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The top documents tagged [adjacent phase regions]
New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout Andrew B. Kahng (UCSD) Shailesh Vaya (UCLA) Alex Zelikovsky
214 views
Subwavelength Design: Lithography Effects and Challenges Part II: EDA Implications Andrew B. Kahng, UCLA Computer Science Dept. ISQED-2000 Tutorial March
216 views
New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout
37 views
Subwavelength Optical Lithography: Challenges and Impact on Physical Design Part II: Problem Formulations and Tool Integration
38 views