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The top documents tagged [film technology instructor]
Chapter 2 Modern CMOS technology 1.Introduction. 2.CMOS process flow. 1 NE 343: Microfabrication and thin film technology Instructor: Bo Cui, ECE, University
320 views
1.Introduction and application. 2.Dopant solid solubility and sheet resistance. 3.Microscopic view point: diffusion equations. 4.Physical basis for diffusion
224 views
Chapter 9 Thin film deposition 1.Introduction to thin film deposition. 2.Introduction to chemical vapor deposition (CVD). 3.Atmospheric Pressure Chemical
255 views
1.Introduction and application. 2.Ion implantation tools. 3.Dopant distribution. 4.Mask thickness and lateral distribution. 5.Effect of channeling. 6.Damage
217 views
1.SiO 2 properties and applications. 2.Thermal oxidation basics. 3.Manufacturing methods and equipment. 4.Measurement methods. 5.Deal-grove model (linear
213 views
1.Introduction to etching. 2.Wet chemical etching: isotropic. 3.Anisotropic etching of crystalline Si. 4.Dry etching overview. 5.Plasma etching mechanism
449 views
1.Introduction and application. 2.Dopant solid solubility and sheet resistance. 3.Microscopic view point: diffusion equations. 4.Physical basis for diffusion
220 views
1.Introduction and application. 2.Light source and photomask, alignment. 3.Photolithography systems. 4.Resolution, depth of focus, modulation transfer
221 views
Chapter 1 Introduction and Historical Perspective 1.Introduction. 2.Growth of IC – Moore’s law. 3.Some history in IC industry. 4.Semiconductors. 5.Semiconductor
229 views
1.SiO 2 properties and applications. 2.Thermal oxidation basics. 3.Manufacturing methods and equipment. 4.Measurement methods (mechanical, optical, electrical)
216 views
Chapter 2 Modern CMOS technology 1.Introduction. 2.CMOS process flow (continued). 1 NE 343: Microfabrication and thin film technology Instructor: Bo Cui,
263 views
1.Silicon crystal structure and defects. 2.Czochralski single crystal growth. 3.Growth rate and dopant incorporation for CZ method. 4.Float zone single
245 views