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Probing Strategies for Through-Silicon Stacking
Eric Strid, Ken Smith, Peter Hanaway, Reed Gleason Cascade Microtech – Beaverton, Oregon
Abstract
• Abstract: Wafer-level screening of die for through-silicon stacking requires various wafer probing strategies, depending upon the application. Probing on microbumps will generally be necessary for screening ICs as their complexity increases, to adequately power the IC, run at-speed or analog tests, check through-silicon via (TSV) connectivity, run parametric tests on I/O drivers, etc. Test throughput and cost can benefit from contacting many more I/Os available at the microbumps vs. limiting test access to larger test pads. Probe cards will need to scale down pitch, tip forces, and cost per area; and practical examples of each are demonstrated. The likelihood of standard microbump footprints favors MEMS probe cards. More footprint standardization is possible and would be beneficial.
Probing Strategies for TSS
• Motivation
• Some 3D-TSV applications and test options landscape
• Status of probe technology for microbumps data
• Standards would make life much easier speculation
• Conclusions
Motivation
• Variety of stack architectures and
• Unknown IC and stacking yields beget – A variety of potential test strategies, which imply – Highly uncertain test requirements
• Waiting for the market to form does not allow enough development time
How can infrastructure players mitigate these uncertainties?
What puzzle pieces can we fill in?
The Silicon Stacking Revolution • Pent-up demand for more connectivity and lower power
• Expect 10X, then 100X or 1000X more I/Os per die
• Test and probing solutions are truly at a crossroads – Test strategies and tools must address the explosion in I/O count,
with no decrease in test coverage and no increase in test cost per circuit function
– Some sort of probing will be necessary for KGD
– Probe card mechanics must be scaled to smaller pitches and forces
– Probes must address the tighter pitches and higher pincount, even if the signal count does not increase
– Probing must be compatible with bonding processes
Probing Strategies for TSS
• Motivation
• Some 3D-TSV applications and test options landscape
• Status of probe technology for microbumps data
• Standards would make life much easier speculation
• Conclusions
TSV Application: Stacked Memory Dice
• Memory ICs stacked with TSVs under the bond pads • 70-100 um pitch • KGD test: conventional probing by memory vendor • Logistics: OSATs or IDMs thin, add TSVs (vias-last), stack, test
Face
Back
3D-TSV DRAM Device Test Flow
8 R7 Sept 29, 2011
Burn-In
Sort (s1)
Sort (s2)
Laser Repair
High-Speed Sort (s3)
Die Stacking
Burn- In
Final Test Ship
Wafer-Level Test 3D “Package” Test
Uses Aluminum Sacrificial Pads
On Die
or
Highest Yield by Probing TSV
Highest Yield by Probing TSV
“Traditional” Memory Probe Card
TSV Probe Card
KGD Bare Die
Socket
KGS Socket
• Memory IC stack (cube) is stacked onto a low-power ASIC
• ASIC KGD test: Conventional probing on solderballs pre-thinning
ASIC (processor)
Memory Memory “Cube”
• Probe the TSVs to test continuity? (on carrier wafer?)
• Stack test: Probe the stack? After package?
• Memory KGD test: Extra pads & BIST for conventional probing • Known-good cube test: D2W? Cube handling? Test on extra pads?
