electroless cobalt with designed coercivity
TRANSCRIPT
tion of lead on the surfaces of the brass components and to effec- tively remove oxide from the sur- faces of the brass components; rinsing with an aqueous solution to remove the cleaning agent; re- moving essentially all of the leachable lead by contacting with a lead removal reagent selected from the group consisting of am- monium chloride and an alkali metal hydroxide; contacting with an aqueous solution to remove the lead removal reagent; contacting with an aqueous solution to re- move the lead removal reagent; contacting with a water-soluble acid to remove any leachable lead remaining on the surfaces of the brass components and to remove any precipitated lead salts; and
rinsing to leave the component substantially free of the reagents.
ELECTROLESS COBALT WlTH DESIGNED COERClVlTV
U.S. Patent 6,197,364. Mar. 6, 2001 M. Paunovic and C. Jahnes, assignors to International Business Machines Corp., Armonk., N.Y.
A method of depositing from a sin- gle electroless plating bath a co- balt-phosphorus magnetic film on a substrate, the cobalt-phospho- rus film having a variable coerci- vity between 510 and 1.6 Oe, com- prising preparing an electroless plating solution consisting essen- tially of a source of cobalt ions, a source of citrate ions, a buffering compound to stabilize the pH, a source of hypophosphite ions, and
sufficient hydroxide anions to ob- tain a pH between 7 and 9 and a sulfamate non-reactant com- pound selected from the group consisting of sodium sulfamate, potassium sulfamate, and sulfa- mic acid, said sulfamate com- pound present in concentrations ranging from trace amounts to 0.2M to obtain a plating solution; and immersing the substrate in the plating solution for a time suf- ficient to produce, at a constant rate, a film on the substrate hav- ing a direct linear relationship to the concentration of the sulfa- mate compound.
IN-LINE COATING AND CURING WELDED TUBE
U.S. Patent 6,197,394. Mar. 6, 2001
> Bright Cd Range > Deposit Ductility > Covering Power
> Organic Contamination > Metallic Contamination
> Suspending Particles
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