eq-10 euv source for metrology applications

EQ-10 EUV Source

for Metrology Applications

EQ-10 EUV Source

for Metrology Applications

Debbie Gustafson, Matt Partlow,

Paul Blackborow, Steve Horne,

Matt Besen, Don Smith

Debbie Gustafson, Matt Partlow,

Paul Blackborow, Steve Horne,

Matt Besen, Don Smith

2010 International Workshop on EUV Sources – Dublin- November 2010 2

Key Requirements for a Metrology SourceKey Requirements for a Metrology Source

• High Brightness

• Excellent Spatial Stability

• High Pulse-Pulse Stability

• High System Reliability


EQ-10 Source

• Introduced in 2005

• 13.5nm ±1% Power in 2π

– 10W continuously

– Now 20W

– @2 kHZ

• 10kHz operation also

• Operates continuously for

days and weeks


Electrodeless Z-Pinch

Induced High Current Pulse

Induced High Current Pulse

Magnetic

Field

Magnetic

Field

Inductively

Coupled Gas

Plasma (Xe)

Inductively

Coupled Gas

Plasma (Xe)

Z-Pinched

Plasma

Z-Pinched

Plasma

EUV

• Inductive design

eliminates electrodes

and electrode current

• Plasma is magnetically

confined away from

source components and

‘pinned’

electromagnetically to

the geometric center of

the bore


System Reliability

•Shipped over 15 sources in the field

• Installations in Japan, Europe and US

•Systems being operated 24/7 with minimal downtime

– One system has many 10s of billions of pulses at 2kHz at 24/7 operation

•Systems integrated into tools for research and development

– Actinic Inspection

– Resist Outgassing

– Mask Contamination

– Optics Testing


Wavefront Metrology Tool

Optics Testing

Wavefront Metrology Tool

Optics Testing


Actinic Mask Defect Detection Tool at

MIRAI-Selete

Recent Improvements in EQ-

10 Brightness and Power

Recent Improvements in EQ-

10 Brightness and Power


EQ-10 in-band EUV Brightness

0

5000

10000

15000

20000

25000

30000

-2.5 -2 -1.5 -1 -0.5 0 0.5 1 1.5 2 2.5

radius [mm]

0%

10%

20%

30%

40%

50%

60%

70%

80%

90%

100%

0 0.5 1 1.5 2 2.5 3 3.5 4

radius [mm]

% p

ow

er

wit

hin

rad

ius

•Brightness is a function of power and radius


0

1

2

3

4

5

6

7

8

0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1

radius 'r' [mm]

bri

gh

tne

ss

(r)

[W/m

m^

2/s

r]

Brightness as function of radius

Standard EQ-10

P= 11.2 Watts/2π;

13.5nm 2%BW

F= 0.345 FWHM


Stability in EUV Plasma Position

• Image recorded once an hour for over 300 million pulses (~44hours) of continuous

operation. Position then extracted from images:

– Position: σx= 5.8 µm and σy= 5.0 µm

-200

-150

-100

-50

0

50

100

150

200

-200 -100 0 100 200

X position [microns]

Y p

ositi

on [m

icro

ns]

• Brightness remains

constant

• This is open-loop stability: No feedback!

• Brightness remains

constant


-20

-10

0

10

20

-20 -10 0 10 20

FWHM ~ 400 µµµµm


Stability in EUV Plasma Size

• Image recorded once an hour for over 300 million pulses (~44hours) of continuous

operation. Size then extracted from images:

– Size: σFWHMx= 3.1 µm and σFWHMy= 3.6 µm

300

320

340

360

380

400

420

440

460

480

500

0 50 100 150 200 250 300

millions of pulses

FW

HM

[m

icro

ns

]

x FWHM (microns)

y FWHM (microns)

mean +/- 30microns

• Brightness Remains Constant


• Brightness Remains Constant



Redesigned Source

Advantages for new design

•All surfaces exposed to plasma

pinch are replaced with bore

exchange

• High current capacity contact

insert

– plasma erosion at contact area

reduced

– More consistent electrical contact

• Improved cooling for bore insert


Increased Power with New Source Design

280V 1900Hz – Standard Operating Conditions

0

5

10

15

20

25

50 55 60 65 70 75 80 85 90

Pressure (mT)

EU

V P

ow

er

[Watt

s/2

p/2

%B

W]

EQ-10 Redesigned EQ-10


Increased Brightness New Source

0

1

2

3

4

5

6

7

8

9

10

0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1

radius 'r' [mm]

bri

gh

tne

ss

(r)

[W/m

m^

2/s

r]

P= 25.7 Watts/2π

13.5nm 2%BW

F= 0.440 FWHM


Improvements to Pulse ModulatorImprovements to Pulse Modulator

•Conditions: 280V,2200Hz,100mT

•The modulator was recently redesigned to improve power handling and stability.

•The redesign is to force the compression stages to a well-defined state prior to

each charging cycle, thus reducing or eliminating this source of variability

•Pulse to pulse stability with Original Modulator – ~16%

•Pulse to pulse stability with redesigned Modulator ~2%


Key Requirements for a Metrology SourceKey Requirements for a Metrology Source

√High Brightness

√Excellent Spatial Stability

√High Pulse-Pulse Stability

√High System Reliability


Closing RemarksClosing Remarks

• The Energetiq EQ-10 EUV source is a reliable and stable source of EUV

photons.

• The system is being operated in the field 24/7 with consistent operation over

years!

• Energetiq Sources are being used for infrastructure development globally.

• Redesign of the source offers higher power and higher brightness operation

– Brightness of ~8W/mm^2-sr

– 20W/ 2π

– Improved pulse-to-pulse stability

– Continued excellent plasma stability


AcknowledgementsAcknowledgements

• The team at Energetiq…

• Our valued customers…

• Our excellent partners and collaborators…

eq-10 euv source for metrology applications

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