abab dipamat direct patterning materials etch / plating resist
TRANSCRIPT
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ab
DiPamat
Direct Patterning Materials
Etch / Plating Resist
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abSlide 2
What is resist
A photo resist is a chemical product that, under the influence of UV light,
changes its chemical nature.
Resist without UV: is washed away during resist development
Resist with UV:
is NOT washed away during resist development protects the copper in the etch batch is stripped away after etching
Remark:
1 Etch resist: print & etch of inner layers
2 Plating resist: print, plate & etch of outer layers
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abSlide 3
What is resist
Liquid photo resist (20%)• Curtain, roller- or spray coated• Thickness: 5 - 20µm• Pro: high resolution• Contra: dust inclusions and chemical sensitivity
Dry photo resist (80%)• Cold, hot or wet laminated• Thickness: 25 - 75µm• Pro: high yield and good tenting• Contra: line width
Tenting: Via’s must be tented to avoid resist getting in the via
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abSlide 4
Traditional resist printing
Workflow:• Design• Image and develop film, check• Coat, laminate resist• Image resist• If laminated: peel cover layer• Develop resist• Etch• Strip
Working with resist is:• A time consuming process step• Expensive• Fixed data• Ecological unfriendly
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abSlide 5
Inkjet resist printing
Principle:• apply etch / plating resist• directly on the panel• using a set of Inkjet nozzles mounted on a XY table• ie without the use of a phototool or screen
Workflow:• Design• Print (with pin curing)• Curing (thermal and/or UV)• Etch• Strip
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abSlide 6
Inkjet resit printing
Advantages:• Reduce cost
- no phototool, less production steps- shorter production cycle, higher yields
• Registration panel per panel / distortion compensation- front-to-back- outer layer to inner layer
• Design changes & variable data per board• Fast (no set up)• Ecology
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abSlide 7
Quid May 2013
R&D project is in progress
Jetability and etch resistance: OK
Stripability: concepts are tested
Planning• One ER fieldtest in operation by end 2013• Proliferation of ER in 2014• Concept study PR
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abSlide 8
Quid May 2013
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abSlide 9
Quid May 2013
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abSlide 10
Quid May 2013
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abSlide 11
Competition: Dow (Rohm and Haas)www.dowelectronicmaterials.com
Phase shift ink
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abSlide 12
Competition: MacDermidwww.macdermid.com
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abSlide 13
Competition: MuTracx
Spin-off from OCE Technologies (Canon)
Announces Lunaris: print system and etch resist for IL
Phase shift inkl
Uses Predict
Fieldtest summer 2010 in EU
Commercially available by mid 2011
www.mutracx.com
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abSlide 14
Competition: MuTracx
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abSlide 15
System supplier: MuTracx
lunaris animation.avi
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abSlide 16
Conclusion
Inform your customers and prospects on our plans
Gather as much information as possible