research fueled by: frontiers in materials: spintronics strasboug, france may 13 th, 2012 expecting...

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Research fueled by: Frontiers in Materials: Spintronics Strasboug, France May 13 th , 2012 Expecting the unexpected in the spin Hall effect: from fundamental to practical JAIRO SINOVA Vivek Amin Texas A&M University Institute of Physics ASCR Hitachi Cambridge Joerg W ü nderlich , A. Irvine, et al Institute of Physics ASCR Tomas Jungwirth , Vít Novák, Karel Vyborny, et al

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Page 1: Research fueled by: Frontiers in Materials: Spintronics Strasboug, France May 13 th, 2012 Expecting the unexpected in the spin Hall effect: from fundamental

Research fueled by:

Frontiers in Materials: SpintronicsStrasboug, France

May 13th, 2012

Expecting the unexpected in the spin Hall effect:

from fundamental to practical

JAIRO SINOVA Vivek Amin

Texas A&M UniversityInstitute of Physics ASCR

Hitachi CambridgeJoerg Wünderlich, A. Irvine, et al

Institute of Physics ASCRTomas Jungwirth, Vít Novák, Karel Vyborny, et al

Page 2: Research fueled by: Frontiers in Materials: Spintronics Strasboug, France May 13 th, 2012 Expecting the unexpected in the spin Hall effect: from fundamental

Expecting the unexpected in the spin Hall effect: from fundamental to practical! The spin Hall effects is a relativistic spin-orbit coupling phenomenon which can be used to electrically generate or detect spin currents in magnetic and non-magnetic systems. In spite of the short time since its discovery it has now become ubiquitous in the field of spintronics and its development has also sparked a renewed interest in the full understanding of all the relating effects, such as the anomalous Hall effect. Exploiting such effects fully requires a better understanding of the effects and their intricate connections. SHE has been used to create one of the first spin FETs, to measure spin-currents generated by magnetization dynamics, and even to generate spin-currents large enough to produce spin-torque effects! In this talk I attempt to give a short, brief, and possibly oversimplified overview of some of the critical developments of this vibrant subfield of spintronics, its present understanding, its present applications, and some of its future challenges.

Page 3: Research fueled by: Frontiers in Materials: Spintronics Strasboug, France May 13 th, 2012 Expecting the unexpected in the spin Hall effect: from fundamental

3Nanoelectronics, spintronics, and materials control by spin-orbit coupling

I. Introduction:•Basic AHE and SHE phenomenology•Mechanism

II. Spin Hall effect: the early days I.First proposals: from theory to experimentII.First observations of the extrinsic and intrinsic (optical)

III. Inverse spin Hall effect•Direct iSHE in metals•Spin pumping and FMR

IV.SHE-FET•Spin Hall injection and spin precession manipulation•iSHE device with spin-accumulation modulation

V. SHE as a spin current generator and detector•Spin based FET: old and new paradigm in charge-spin transport•Theory expectations and modeling•Experimental results

VI.Conclusion

Expecting the unexpected in the spin Hall effect:

from fundamental to practical

Page 4: Research fueled by: Frontiers in Materials: Spintronics Strasboug, France May 13 th, 2012 Expecting the unexpected in the spin Hall effect: from fundamental

4Nanoelectronics, spintronics, and materials control by spin-orbit coupling

The electron: the key character with dual personalities

CHARGECHARGEEasy to manipulate: Coulomb interaction

SPIN 1/2SPIN 1/2Makes the electron antisocial: a fermion

quantum mechanics

E=p2/2mE→ iħ d/dtp→ -iħ d/dr

““Classical” external manipulation of charge & spinClassical” external manipulation of charge & spin

special relativity

E2/c2=p2+m2c2

(E=mc2 for p=0)

+ particles/antiparticles & spin

Dirac equation=

Page 5: Research fueled by: Frontiers in Materials: Spintronics Strasboug, France May 13 th, 2012 Expecting the unexpected in the spin Hall effect: from fundamental

5Nanoelectronics, spintronics, and materials control by spin-orbit coupling

Using charge and spin in information technology

HIGH tunablity of electronic transportproperties the key to FET success in processing technology

substrate

semiconductor

insulatorS Dgate

Vg >0

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