profile measurement of hsx plasma using thomson scattering k. zhai, f.s.b. anderson, j. canik, k....
TRANSCRIPT
Profile Measurement of HSX Plasma Using Thomson Scattering
K. Zhai, F.S.B. Anderson, J. Canik, K. Likin , K. J. Willis, D.T. Anderson, HSX Plasma Laboratory, U. of Wisconsin, Madison
1. Abstract 3. The HSX TS System CalibrationAt the HSX plasma laboratory, a 10 channel Thomson scattering system has been established and is now operational. The system has been absolutely calibrated for density measurement using Raman scattering with nitrogen gas. It is found that for the QHS configuration the electron temperature gradually decreases when we increase the density at a fixed ECRH power and that the whole temperature profile increases with the heating power at a fixed plasma density. The central temperature increases from about 500eV to 950eV while the launched heating power increases from 37KW to 150KW for the QHS configuration plasma with a density of 1.51012cm-3. At the present density and heating power, the difference between the QHS and Mirror mode is not pronounced. Detailed results will be presented at the conference.
*Work supported by US DoE under grant DE-FG02-93ER54222
• The image spot is less than 100 microns for all the ten channels.
• Transmission efficiency of the fiber bundle is around 60%.
• At plasma density of 1012/cm3, the collection lens collects ~20000 photons for each of the ten fibers, which then couple the photons to the ten polychromators through fiber bundles.
3.a Spectrum Dispersion Calibration
4. Experiment Results
4.b QHS Mode vs Mirror Mode
4.e ECH Off-axis Heating
• Ten-Channel HSX TS system for electron temperature and density measurement has been calibrated and is now operational for daily routine service.
• Peaked electron temperature and density profile has been observed for QHS mode. • Temperature increases with ECH heating power at fixed density and decreases as density increase at fixed heating power.• Off-axis ECH heating affects plasma profiles for both QHS and Mirror mode• Signal in different spectral channels indicates the existence of the superthermal electrons.
2.The HSX Device and HSX TS System
Major Radius 1.2 m
Average Plasma Minor Radius 0.15 m
Plasma Volume ~.44 m3
Rotational Transform
Axis1.05
Edge 1.12
Number of Coils/period 12
Magnetic Field Strength (max) 1.25 T
Magnet Pulse Length (full field) 0.2 s
Auxiliary Coils (total) 48
Heating source 28GHz
200 kW
HSX (the Helically Symmetric eXperiment) is a new concept in toroidal stellarators that is operational at the HSX Plasma Laboratory of the University of Wisconsin - Madison. It is the only device in the world that will have a magnetic field structure that has been termed Quasi-Helically Symmetric (QHS)
2.a HSX Parameters
2.b HSX TS System Introduction
The Thomson scattering system installed on Helical Symmetry Experiment (HSX) is a polychromator-type system, which covers the complete plasma cross section, providing a 10-point plasma parameter profile measurement during a single plasma shot. The system consists of a commercial 1J-10nsYAG laser, 10 polychromators from GA, the specially designed collection optics, a CAMAC data acquisition unit, and a controlling computer.
The spectral calibration determines the response of the detection system to a radiation source of constant spectral emissivity. The result of spectral calibration will be used to build a look-up-table for electron temperature measurement.
3.b Absolute Signal Calibration – Raman Scattering
Calibration stable over time.
0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.80
200
400
600
800
1000
Ele
ctr
on
Tem
pera
ture
(eV
)
Radius r/a
37KW 50KW 100KW 150KW
This shows that the whole temperature profile increase with the heating power at the fixed density of 1.51012/cm3. The central temperature increases from about 500eV to 950eV while the heating power increases form 37KW to 150KW.
0.0 0.2 0.4 0.6 0.80
200
400
600
800
0.5x1012
/cm3
1.0x1012
/cm3
1.6x1012
/cm3
2.0x1012
/cm3
Ele
ctr
on
Tem
pera
ture
(eV
)
Radius (r/a)
• QHS mode, 50 kW ECRH heating power
• This result shows that the temperature gradually decreases when we increase the density at a fixed ECRH power.
