Progress in Dielectric Science & Technology:Progress in Dielectric Science & Technology:A Retrospective/ProspectiveA Retrospective/Prospective

Dennis W. Hess

School of Chemical Engineering

Georgia Institute of Technology

Atlanta, GA 30332-0100

Michael FaradayMichael Faraday(1791 – 1867)(1791 – 1867)

• Coined the term “dielectric” in the mid 1800’s to indicate that something analogous to current flow occurs through a capacitor during the charging process

• Was described, in the 1879 edition of Encyclopaedia Britannica, by the remark that Faraday is a “chemist, electrician, and philosopher”

• Was offered BUT REFUSED

* Presidency of the Royal Society

* Presidency of the Royal Institution

* Knighthood

He explained: “I must remain plain Michael Faraday to the last; . . . if I accepted the honour which the Royal Society desires to confer upon me, I would not answer for the integrity of my intellect for a single year”

Dielectric Science & Technology DivisionDielectric Science & Technology DivisionBackground and HistoryBackground and History

• Founded in 1945 as the ‘Electric Insulation Division’, primarily due to efforts of F. M. Clark at General Electric

* Offered interdisciplinary forum for discussions on electrical insulation as applied to power transmission, e.g., cables, transformers, and capacitors

* Until ~1960, symposia sponsored by EID involved

- electrophysics - electrical properties of plastics

- wet electrolytic capacitors - wires and cables

- inorganic & organic dielectrics - liquid dielectrics

- high temperature insulation - pre-fabricated circuitry

- chemical aspects of printed wiring

DS&T – Background and HistoryDS&T – Background and History

• In the July, 1952 issue of Journal of The Electrochemical Society, Thomas D. Callinan, then Chair of the Electric Insulation Division, wrote that the Division was formed to:

“. . . promote the attainment and dissemination of knowledge of dielectrics, including the electrical, mechanical, and chemical properties of non-conductors of electricity.

He further remarked that the interest in this field was shifting from:

“. . . power transmission to intelligence transmission”

He further implied that the recent discovery of the transistor would have a major impact on the field of dielectrics!!

This comment has been a cornerstone of the Division’s development

DS&T – Background and HistoryDS&T – Background and History

• Due to the changed emphasis of the Electric Insulation Division, a name change occurred in 1965, when the Division became the

Dielectrics and Insulation Division

* Symposia held between 1965 and 1988 include

- Anodic Oxide Dielectrics for Electrolytic Capacitors

- Silicon Nitride and Silicon Oxide Thin Insulating Films

- Thin Films for Electronic Applications

- Plasma Processing

- Chemical Vapor Deposition

- Multilevel Metallization

NOTE: Some of the above symposia were and continue to be sponsored jointly with the Electronics Division and/or the High Temperature Materials Division

DS&T – Background and HistoryDS&T – Background and History• Again, due to changes in the interests of our members, the D&I Division, underwent a name change in 1990, becoming the

Dielectric Science and Technology Division

* Symposia held since 1989 include

- Diamond and Diamond-like Carbon Films

- Corrosion and Reliability of Electronic Materials and Devices

- Environmental Issues with Materials and Processes for IC Manufacture

- Process Control, Diagnostics, and Modeling in Semiconductor Manufacture

- III-V Nitride Materials and Devices - Rapid Thermal Processing

- ULSI Science and Technology - Polymeric Materials for ICs

NOTE: Some of the above symposia have been co-sponsored with several other Divisions and with other professional societies

Application of an Electric Field to a Dielectric Application of an Electric Field to a Dielectric Produces a Displacement of ChargeProduces a Displacement of Charge

• Charge displacement occurs through a progressive orientation of both permanent and induced dipoles, termed polarization

• Since all materials contain charges of one type or another, essentially every material can be broadlybroadly classified as a dielectric

Interactions Among Core Areas of DS&TInteractions Among Core Areas of DS&T

Electric Insulation Division ChairsElectric Insulation Division Chairs

1945-1948 F. M. Clark, General Electric

1948-1951 J. F. Gall, Pennsylvania Salt Mfg. Co.

1951-1954 T. D. Callinan, General Electric

1954-1955 R. A. Ruscetta, General Electric

1955-1956 L. L. Deer, U.S. Naval Ordinance

1956-1957 D. A. Lupfer, General Electric

1957-1959 L. J. Frisco, Johns Hopkins University

1959-1961 A. T. Sherburne, General Electric

1961-1963 T. D. Callinan, General Electric

1963-1965 C. C. Houtz, AT&T Bell Laboratories

Dielectrics and Insulation Division ChairsDielectrics and Insulation Division Chairs1965-1967 B. R. Eichbaum, AMP, Inc.

