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Determination of Electrostatic Potential and Charge Distribution of Semiconductor Nanostructures using Off-axis Electron Holography by Luying Li A Dissertation Presented in Partial Fulfillment of the Requirements for the Degree Doctor of Philosophy Approved April 2011 by the Graduate Supervisory Committee: Martha R. McCartney, Co-Chair David J. Smith, Co-Chair Michael J. Treacy John Shumway Jeff Drucker ARIZONA STATE UNIVERSITY May 2011

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  • Determination of Electrostatic Potential and Charge Distribution of

    Semiconductor Nanostructures using Off-axis Electron Holography

    by

    Luying Li

    A Dissertation Presented in Partial Fulfillment of the Requirements for the Degree

    Doctor of Philosophy

    Approved April 2011 by the Graduate Supervisory Committee:

    Martha R. McCartney, Co-Chair

    David J. Smith, Co-Chair Michael J. Treacy

    John Shumway Jeff Drucker

    ARIZONA STATE UNIVERSITY

    May 2011

  • i

    ABSTRACT

    The research of this dissertation involved quantitative characterization of

    electrostatic potential and charge distribution of semiconductor nanostructures

    using off-axis electron holography, as well as other electron microscopy

    techniques. The investigated nanostructures included Ge quantum dots, Ge/Si

    core/shell nanowires, and polytype heterostructures in ZnSe nanobelts. Hole

    densities were calculated for the first two systems, and the spontaneous

    polarization for wurtzite ZnSe was determined.

    Epitaxial Ge quantum dots (QDs) embedded in boron-doped silicon were

    studied. Reconstructed phase images showed extra phase shifts near the base of

    the QDs, which was attributed to hole accumulation in these regions. The

    resulting charge density was (0.03 0.003) holes/nm3, which corresponded to

    about 30 holes localized to a pyramidal, 25-nm-wide Ge QD. This value was in

    reasonable agreement with the average number of holes confined to each Ge dot

    determined using a capacitance-voltage measurement.

    Hole accumulation in Ge/Si core/shell nanowires was observed and

    quantified using off-axis electron holography and other electron microscopy

    techniques. High-angle annular-dark-field scanning transmission electron

    microscopy images and electron holograms were obtained from specific

    nanowires. The intensities of the former were utilized to calculate the projected

    thicknesses for both the Ge core and the Si shell. The excess phase shifts

    measured by electron holography across the nanowires indicated the presence of

  • ii

    holes inside the Ge cores. The hole density in the core regions was calculated to

    be (0.4 0.2) /nm3 based on a simplified coaxial cylindrical model.

    Homogeneous zincblende/wurtzite heterostructure junctions in ZnSe

    nanobelts were studied. The observed electrostatic fields and charge accumulation

    were attributed to spontaneous polarization present in the wurtzite regions since

    the contributions from piezoelectric polarization were shown to be insignificant

    based on geometric phase analysis. The spontaneous polarization for the wurtzite

    ZnSe was calculated to be psp = -(0.0029 0.00013) C/m2, whereas a first

    principles calculation gave psp = -0.0063 C/m2. The atomic arrangements and

    polarity continuity at the zincblende/wurtzite interface were determined through

    aberration-corrected high-angle annular-dark-field imaging, which revealed no

    polarity reversal across the interface.

    Overall, the successful outcomes of these studies confirmed the capability

    of off-axis electron holography to provide quantitative electrostatic information

    for nanostructured materials.

  • iii

    ACKNOWLEDGMENTS

    First of all, I would like to express my deepest gratitude to my advisors

    Professor Martha R. McCartney and Regents Professor David J. Smith for their

    esteemed support and guidance that made all the exciting achievements possible.

    As an expert in the area of electron holography, Professor McCartney is so

    experienced in experimental details as well as creative in generating new ideas,

    discussing with her is really a spiritual enjoyment. Professor Smith is really

    enthusiastic to work with, and his meticulous attitude and patience in front of

    students deeply impresses me. Study in their group will be a great memory for me.

