integrated optical interferometric biosensors based on

6
Integrated Optical Interferometric Biosensors based on Microelectronics Technology for Biosensing Applications F. Prieto l , B. Sepúlveda J , A. Calle l , A. Llobera 2 , C. Dominguez 2 and L.M . Lechuga] Biosensors Group. Centro Nacional de Mi croelectrónica CIMM;2rMB)-CNM.CSrc. Isaac Newton 8 (PTM), 28760 Tres Cantos, Madrid (Spai n) e-mail: [email protected] .csic. es http://www.imm.cnm.csic.es/biosensores/ho me.html Summary. In/ egraled aplica/ sensors have reached a greal importance during lasl years since Ihe)' can be l/sed for Ihe direcl deleclion of biomo/eClllar interaclions. Moreover, Silicon microelectronics lechn%gy a// oH' s mass produclion as we // as Ihe fabrica/ion of microsyslems by hybrid integration of sources, sensors. pholOdeleclOrs and CMOS eleclronics. For the fabricatiol1 of an eVClnescenl fie/d sensor with an integrated Mach-Zehnder interferometric (MZI) configuration, Ihe optica/ waveguides must verify two main characteristics: monomode behavio ur and high slllf ace sensilivin·. 1/1 Ihis paper we present the development of a MZI sensor based on two different oplical ,vaveguides: TlR (Total Internal Reflection) and ARROW (Anliresonant Reflecting Oplical Wavegu ides). The advantages of both struclures ar e discllssed and experimental results of Ihe devices are prese nta/o Kevwords: evanescenlfie/d sensor, MZI, biosensor Subject categor)': 5 (Biosel1sors) 1. Introduction Sensors based on integraled optícs are acquiring greal si gnific an ce due to its hi gh sensitivity, mechanical stabílity, possibility of miniaturisation and mass production [1]. These dev ices are based on eva nes ce nt field sensing: although light is confined within lhe core of th e waveguide, there is a pan of the guided light that travels lhrough a region that ex tends outward, approximalely a hundred nanometers, into the media surrounding the waveguide. so its field can interact with the environment. Therefore, a biomolecular interaclion between a receptor mol ecule, previously deposited on the waveguide surface, and its complementary analyte . produces a change in the refractive index at lhe sensor surface that induces a variation in the optical properties of ¡he guided light via the evanescenr field . Among the dífferent measurement configurations (grating coupler [2]. resonant minor [3], ... ) 10 detect this variation , we have chose n an interferometric method based on the Mach-Zehnder Interferometer (MZI) due ro its higher sensitivity [4]. In a MZI [5], a phase shi ft between the sensing and the reference arm is indu ced by lhe biomolecular reaction that causes an intensity modulation at th e se nsor output. For sensing applications. the oplical waveguides thal form the MZI se nsor must veri fy two condi li ons: monomode behavióur a nd high surface sensitivity. In this work we present the developmenl of a Mach- Zehnder interferometer sensor based on two different optical waveguides. Single-mode optical waveguides based on Total Internal Reflection (TIR) have a very high surface se nsitivit y [6 ] but present sorne drawbacks: the reduced core dimensions for monomode behaviour (thi ckness of hundreds nanometers and rib depths of few nanometers) implies a t ec hnological di sadvantage for mass production and large insertion los ses when coupling light with single-mode op tical fibres (w ith a core lhickness of severa! micromelers ). To overcome these difficulties we propose lhe use of Antiresona nt Reílecting Optical Waveguides (ARROW) [7]. Mon omode behaviour for these waveguides can be achieved with co re dimensions in lhe order of micrometers and, therefore, we eliminate the difficu!ty in the fabrication of TIR wavegu ides. Moreover, the larger core dimensions implies lower inserti on losses for end-fire coupling. The main disadvantage of this s tructu re is the lower surface sensitivity when compared with TIR waveguides. 2. MZr sensor configuration In the integrated version of a Mach-Zehnder interferometer, an input optical waveguide is split into two arms, whi ch, after a cenain distance, recombine again in an output optica! waveguide [5] (se e Fig.1). The sensor is complete!y covered with a protective layer and only in one of ¡he arms, a sensor area of length L is opened to bring into contact tlle waveguide and the 111 Congreso Iberoamericano de Sensores y Biosensores t31-.

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Page 1: Integrated Optical Interferometric Biosensors based on

Integrated Optical Interferometric Biosensors based on Microelectronics Technology for Biosensing Applications

F Prieto l B SepuacutelvedaJ

A Calle l A Llobera2

C Dominguez2 and LM Lechuga] Biosensors Group Centro Nacional de Microe lectroacutenica CIMM2rMB)-CNMCSrc

Isaac Newton 8 (PTM) 28760 Tres Cantos Madrid (Spai n) e-mail borjaimmcnmcsic es httpwww immcnmcsicesbiosensoreshomehtml

Summary Inegraled aplica sensors have reached a greal importance during lasl years since Ihe) can be lsed for Ihe direcl deleclion of biomoeClllar interaclions Moreover Silicon microelectronics lechngy aoHs mass produclion as we as Ihe fabricaion of microsyslems by hybrid integration of sources sensors pholOdeleclOrs and CMOS eleclronics For the fabricatiol1 of an eVClnescenl fied sensor with an integrated Mach-Zehnder interferometric (MZI) configuration Ihe optica wa veguides must verify two main characteristics monomode behaviour and high slllface sensilivinmiddot 11 Ihis paper we present the development of a MZI sensor based on two different oplical vaveguides TlR (Total Internal Reflection) and ARROW (Anliresonant Reflecting Oplical Waveguides) The advantages of both struclures are discllssed and experimental results of Ihe devices are presentao

Kevwords evanescenlfied sensor MZI biosensor Subject categor) 5 (Biosel1sors)

1 Introduction

Sensors based on integraled optiacutecs are acquiring greal si gnificance due to its high sensitivity mechanical stabiacutelity possibility of miniaturisation and mass production [1] These devices are based on evanescent field sensing although light is confined within lhe core of the waveguide there is a pan of the guided light that travels lhrough a region that ex tends outward approximalely a hundred nanometers into the media surrounding the waveguide so its field can interact with the environment Therefore a biomolecular interaclion between a receptor molecule previously deposited on the waveguide surface and its complementary analyte

produces a change in the refractive index at lhe sensor surface that induces a variation in the optical properties of iexclhe guided light via the evanescenr field

Among the diacutefferent measurement configurations (grating coupler [2] resonant minor [3] ) 10 detect this variation we have chosen an interferometric method based on the Mach-Zehnder Interferometer (MZI) due ro its higher sensitivity [4] In a MZI [5] a phase shi ft between the sensing and the reference arm is induced by lhe biomolecular reaction that causes an intensity modulation at th e se nsor output

For sensing applications the oplical waveguides thal form the MZI se nsor must veri fy two condi lions monomode behavioacuteur and high surface sensitivity In this work we present the developmenl of a Mach-

Zehnder interferometer sensor based on two different optical waveguides Single-mode optical waveguides based on Total Internal Reflection (TIR) have a very high surface sensitivity [6] but present sorne drawbacks the reduced core dimensions for monomode behaviour (thickness of hundreds nanometers and rib depths of few nanometers) implies a technological disadvantage for mass production and large insertion losses when coupling light with single-mode op tical fibres (with a core lhickness of severa micromelers ) To overcome these difficulties we propose lhe use of Antiresona nt Reiacutelecting Optical Waveguides (ARROW) [7] Monomode behaviour for these waveguides can be achieved with core dimensions in lhe order of micrometers and therefore we eliminate the difficuty in the fabrication of TIR wavegu ides Moreover the larger core dimensions implies lower inserti on losses for end-fire coupling The main disadvantage of this structu re is the lower surface sensitivity when compared with TIR waveguides

