bioul.ppt
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bioulTRANSCRIPT
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Optimization of the Czochralski silicon
growth process by means of
configured magnetic fields
F. Bioul, N. Van oethem, !. "u,B. #elsaute, $. $olinsky,
N. Van den Bogaert, V. $egnier, F. #upret
%ni&ersit' catholi(ue de !ou&ain
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Bulk growth from the melt : basic
techniquesCzochralski (Cz),
Liquid Encapsulated
Czochralski (LEC)
Czochralski (Cz),
Liquid Encapsulated
Czochralski (LEC)
Floating Zone (FZ)
Floating Zone (FZ) Vertical Bridgman
Vertical Bridgman
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Czochralski process
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Factors affecting crystal quality
• Cylindrical shape(technological requirement)
• egularity of the lattice(reduction of defects : point defects! dislocations! twins")
• #mpurities(o$ygen in %i growth)
• Crystal stoichiometry&dopant concentration(reduction of a$ial and radial segregation)
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'umerical modeling goals
• Better understanding of the factors affecting crystal quality
• rediction of : crystal and melt temperature e*olution solid+liquid interface shape melt flow residual stresses dopant and impurity concentrations defects and dislocations
• rocess design impro*ement
• rocess control and optimization
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rincipal aspects of the problem
• Coupled! global→ interaction between heat transfer in crystal andmelt! solidification front deformation and o*erallradiation transfer
• 'on+linear
→ physics of radiation! melt con*ection andsolidification
• ,ynamic→ critical growth stages: seeding! shouldering! tail+
end! crystal detachment! post+growth
• #n*erse→ natural output is prescribed (crystal shape)! while
natural input is calculated (heater power or pull rate)
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-elt con*ection
. %ignificant heat transfer mechanism defect and dislocation densities
growth striations
interface shape
. ,ominant mechanism for dopant and
impurity transfer dopant and impurity (o$ygen) distributions
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/ypical flow pattern
-elt con*ection is due to
• Buoyancy (0)
• Forced con*ection
+ Coriolis (1)
+ Centrifugal pumping (2)
• -arangoni effect (3)
• 4as flow (5)
01
23
5crystal
melt
Ωs
Ωc
crucible
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6uasi+steady a$isymmetric models
• 7b8ecti*eCoupling with quasi+steady and dynamic
global heat transfer models
• ,ifficulties
%tructured temporal and azimuthal oscillations
(2, unsteady effects) 9 superposed chaotic
oscillations (turbulence)
a&erage modeling re(uired
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-elt flow model
Renolds equations !
→ µ", k " ! additional #iscosit and conducti#it
Renolds equations !
→ µ", k " ! additional #iscosit and conducti#it
Hypotheses : $ncompressi%le &e'tonian luid Boussinesq approimation
*uasi+stead, tur%ulent or laminar lo'
Hypotheses : $ncompressi%le &e'tonian luid Boussinesq approimation
*uasi+stead, tur%ulent or laminar lo'
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t t- t. t/ t0 t1 t2 timet3
Cone
gro'th
Bod
gro'th
4ail+end
stage
*uasi+stead simulations
'ith melt lo'
*uasi+stead simulations
'ith melt lo'
4ime+
dependentsimulation
'ith
interpolated
lo' eect
4ime+
dependent
simulation
'ith
interpolated
lo' eect
4ime+dependent
simulation can pro#ide
quasi+stead sourceterms equi#alent to
transient terms
4ime+dependent
simulation can pro#ide
quasi+stead sourceterms equi#alent to
transient terms
4eneral dynamic strategy
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-elt con*ection
• ow to modify the flow;<arge electrical conducti*ity of semiconductor melts
=se of magnetic fields to control the flow
• >*ailable magnetic fields ,C or >C >$isymmetric : *ertical or configured /rans*erse (horizontal) otating
• ,ifficulties orizontal fields (2, effects) 'umerical problems (artmann layers") 1, turbulence (;)
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igid magnetic fields
5hm6s la' !
Conser#ation o charge !
5hm6s la' !
