process simulation
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EEE 533 - Semiconductor Device and Process Simulation
EEE 533: Semiconductor Device andProcess Simulation
Spring 2001
Lecture 2
Instructor: Dragica VasileskaDepartment of Electrical Engineering
Arizona State University
EEE 533 - Semiconductor Device and Process Simulation
A. INTRODUCTIONModeling
Representation of the physical structure or behavior of a device by an abstract mathematical model which approximates this behavior:
• closed form expression (analytical model), or • a system of simultaneous equations that are solved numerically.
• Analysis - method by which a complex problem of characterizing the device is resolved into similar component parts which allow the required investigation to be achieved in a near exact manner.
• Device Simulation - more approximate in nature (although this need not always be the case) and frequently takes a phenomenological approach.
• Process Simulation - Numerical simulation of the physical formation of the semiconductor device structure through one or more steps of processing.
* Traditional device modeling has involved a trial and error approach, which is becoming too expensive for ultra-small devices.
EEE 533 - Semiconductor Device and Process Simulation
Solid State Device Models
• Equivalent circuit models:- Based on the electrical performance of the device- Suitable for circuit design applications- Limited in their range of application, since it is difficult to relate the model elements to physical parameters- Not suitable for predicting performance of novel device structures
• Physical device models:- Based on the physics of carrier transport (dc, transient, large signal, and high-frequency operation)- Detailed physical device models require substantial amount of computer time and memory- Physical device models are solved using: bulk carrier transport models, Boltzmann transport models, or quantum transport concepts- Suitable for predicting the performance of complex device structures
EEE 533 - Semiconductor Device and Process Simulation
Hierarchy of Physical Device Models
Quantum Approaches
Boltzmann Equation Monte Carlo ParticleBased Approaches
Moments of Boltzmann TransportEquation (Hydrodynamic and Energy
Balance Approaches)
Drift-Diffusion Approaches
Compact Approaches
EEE 533 - Semiconductor Device and Process Simulation
Validity of the Semiclassical Transport Models
Drift-Diffusion Model: Good for devices with LG>0.5 m Can’t deal with hot carrier effects
Hydrodynamic Model: Hot carrier effects, such as
velocity overshoot, included into the model
Overestimates the velocity at high fields
Particle-Based Simulation: Accurate up to classical limits Allows proper treatment of the
discrete impurity effects and e-e and e-i interactions
Time consuming
LG > 0.5 m
LG < 0.1 m
LG 0.1 m
discrete impurity effects,electron-electron interactions
EEE 533 - Semiconductor Device and Process Simulation
Review of Field Equations
In general, one needs to solve Maxwell’s equations inside and outside the device
t
t
DJH
BE
0
BD
Numerical techniques to solve these equations include:
• Finite Difference Time domain solutions (FDTD)• Frequency domain solutions (spectral techniques)
At present, nearly all device simulation tools assume the quasi-static approximation, such that the electric field is obtained from Poisson’s equation:
VV Err
)()(2
EEE 533 - Semiconductor Device and Process Simulation
V
pqDpqnqDnq
grqt
p
grqt
n
ppp
nnn
ppp
nnn
2
EJEJ
J1
J1
Phenomenological Transport Simulation
Drift-Diffusion Model (zeroth and first-order moments of the BTE):
Continuity equations
Current density equations
Poisson’s equation
Variables n, p, and V solved simultaneously on a mesh. Transport is local, and described by the phenomenological mobility v =(E)E and diffusion coefficient D(E)=kT/q (E) (Einstein relation).
EEE 533 - Semiconductor Device and Process Simulation
Physical Device Simulation
There are two main components in any physical device simulator:
- Characterization of charge motion due to driving forces and diffusion process (transport)
- Fields due to charge distribution and motion
Recessed MOSFET represented on 3D mesh over finite domain (courtesy of S. M. Goodnick)
Initialize Data
Field Solver
Transport Kernel
yes
no Criterionsatisfied?
START
STOP
EEE 533 - Semiconductor Device and Process Simulation
Historical Development of Physical Device Modeling
Closed-form analytical modeling:• Gradual-channel approximation (Schockley, 1952)
Numerical modeling:• Gummel’s 1D numerical scheme for BJTs (1964)• De Mari (1968): 1D numerical model for pn - junctions• Sharfetter and Gummel (1969): 1D simulation for Silicon Read
(IMPATT) diodes• Kenedy and O’Brien (1970): 2D simulation of silicon JFETs• Slotboom (1973): 2D simulation of BJTs• Yoshii et al. (1982): 3D modeling for a range of semiconductor devices
Commercial device simulators:• 2D MOS: MINMOS, GEMINI, PISCES, CADDET, HFIELDS, CURRY• 3D MOS: WATMOS, FIELDAY• 1D BJT: SEDAN, BIPOLE, LUSTRE• 2D BJT: BAMBI, CURRY• MESFETs: CUPID• Particle-based simulators: DAMOCLES• Quantum transport simulators: NEMO