RECIPE

RIE, ICP ETCH SIMULATOR

Features

RECIPE 3DRIE, ICP and Bosch Etch simulator

Validated databaseExperimental etch database Rigorous validation experiments

Real world usagePredict and fine tune etch lag, sidewall angle and footing

MultiEtch simulationSimulate effect of multiple etches

Sidewall & etch lag simulationCapability to predict important parameters such as etch lag and sidewall angles

Speed and accuracyFaster than performing a real etch. Tapeout with confidence

RSM derived etch database

Response surface matrix Etch rate as a function of APC and Coil Power

Etch characterization experiments (1)

Etch characterization experiments (2)

ICP/BOSCH ETCHING

Ion assisted etch

Reactive Ion Etching

Combination etch: Isotropic+Bosch

Isotropic plate release simulation

Benefits

Design verification before tape-outIdentify and remove source of manufacturing problems at design stage

Recipe developmentSave precious time and money by developing process recipes offline

Fine tune your etchesTune your etches for each device

Thank you

ありがとう•謝謝 • ध"यवाद • شكرا لكم

Grazie •Merci • Gracias • Danke •Obrigado • Dank U •Terima Kasih

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