m. pittman icuil 2010 - watkins glen, ny, october 2010 1 icuil 2010 xuv beamlines for applications...
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M. PittmanICUIL 2010 - Watkins Glen, NY, October 20101
ICUIL 2010
XUV beamlines for applications at LASERIX facility
O. Guilbaud, S. Kazamias, K. Cassou, J. C. Lagron, M. Pittman, D. Ros, S. Daboussi, D. Zimmer, J. Demailly, B. Cros
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20102
OUTLINE
1 – The LASERIX facility : an overview
2 – Research on XUV sources and applications from 2007 to 2009
4 – Prospects and conclusion
3 – Present status of LASERIX (2010)
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20103
1- The LASERIX facility:
an overview
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20104
OUTLINE
Paris-Sud XI University (Orsay) - Laser Center of PSU (CLUPS)Integrated in Federation for Light-Matter Interaction (LUMAT) in 2010
Status : Soft X ray Laser platform for applications
Director : David ROS
Location : ENSTA Palaiseau (coll. LOA & ILE)
Operation : 2003 - 2008 : development room at LOA (turquoise room) May 2009 : Moving to new building next to LUIRE-ILE (Bât. P)
Staff (10 pers.) : 5 researchers & professors, 2 engineers, 2 technicians, 2 PhD
Collaborations :Laser → ILE, LOA (Palaiseau, F), CEA (Saclay & CESTA, F)XUV sources → LPGP (Orsay, F), LOA, LULI, LCFIO (Palaiseau, F), GSI (Darmstadt, DE),
PALS (RT)
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20105
GOAL
LASERIX
Facility for XUV experiments
HRR
Laser driver
PW class
Ti:Sa
2 J - 10 Hz
XUV Laser
High rep. rate > 10nm - 1 µJ - 10 Hz
40 J – 0.1 HzXUV Laser
High energy> 4-8 nm - 20 µJ – 0.1 Hz
Compressor
100 mJ - 10 Hz –40 fs à 10 ps
HHG : > 20 nm - 10 Hz
Compressor100 mJ - 10 Hz –40 fs à 10 ps
HHG : > 20 nm - 10 HzHE
→ XUV wavelengths : 8 nm à 32 nm→ XUV energy : > µJ→ XUV rep. rate : 0.1 Hz & 10 Hz→ Multibeam - optically synchronized (IR fs-ps & HHG)
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20106
Laser amplification for PW Performances
Demonstration of36 J @ 0.1 Hz
with 72J pump energy
F. Plé et al., Opt. Lett., Vol. 32 (2007)M. Pittman et al., ICUIL 2006 (Cassis)
Diameter: 100 mm
Thickness : 20 mm
Absorption (@ 532nm) : 97%
Ti:Sa Crystal (Crystal Systems)
4 Pass-Amplifier
Transverse lasing suppression with
Index matching liquid + absorbing dye
Liquid IN
Liquid OUT
IR beam
8 beams – 100 J – 0.1 Hz pumping
Homogenized pump laser Profiles
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20107
Research on XUV sources and applications : 6 years in 1 slide
2004 - 2006 : Laser installation in a development room (90m2)& demonstration of laser amplification @ 40 J / 0.1 Hz
2007 - 2009 : → X-ray and HHG sources @ 10 Hz→ increase reliability→ first applications @ 10 Hz
IR
XUV
David ROS in X-Ray lasers conference, Belfast 2008 : « Waiting for moving in the new building at end of this year »
Started may 2009
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20108
2 – Research on XUV sources and applications
from 2007 to 2009
M. PittmanICUIL 2010 - Watkins Glen, NY, October 20109
Arrangement of the experimental area
2007 : XUV laser & experiments
40 J – 0.1Hz Amplifier
IR Beam
XUV Beam
2 J - 10Hz Front-end
Pulse Compressor
XUV Generation
Experiment Chamber
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201010
XUV Generation by transient collisionnal excitation : GRIP scheme
Solid Target
Stretched laser pulse(500 ps, 0.5 J)
DelayedCompressed laser pulse
(4 ps, 0.7 J)
XUV beam
Plasma column
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201011
XUV Development : DGRIP principle (single beam pumping technique)
Solid Target
XUV beam
Plasma column
Stretched laser pulse(500 ps, 0.5 J)
+Delayed
Compressed laser pulse (4 ps, 0.7 J)
ONE BEAM
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201012
Öffner stretcher
Regenerative amplifier
Amplifiers
Compression
Regen cavity selects the propagation direction the two pulses propagate along the same beam path
XUV Development : DGRIP scheme
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201013
XUV Development : demonstrated beamlines
Demonstrated applicationDouble-stand breaks in DNA samples
induced with X-ray laser
F. Lindau et al., Opt. Exp.15, 9486 (2006)K. Cassou et al. Opt. Lett.32, 2 (2007)
X-ray laser source
Wavelengths:
18,9 nm (Mo ni-like,4d-4p) and 22.6 nm (4f-4d)
13,9 nm (Ag ni-like, 4d-4p)
Repetition rate : 10 HzSource size 20 µm x 60 µmDivergence 5 mrad x10 mradEnergy : >1 J