2 MZr sensor configuration

In the integrated version of a Mach-Zehnder interferometer an input optical waveguide is split into two arms which after a cenain distance recombine again in an output optica waveguide [5] (se e Fig1) The sensor is completey covered with a protective layer and only in one of iexclhe arms a sensor area of length L is opened to bring into contact tlle waveguide and the

111 Congreso Iberoamericano de Sensores y Biosensores t31-

environment When there is a in the the mediacuteum refractive

in the sensor arm will experience a phase shift with guided in the other branch

At the output i nterference between from both arms will be observed

oc [1 + V cos (1)

where LlltP (ltp r - ltP s) is the shift between

modes in the reference and arm

LlltP 2n L jN

L is the of the sensor area is the and LlN is the in the effective refracrive index

iexclhe variariacuteon in iexclhe properties of iexclhe ourer medium The factor (V) the contraS of the interference between the maximum and miacutenimum intensity) and on iexclhe

factor of iexclhe divisor and on iexclhe propagariacuteon losses of iexclhe mode in the interferometer arms To obtain a maximum 10

a divisor or factor of 3 dE that input is in each branch of the interferometer Moreover losses in the sensor and reference arm should be identical

1 MZI scheme

With these several MZI were rhe

parameters AII iexclhe devices are symmetric wiiexclh two differen divisor in the tlrst case the Y-junction is formed with arms and of 1deg In the second case the divisor is with circular bends with radii of 5 20 and 80 mm In all cases iexclhe separation between the sensor and reference arms is lOO lm to avoid coupling between modes

both branches In one arm a sensor area with different (6 10 15 and 20 is created The total

3 Optical waveguides for applications

The optical iexclhat will foriacuten iexclhe MZI must verify two conditions monomode behaviour and surface We have based on two different types of and ARROW structures For iexclhe fabricariacuteon of these

we have used a Silicon CMOS compatible

structure in which the optica is by total interna reflection at rhe interfaces of the core layer and the surrounding media The materias used for the fabrication of iexclhese structures are silicon oxide for the cladding 1 and silicon niacutetride for the core 200) Single-mode behaviour for this configuratiacuteon is obtained with core thickness in the order of hundreds of nanometers (l00-300 nm) and rib depths of few nanometers

is a

As we mentioned applications sorne reduced dimensions of the core To overcome these

we have iexclhe use of VC~UlJC based on the ARROW structure In these

is confined in iexclhe core total internal reflection at iexclhe ouler medium-core interface and by antiresonant reneCllOn al the interference cladding underneath the core [9] The materials used for iexclhe fabricariacuteon of these structures are silicon oxide for iexclhe core and second cladding and silicon nitride for iexclhe first With this monomode behaviour is obtained with core thickness in iexclhe order of several micrometers Jm) and of few micrometers of iexclhe core These dimensions are with the diameter

111 Congreso Iberoamericano de Sensores y Biosensores

35 T1R Vave guld e

30 = 20 0

2 o

15

lt1l 10 u

~ 05 J (J)

20 30 40 50 60 70

eommereial optical fibers ando therefore insertion losses are lower than for TIR waveguides Moreo ver the core dimensions also imply advanrages in rhe fabrieation processes

However surface sensitivity for the ARROW structure is two orders of magnitude lower than for TIR waveguides [7] As it has been shown previously [10 11] coating the core surface of iexclhe ARROW structure with a high refractive index thin layer can enhance surfaee sensitivity For overlay thiekness of some tens of nanometer (35-40nm) sensitivity is increased more than one order of magnitude and with iexclhis eontiguration the ARROW sensitivity differs only a factor 4 compared to surface sensiti vity for TIR waveguides (see Figure 3)

4 0 -

E c o ~ --o

25

~ Vl c lt1l Vl

Overla y thi ckn es s (nm)

Fig 3 Comparison of surfaee sensitivity for the ARROW (so lid line) and TIR (dashed line) structures (TE polarization )

31 Fabrication of the devices The fabrication of the devices is performed on our

Clean Room facilities using a CMOS compatible process The scheme for the fabrication of ARROW structures is shown in Figure 4 The general structure is a substrate of Si a 2 )lm Si01 second cladding layer of refraetive index 146 made by thermal oxidation of the Silicon substrate (see Figure 4 (a) ) a 03 )lm SiN4 first cladding layer of refractive index 200 deposited using Low Pressure Chemical Vapour Deposition (LPCVD) at 800 Oc (Figure 4 (b)) and a 2-4 )lm Sio eore with refractive index ranging from 146-1 9 (depending on x) deposited by Plasma Enhanced Chemieal Vapour Deposition (PECVD) at 300 oC (Figure 4 (e)) The teehnology of growing non-stoichiometric silieon oxide by PECVD has been developed pre viously in our group [12) To obtain monomode lateral confinement of light a rib structure with a depth of 60 of the core thickness and a width of 4-7 f-lm was defined by dry Reacti ve Ion Etch ing (RIE) Using this technique the Mach-Zehnder eonfiguration was defined on the core layer (Figure 4 (draquo On the top of the interferometer a protective

C ore iexclh ic kn es s (nm I 50 100 15 0 200 250 300

TE pol ~ flzatlon

80 90 100

Silicon Nitride layer of 012 f-lm was deposi ted (Figure 4 Ceraquo FinaJl y the structure was covered with a silicon oxicle layer of 2 )lm (Figure 4 (f)) In one of the arms (sensor arm) the Si01 layer was etched in an area of 100 f-lm wide and 6-20 mm large in order to bring into contact the waveguide and the environment (Figure 4 (g)) Finally the sensors are cut in indi vidual pieces and polished for light coupling by end-face

The fabrication process for the devices based on the TlR structure is similar to the one described above In this case the fabrication only in vo lves the deposition of three layers a 2 f-lm Si01 cladding layer of refractive index 146 grown by thermal oxidation of the Silicon substrate the silicon nitride core layer (ncore 200) deposited by LPCVD with a thickness of 250 nm After the definition of the MZI structure by RIE (rib depth = 3 nm) a 2 )lm silicon oxideprotec tive layer (n = 146) is deposited by PECVD

~

ITE Siliacutec on (Siacute) El Silicon dioxide (Si02)

al Silicoll nilride (SiN4 )

Fi gure 4 Fabrication process for the ARROW structure a) Si01 second c1adding growth by Thermal Oxidation b) Si3N4 first cladding deposited by LPCVD c) SiO core deposited by PECVD d) definition of the se nsor structure by RIE e) Si3N4 overlay deposited by LPCVD f) SiOx protection layer deposited by PECVD g) opening of the se nsor area by RIE

4 Experimental evaluation

For the experimental evaluation Jight from a He-Ne Jaser (A-=6328 nm) is coupled to a si ngle-mode optical fibre (38 )lm eore diameter) using a mieroseope objeetive (40 x) The end of the monomode fibre is pl aeed in front of the waveguide rib faee to couple light into the sensor (end-fire eoupling) Light is eolleeted by a multimode optical f1bre (50 f-lm core diameter) connected to a PIN si licon photodiode We use precise translation stages for the aceurate alignment of all the

111 Congreso Iberoamericano de Sensores y Biosensores fj)

I components A synchronous detection scheme is used with the aid of a lock-in ampl ifier and a Iight chopper