TSV Application: Memory Cube on ASIC
TSV Application: 2.5D Interposer • Higher yields from sorted, smaller die
• More and shorter interchip I/Os, lower power and latency
• Better power integrity from capacitance in the interposer
• KGD test: Must probe the microbump pads
• Interposer test: Pray or some level of opens-shorts testing
Heatsinking
Die 1 Die 2
Passive interposer
TSV Application: DRAM for ASIC/MPU • Memory IC stacked F2F onto a high-power processor
– Vias-mid through the RAM to conventional flip-chip at ~150 um pitch • ASIC KGD test: Must probe the TSV pads; RAM pads optional • Memory KGD test: Extra pads & BIST or probe the microbumps • Stack KGD: Probe the solderballs conventionally • Logistics: Many questions
Heat sink ASIC (processor)
Package PCB
Memory
⇒ Microbump probing necessary to power & test the ASIC and may be necessary to power and test the RAM
Future: Multi-function Stacks • Logic, SoC, memory, sensor functions stacked with vias-mid
– Potential to become the new PCB • KGD test: Probing the TSVs or microbumps will maximize power
integrity, test coverage, and test throughput • Other approaches
– Probe microbumps on one side for scan or functional test – Probe TSVs on backside for leakage and connectivity – Self-test and self-heal
Power control Memory
⇒ TSV or microbump probing likely necessary for KGD
Logic Sensor
Probing Strategies for TSS
• Motivation
• Some 3D-TSV applications and test options landscape
• Status of probe technology for microbumps data
• Standards would make life much easier speculation
• Conclusions
3D Probing Requires Lower Tip Forces
Force per tip
(gf)
Array Pitch (um) 400 200 100 50 25 12 800 6 3 1600
Spring pins
Conventional probe cards
20
10
5
2
1
0.5
0.2
15
Scaling a Probe Card Technology
100 um pitch ~10 gf/tip
35 um pitch ~1 gf/tip
• Decrease XYZ dimensions by K • Same materials • Decrease Z motions by K • Force per tip decreases by K2; tip pressure constant
3D Probing Requires a New Cost Structure
Price per pin
DRAM & Flash
Logic/SoC
Technology must be printed, repairable, scalable, compliant Array Pitch (um)
400 200 100 50 25 12 800 6 3 1600
Contact Resistance Proven
Lifetests
Gold Copper Tin
Probe Mark Size and Uniformity
Maximum depth 100 nm Maximum berm 500 nm
Highly uniform
Compatible with thin Au
Routing the New Pitches
• Fully-routed 40/50 um pitch • New space transformer technologies
Probing Strategies for TSS
• Motivation
• Some 3D-TSV applications and test options landscape
• Status of probe technology for microbumps data
• Standards would make life much easier speculation
• Conclusions
Standard Pad Locations Change the Game • Required for vendor interchangeability
• Standard physical specs for pads required—materials, thicknesses, flatness, etc.
• Standard pad locations enable standard test tooling
Pad locations must survive shrinks Pad
area High-power ICs can use extra P and G pins all over the die ⇒ I/Os are in center instead of periphery
Number of Pads vs. Time • Driven by I/O bandwidths
– Processors need ~10X every four years – Speed of DRAM cells doesn’t scale
• TSV density ~4X every three years? • I/O counts not compatible with incumbent ATE
– Test bandwidth limited by scan methods
2012 2015 2018
Array pitch (um) 40 20 10
# pads in 4X4 mm area 10k 40k 160k
# pads in 8X8 mm area 40k 160k 640k
A Brave New World of Standard Interconnects?
• Through-silicon stacking eliminates the pitch limitations of assembly and packaging processes
• Inter-tier connections clustered in middle of die
• So why not adopt standard pitches? – Facilitates standard I/O cells – Facilitates stacking by having interconnects in standard
places – Facilitates test tooling
• How would that work?? – Like every connection on a 40 um grid—or 30, 20, 10 – Standard pad locations for powers and grounds – Lots of pads enable layouts to skip unused pads – Is a general-purpose tiling pattern practical?
Could Standard Pad Locations Enable Stacking Anything on Anything? • Example: RF on power management on memory on processor • All with the same pad pattern? • Dense enough for ultra-wide memory • Plenty of extra pads everywhere
– Standard pattern for powers & grounds – Programmable or redundant I/Os – Network on chip pad areas
NoC cluster
DRAM cluster
Sea of pads elsewhere Issues: Removing heat! Overhead of TSV pass-throughs
Pad Area Example
Probing Strategies for TSS
• Motivation
• Some 3D-TSV applications and test options landscape
• Status of probe technology for microbumps data
• Standards would make life much easier speculation
• Conclusions
Conclusions • TSS will create many new opportunities and
problems in test, but uncertainties abound
• Optimal test strategies will depend upon the application, assembly flow, and various yields
• Increasing complexity of applications will require probing of the TSVs or microbump pads
• Practical probe cards are capable of 40 um pitch and tip forces below 1 gram-force
• Pad damage at these low forces is extremely small with scrub marks less than 100 nm deep
• Probing on TSVs or microbumps appears to be viable
Potential Standards
• Standard assembly and test flows
• Standard bonding processes, specs
• Standard footprints – Defacto footprint standards from JEDEC memory
footprints
– More general stacking standards?