progress in dielectric science & technology: a retrospective/prospective dennis w. hess school...
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Progress in Dielectric Science & Technology:Progress in Dielectric Science & Technology:A Retrospective/ProspectiveA Retrospective/Prospective
Dennis W. Hess
School of Chemical Engineering
Georgia Institute of Technology
Atlanta, GA 30332-0100
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Michael FaradayMichael Faraday(1791 – 1867)(1791 – 1867)
• Coined the term “dielectric” in the mid 1800’s to indicate that something analogous to current flow occurs through a capacitor during the charging process
• Was described, in the 1879 edition of Encyclopaedia Britannica, by the remark that Faraday is a “chemist, electrician, and philosopher”
• Was offered BUT REFUSED
* Presidency of the Royal Society
* Presidency of the Royal Institution
* Knighthood
He explained: “I must remain plain Michael Faraday to the last; . . . if I accepted the honour which the Royal Society desires to confer upon me, I would not answer for the integrity of my intellect for a single year”
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Dielectric Science & Technology DivisionDielectric Science & Technology DivisionBackground and HistoryBackground and History
• Founded in 1945 as the ‘Electric Insulation Division’, primarily due to efforts of F. M. Clark at General Electric
* Offered interdisciplinary forum for discussions on electrical insulation as applied to power transmission, e.g., cables, transformers, and capacitors
* Until ~1960, symposia sponsored by EID involved
- electrophysics - electrical properties of plastics
- wet electrolytic capacitors - wires and cables
- inorganic & organic dielectrics - liquid dielectrics
- high temperature insulation - pre-fabricated circuitry
- chemical aspects of printed wiring
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DS&T – Background and HistoryDS&T – Background and History
• In the July, 1952 issue of Journal of The Electrochemical Society, Thomas D. Callinan, then Chair of the Electric Insulation Division, wrote that the Division was formed to:
“. . . promote the attainment and dissemination of knowledge of dielectrics, including the electrical, mechanical, and chemical properties of non-conductors of electricity.
He further remarked that the interest in this field was shifting from:
“. . . power transmission to intelligence transmission”
He further implied that the recent discovery of the transistor would have a major impact on the field of dielectrics!!
This comment has been a cornerstone of the Division’s development
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DS&T – Background and HistoryDS&T – Background and History
• Due to the changed emphasis of the Electric Insulation Division, a name change occurred in 1965, when the Division became the
Dielectrics and Insulation Division
* Symposia held between 1965 and 1988 include
- Anodic Oxide Dielectrics for Electrolytic Capacitors
- Silicon Nitride and Silicon Oxide Thin Insulating Films
- Thin Films for Electronic Applications
- Plasma Processing
- Chemical Vapor Deposition
- Multilevel Metallization
NOTE: Some of the above symposia were and continue to be sponsored jointly with the Electronics Division and/or the High Temperature Materials Division
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DS&T – Background and HistoryDS&T – Background and History• Again, due to changes in the interests of our members, the D&I Division, underwent a name change in 1990, becoming the
Dielectric Science and Technology Division
* Symposia held since 1989 include
- Diamond and Diamond-like Carbon Films
- Corrosion and Reliability of Electronic Materials and Devices
- Environmental Issues with Materials and Processes for IC Manufacture
- Process Control, Diagnostics, and Modeling in Semiconductor Manufacture
- III-V Nitride Materials and Devices - Rapid Thermal Processing
- ULSI Science and Technology - Polymeric Materials for ICs
NOTE: Some of the above symposia have been co-sponsored with several other Divisions and with other professional societies
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Application of an Electric Field to a Dielectric Application of an Electric Field to a Dielectric Produces a Displacement of ChargeProduces a Displacement of Charge
• Charge displacement occurs through a progressive orientation of both permanent and induced dipoles, termed polarization
• Since all materials contain charges of one type or another, essentially every material can be broadlybroadly classified as a dielectric
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Interactions Among Core Areas of DS&TInteractions Among Core Areas of DS&T
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Electric Insulation Division ChairsElectric Insulation Division Chairs
1945-1948 F. M. Clark, General Electric
1948-1951 J. F. Gall, Pennsylvania Salt Mfg. Co.
1951-1954 T. D. Callinan, General Electric
1954-1955 R. A. Ruscetta, General Electric
1955-1956 L. L. Deer, U.S. Naval Ordinance
1956-1957 D. A. Lupfer, General Electric
1957-1959 L. J. Frisco, Johns Hopkins University
1959-1961 A. T. Sherburne, General Electric
1961-1963 T. D. Callinan, General Electric
1963-1965 C. C. Houtz, AT&T Bell Laboratories
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Dielectrics and Insulation Division ChairsDielectrics and Insulation Division Chairs1965-1967 B. R. Eichbaum, AMP, Inc.