The se nsor is being developed for the detection of biochemical interactions between a receptor molecule and its complementary analyte The effect of this reaction is comparable to a change of the bulk refractive index of the outer medium Therefore the use of solutions with different refractive indexes is useful for studying the sensor sensitivity Several solutions were prepared with different glucose concentrations in water with refractive indexes varying from 13325 to 14004 (plusmn 00002) as determined by an Abbe refractometer operating at 25 oc A tlow cel] mechanised in Teflon (with a channel width of 3 mm a depth of 100 iexcltm and a length of 15 mm) is cJamped onto the interferometer and a tlow injection system is used to deliver the glucose solutions into the sensor area

41 ARROW-MZI sensor Next results with the MZI sensors fabricated with

the ARROW structure are presented Using as a reference the refractive index of deionised (DI) water (13325) different glucose solutions with varying refractive indexes were introduced alternatively as it is shown in Figure 5 With these measulements a calibrating curve was evaluated where the phase response of the sensor is plotted versus the variation in the refractive index o Figure 6 shows these calibrating curves for four different MZI sensors using TE polarization For a sensor with a core thickness of 4 iexcltm and the overlay thickness of 120 nm (solid circle in Fig 6) sensitivity is very low as theory predicts [7] However if the overlay thickness is decreased to some tens of nanometers ie 39 nm (sol id square in Fig 6) sensitivity is enhanced more than an order of magnitude [10] In this case the detection limit for the refractive index variation is LlnIIIill = 1middot 101 (M = lmiddot 10

065 ~

11

QM M

N g iexcl N

~ Mo M M060 ~ ~

~ ~

11 ~ 11 e ee 055

---shy~ 050 ro --

~ 045 21 ~

i1(J) -040

035

030 30 35 40 45 50 JJ

Tim e (min) Fig 5 Sensor response for a change of the refractive index in the sensor area Variation for glucose solutions with different refractive indexes TE polarization

31 111 Congreso Iberoamericano de Sensores y Biosensores

Sensitivity can also be increased if the core thickness diminishes because the guided mode is less confined within the core [7] For a sensor with 3 iexcltm of core thickness (open square in Figure 6) the refractive index detection limit is one order of magnitude higher than before (LlnOlllin = lmiddot 104 (M =2middot 105raquo

30 oshyN 25 euroo S 20 Q) el t 15 ro c U 10 al ()

ro c o O

bull de 4 JlIn d llU ~ 1 20 nm

bull de = 4 iexcliexclIYI do ~ 39 nm

O d 3 ~d bullbull -3gnm

d 3 ~ d~ shy 37 nm

0 00 001 0 02 0 03 0 04 0 05 0 06 0 07

Refractive index varlatlon (oacuten)

Fig 6 Calibrating curves for the MZI-ARROW sensor with different waveguide structures (see the inset) (TE polarization)

Finally as it is shown in Figure 3 for small variations of the overay thickness sensi ti vity can be increased significantly A variation of on1y 2 nm in this overlay (37 nm solid triangle in Figure 6) implies a sensitivity increment of almost one order of magnitude In this case the maximum sensitivity obtained is

dLlt1gt(2rr) ) = 481 whlch corresponds to a( dn ARROW

minimum detectable refractive index variation of Llnolnin =2middot 105 (M =lmiddot 106)

6 r-----------------------------~--~ lt1(211) = 145267LY1

NI = 71 0middot 0 m 11

~ 4 (1)

Ol t 3 ~

c u 2 (1) ()

c ~

o o L-~__~__~__~__~__~______~__~

00 10 103 20x10 3 0x10 40x10

Refractlve Index variallan (6n)

Fig 7 Calibration curve for the MZI-TIR sensor Core thickness of 250 nm TM polarization

4

42 TIR-MZI sensor The same type of measurements was performed wiacuteth

a MZI sensor fabricated with the TIR structure We selected a sensor with a core thickness of 250 nm and a rib width of 3 nm Results for TM polarization are shown if Figure 7 Sensitivity for the MZI-TIR sensor

dM)(27r) ) ( = 1453) IS a factor 3 higher than for the ( dn TlR

sensor based on the ARROW structure This implies a lower detection limit of L1n om il = 7middot 106 (L1N = 75middot lO

0

~

F~ (J

)

Glt

)

GJ e g1o )

reg

BS

0) ~~~~~~~~~~~~~~~~~

O 20 ~o 40 Time (rnin)

a)

reg reg )

~ (-l

~

C)

-ltl

--- J

GJ

3 e O)

(i)

iexcl~

n 45

Time (min)

b)

Fig 8 Signa response (TE polarisation) of the MZIshyARROW sensor to the antigenantibody (X-HSAlHSA immunoreaction 1) Physical adsorption of the (X-HSA antibody 2) Rinsing with PBS 3) Blocking with BSA 4) Rinsing with PBS 5) Immunoreaction with the antigen HSA 6) Rinsing wilh PBS

5 Biosensor applications

As an example of biosensing appication we ha ve used the sensor for the detection of the immunoreaction antibody-antigen (X-HSNHSA (Human Serul1I Albumin

Sigma A0433) The measurements have been performed with a MZI-ARROW sensor with 3 iexcliexclm of core thic~_ness an interaction length of 15 mm and an overlay thiCkness of 37 nm

Measurements are performed in phosphate buffered saline (PBS) with a pH of 735 at room temperature and maintaining a low flow rate (20 ~Imin) Initially a concentration of 67middot 106 M (Img mr 1

) human serum abumin antibody (X-HSA) is introduced in the sensor mea Figure 8a shows the response of the sensor ro the physical adsorptiacuteon of the antibodiacutees that correspond to a net phase change of 6lt1gt=42middot 211 equivalent to a surface coverage of 18 ng mm2 After rinsing with PBS and bocking with BSA (bovine serum albumin) a concentration of 77middot 10-6 M human serum albumin antigen (HSA) is flowed through the sensor giving a net phase change of 6lt1gt=2middot 211 (Figure 8b) due to the immunoreaction

6 Conclusions

We have deveoped an evanescent field sensor based on Silicon microelectronics technology It makes use of an integrated MZI configuration fabricated with two different waveguide structures TIR and ARROW The main features of these waveguides must be monomode behaviour and high surface sensitivity To achieve these characteristics for ARROW we employ a modified structure in which lhe core is overcoated with a high refractive index thin ayer To obtain monomode behaviour the parameters oiacute the waveguide must be carefully chosen We have presented experimental results of a MZI sensor based on the two waveguides working as a refractometer For the MZI-ARROW sensor the lower refractive index detection limit is L1nom il = 2middot 10-5

while for the MZI-TIR sensor this limit is a factor 3 lower (L1n omin = 7middot 10-6

) Finally we present a preliminary result of the MZI-ARROW sensor for biochernical applications

References

[1] R P H Kooyman and L M Lechuga Immunosensors middot based on total internal reflectance in Handbook of middot hiosensors and eleclronic loses E Kress-Rogers Ed

New York CRC Press 1997 pp 169-196 [2] K Tiefenthaler W Lukosz Sensitivity of grating

couplers as integrated-optical chemical sensors 1 Opl Soco Am S vol 6 n 2 pp 209-2201989

[3] R Cush 1M Cronin WJ Stewart CH Maule 1 Molloy NJ Godclard The resonant mirror a novel optical biosensor for direct sensing of biomolecular interactions Part 1 principie of operation and associated

middot instrumentation Siosel1 and Sioelectron vol 8 pp 347-353 1993

111 Congreso Iberoamericano de Sensores y Biosensores

I [4] W Lukosz Principies and sensitivities of integrated optical and surface plasmon sensors for direct aftinity sensing and immuno se nsing Biosen Bioleelrol1 vol 6 pp 215-2251991

[5] R Syms J Cozens OJliell gllided 11a1es und deviels Ed McGraw Hil Londres 1992

[6] EF Shipper AM Brugman C Oomiacutenguez LM Lechuga RPH Koo yman J Gre ve Tile realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology Sellsors (llld AelltalOrS B vol 40 pp 147-153 1997

