process for inducing porosity in an abrasive

1
Method for Making Abrasive Grain U.S. Patent 5,429,647. July 4, i995 HA. Larmie, assignor to Minnesota Mining and Manufacturing Co, St. Paul, Minn. A nlethod of prepanng abrasive grain, comprising preparing a dispersion compris- ing alumina hydrate and a sufficient amount of a sol of ceria particles to provide an abra- si\e _qain having greater than 0.5% by weight ceria. wherein at least 97% by weight of the ccl-ia particles are less than 0.5 mi- cromerer in size; forming alumina base grits fr(w, the dispersion; and nintering. Process for Inducing Porosity in an Abrasive U.S Patent 5,429,648. July 4, 1995 M Wu, assfgnor fo Norton Co.. Worcester, Mass. A process of manufacturing an abrasive an~cle compnsing forming an unfired art- clc comprising a polymer resin. a vitreoub bond, and an abrasive. and firing thereby drcomposing the polymer resin and form inp a porous abrasive article. Vacuum Coating Device US. Patent 5,429,705. July 4, 1995 P Mahler and W. Stang, assrgnors to Leyboid AK, Hanau, Germany An apparatus for coating and/or etching substrates in a vacuum chamber. Sputtering Target U.S. Patent 5,426,882. Ju!y 4. 1995 D.M. Makowiecki el a/., assjgnors to The Regents of fhe University of Calrfomia, Oakland, Calrf. A process for the fabrication of alumi- num metallixed pyrolytic grapbitc sputter- ing targets. Dual Air Supply Spray Gun U.S. Patent $429,307. Ju& 4, 1995 J.B Darroch. assignor to Apollo Sprayers lntemational inc., Vista, Cakf A spray gun suitable for use with both high-volume, low-pressure (HVLP) and high pressure air sowxs for atomizing liq- uids. We’ve Got the Power! Rameo ha8 reinvented the multi stage cleaning console. Born @ona the industrial factory floor, not a laboratory, and built for production. We started rnth a heavy gauge stainless steel tank ( 7ga. and 12ga.j and added a transport elevator to each stage to take the work in and out of solution automatically. * WC added a versatile oscillation package to each elevator that could move the workload within all zones of the cleaning chamber. * We designed the system to be easily senwed with parts (pumps. motors, filters, pneumatics, electric, etc.) outside the console, not tucked under “acce~s~ pan&. And then we added power- * Powerful turbulence created by cast stainless steel high volume pumps and multiple inlectors drected at the work zone. * An ~wesc~me sweep frequency ultrasonic system combined with our oscillating elevator to move the work through the wave energy ?? An air knife blow-off drxr usine the elevator to cut in and out of the high volume Aot air &ream for rapid drying without excessive heat. * And a revolutionary “cable ready” transfer system that moves all baskets through all stages, all at the same time. Circle 065 on reader Information card Sputtering Apparatus U.S Patent 5429.729. July 4, 1995 M. Kame, and E. Setoyama, assignors to Hitachi Ltd.. Tokyo A method for exchanging a target elec- trode in an in-line sputtering apparatus. Platina Device U.S. Pafe;;t5,429.733. Sly 4, 1995 H. Ishrda, assrgnor to Elecfroplaling Engrneers of JapanLId., Tokyo A de\ ice for plating a wafer in which the lower surface of the circumferential edge of the wafer is held by a holding means onlo a posittoning base portion formed in an opening portion of a plating bath and a plating fluid is applied onto the lower SW face of the wafer- for plating. characterized in that the holding means comprises an air bag, which is adapted to constrain only the upper surface of the circumferential edge of the wafer at an expanded state and re- leases the constraint by contracting to re- store an initial configuration at a nonex- panded state hMSf CO& CFC-free fully-automated parts cleaning system .he Vector is a high throughput ultrasonic cleaning system that icorporates a combination of the most effective cleaning tech- lotogles available (pat. #4,409,999). Baskets are processed III IO- nmute intervals. Deslgned for parts larger than 3” In size, the Vector bliminatesthe inefficiencies commonly found in fully-automated multi- ankcleaning systems. Initial and operating costsare lowerthan any ompetitive system. Contact Zenith for details. Zenith Ultrasonics, Inc. I 85 Oak Street, Nomood, NJ 07648 201-767-l 332 I 600.432.SONICS I FAX 201-768-6999 Circle OS2 an reader Information card METAL FINISHING . MARCH 1996 95

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Page 1: Process for inducing porosity in an abrasive

Method for Making Abrasive Grain U.S. Patent 5,429,647. July 4, i995 HA. Larmie, assignor to Minnesota Mining and Manufacturing Co, St. Paul, Minn.

