joule heating),
scattering (an adiabatic
profile), and maintaining a high enough
effective index at all points of
propagation to maintain
features
n9> n8> >n1>n0
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Criteria
0 50 100 1500.0
0.1
0.2
0.3
0.4
Loss
/
Wavelength (nm)
It is clear that Loss/ becomes
prohibitively large at
short wavelengths
Thus we change are adiabatic criteria
accordingly
/ = constant
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Length (nm)
Silv
er F
ilm T
hick
ness
(nm
)
100 200 300 400 500 600
10
20
30
40
50
60
Taper Profile