[7] F Priero A Lobera O Jimeacutenez C Oominguez A Calle and LM Lechuga Ocs ign and Analysis 01 Silicon Antiresonant Retlecring Optica l Waveguides for Evanescent Field Sensors1 of Liglzlllale Teehno vol 18 pp 966-972 2000

[81 Moreno M Garceacutes 1 Muiioz J Oomiacutenguez c Calderer J Yilluendas F amp Pelayo J CMOS Comparible ARROW Guides Proc of rhe 8th CIMTECshyWorld Cerami e Congress and Forum on New Material s Advanced Materials in Oprics Electro-Opties and Communieations Technologies Firenza (Italyl pp 465shy472 1995

[9] Ouguay MA Kokubun Y amp Koeh TL Antiresonant Retleeting Optical Waveguides in SiOTSi Mulrilayer Struetures Applied Physies Lerters 22 pp 892 1986

[10) F Prieto LM Lechuga A Calle A Lobera and C Oominguez Optimixed Silieon AntiResonant Retleeting Optieal Waveguides fol Sensing Applieations1 of LighlYiexclave TecllllO January 200 l

[11) GR Quigley RO Harris and 1S Wilkinson Sensitivity enhancement of integrated optical sensors by use of thin high-index lilms Applied Ofilies vol 38 no 28 pp 6036-60391999

(12) C Oomiacutenguez 1 A Rodriacuteguez F 1 Muntildeoz and N Zine Plasma enhanced CYO silicon oxide films fol integrated opti e applications Vacuwll vol 52 pp 395shy400 1999

3sect 111 Congreso Iberoamericano de Sensores y Biosensores

Page 2: Integrated Optical Interferometric Biosensors based on

environment When there is a in the the mediacuteum refractive

in the sensor arm will experience a phase shift with guided in the other branch

At the output i nterference between from both arms will be observed

oc [1 + V cos (1)

where LlltP (ltp r - ltP s) is the shift between

modes in the reference and arm

LlltP 2n L jN

L is the of the sensor area is the and LlN is the in the effective refracrive index

iexclhe variariacuteon in iexclhe properties of iexclhe ourer medium The factor (V) the contraS of the interference between the maximum and miacutenimum intensity) and on iexclhe

factor of iexclhe divisor and on iexclhe propagariacuteon losses of iexclhe mode in the interferometer arms To obtain a maximum 10

a divisor or factor of 3 dE that input is in each branch of the interferometer Moreover losses in the sensor and reference arm should be identical

1 MZI scheme

With these several MZI were rhe

parameters AII iexclhe devices are symmetric wiiexclh two differen divisor in the tlrst case the Y-junction is formed with arms and of 1deg In the second case the divisor is with circular bends with radii of 5 20 and 80 mm In all cases iexclhe separation between the sensor and reference arms is lOO lm to avoid coupling between modes

both branches In one arm a sensor area with different (6 10 15 and 20 is created The total

3 Optical waveguides for applications

The optical iexclhat will foriacuten iexclhe MZI must verify two conditions monomode behaviour and surface We have based on two different types of and ARROW structures For iexclhe fabricariacuteon of these

we have used a Silicon CMOS compatible

structure in which the optica is by total interna reflection at rhe interfaces of the core layer and the surrounding media The materias used for the fabrication of iexclhese structures are silicon oxide for the cladding 1 and silicon niacutetride for the core 200) Single-mode behaviour for this configuratiacuteon is obtained with core thickness in the order of hundreds of nanometers (l00-300 nm) and rib depths of few nanometers

is a

As we mentioned applications sorne reduced dimensions of the core To overcome these

we have iexclhe use of VC~UlJC based on the ARROW structure In these

is confined in iexclhe core total internal reflection at iexclhe ouler medium-core interface and by antiresonant reneCllOn al the interference cladding underneath the core [9] The materials used for iexclhe fabricariacuteon of these structures are silicon oxide for iexclhe core and second cladding and silicon nitride for iexclhe first With this monomode behaviour is obtained with core thickness in iexclhe order of several micrometers Jm) and of few micrometers of iexclhe core These dimensions are with the diameter

111 Congreso Iberoamericano de Sensores y Biosensores

35 T1R Vave guld e

30 = 20 0

2 o

15

lt1l 10 u

~ 05 J (J)

20 30 40 50 60 70

eommereial optical fibers ando therefore insertion losses are lower than for TIR waveguides Moreo ver the core dimensions also imply advanrages in rhe fabrieation processes

However surface sensitivity for the ARROW structure is two orders of magnitude lower than for TIR waveguides [7] As it has been shown previously [10 11] coating the core surface of iexclhe ARROW structure with a high refractive index thin layer can enhance surfaee sensitivity For overlay thiekness of some tens of nanometer (35-40nm) sensitivity is increased more than one order of magnitude and with iexclhis eontiguration the ARROW sensitivity differs only a factor 4 compared to surface sensiti vity for TIR waveguides (see Figure 3)

4 0 -

E c o ~ --o

25

~ Vl c lt1l Vl

Overla y thi ckn es s (nm)

Fig 3 Comparison of surfaee sensitivity for the ARROW (so lid line) and TIR (dashed line) structures (TE polarization )

31 Fabrication of the devices The fabrication of the devices is performed on our

Clean Room facilities using a CMOS compatible process The scheme for the fabrication of ARROW structures is shown in Figure 4 The general structure is a substrate of Si a 2 )lm Si01 second cladding layer of refraetive index 146 made by thermal oxidation of the Silicon substrate (see Figure 4 (a) ) a 03 )lm SiN4 first cladding layer of refractive index 200 deposited using Low Pressure Chemical Vapour Deposition (LPCVD) at 800 Oc (Figure 4 (b)) and a 2-4 )lm Sio eore with refractive index ranging from 146-1 9 (depending on x) deposited by Plasma Enhanced Chemieal Vapour Deposition (PECVD) at 300 oC (Figure 4 (e)) The teehnology of growing non-stoichiometric silieon oxide by PECVD has been developed pre viously in our group [12) To obtain monomode lateral confinement of light a rib structure with a depth of 60 of the core thickness and a width of 4-7 f-lm was defined by dry Reacti ve Ion Etch ing (RIE) Using this technique the Mach-Zehnder eonfiguration was defined on the core layer (Figure 4 (draquo On the top of the interferometer a protective

C ore iexclh ic kn es s (nm I 50 100 15 0 200 250 300

TE pol ~ flzatlon

80 90 100

Silicon Nitride layer of 012 f-lm was deposi ted (Figure 4 Ceraquo FinaJl y the structure was covered with a silicon oxicle layer of 2 )lm (Figure 4 (f)) In one of the arms (sensor arm) the Si01 layer was etched in an area of 100 f-lm wide and 6-20 mm large in order to bring into contact the waveguide and the environment (Figure 4 (g)) Finally the sensors are cut in indi vidual pieces and polished for light coupling by end-face

The fabrication process for the devices based on the TlR structure is similar to the one described above In this case the fabrication only in vo lves the deposition of three layers a 2 f-lm Si01 cladding layer of refractive index 146 grown by thermal oxidation of the Silicon substrate the silicon nitride core layer (ncore 200) deposited by LPCVD with a thickness of 250 nm After the definition of the MZI structure by RIE (rib depth = 3 nm) a 2 )lm silicon oxideprotec tive layer (n = 146) is deposited by PECVD

~

ITE Siliacutec on (Siacute) El Silicon dioxide (Si02)

al Silicoll nilride (SiN4 )