A nlethod of prepanng abrasive grain, comprising preparing a dispersion compris- ing alumina hydrate and a sufficient amount of a sol of ceria particles to provide an abra- si\e _qain having greater than 0.5% by weight ceria. wherein at least 97% by weight of the ccl-ia particles are less than 0.5 mi- cromerer in size; forming alumina base grits fr(w, the dispersion; and nintering.

Process for Inducing Porosity in an Abrasive U.S Patent 5,429,648. July 4, 1995 M Wu, assfgnor fo Norton Co.. Worcester, Mass.

A process of manufacturing an abrasive an~cle compnsing forming an unfired art- clc comprising a polymer resin. a vitreoub bond, and an abrasive. and firing thereby drcomposing the polymer resin and form inp a porous abrasive article.

Vacuum Coating Device US. Patent 5,429,705. July 4, 1995 P Mahler and W. Stang, assrgnors to Leyboid AK, Hanau, Germany

An apparatus for coating and/or etching substrates in a vacuum chamber.

Sputtering Target U.S. Patent 5,426,882. Ju!y 4. 1995 D.M. Makowiecki el a/., assjgnors to The Regents of fhe University of Calrfomia, Oakland, Calrf.

A process for the fabrication of alumi- num metallixed pyrolytic grapbitc sputter- ing targets.

Dual Air Supply Spray Gun U.S. Patent $429,307. Ju& 4, 1995 J.B Darroch. assignor to Apollo Sprayers lntemational inc., Vista, Cakf

A spray gun suitable for use with both high-volume, low-pressure (HVLP) and high pressure air sowxs for atomizing liq- uids.

We’ve Got the Power! Rameo ha8 reinvented the multi stage cleaning console. Born @ona the industrial factory floor, not a laboratory,

and built for production. ’ We started rnth a heavy gauge stainless steel tank ( 7ga. and 12ga.j

and added a transport elevator to each stage to take the work in and out of solution automatically.

* WC added a versatile oscillation package to each elevator that could move the workload within all zones of the cleaning chamber.

* We designed the system to be easily senwed with parts (pumps. motors, filters, pneumatics, electric, etc.) outside the console, not tucked under “acce~s~ pan&.

And then we added power- * Powerful turbulence created by cast stainless steel high volume

pumps and multiple inlectors drected at the work zone. * An ~wesc~me sweep frequency ultrasonic system combined with our

oscillating elevator to move the work through the wave energy ?? An air knife blow-off drxr usine the elevator to cut in and

out of the high volume Aot air &ream for rapid drying without excessive heat.

* And a revolutionary “cable ready” transfer system that moves all baskets through all stages, all at the same time.

Circle 065 on reader Information card

Sputtering Apparatus U.S Patent 5429.729. July 4, 1995 M. Kame, and E. Setoyama, assignors to Hitachi Ltd.. Tokyo

A method for exchanging a target elec- trode in an in-line sputtering apparatus.

Platina Device U.S. Pafe;;t 5,429.733. Sly 4, 1995 H. Ishrda, assrgnor to Elecfroplaling Engrneers of Japan L Id., Tokyo

A de\ ice for plating a wafer in which the lower surface of the circumferential edge of the wafer is held by a holding means onlo a posittoning base portion formed in an opening portion of a plating bath and a plating fluid is applied onto the lower SW face of the wafer- for plating. characterized in that the holding means comprises an air bag, which is adapted to constrain only the upper surface of the circumferential edge of the wafer at an expanded state and re- leases the constraint by contracting to re- store an initial configuration at a nonex- panded state

hMSf CO& CFC-free fully-automated

parts cleaning system

.he Vector is a high throughput ultrasonic cleaning system that icorporates a combination of the most effective cleaning tech- lotogles available (pat. #4,409,999). Baskets are processed III IO- nmute intervals. Deslgned for parts larger than 3” In size, the Vector bliminates the inefficiencies commonly found in fully-automated multi- ankcleaning systems. Initial and operating costsare lowerthan any ompetitive system. Contact Zenith for details.

Zenith Ultrasonics, Inc. I 85 Oak Street, Nomood, NJ 07648 201-767-l 332 I 600.432.SONICS I FAX 201-768-6999

Circle OS2 an reader Information card

METAL FINISHING . MARCH 1996 95