work in progress --- not for publication 1 pids 7/11/00 pids itwg meeting pids itwg emerging...
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Work in Progress --- Not for Publication
1 PIDS
7/11/00
PIDS ITWG Meeting
PIDS ITWG Emerging Research Devices Working Group Face-to-Face
Meeting
Jim Hutchby - FacilitatingRoom: Mont Blanc 2
Atria Novotel - Grenoble, France8:00 a.m - 4:00 p.m.
April 25, 2001
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PIDS ITWG Novel Devices Working Group Participants
George Bourinaoff Intel/SRC Joop Bruines Philips Joe Brewer U. Florida Jim Chung Compaq Peng Fang AMAT Steve Hillenius Agere Toshiro Hiramoto Tokyo U. Jim HutchbySRC Dae Gwan Kang Hyundai
Makoto Yoshimi Toshiba Kentarou Shibahara Hiroshima U. Kristin De Meyer IMEC Tak Ning IBM Byong Gook Park Seoul N. U. Luan Tran Micron Bin Zhao Conexant Victor Zhirnov SRC/NCSU Ramon Compano Europe Com
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PIDS ITWG Emerging Devices Working Group Working Group Objectives
Prepare a sub-section of the 2001PIDS ITRS Assess advanced non-bulk CMOS-related
technologies Assess potential and issues related to novel
devices and technologies related to: Logic Memory Information Processing Architectures
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4 PIDS
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PIDS ITWG Emerging Devices Working Group Meeting Objectives & Desired Outcomes
Complete the Emerging Research Devices Tables– Non Bulk CMOS– Research Memory Devices– Logic Devices– Technologies– Architectures
Complete design and layout of the Emerging Technology Sequence Chart
Set Working Group Agenda for completing our section– Emerging Technology Sequence Chart (July ITRS Mtg.)– Text descriptions of Table Entries (July ITRS Mtg.)– Reference text for Table Entries (July ITRS Mtg.)– Completed Emerging Research Devices Section (8/30)
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PIDS ITWG Emerging Devices Working Group Agenda
8:00 Introductions 8:15 Review meeting objectives and agenda Hutchby8:30 Review status of Emerging Research Hutchby
Devices Section Tables (technology entries & row metrics)
– Identify points of consensus– Identify issues not having consensus
Emerging Technology Sequence Chart9:00 Discuss Tables
9:00 Non-Bulk CMOS Table Yoshima 9:45 Memory Table Zhirnov
10:00 Break10:15 Memory Table (continued) Zhirnov11:00 Logic Table Compano
12:00 Lunch 1:00 Technology Table Hutchby
2:00 Architecture Table Bourianoff 3:00 Emerging Technology Sequence Chart Hutchby 4:00 Adjourn Meeting
Model Table for Non-Bulk CMOS Devices PIDS ITWG Emerging Research Devices Working Group
Device
FD SOI High mobility channelbulk/SOI
BOX
Source Drain
Source
Gate
Drain
Si fin - Body! BOX
Source Drain
Source
Gate
Drain
Si fin - Body!