1967-1969 N. Schwartz, AT&T Bell Laboratories
1969-1970 E. M. DaSilva, IBM
1970-1971 D. M. Smyth, Sprague Electric
1971-1972 D. Gerstenberg, AT&T Bell Laboratories
1972-1973 L. V. Gregor, IBM
1973-1974 L. Mandelcorn, Westinghouse
1974-1976 B. H. Vromen, IBM
1976-1978 L. D. Locker, Solid State Sensors
1978-1980 R. G. Frieser, IBM
1980-1982 J. A. Amick, RCA
1982-1984 W. Kern, RCA
1984-1986 L. Rothman, IBM
1986-1988 R. Comizzoli, AT&T Bell Laboratories
1988-1990 J. P. Dismukes, Exxon
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Dielectric Science & Technology Dielectric Science & Technology Division ChairsDivision Chairs
1990-1992 G. C. Schwartz, IBM
1992-1994 R. A. Susko, IBM
1994-1996 J. R. Susko, IBM
1996-1998 W. D. Brown, Univ. Arkansas
1998-2000 R. L. Opila, Lucent Technologies
2000-2002 R. A. Ulrich, Univ. Arkansas
2002-2004 C. R. Simpson, Motorola
2004-2006 J. Deen, McMaster University, Canada
2006-2008 K. Voros, UC Berkeley
2008-2010 D. Misra, NJ Institute of Technology
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Thomas D. Callinan AwardThomas D. Callinan Award
Established in 1967 to honor Thomas D. Callinan who
* broadened the scope of dielectric science and technology in ECS
* twice served as Chair of the Division (1951-1954; 1961-1963)
The Purpose of the Award is to
“Encourage excellence in dielectrics and insulation investigations”
Recipients of the award have made contributions to dielectric science and technology in numerous applications and areas of interest to The Division and The Society
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T. D. Callinan Award RecipientsT. D. Callinan Award Recipients1968 - J. A. Davies; J. P. S. Pringle
1970 - G. M. Sessler; J. E. West
1971 – C. A. Mead
1972 – W. Kern
1973 – J. R. Szedon
1975 – C. M. Osburn
1976 – T. W. Hickmott
1977 – J. R. Ligenza
1978 – R. Williams
1979 – R. J. Kriegler
1982 – B. E. Deal
1983 – L. Young
1985 – A. K. Sinha
1986 – A. C. Adams
1987 – S. P. Murarka
1988 – R. B. Commizzoli; E. A. Irene
1989 – R. A. Levy
1990 – M. H. Woods
1991 – V. J. Kapoor
1992 – S. I. Raider
1993 – D. W. Hess
1994 – Y.-H. Wong
2008 – P. Kohl
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T. D. Callinan Award RecipientsT. D. Callinan Award Recipients1995 – K. L. Mittal
1996 – W. D. Brown
1997 – J. P. Dismukes
1998 – R. Singh
1999 – A Rohatghi
2000 - K. Saraswat
2001 - P. Ho
2002 - J. Deen
2003 - S.K. Banerjee, A.G. Revesz
2004 - S. Fonash
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DS&T Lead Division Proceedings VolumesDS&T Lead Division Proceedings Volumes
First Proceedings Volume in 1967: “Electrolytic Rectification and Conduction Mechanisms in Anodic Oxide Films”
1967 – 1975: 6
1976 - 1985: 15
1986 – 1995: 28
1996 – 2001: 40
Numerous other volumes have been published where DS&T is a co-organizer and co-sponsor.
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Technical Presentations for DS&T Retrospective at Technical Presentations for DS&T Retrospective at the ECS Centennial Meeting – May 2002 the ECS Centennial Meeting – May 2002
Philadelphia, PAPhiladelphia, PA
“MOSFET Device Scaling: A (Biased) History of Gate Stacks”,
C. M. Osburn (N.C. State) and H. R. Huff (SEMATECH)
“Thermal Silicon Dioxide – A Unique Dielectric in Semiconductor
Technology”, B. E. Deal (Stanford)
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Technical Presentations for DS&T RetrospectiveTechnical Presentations for DS&T Retrospective
“Solid Electrolyte Capacitors”, D. M. Smyth (Lehigh)
“Deposited Dielectrics and Associated Process Technologies for Device
Metallization and Interconnection”, G. C. Schwartz (Retired)
T. D. Callinan Award Address:
“Electrical Characterization Techniques for Semiconductors and
Semiconductor-Dielectric Interfaces – A Review”, M. J. Deen
(McMaster)