1967-1969 N. Schwartz, AT&T Bell Laboratories

1969-1970 E. M. DaSilva, IBM

1970-1971 D. M. Smyth, Sprague Electric

1971-1972 D. Gerstenberg, AT&T Bell Laboratories

1972-1973 L. V. Gregor, IBM

1973-1974 L. Mandelcorn, Westinghouse

1974-1976 B. H. Vromen, IBM

1976-1978 L. D. Locker, Solid State Sensors

1978-1980 R. G. Frieser, IBM

1980-1982 J. A. Amick, RCA

1982-1984 W. Kern, RCA

1984-1986 L. Rothman, IBM

1986-1988 R. Comizzoli, AT&T Bell Laboratories

1988-1990 J. P. Dismukes, Exxon

Dielectric Science & Technology Dielectric Science & Technology Division ChairsDivision Chairs

1990-1992 G. C. Schwartz, IBM

1992-1994 R. A. Susko, IBM

1994-1996 J. R. Susko, IBM

1996-1998 W. D. Brown, Univ. Arkansas

1998-2000 R. L. Opila, Lucent Technologies

2000-2002 R. A. Ulrich, Univ. Arkansas

2002-2004 C. R. Simpson, Motorola

2004-2006 J. Deen, McMaster University, Canada

2006-2008 K. Voros, UC Berkeley

2008-2010 D. Misra, NJ Institute of Technology

Thomas D. Callinan AwardThomas D. Callinan Award

Established in 1967 to honor Thomas D. Callinan who

* broadened the scope of dielectric science and technology in ECS

* twice served as Chair of the Division (1951-1954; 1961-1963)

The Purpose of the Award is to

“Encourage excellence in dielectrics and insulation investigations”

Recipients of the award have made contributions to dielectric science and technology in numerous applications and areas of interest to The Division and The Society

T. D. Callinan Award RecipientsT. D. Callinan Award Recipients1968 - J. A. Davies; J. P. S. Pringle

1970 - G. M. Sessler; J. E. West

1971 – C. A. Mead

1972 – W. Kern

1973 – J. R. Szedon

1975 – C. M. Osburn

1976 – T. W. Hickmott

1977 – J. R. Ligenza

1978 – R. Williams

1979 – R. J. Kriegler

1982 – B. E. Deal

1983 – L. Young

1985 – A. K. Sinha

1986 – A. C. Adams

1987 – S. P. Murarka

1988 – R. B. Commizzoli; E. A. Irene

1989 – R. A. Levy

1990 – M. H. Woods

1991 – V. J. Kapoor

1992 – S. I. Raider

1993 – D. W. Hess

1994 – Y.-H. Wong

2008 – P. Kohl

T. D. Callinan Award RecipientsT. D. Callinan Award Recipients1995 – K. L. Mittal

1996 – W. D. Brown

1997 – J. P. Dismukes

1998 – R. Singh

1999 – A Rohatghi

2000 - K. Saraswat

2001 - P. Ho

2002 - J. Deen

2003 - S.K. Banerjee, A.G. Revesz

2004 - S. Fonash

DS&T Lead Division Proceedings VolumesDS&T Lead Division Proceedings Volumes

First Proceedings Volume in 1967: “Electrolytic Rectification and Conduction Mechanisms in Anodic Oxide Films”

1967 – 1975: 6

1976 - 1985: 15

1986 – 1995: 28

1996 – 2001: 40

Numerous other volumes have been published where DS&T is a co-organizer and co-sponsor.

Technical Presentations for DS&T Retrospective at Technical Presentations for DS&T Retrospective at the ECS Centennial Meeting – May 2002 the ECS Centennial Meeting – May 2002

Philadelphia, PAPhiladelphia, PA

“MOSFET Device Scaling: A (Biased) History of Gate Stacks”,

C. M. Osburn (N.C. State) and H. R. Huff (SEMATECH)

“Thermal Silicon Dioxide – A Unique Dielectric in Semiconductor

Technology”, B. E. Deal (Stanford)

Technical Presentations for DS&T RetrospectiveTechnical Presentations for DS&T Retrospective

“Solid Electrolyte Capacitors”, D. M. Smyth (Lehigh)

“Deposited Dielectrics and Associated Process Technologies for Device

Metallization and Interconnection”, G. C. Schwartz (Retired)

T. D. Callinan Award Address:

“Electrical Characterization Techniques for Semiconductors and

Semiconductor-Dielectric Interfaces – A Review”, M. J. Deen

(McMaster)