Fi gure 4 Fabrication process for the ARROW structure a) Si01 second c1adding growth by Thermal Oxidation b) Si3N4 first cladding deposited by LPCVD c) SiO core deposited by PECVD d) definition of the se nsor structure by RIE e) Si3N4 overlay deposited by LPCVD f) SiOx protection layer deposited by PECVD g) opening of the se nsor area by RIE

4 Experimental evaluation

For the experimental evaluation Jight from a He-Ne Jaser (A-=6328 nm) is coupled to a si ngle-mode optical fibre (38 )lm eore diameter) using a mieroseope objeetive (40 x) The end of the monomode fibre is pl aeed in front of the waveguide rib faee to couple light into the sensor (end-fire eoupling) Light is eolleeted by a multimode optical f1bre (50 f-lm core diameter) connected to a PIN si licon photodiode We use precise translation stages for the aceurate alignment of all the

111 Congreso Iberoamericano de Sensores y Biosensores fj)

I components A synchronous detection scheme is used with the aid of a lock-in ampl ifier and a Iight chopper

The se nsor is being developed for the detection of biochemical interactions between a receptor molecule and its complementary analyte The effect of this reaction is comparable to a change of the bulk refractive index of the outer medium Therefore the use of solutions with different refractive indexes is useful for studying the sensor sensitivity Several solutions were prepared with different glucose concentrations in water with refractive indexes varying from 13325 to 14004 (plusmn 00002) as determined by an Abbe refractometer operating at 25 oc A tlow cel] mechanised in Teflon (with a channel width of 3 mm a depth of 100 iexcltm and a length of 15 mm) is cJamped onto the interferometer and a tlow injection system is used to deliver the glucose solutions into the sensor area

41 ARROW-MZI sensor Next results with the MZI sensors fabricated with

the ARROW structure are presented Using as a reference the refractive index of deionised (DI) water (13325) different glucose solutions with varying refractive indexes were introduced alternatively as it is shown in Figure 5 With these measulements a calibrating curve was evaluated where the phase response of the sensor is plotted versus the variation in the refractive index o Figure 6 shows these calibrating curves for four different MZI sensors using TE polarization For a sensor with a core thickness of 4 iexcltm and the overlay thickness of 120 nm (solid circle in Fig 6) sensitivity is very low as theory predicts [7] However if the overlay thickness is decreased to some tens of nanometers ie 39 nm (sol id square in Fig 6) sensitivity is enhanced more than an order of magnitude [10] In this case the detection limit for the refractive index variation is LlnIIIill = 1middot 101 (M = lmiddot 10

065 ~

11

QM M

N g iexcl N

~ Mo M M060 ~ ~

~ ~

11 ~ 11 e ee 055

---shy~ 050 ro --

~ 045 21 ~

i1(J) -040

035

030 30 35 40 45 50 JJ

Tim e (min) Fig 5 Sensor response for a change of the refractive index in the sensor area Variation for glucose solutions with different refractive indexes TE polarization

31 111 Congreso Iberoamericano de Sensores y Biosensores

Sensitivity can also be increased if the core thickness diminishes because the guided mode is less confined within the core [7] For a sensor with 3 iexcltm of core thickness (open square in Figure 6) the refractive index detection limit is one order of magnitude higher than before (LlnOlllin = lmiddot 104 (M =2middot 105raquo

30 oshyN 25 euroo S 20 Q) el t 15 ro c U 10 al ()

ro c o O

bull de 4 JlIn d llU ~ 1 20 nm

bull de = 4 iexcliexclIYI do ~ 39 nm

O d 3 ~d bullbull -3gnm

d 3 ~ d~ shy 37 nm

0 00 001 0 02 0 03 0 04 0 05 0 06 0 07

Refractive index varlatlon (oacuten)

Fig 6 Calibrating curves for the MZI-ARROW sensor with different waveguide structures (see the inset) (TE polarization)

Finally as it is shown in Figure 3 for small variations of the overay thickness sensi ti vity can be increased significantly A variation of on1y 2 nm in this overlay (37 nm solid triangle in Figure 6) implies a sensitivity increment of almost one order of magnitude In this case the maximum sensitivity obtained is

dLlt1gt(2rr) ) = 481 whlch corresponds to a( dn ARROW

minimum detectable refractive index variation of Llnolnin =2middot 105 (M =lmiddot 106)

6 r-----------------------------~--~ lt1(211) = 145267LY1

NI = 71 0middot 0 m 11

~ 4 (1)

Ol t 3 ~

c u 2 (1) ()

c ~

o o L-~__~__~__~__~__~______~__~

00 10 103 20x10 3 0x10 40x10

Refractlve Index variallan (6n)

Fig 7 Calibration curve for the MZI-TIR sensor Core thickness of 250 nm TM polarization

4

42 TIR-MZI sensor The same type of measurements was performed wiacuteth

a MZI sensor fabricated with the TIR structure We selected a sensor with a core thickness of 250 nm and a rib width of 3 nm Results for TM polarization are shown if Figure 7 Sensitivity for the MZI-TIR sensor

dM)(27r) ) ( = 1453) IS a factor 3 higher than for the ( dn TlR

sensor based on the ARROW structure This implies a lower detection limit of L1n om il = 7middot 106 (L1N = 75middot lO

0

~

F~ (J

)

Glt

)

GJ e g1o )

reg

BS

0) ~~~~~~~~~~~~~~~~~

O 20 ~o 40 Time (rnin)

a)

reg reg )

~ (-l

~

C)

-ltl

--- J

GJ

3 e O)

(i)

iexcl~

n 45

Time (min)

b)

Fig 8 Signa response (TE polarisation) of the MZIshyARROW sensor to the antigenantibody (X-HSAlHSA immunoreaction 1) Physical adsorption of the (X-HSA antibody 2) Rinsing with PBS 3) Blocking with BSA 4) Rinsing with PBS 5) Immunoreaction with the antigen HSA 6) Rinsing wilh PBS

5 Biosensor applications

As an example of biosensing appication we ha ve used the sensor for the detection of the immunoreaction antibody-antigen (X-HSNHSA (Human Serul1I Albumin

Sigma A0433) The measurements have been performed with a MZI-ARROW sensor with 3 iexcliexclm of core thic~_ness an interaction length of 15 mm and an overlay thiCkness of 37 nm

Measurements are performed in phosphate buffered saline (PBS) with a pH of 735 at room temperature and maintaining a low flow rate (20 ~Imin) Initially a concentration of 67middot 106 M (Img mr 1

) human serum abumin antibody (X-HSA) is introduced in the sensor mea Figure 8a shows the response of the sensor ro the physical adsorptiacuteon of the antibodiacutees that correspond to a net phase change of 6lt1gt=42middot 211 equivalent to a surface coverage of 18 ng mm2 After rinsing with PBS and bocking with BSA (bovine serum albumin) a concentration of 77middot 10-6 M human serum albumin antigen (HSA) is flowed through the sensor giving a net phase change of 6lt1gt=2middot 211 (Figure 8b) due to the immunoreaction

6 Conclusions

We have deveoped an evanescent field sensor based on Silicon microelectronics technology It makes use of an integrated MZI configuration fabricated with two different waveguide structures TIR and ARROW The main features of these waveguides must be monomode behaviour and high surface sensitivity To achieve these characteristics for ARROW we employ a modified structure in which lhe core is overcoated with a high refractive index thin ayer To obtain monomode behaviour the parameters oiacute the waveguide must be carefully chosen We have presented experimental results of a MZI sensor based on the two waveguides working as a refractometer For the MZI-ARROW sensor the lower refractive index detection limit is L1nom il = 2middot 10-5

while for the MZI-TIR sensor this limit is a factor 3 lower (L1n omin = 7middot 10-6

) Finally we present a preliminary result of the MZI-ARROW sensor for biochernical applications