Conser#ation o charge !
igid magnetic field appro$imation :induced magnetic field is negligible
#mposed steady a$isymmetric magnetic field :
igid magnetic field appro$imation :induced magnetic field is negligible
#mposed steady a$isymmetric magnetic field :
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>nalytical solutionsFrom 8ellming ? @alker! 0AA2
$istence of a free shear layer :plays an important role in o$ygen andimpurity transfer
ypotheses :
igh artmann number :
#nertialess appro$imation (*alid if BDE1/) :
ypotheses :
igh artmann number :
#nertialess appro$imation (*alid if BDE1/) :
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Case # : Case ## :
'o magnetic field lines incontact with neither thecrystal nor the crucible
-agnetic field lines incontact with both the crystaland the crucible
B
Crystal
-elt
Crucible
B
Crystal
-elt
Crucible
Free shear layer
>nalytical solution
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6uasi+steady numerical results
Material and geometrical parameters :
7ilicon crstal diameter ! - mm
Cruci%le diameter ! / mm8olecular dnamic #iscosit ! 9:..e+0 kg;m:s
Process parameters :
Crstal rotational rate ! + . rpm (+ .:< rad;s)
Cruci%le rotational rate ! = 1 rpm (= :1./ rad;s)
>ull rate ! -:9 cm;h (1:e+2 m;s)
Material and geometrical parameters :
7ilicon crstal diameter ! - mm
Cruci%le diameter ! / mm8olecular dnamic #iscosit ! 9:..e+0 kg;m:s
Process parameters :
Crstal rotational rate ! + . rpm (+ .:< rad;s)
Cruci%le rotational rate ! = 1 rpm (= :1./ rad;s)
>ull rate ! -:9 cm;h (1:e+2 m;s)
FEMAG SoftwareFEMAG Software
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-agnetic field lines
Bma$.DED2/ Bma$.DE/
-agnetic field generated by
1 coils with same radius
(GDD mm)
/urbulence -odel :
>dapted -i$ing <ength
B.D/
%tokes stream function
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-agnetic field lines
-agnetic field generated by 1
coils with different radii
(GDD mm and 5 mm)
/urbulence model :
>dapted -i$ing <ength
Bma$.DE1/ Bma$.DEA/
%tokes stream function
B.D/
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Run A
5pposite crstal and cruci%le
rotation senses
7ilicon
8iing length model
µ ? 9:..1 -+0 kg;m:s
Ωc? :1. s+-
Ωs? +.:5< s+-
V pul ? 1: -+2 m;s
Run A
5pposite crstal and cruci%le
rotation senses
7ilicon
8iing length model
µ ? 9:..1 -+0 kg;m:s
Ωc? :1. s+-
Ωs? +.:5< s+-
V pul ? 1: -+2 m;s
Run B
7ame as " 'ith a #ertical
magnetic ield
B ? :/. 4esla
Run B
7ame as " 'ith a #ertical
magnetic ield
B ? :/. 4esla
)n&erse dynamic simulations of silicon growth
FEMAG! softwareFEMAG! software
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BB
AA
*tream function for runs + and B*tream function for runs + and B
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emperature field for runs + and Bemperature field for runs + and B
BB
AA
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7ff+line Control
• Ob-ecti&e/o determine the best e*olution of the process
parameters in order to optimize selected process
*ariables characterizing crystal shape and quality
<ong+term time scales are considered (instead of
short+term time scales for on+line control)
• ethodology,ynamic simulations are performed under super*ision
of a controller
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7ff+line Control
4ime+dependent
simulator
4ime+dependent
simulator
5+linecontroller 5+line
controller
@o process #aria%les
satis the control
o%Aecti#es
7tartne' time step 'ith
updated process
parameters
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Conclusions
• >ccurate quasi+steady and dynamic simulation modelsare a*ailable using F->4+1 software
• %imulations are in agreement with theoretical predictions
• /urbulence modeling must be *alidated and impro*ed ifnecessary
• 'umerical scheme should be able to control mesh
refinement along boundary and internal layers
• 7ff+line control is a promising technique for optimizingthe magnetic field design
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k+l turbulence model
• ow to modify the flow;
"dditional #iscosit !
"dditional conducti#it !
! mean tur%ulent kinetic energ
'here
"ur#ulent $inetic energy e%uation
! parameters o the model
! additional >randtl num%er
From /hE @etzel
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,imensionless parameters
cruci%le Renolds num%er
(related to Coriolis orce)
crstal rotation Renolds
num%er
(related to centriugal orce)
rasho num%er
(related to natural con#ection)
>randtl num%er
Dartmann num%er
cruci%le Renolds num%er (related to Coriolis orce)
crstal rotation Renolds
num%er
(related to centriugal orce)
rasho num%er
(related to natural con#ection)
>randtl num%er
Dartmann num%er