    I would like to thank Professors Michael Treacy, John Shumway, and Jeff

    Drucker for serving on my dissertation committee. I am grateful for the use of

    facilities in the John M. Cowley Center for High Resolution Electron Microscopy,

    and I thank for Karl Weiss and Dr. Zhenquan Liu for their technical support and

    assistance throughout my research.

    I would like to express my appreciation to Professor Jeff Drucker, Dr.

    Sutharsan Ketharanathan, Dr. Eric Dailey, and Dr. Prashanth Madras of Arizona

    State University, and Professor Jianbo Wang and Dr. Lei Jin of Wuhan University

    for their collaboration and for providing the samples used for investigation in this

    dissertation. Financial support from US Department of Energy (Grant No. DE-

    FG02-04ER46168) is also gratefully acknowledged.

    Particular thanks to our research group members for their help during my

    stay. I thank Dr. Lin Zhou, Lu Ouyang, Wenfeng Zhao, Michael Johnson, Allison

  • iv

    Boley, Sahar Hihath, Jae Jin Kim, Dinghao Tang, and Zhaofeng Gan for their

    friendship and kindness.

    Finally, I am very grateful to my family for their love and encouragement

    in sunny and rainy days.

  • v

    TABLE OF CONTENTS

    Page

    LIST OF FIGURES .................................................................................................... ix

    CHAPTER

    1. INTRODUCTION .......................................................................................... 1

    1.1 Backgound ................................................................................................ 1

    1.2 Tailoring of Charge Distribution in Semiconductors .............................. 6

    1.2.1. p-n junctions ......................................................................................... 6

    1.2.2. Band-alignment-induced charge distribution ...................................... 9

    1.2.3. Polarization-induced charge distribution ........................................... 11

    1.3. Growth of Semiconductor Nanostructures ........................................... 15

    1.3.1. Epitaxial growth ................................................................................. 15

    1.3.2. Thermal evaporation .......................................................................... 20

    1.4. Outline of Dissertation .......................................................................... 20

    References ..................................................................................................... 23

    2. EXPERIMENTAL DETAILS ..................................................................... 27

    2.1. Off-axis Electron Holography ............................................................... 27

    2.1.1. Background ........................................................................................ 27

    2.1.2. Experimental setup ............................................................................. 28

    2.1.3. Reconstruction of electron holograms ............................................... 30

    2.1.4. Mean inner potential .......................................................................... 36

    2.2. Scanning Transmission Electron Microscopy ...................................... 38

    2.2.1. Energy-dispersive X-ray spectroscopy .............................................. 39

  • vi

    CHAPTER Page

    2.2.2 High-angle annular-dark field imaging .............................................. 40

    2.3. Sample Preparation ............................................................................... 42

    References ..................................................................................................... 45

    3. STUDY OF HOLE ACCUMULATION IN INDIVIDUAL GERMANIUM

    QUANTUM DOTS IN P-TYPE SILICON ................................................ 47

    3.1. Introduction ........................................................................................... 47

    3.1.1. Hut, pyramid and dome structures ..................................................... 47

    3.1.2. Composition and shape transition for capped Ge quantum

    dots ...................................................................................................... 50

    3.1.3. Electron charging behavior of Ge quantum dots ............................... 51

    3.2. Experimental Details ............................................................................. 53

    3.3. Results and Discussion .......................................................................... 55

    3.3.1. Charge distribution in n-type and p-type Ge quantum dots .............. 55

    3.3.2. Electron holography study of n-type Ge quantum dots .................... 57

    3.3.3. Electron holography study of p-type Ge quantum dots .................... 58

    3.3.4. Comparison of hole density with C-V measurement ........................ 65

    3.4. Conclusions ........................................................................................... 66

    References ..................................................................................................... 68

    4. OBSERVATION OF HOLE ACCUMULATION IN Ge/Si CORE/SHELL

    NANOWIRES .............................................................................................. 70

    4.1 Introduction .....................................