References

[1] R P H Kooyman and L M Lechuga Immunosensors middot based on total internal reflectance in Handbook of middot hiosensors and eleclronic loses E Kress-Rogers Ed

New York CRC Press 1997 pp 169-196 [2] K Tiefenthaler W Lukosz Sensitivity of grating

couplers as integrated-optical chemical sensors 1 Opl Soco Am S vol 6 n 2 pp 209-2201989

[3] R Cush 1M Cronin WJ Stewart CH Maule 1 Molloy NJ Godclard The resonant mirror a novel optical biosensor for direct sensing of biomolecular interactions Part 1 principie of operation and associated

middot instrumentation Siosel1 and Sioelectron vol 8 pp 347-353 1993

111 Congreso Iberoamericano de Sensores y Biosensores

I [4] W Lukosz Principies and sensitivities of integrated optical and surface plasmon sensors for direct aftinity sensing and immuno se nsing Biosen Bioleelrol1 vol 6 pp 215-2251991

[5] R Syms J Cozens OJliell gllided 11a1es und deviels Ed McGraw Hil Londres 1992

[6] EF Shipper AM Brugman C Oomiacutenguez LM Lechuga RPH Koo yman J Gre ve Tile realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology Sellsors (llld AelltalOrS B vol 40 pp 147-153 1997

[7] F Priero A Lobera O Jimeacutenez C Oominguez A Calle and LM Lechuga Ocs ign and Analysis 01 Silicon Antiresonant Retlecring Optica l Waveguides for Evanescent Field Sensors1 of Liglzlllale Teehno vol 18 pp 966-972 2000

[81 Moreno M Garceacutes 1 Muiioz J Oomiacutenguez c Calderer J Yilluendas F amp Pelayo J CMOS Comparible ARROW Guides Proc of rhe 8th CIMTECshyWorld Cerami e Congress and Forum on New Material s Advanced Materials in Oprics Electro-Opties and Communieations Technologies Firenza (Italyl pp 465shy472 1995

[9] Ouguay MA Kokubun Y amp Koeh TL Antiresonant Retleeting Optical Waveguides in SiOTSi Mulrilayer Struetures Applied Physies Lerters 22 pp 892 1986

[10) F Prieto LM Lechuga A Calle A Lobera and C Oominguez Optimixed Silieon AntiResonant Retleeting Optieal Waveguides fol Sensing Applieations1 of LighlYiexclave TecllllO January 200 l

[11) GR Quigley RO Harris and 1S Wilkinson Sensitivity enhancement of integrated optical sensors by use of thin high-index lilms Applied Ofilies vol 38 no 28 pp 6036-60391999

(12) C Oomiacutenguez 1 A Rodriacuteguez F 1 Muntildeoz and N Zine Plasma enhanced CYO silicon oxide films fol integrated opti e applications Vacuwll vol 52 pp 395shy400 1999

3sect 111 Congreso Iberoamericano de Sensores y Biosensores

Page 3: Integrated Optical Interferometric Biosensors based on

35 T1R Vave guld e

30 = 20 0

2 o

15

lt1l 10 u

~ 05 J (J)

20 30 40 50 60 70

eommereial optical fibers ando therefore insertion losses are lower than for TIR waveguides Moreo ver the core dimensions also imply advanrages in rhe fabrieation processes

However surface sensitivity for the ARROW structure is two orders of magnitude lower than for TIR waveguides [7] As it has been shown previously [10 11] coating the core surface of iexclhe ARROW structure with a high refractive index thin layer can enhance surfaee sensitivity For overlay thiekness of some tens of nanometer (35-40nm) sensitivity is increased more than one order of magnitude and with iexclhis eontiguration the ARROW sensitivity differs only a factor 4 compared to surface sensiti vity for TIR waveguides (see Figure 3)

4 0 -

E c o ~ --o

25

~ Vl c lt1l Vl

Overla y thi ckn es s (nm)

Fig 3 Comparison of surfaee sensitivity for the ARROW (so lid line) and TIR (dashed line) structures (TE polarization )

31 Fabrication of the devices The fabrication of the devices is performed on our

Clean Room facilities using a CMOS compatible process The scheme for the fabrication of ARROW structures is shown in Figure 4 The general structure is a substrate of Si a 2 )lm Si01 second cladding layer of refraetive index 146 made by thermal oxidation of the Silicon substrate (see Figure 4 (a) ) a 03 )lm SiN4 first cladding layer of refractive index 200 deposited using Low Pressure Chemical Vapour Deposition (LPCVD) at 800 Oc (Figure 4 (b)) and a 2-4 )lm Sio eore with refractive index ranging from 146-1 9 (depending on x) deposited by Plasma Enhanced Chemieal Vapour Deposition (PECVD) at 300 oC (Figure 4 (e)) The teehnology of growing non-stoichiometric silieon oxide by PECVD has been developed pre viously in our group [12) To obtain monomode lateral confinement of light a rib structure with a depth of 60 of the core thickness and a width of 4-7 f-lm was defined by dry Reacti ve Ion Etch ing (RIE) Using this technique the Mach-Zehnder eonfiguration was defined on the core layer (Figure 4 (draquo On the top of the interferometer a protective

C ore iexclh ic kn es s (nm I 50 100 15 0 200 250 300

TE pol ~ flzatlon

80 90 100

Silicon Nitride layer of 012 f-lm was deposi ted (Figure 4 Ceraquo FinaJl y the structure was covered with a silicon oxicle layer of 2 )lm (Figure 4 (f)) In one of the arms (sensor arm) the Si01 layer was etched in an area of 100 f-lm wide and 6-20 mm large in order to bring into contact the waveguide and the environment (Figure 4 (g)) Finally the sensors are cut in indi vidual pieces and polished for light coupling by end-face

The fabrication process for the devices based on the TlR structure is similar to the one described above In this case the fabrication only in vo lves the deposition of three layers a 2 f-lm Si01 cladding layer of refractive index 146 grown by thermal oxidation of the Silicon substrate the silicon nitride core layer (ncore 200) deposited by LPCVD with a thickness of 250 nm After the definition of the MZI structure by RIE (rib depth = 3 nm) a 2 )lm silicon oxideprotec tive layer (n = 146) is deposited by PECVD

~

ITE Siliacutec on (Siacute) El Silicon dioxide (Si02)

al Silicoll nilride (SiN4 )

Fi gure 4 Fabrication process for the ARROW structure a) Si01 second c1adding growth by Thermal Oxidation b) Si3N4 first cladding deposited by LPCVD c) SiO core deposited by PECVD d) definition of the se nsor structure by RIE e) Si3N4 overlay deposited by LPCVD f) SiOx protection layer deposited by PECVD g) opening of the se nsor area by RIE

4 Experimental evaluation

For the experimental evaluation Jight from a He-Ne Jaser (A-=6328 nm) is coupled to a si ngle-mode optical fibre (38 )lm eore diameter) using a mieroseope objeetive (40 x) The end of the monomode fibre is pl aeed in front of the waveguide rib faee to couple light into the sensor (end-fire eoupling) Light is eolleeted by a multimode optical f1bre (50 f-lm core diameter) connected to a PIN si licon photodiode We use precise translation stages for the aceurate alignment of all the

111 Congreso Iberoamericano de Sensores y Biosensores fj)

I components A synchronous detection scheme is used with the aid of a lock-in ampl ifier and a Iight chopper