Wavelength
Gas cell
HHG source
H43 = 18.9 nm
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201014
XUV Development : diagnostics & automation
XUV diagnostics
Spatial
Energy
Near field imaging
~300 shots on the same place of the target
(DGRIP configuration)
Footprint (Far field ~2m from source)
Multilayer mirror photocurrent (pico-amperemeter)
& Calibrated near field imaging
0.00E+00
5.00E+06
1.00E+07
1.50E+07
2.00E+07
2.50E+07
3.00E+07
0 50 100 150 200 250 300 350
shot number
ne
ar
fie
ld e
ne
rgy
(a
.u)
0.00E+00
5.00E+06
1.00E+07
1.50E+07
2.00E+07
2.50E+07
3.00E+07
0 50 100 150 200 250 300 350
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201015
XUV Development : diagnostics & automation
Automation of experiments (B. Zielbauer, coll. GSI)
50 mm
Fresh target surface every 200 shots
System stops when the desired number of shots / integrated signal is reached
Up to 25000 shots of 300 nJ in 2 h 4,3.1014 photons (65 eV) / cm2
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201016
Users : • LCAM (Univ. Paris XI) : E. Porcel, C. Le Sech, S. Lacombe • GPS (Univ. Paris VI) : A.-M. Penhoat, A. TouatiBackground • Effect of pulsed ionising radiation on DNA• Investigation of direct effects• Single strand or double strand break of DNA moleculesExperimental method• Irradiation of plasmids (DNA loops)• Accumulation of a XUV dose perfectly known and uniform• Strand rate estimation by an ex-situ electrophoresis
Example of application using the optimized XUV source
DNA samples irradiation
Courtesy of B. Zielbauer (GSI, DE)
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201017
3 – Present status of LASERIX from 2010
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201018
Present status of LASERIX 2010 : Implementation in the new building
ADONISlaser driver
Comp. 2J - 10Hz
SXRL 10 Hz
HHG 10 Hz
SXRL 0.1 Hz
Comp.40J -0.1Hz
SXRL 0.1 Hz
HHG 0.1 Hz
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201019
ADONIS : The Laser driver Scheme
FRONT-END10Hz - 4 Pass Preamplifier
Oscillator
Verdi 5V
Öffner Stretcher
Dazzler
10Hz - Regenerativeamplifier
QL - CFR
0.1Hz - 8 x 12.5J – 527nm pump lasers (100J)
Femtolaser fs-20
0.1
Hz
Nd
:Gla
ss
0.1
Hz
Nd
:Gla
ss
AMPLI - HE
MZ
10Hz – fs Booster Pre-amplifier
QL - ULTRA
FR
PK CA
SPK C
PK C
PK C
QL - ULTRA
2.5J – 0.1Hz
10Hz - 4 Pass Direct water cooled Power Amplifier
PROPULSE
PROPULSE
10Hz - 4 Pass Cryogenic Power Amplifier
PROPULSE
PROPULSE
PROPULSE
PROPULSE
PROPULSE
PROPULSE
AMPLI - HC
0.1
Hz
Nd
:Gla
ss
0.1
Hz
Nd
:Gla
ss
XU
V
HC
/2 moving plate (0.1 Hz)
>10 mJ – 50 fs – 10 Hz (IR probes, HHG…)
1J - 0.1Hz / 10Hz 40 fs
> 50 mJ – 40 fs – 10 Hz (IR probes, HHG…)2.5J – 10Hz (99% shots )
/2
10 J - 0.1 Hz 40 fs - 100 ps
XU
V
HE
20 J - 0.1 Hz 500 ps
0.1Hz - 4 x 20J – 527nm pump lasers (80J) – LBO SHG
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201020
Ground floor
Overview of the laser driver ADONIS and SXRL sources area
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201021
Overview of the experimental area
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201022
4- Prospects and Conclusion
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201023
LASERIX Beamlines
SXRL 10Hz
HHG10Hz
Exp. 1
Exp. 2
ADONIS
2.5J 10Hz
100mJ 10Hz
SXRL - HC
40J 0.1Hz
100mJ 0.1Hz
SXRL 0.1HzExp. 3
HHG0.1Hz
SXRL - HE
Ongoing → ready for 2011
Coming soon → expected for 2012
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201024
Status and ongoing work
Present situation• ADONIS (Laser driver) operating at 2.5 J – 10 Hz
• Two 10 Hz compressed IR beamlines available : 1.4 J / 1 ps to 100 ps (SXRL) 100 mJ / 40 fs (IR probe or HHG pumping)
• 100 J / 0.1 Hz pump lasers ready with DKDP, LBO installed soon (160 J expected)→ 4 beams (2 tables) will be shared with ILE (LUIRE & APPOLON)
• 10 Hz SXRL and HHG under development→ expected with optimized performances before end 2010 (GRIP &
DGRIP)
• Full Command-control of the entire installation under development→ expected before summer 2011 (coll. Amplitude Technologies)
Coming soon• 10 Hz SXRL beamline opening for experiments (coll.) → beginning 2011
• 40 J – 0.1 Hz amplifier (8 pump beams) & compressor → planned for beginning 2011
• 0.1 Hz high energy SXRL development → planned for mid-2011
• 0.1 Hz SXRL HE beamline opening for experiments (coll.) → end 2011
M. PittmanICUIL 2010 - Watkins Glen, NY, October 201025
THANK YOU
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