1.2 1.6 2.0
1.2
1.6
2.0
QHS Mode
Inte
rfe
rem
ete
r d
en
sity
(1
012/c
m3 )
TS density (1012
/cm3)
0.0 0.2 0.4 0.6 0.8 1.00
200
400
600
800
QHS Mirror
Ele
ctro
n te
mpe
ratu
re (
eV)
r/a0.0 0.2 0.4 0.6 0.8 1.0
0.0
0.5
1.0
1.5
2.0
2.5
3.0
3.5
Ele
ctro
n D
ensi
ty(1
012/c
m3 )
r/a
QHS, Interferometer QHS, TS Mirror, Interferometer mirror, TS
0.0 0.2 0.4 0.6 0.80
200
400
600
800
Ele
ctro
n T
empe
ratu
re (
eV)
r/a
TS time at 820 ms TS time at 820.5 ms TS time at 821 ms
0.79 0.8 0.81 0.82 0.83 0.84 0.85 0.86 0.870
0.5
1
1.510/22/04 HSX Mode = QHS AntiClockwise
0.79 0.8 0.81 0.82 0.83 0.84 0.85 0.86 0.87
0
20
40
0.79 0.8 0.81 0.82 0.83 0.84 0.85 0.86 0.870
1
2
Line Average Density (1012
cm-3
)
Stored Energy (J)
ECH Power
0
200
400
600
Te(
eV)
QHS center heating QHS offaxis heating at 0.4
0.0 0.2 0.4 0.6 0.8 1.00.0
0.5
1.0
1.5
2.0
2.5
Ne(
1012
/cm
3 )
r/a
100
200
300
Te
(eV
)
Mirror center heating Mirror offaxis heating at r/a=0.4
0.2 0.4 0.6 0.8 1.00.4
0.8
1.2
1.6
2.0
r/a
Ne(
1012
/cm
3 )
Ratio of signals in different spectral channels
Electron Temperature (eV)
0 500 1000 1500 20000
5
10
15
20
ratio21 ratio31 ratio41 ratio32 ratio42 ratio43
Since the stray light contribution to the first wavelength channel makes the Rayleigh scattering troublesome, we use rotational Raman scattering for density calibration. Nitrogen gas is chosen For safety reason and the second spectral channel extending from 1050 to 1060 nm is used for the calibration, which cover the most Raman scattering power.
The TS signal from spectral channel i, after allowance for channel sensitivity, will be
For the Raman scattering, the scattered light corresponding to the rotational transition J>J-2 is given by
in which
Electron density is then given by
dTa
rLPnS ie
Te
Ti )(),(
20
0
Raman signal from channel i after allowance for channel sensitivity
Principles of Raman Scattering
850 900 950 1000 1050 1100-0.1
0.0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1.0
1.1
ch1 ch2 ch3 ch4 Te=50eV Te=100eV Te=200eV Te=500eV Te=1000eV te=1500eV te=2000eV
Wavelength (nm)
Spectral response function and TS scattering spectrum for different
electron temperature.
Raman Scattering Calibration Results
1045 1050 1055 1060 1065
0.0
0.2
0.4
0.6
0.8
1.0
0.00
0.61
1.22
1.84
2.45
3.06
Ram
an S
catt
erin
g C
ross
Sec
tio
n (
10-3
6 cm2 )
Ch
ann
el 2
sp
ectr
al r
esp
on
se a
nd
R
aman
Sca
tter
ing
lin
e cr
oss
sec
tio
n (
a.u
.)
Wavelength (nm)
Most Raman scattering power collected in second spectral channel
0 1 2 3 4 5 6 7 8 9 100.0
0.2
0.4
0.6
0.8
1.0
1.2
1.4
10_21_04/10_12_04 10_28_04/10_12_04 11_04_04/10_12-04
Raman scattering signal changes linearly with gas pressure.
0 20 40 60 80 100 120
0
50
100
150
200
250
300
Dig
itiz
er c
ou
nt
Gas pressure (torr)
polychromator 1 polychromator 2 Linear Fit of Linear Fit of
The calibration factor is defined by the slope of the fitted line
TS results compared with interferometer results
4.a
Pla
sma
Den
sity
Sca
n an
d
EC
H P
ower
Sca
n fo
r Q
HS
Mod
e
• Electron temperature is a little higher in QHS mode than Mirror mode.
• Density profile is more peaked in QHS mode and flat in Mirror mode.
• TS measurement gives similar density profile compared with the inverted density profile from interferometer measurement.
4.c ECH Heating Power Modulation
• Energy confinement time from diamagnetic flux measurement: ~0.8 ms
• Electron temperature drops during ECH modulation of 1 ms.
4.d Superthermal Electron Tail
Mirror mode * Electron temperature increases at heating location.
* Density profile changes to a center-peaked shape compared with the flat shape of the normal central heating mirror mode.
QHS mode * Electron temperature peaks at the heating location and decreases dramatically at center compared with central heating.
* Shape of plasma density profile doesn’t change with off-axis heating.
Channel 4 have unusual high signal level compared with channel 2 and 3.
Fitting the Thomson Scattering signal with bi-Maxwellian electron distributionftotal=(1-p) f(Tb)+p f (Ttail),we can separate the superthermal electrons’ contribution to the scattering signal.
•Significant tail in center region at ECH central heating.
•Tail temperature around 5-8 KeV
•Increasing ECH heating power increases the tail fraction.
0 0.2 0.4 0.6 0.8 10
200
400
600Central heating power 70kWCentral heating power 40kW0ffaxis heating, 40kW
0 0.2 0.4 0.6 0.8 14000
6000
8000
0 0.2 0.4 0.6 0.8 10
0.25
0.5
r/a
Bulk Electron Temperature (eV)
Tail Electron temperature (eV)
Tail fraction 0
20
40
60
80
Sto
red
Ene
rgy
(J)
E=Te*Ne
E from Diamagnetic loop E=Te_bulk*Ne_bulk+Te_tail*Ne_tail
Integrated stored energy compared with the diamagnetic
flux measurement.
5. Summary
Superthermal electron at different ECH heating power and location at QHS mode of 1.51012/cm3.
70KW 40KW 40KW off-axis
Spe
ctra
l Res
pons
e (a
.u.)
Rat
io
Spatial channel number