The se nsor is being developed for the detection of biochemical interactions between a receptor molecule and its complementary analyte The effect of this reaction is comparable to a change of the bulk refractive index of the outer medium Therefore the use of solutions with different refractive indexes is useful for studying the sensor sensitivity Several solutions were prepared with different glucose concentrations in water with refractive indexes varying from 13325 to 14004 (plusmn 00002) as determined by an Abbe refractometer operating at 25 oc A tlow cel] mechanised in Teflon (with a channel width of 3 mm a depth of 100 iexcltm and a length of 15 mm) is cJamped onto the interferometer and a tlow injection system is used to deliver the glucose solutions into the sensor area

41 ARROW-MZI sensor Next results with the MZI sensors fabricated with

the ARROW structure are presented Using as a reference the refractive index of deionised (DI) water (13325) different glucose solutions with varying refractive indexes were introduced alternatively as it is shown in Figure 5 With these measulements a calibrating curve was evaluated where the phase response of the sensor is plotted versus the variation in the refractive index o Figure 6 shows these calibrating curves for four different MZI sensors using TE polarization For a sensor with a core thickness of 4 iexcltm and the overlay thickness of 120 nm (solid circle in Fig 6) sensitivity is very low as theory predicts [7] However if the overlay thickness is decreased to some tens of nanometers ie 39 nm (sol id square in Fig 6) sensitivity is enhanced more than an order of magnitude [10] In this case the detection limit for the refractive index variation is LlnIIIill = 1middot 101 (M = lmiddot 10

065 ~

11

QM M

N g iexcl N

~ Mo M M060 ~ ~

~ ~

11 ~ 11 e ee 055

---shy~ 050 ro --

~ 045 21 ~

i1(J) -040

035

030 30 35 40 45 50 JJ

Tim e (min) Fig 5 Sensor response for a change of the refractive index in the sensor area Variation for glucose solutions with different refractive indexes TE polarization

31 111 Congreso Iberoamericano de Sensores y Biosensores

Sensitivity can also be increased if the core thickness diminishes because the guided mode is less confined within the core [7] For a sensor with 3 iexcltm of core thickness (open square in Figure 6) the refractive index detection limit is one order of magnitude higher than before (LlnOlllin = lmiddot 104 (M =2middot 105raquo

30 oshyN 25 euroo S 20 Q) el t 15 ro c U 10 al ()

ro c o O

bull de 4 JlIn d llU ~ 1 20 nm

bull de = 4 iexcliexclIYI do ~ 39 nm

O d 3 ~d bullbull -3gnm

d 3 ~ d~ shy 37 nm

0 00 001 0 02 0 03 0 04 0 05 0 06 0 07

Refractive index varlatlon (oacuten)

Fig 6 Calibrating curves for the MZI-ARROW sensor with different waveguide structures (see the inset) (TE polarization)

Finally as it is shown in Figure 3 for small variations of the overay thickness sensi ti vity can be increased significantly A variation of on1y 2 nm in this overlay (37 nm solid triangle in Figure 6) implies a sensitivity increment of almost one order of magnitude In this case the maximum sensitivity obtained is

dLlt1gt(2rr) ) = 481 whlch corresponds to a( dn ARROW

minimum detectable refractive index variation of Llnolnin =2middot 105 (M =lmiddot 106)

6 r-----------------------------~--~ lt1(211) = 145267LY1

NI = 71 0middot 0 m 11

~ 4 (1)

Ol t 3 ~

c u 2 (1) ()

c ~

o o L-~__~__~__~__~__~______~__~

00 10 103 20x10 3 0x10 40x10

Refractlve Index variallan (6n)

Fig 7 Calibration curve for the MZI-TIR sensor Core thickness of 250 nm TM polarization

4

42 TIR-MZI sensor The same type of measurements was performed wiacuteth

a MZI sensor fabricated with the TIR structure We selected a sensor with a core thickness of 250 nm and a rib width of 3 nm Results for TM polarization are shown if Figure 7 Sensitivity for the MZI-TIR sensor

dM)(27r) ) ( = 1453) IS a factor 3 higher than for the ( dn TlR

sensor based on the ARROW structure This implies a lower detection limit of L1n om il = 7middot 106 (L1N = 75middot lO

0

~

F~ (J

)

Glt

)

GJ e g1o )

reg

BS

0) ~~~~~~~~~~~~~~~~~

O 20 ~o 40 Time (rnin)

a)

reg reg )

~ (-l

~

C)

-ltl

--- J

GJ

3 e O)

(i)

iexcl~

n 45

Time (min)

b)

Fig 8 Signa response (TE polarisation) of the MZIshyARROW sensor to the antigenantibody (X-HSAlHSA immunoreaction 1) Physical adsorption of the (X-HSA antibody 2) Rinsing with PBS 3) Blocking with BSA 4) Rinsing with PBS 5) Immunoreaction with the antigen HSA 6) Rinsing wilh PBS

5 Biosensor applications

As an example of biosensing appication we ha ve used the sensor for the detection of the immunoreaction antibody-antigen (X-HSNHSA (Human Serul1I Albumin

Sigma A0433) The measurements have been performed with a MZI-ARROW sensor with 3 iexcliexclm of core thic~_ness an interaction length of 15 mm and an overlay thiCkness of 37 nm

Measurements are performed in phosphate buffered saline (PBS) with a pH of 735 at room temperature and maintaining a low flow rate (20 ~Imin) Initially a concentration of 67middot 106 M (Img mr 1

) human serum abumin antibody (X-HSA) is introduced in the sensor mea Figure 8a shows the response of the sensor ro the physical adsorptiacuteon of the antibodiacutees that correspond to a net phase change of 6lt1gt=42middot 211 equivalent to a surface coverage of 18 ng mm2 After rinsing with PBS and bocking with BSA (bovine serum albumin) a concentration of 77middot 10-6 M human serum albumin antigen (HSA) is flowed through the sensor giving a net phase change of 6lt1gt=2middot 211 (Figure 8b) due to the immunoreaction

6 Conclusions

We have deveoped an evanescent field sensor based on Silicon microelectronics technology It makes use of an integrated MZI configuration fabricated with two different waveguide structures TIR and ARROW The main features of these waveguides must be monomode behaviour and high surface sensitivity To achieve these characteristics for ARROW we employ a modified structure in which lhe core is overcoated with a high refractive index thin ayer To obtain monomode behaviour the parameters oiacute the waveguide must be carefully chosen We have presented experimental results of a MZI sensor based on the two waveguides working as a refractometer For the MZI-ARROW sensor the lower refractive index detection limit is L1nom il = 2middot 10-5

while for the MZI-TIR sensor this limit is a factor 3 lower (L1n omin = 7middot 10-6

) Finally we present a preliminary result of the MZI-ARROW sensor for biochernical applications

References

[1] R P H Kooyman and L M Lechuga Immunosensors middot based on total internal reflectance in Handbook of middot hiosensors and eleclronic loses E Kress-Rogers Ed

New York CRC Press 1997 pp 169-196 [2] K Tiefenthaler W Lukosz Sensitivity of grating

couplers as integrated-optical chemical sensors 1 Opl Soco Am S vol 6 n 2 pp 209-2201989

[3] R Cush 1M Cronin WJ Stewart CH Maule 1 Molloy NJ Godclard The resonant mirror a novel optical biosensor for direct sensing of biomolecular interactions Part 1 principie of operation and associated

middot instrumentation Siosel1 and Sioelectron vol 8 pp 347-353 1993

111 Congreso Iberoamericano de Sensores y Biosensores

I [4] W Lukosz Principies and sensitivities of integrated optical and surface plasmon sensors for direct aftinity sensing and immuno se nsing Biosen Bioleelrol1 vol 6 pp 215-2251991

[5] R Syms J Cozens OJliell gllided 11a1es und deviels Ed McGraw Hil Londres 1992

[6] EF Shipper AM Brugman C Oomiacutenguez LM Lechuga RPH Koo yman J Gre ve Tile realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology Sellsors (llld AelltalOrS B vol 40 pp 147-153 1997

