topcon offers fast, easy feature location

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Nen, Products Applied Thermal Control launch world's smallest chiller New technology has re- duced the size of Applied Thermal Control's (ATC) K series chillers and heat ex- changers by over 60%, mak- ing them the world's smallest according to the company. The reduction in size reduces the cost of ownership, and enables the systems to fit through a standard door frame. ATC says the K series chillers provide the reliable precision temperature con- trol required for analytical instrumentation and semi- conductor fabrication tools. Typical applications include etch, deposition and other plasma processes, electron microscopes and inductively coupled mass spectrometry. The new ser- ies is designed for continu- ous operation, only 15 minutes are required for an- nual maintenance. James Stenhouse, tel/fax: +44 (0)1530839998/835199. Compact K series chiller packs more power into hal/the space. Topcon offers fast, easy feature location Topcon says that its compu- ter controlled Opti-SEM 300, a combined SEM (scanning electron micro- scope) and optical micro- scope, has a unique configuration. Aligning an area of interest in the cross hairs of the optical micro- scope field places the beam directly over the same area upon switching to the SEM. The integrated system features a full computer- controlled digital SEM running in Microsoft Win- dows, along with 5" sample capability. Michael McCarthy, tel: +1 201 261-5410; e-mail: mpmccarthy@worldnet. att.net New system offers fully automated thin film measurement Hitachi Scientific Instru- ments has announced the availability of a new, fully automated thin film de- position measurement sys- tems for use in semiconductor and optoe- lectronic production. Using a high performance spec- trophotometer, absolute re- flectance measurements of semiconductor wafer mate- rials such as Si, GaAs and Ge are possible. The system also provides a method of measuring the thickness of a wide range of deposited layers such as A1, W, MoSi2 and SiN. An optional sys- tem is also available, opti- mised for use in the UV region of the spectrum, for the measurement of the characteristics of optical components used in exci- mer lasers. The system is housed in a compact unit for use in cleanrooms and features a completely automated cas- sette to cassette wafer hand- ling system capable of handling 8" wafers. A throughput of 1 wafer/min. is achieved at five sampling points per wafer. The high performance spectrophotometer oper- ates over a wavelength range of 240-2600 nm. The The new thin film deposition measurement system from Hitachi Scientific Instruments. large sampling compart- ment accomodates mea- surement accessories. Vince Phelan, tel/fax: +44 (0)118-932 8632/-973 2622; e-mail: [email protected] 50 III-Vs Review • Vol.lO No.4 1997 0961-1290/97/$17.00 ©1997, Elsevier Science Ltd

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Page 1: Topcon offers fast, easy feature location

N e n , P r o d u c t s

Applied Thermal Control launch world's smallest chiller New t e c h n o l o g y has re- duced the size of Applied Thermal Control's (ATC) K series chillers and heat ex- changers by over 60%, mak- i n g t h e m t h e w o r l d ' s smallest according to the company. The reduction in size reduces the cost o f ownership, and enables the systems to fi t t h r o u g h a standard door frame.

ATC says the K series chillers provide the reliable precision temperature con- trol required for analytical instrumentation and semi- c o n d u c t o r f a b r i c a t i o n tools. Typical applications include etch, depos i t ion and other plasma processes, electron microscopes and inductively coupled mass spectrometry. The new ser- ies is designed for continu- ous o p e r a t i o n , o n l y 15 minutes are required for an- nual maintenance. James Stenhouse, tel/fax: +44 (0)1530 839998/835199. Compact K series chiller packs more power into hal/ the space.

Topcon offers fast, easy feature location Topcon says that its compu- ter control led Opt i -SEM 300, a c o m b i n e d S E M (scanning electron micro- scope) and optical micro- s c o p e , h a s a u n i q u e configuration. Aligning an area of interest in the cross hairs of the optical micro- scope field places the beam directly over the same area u p o n s w i t c h i n g to the SEM.

The integrated system features a full computer- c o n t r o l l e d d ig i ta l SEM running in Microsoft Win- dows, along with 5" sample capability. Michael McCarthy, tel: +1 201 261-5410; e-mail: mpmccarthy@worldnet. att.net

New system offers fully automated thin film measurement Hitachi Scientific Instru- ments has announced the availability of a new, fully au tomated thin fi lm de- position measurement sys- t e m s f o r u s e i n semiconductor and optoe- lectronic production. Using a high performance spec- trophotometer, absolute re- flectance measurements of semiconductor wafer mate- rials such as Si, GaAs and Ge are possible. The system also provides a method of measuring the thickness of a wide range of deposited layers such as A1, W, MoSi2 and SiN. An optional sys- tem is also available, opti-

mised for use in the UV region of the spectrum, for the m e a s u r e m e n t o f the characterist ics o f optical components used in exci- mer lasers.

The system is housed in a compact unit for use in cleanrooms and features a completely automated cas- sette to cassette wafer hand- l ing sys tem capab le o f h a n d l i n g 8" wafers . A throughput of 1 wafer/min. is achieved at five sampling points per wafer.

The high performance spec t ropho tomete r oper- ates ove r a w a v e l e n g t h range of 240-2600 nm. The

The new thin film deposition measurement system from Hitachi Scientific Instruments.

large sampling compart - ment accomoda tes mea- surement accessories.

Vince Phelan, tel/fax: +44 (0)118-932 8632/-973 2622; e-mail: [email protected]

5 0 III-Vs Review • Vol.lO No.4 1997 0961-1290/97/$17.00 ©1997, Elsevier Science Ltd