Concept -Fully-depleted SOI -High carrier mobility-Conventional structure
-Double or surround gate-Three-terminal operation
-Double or surround gate-Four-terminal operation
Maturity DevelopmentApplication/ Driver Performance; functional density; power
Advantages -Extension of PD SOI-Performance advantageunclear (scales worst thanbulk )
-Compatible withconventional bulk and SOICMOS
-Higher drive current-Improved subthreshold slope (60 mV/decade at RT) -Stacked NAND
-Higher drive current (in 3-terminal mode only)-Multiple-Vt in four-terminaloperation-Stacked NAND
Challenges: process Thin silicon layer High-mobility materials Complexity ComplexityChallenges: design -Device characteristics
-CADNone -Device characteristics
-PD vs. FD-CAD
-Device characteristics-PD vs. FD-CAD
Timing
Near future Far future
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Emerging Research Memory DevicesPIDS ITWG Emerging Research Devices Sub-Group
Baseline 2001Technologies Magnetic RAM
PhaseChangeMemory
CrestedTunnelBarriers
CoulombBlockadeMemories
MolecularMemory
StorageMechanism
ChargedCapacitor
FloatingGate
Device Types DRAM FlashPseudo-
Spin-Valve
MagneticTunnelJunction
OUM NOVORAM Nanocrystal Quantum dot
Bistable switch Molecular NEMS Spin basedmolecular devices
Availability 2001 > 2003 > 2003 >2003 >2005 >2007 >2010Cell size 8F2 10F2 ~10F2 ~40F2 ~6F2 ~ 6F2 2F2 to 9F2 ~2F2
Access time <20 ns ~80 ns <25 ns <10 ns <100 ns <10 ns <10 ns ~10 nsStore time <20 ns ~1 ms <25 ns <10 ns <100 ns <10 ns <100 ns ~10 nsRetention 64 ms >10 yrs >10 yrs >10 yrs >10 yrs >10 yrs >10 yrs DaysE/W cycles >1E5 >1E15 >1E13 >1E13 >1E6 >1E9 >1E15Maturity production development development concept demonstrated demonstrated
GeneralAdvantages
DensityEconomy
NonvolatileNonvolatile, Fast read & write,Compatible with Si technologies,Rad Hard, NDRO
Nonvolatile,Low Power,NDRORad Hard
Nonvolatile, Fastread & write
Density, Power
Density, PowerIdentical switcheslarge 1/0 difference Opportunities for 3DEasier to interconnectDefect tolerant circuitry
ChallengesReliability, Integration,Material Quality, Control magneticproperties for write operations
New materials& integration
Material QualityDimension control,Background charge
VolatileThermal stability
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8 PIDS
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Emerging Research Logic Devices1 PIDS ITWG Emerging earch Devices
Working Group
1The time horizon for entries increases from left to right in these tables
Device RTD - FET SET
Rapid SingleQuantumFlux Logic
NanotubeDevices
MolecularDevices
Maturity Demonstrated Demonstrated Demonstrated Concept ConceptAdvantages Density,
Performance,RF
Density High Speed,Potentiallyrobust andscalable
Density,Power
Identity ofindividualswitches (e.g.Size, Properties)on sub-nm level.Potentialsolution tointerconnectproblem
Challenges Logic for twoterminaldevice,Matching ofdevicepropertiesacross wafer
New device &System. Roomtemp operationquestionable.Noise (offsetcharge). Lackof drive current
Very lowtemperaturesrequired,New materialsneeded
New Device& System,No route forfabricatingcomplexcircuitry
Thermal &environmentalstability: twoterminaldevices: needfor newarchitectures
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9 PIDS
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Model Table for Emerging Technologies1 PIDS ITWG Novel Devices Working Group
1The time horizon for entries increases from left to right in these tables
Technology PlasticTransistors
Nano-Electro-Mechanical
Systems
All OpticsLogic &Storage
DNA & BiologicalComputing
Maturity Development Demonstration Concept ConceptAdvantages Very low cost;
flexible substrate,human scalecomputing
Unique capabilities-sensor/actuators,Very low powerdissipation andsensitivity
Speed,bandwidth,noiseimmunity
Opportunities for parallelcomputing, self assemby,self-repair, re-configuredsystems, ultra high density
Challenges Slow; limitedniche applications
High frequencyoperations; lack ofdesign tools,integration
Scaling,difficultmaterials andmanufacturing
Thermal and environmentalstability, interface toconventional CMOS,
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Emerging Research Architectures PIDS ITWG Emerging Research Devices
Working GroupArchitecture
3-D Integration
Quantum Cellular Automata
Defect
Tolerant architecture
Molecular architecture
Cellular Nonlinear
networks
Quantum Computing
Device Implementation
CMOS with dissimilar material
systems
Quantum Dots Many self assembled
nanodevices
Molecular switches and
memories
Single electron array architectures
Spin resonance transistors, NMR devices
Single flux quantum devices
Pro
Less interconnect delay
Enables mixed technology solutions
High functional density
No interconnects No clock
Supports imperfect hardware
Supports memory
based computing
Enables utilization of single electron devices at room temperature,
