Process Gas AnalyzerSensitive, real-time monitoring for end-point detection,plasma diagnostics, and process improvements

Multi-Elemental Analysis for ALD Process OptimizationAtomic Layer Deposition of Al₂O₃ with TMA and H₂O*

Evolution of MS spectra during TMA and H2O pulses*ALD equipment provided by EMPA / Swiss Cluster

• Real-time, simultaneous detection of allrelevant compounds

• Continuous monitoring of the evolution ofby-products and precursors in every depositioncycle

• Ar2+ ions (carrier gas) are suppressed with theuse of a notch filter

Time evolution of relevant species

Sensitive, Real-Time Monitoring of Etch ProcessesCF4 Plasma Etching of Si*

Time evolution of relevant species,effect of O₂ addition on the etch rate

Silicon etching in a CF₄ and O₂ plasma*ETCH equipment provided by EMPA

• Real-time monitoring of the evolution of etch gases and all reaction products• Plasma diagnostics based on traces of plasma species• High dynamic range permits monitoring of both abundant and trace level compounds• Sub-monolayer sensitivity• Process fluctuations are easily detected (e.g. instability in plasma gas flow rates)

Process GasMonitoring and

Control

• Ready for diverse semiconductor applications Reactor health state (RHS) monitoring, end-pointdetection, plasma diagnostics and process optimization

• Fast and sensitive mass spectrometric monitoring TOF mass analyzer enables real-time monitoring allprocess species with isotopic mass resolution at sub-second refresh rates

• Large dynamic range Simultaneous detection of all precursors, byproducts and trace species insemiconductor processes

• Robust and mobile Rugged, flexible configuration allows precision in harsh environments andportability for non-invasive detection

• Long-term stability Accurate and reproducible response

• Powerful software Simple control interface with a fully documented API for system integration

• Background reduction with notch filter technology Attenuate specific abundant species to controlmass spectral interferences

The pgaTOF mass spectrometeris a sensitive, real-time analyzerfor monitoring and control in critical semiconductor applications

Specifications

CorrosiveResistant

Operate inAny Position

Resolving Power(M/dM)

Size(cm)

Mass(kg)

pga TOF R

pgaTOF 2R

pga TOF S2

no*

yes

yes

yes

yes

yes

4000

8000

800

90 x 40 x 53

148 x 48 x 62

112 x 47 x 47

85

160

93

pga.info@tofwerk.com tofwerk.com

*corrosion resistant version readily available*corrosive resistant version readily available