memory based computing
Exponential performance scaling, enables unbreakable
cryptography
Con
Heat removal No design tools
Difficult test and measurement
Limited fan out Low temperatures
Requires pre-computing test
Limited functionality
Subject to background noise, tight tolerances
Extreme application limitation, extreme
technology requirements
Maturity Demonstration Demonstration Demonstration Concept Concept Concept
Issues
Asynchronous architecture
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Feature Size:
Technology Progression
Well doping
channelDepletion layer
isolation
halo
Bulk CMOS
PD SOI CMOS
back-gate
channel
isolation
buried oxide
channel
top-gate
Double-Gate CMOS
High mobility (strained Si on SiGe)
High k gate dielectric
Molecular devices
Self-assembly
Metal gate
Nanotube
Wafer bonding & layer transfer
3D, heterogeneous integration
100 nm 15 nm
Time
2 nm
Nanometer-scale CMP
Air bridge
Cu interconnect
Low-k ILD
Technology features (add-on’s)
Mo
lecu
lar
dev
ices
Nan
ote
chn
olo
gy
Contacts to nanodevices
Interconnects for nanodevices
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Critical Size
Emerging Technology Sequence11This chart is intended to guide research. It is not intended to predict future technologies
Well doping
channelDepletion layer
isolation
halo
Bulk CMOS
PD SOI CMOS
back-gate
channel
isolation
buried oxide
channel
top-gate
Double-Gate CMOS
High mobility (strained Si / SiGe)
Hig
h k
gate
diel
ectr
ic
Molecular devices
Sel
f-as
sem
bly
Met
al g
ate
Nanotube
Waf
er b
ondi
ng &
laye
r tr
ansf
er
3D-integration
100 nm 15nm
Nan
omet
er-
scal
e C
MP
Air
bri
dge
Cu
inte
rcon
nect
Low
-k IL
D
Con
tact
s to
nano
devi
ces
Inte
rcon
nect
s
for
nano
devi
ces
2005 2020Year
2nm50nm
2010
CNN & QCA networks
Dev
ices
Arc
hit
ectu
reT
ech
no
log
y
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13 PIDS
7/11/00
NDWG IssuesNon Bulk CMOS Devices
Should we have an entry for Fully Depleted SOI or just a single entry for SOI without specifying PD or FD. We are all agreed that we should have some kind of entry for SOI. The question is whether the entry should refer to SOI or to FD-SOI?
Double gate structures. The Japan Region proposes to discuss 1) Vertical MOSFET, 2) DELTA, 3) double-gate MOSFET separately.
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14 PIDS
7/11/00
NDWG IssuesEmerging Logic Devices
Novel Logic Devices. Should we refer to this table as the “Emerging Logic Devices Table”? Other tables could be similarly named, e.g., “Emerging Memory Devices Table”, etc.
What position should we take regarding application of the NDWG’s judgement on the various entries? Should we leave any out if we think they are too speculative?
Added Row Metric. The US Group added a new row metric entitled “Maturity”. This metric is proposed to be added to all the tables
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15 PIDS
7/11/00
NDWG IssuesEmerging Logic Devices
Given our position on the RTD and its lack of potential, due to its being a 2-terminal device, what position should we take on the newer versions of 2-terminal devices, such as molecular switches, consisting of single molecules operating in a tunneling mode? We all agree that we should have an entry for single molecular devices and for Carbon Nanotubes. Also, the Far East Region view is that we should keep the sub-category for RTD 2-terminal devices. The US Region agrees that we should keep the entry for the RTD 2-terminal device in the RTD-FET section.
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16 PIDS
7/11/00
NDWG IssuesEmerging Memory Devices
MRAM. Should we separate the entries for GMR and Tunnel Junction Devices?
MRAM. The title “Pseudo-Spin-Valve Memory” might be substituted for “GMR Memory”.
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17 PIDS
7/11/00
NDWG IssuesEmerging Memory Devices
We need more discussion of how best to group these different memory types, and how best to categorize them with descriptive titles. Cell size, access time, retention time, write cycles and power.
Should the “Yano Device” be a separate entry to the Memory Table?
Crested Tunnel Barrier Memory. A concern is this title is specific to Prof. Liharev’s approach. Several other names including Nano Floating Gate have been suggested.
Coulomb Blockade Memory. Concern has been expressed that this title is not descriptive. Another title of “Single Electron Memory” has been suggested.
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18 PIDS
7/11/00
NDWG IssuesEmerging Architectures
We need to decide whether and where to put 3-D Heterogeneous Integration? Specifically, do we put the 3-D Heterogeneous Integration in the Emerging Architecture Table? The US Region agrees this should be in the Emerging Architectures Table.
We need to decide whether or not to keep the entries for Defect Tolerant Architecture and Molecular Computing in the Emerging Architecture Table?