[7] F Priero A Lobera O Jimeacutenez C Oominguez A Calle and LM Lechuga Ocs ign and Analysis 01 Silicon Antiresonant Retlecring Optica l Waveguides for Evanescent Field Sensors1 of Liglzlllale Teehno vol 18 pp 966-972 2000

[81 Moreno M Garceacutes 1 Muiioz J Oomiacutenguez c Calderer J Yilluendas F amp Pelayo J CMOS Comparible ARROW Guides Proc of rhe 8th CIMTECshyWorld Cerami e Congress and Forum on New Material s Advanced Materials in Oprics Electro-Opties and Communieations Technologies Firenza (Italyl pp 465shy472 1995

[9] Ouguay MA Kokubun Y amp Koeh TL Antiresonant Retleeting Optical Waveguides in SiOTSi Mulrilayer Struetures Applied Physies Lerters 22 pp 892 1986

[10) F Prieto LM Lechuga A Calle A Lobera and C Oominguez Optimixed Silieon AntiResonant Retleeting Optieal Waveguides fol Sensing Applieations1 of LighlYiexclave TecllllO January 200 l

[11) GR Quigley RO Harris and 1S Wilkinson Sensitivity enhancement of integrated optical sensors by use of thin high-index lilms Applied Ofilies vol 38 no 28 pp 6036-60391999

(12) C Oomiacutenguez 1 A Rodriacuteguez F 1 Muntildeoz and N Zine Plasma enhanced CYO silicon oxide films fol integrated opti e applications Vacuwll vol 52 pp 395shy400 1999

3sect 111 Congreso Iberoamericano de Sensores y Biosensores

Page 4: Integrated Optical Interferometric Biosensors based on

I components A synchronous detection scheme is used with the aid of a lock-in ampl ifier and a Iight chopper

The se nsor is being developed for the detection of biochemical interactions between a receptor molecule and its complementary analyte The effect of this reaction is comparable to a change of the bulk refractive index of the outer medium Therefore the use of solutions with different refractive indexes is useful for studying the sensor sensitivity Several solutions were prepared with different glucose concentrations in water with refractive indexes varying from 13325 to 14004 (plusmn 00002) as determined by an Abbe refractometer operating at 25 oc A tlow cel] mechanised in Teflon (with a channel width of 3 mm a depth of 100 iexcltm and a length of 15 mm) is cJamped onto the interferometer and a tlow injection system is used to deliver the glucose solutions into the sensor area

41 ARROW-MZI sensor Next results with the MZI sensors fabricated with

the ARROW structure are presented Using as a reference the refractive index of deionised (DI) water (13325) different glucose solutions with varying refractive indexes were introduced alternatively as it is shown in Figure 5 With these measulements a calibrating curve was evaluated where the phase response of the sensor is plotted versus the variation in the refractive index o Figure 6 shows these calibrating curves for four different MZI sensors using TE polarization For a sensor with a core thickness of 4 iexcltm and the overlay thickness of 120 nm (solid circle in Fig 6) sensitivity is very low as theory predicts [7] However if the overlay thickness is decreased to some tens of nanometers ie 39 nm (sol id square in Fig 6) sensitivity is enhanced more than an order of magnitude [10] In this case the detection limit for the refractive index variation is LlnIIIill = 1middot 101 (M = lmiddot 10

065 ~

11

QM M

N g iexcl N

~ Mo M M060 ~ ~

~ ~

11 ~ 11 e ee 055

---shy~ 050 ro --

~ 045 21 ~

i1(J) -040

035

030 30 35 40 45 50 JJ

Tim e (min) Fig 5 Sensor response for a change of the refractive index in the sensor area Variation for glucose solutions with different refractive indexes TE polarization

31 111 Congreso Iberoamericano de Sensores y Biosensores

Sensitivity can also be increased if the core thickness diminishes because the guided mode is less confined within the core [7] For a sensor with 3 iexcltm of core thickness (open square in Figure 6) the refractive index detection limit is one order of magnitude higher than before (LlnOlllin = lmiddot 104 (M =2middot 105raquo

30 oshyN 25 euroo S 20 Q) el t 15 ro c U 10 al ()

ro c o O

bull de 4 JlIn d llU ~ 1 20 nm

bull de = 4 iexcliexclIYI do ~ 39 nm

O d 3 ~d bullbull -3gnm

d 3 ~ d~ shy 37 nm

0 00 001 0 02 0 03 0 04 0 05 0 06 0 07

Refractive index varlatlon (oacuten)

Fig 6 Calibrating curves for the MZI-ARROW sensor with different waveguide structures (see the inset) (TE polarization)

Finally as it is shown in Figure 3 for small variations of the overay thickness sensi ti vity can be increased significantly A variation of on1y 2 nm in this overlay (37 nm solid triangle in Figure 6) implies a sensitivity increment of almost one order of magnitude In this case the maximum sensitivity obtained is

dLlt1gt(2rr) ) = 481 whlch corresponds to a( dn ARROW

minimum detectable refractive index variation of Llnolnin =2middot 105 (M =lmiddot 106)

6 r-----------------------------~--~ lt1(211) = 145267LY1

NI = 71 0middot 0 m 11

~ 4 (1)

Ol t 3 ~

c u 2 (1) ()

c ~

o o L-~__~__~__~__~__~______~__~

00 10 103 20x10 3 0x10 40x10

Refractlve Index variallan (6n)

Fig 7 Calibration curve for the MZI-TIR sensor Core thickness of 250 nm TM polarization

4

42 TIR-MZI sensor The same type of measurements was performed wiacuteth

a MZI sensor fabricated with the TIR structure We selected a sensor with a core thickness of 250 nm and a rib width of 3 nm Results for TM polarization are shown if Figure 7 Sensitivity for the MZI-TIR sensor

dM)(27r) ) ( = 1453) IS a factor 3 higher than for the ( dn TlR

sensor based on the ARROW structure This implies a lower detection limit of L1n om il = 7middot 106 (L1N = 75middot lO

0

~

F~ (J

)

Glt

)

GJ e g1o )

reg

BS

0) ~~~~~~~~~~~~~~~~~

O 20 ~o 40 Time (rnin)

a)

reg reg )

~ (-l

~

C)

-ltl

--- J

GJ

3 e O)

(i)

iexcl~

n 45

Time (min)

b)

Fig 8 Signa response (TE polarisation) of the MZIshyARROW sensor to the antigenantibody (X-HSAlHSA immunoreaction 1) Physical adsorption of the (X-HSA antibody 2) Rinsing with PBS 3) Blocking with BSA 4) Rinsing with PBS 5) Immunoreaction with the antigen HSA 6) Rinsing wilh PBS

5 Biosensor applications

As an example of biosensing appication we ha ve used the sensor for the detection of the immunoreaction antibody-antigen (X-HSNHSA (Human Serul1I Albumin

Sigma A0433) The measurements have been performed with a MZI-ARROW sensor with 3 iexcliexclm of core thic~_ness an interaction length of 15 mm and an overlay thiCkness of 37 nm

Measurements are performed in phosphate buffered saline (PBS) with a pH of 735 at room temperature and maintaining a low flow rate (20 ~Imin) Initially a concentration of 67middot 106 M (Img mr 1

) human serum abumin antibody (X-HSA) is introduced in the sensor mea Figure 8a shows the response of the sensor ro the physical adsorptiacuteon of the antibodiacutees that correspond to a net phase change of 6lt1gt=42middot 211 equivalent to a surface coverage of 18 ng mm2 After rinsing with PBS and bocking with BSA (bovine serum albumin) a concentration of 77middot 10-6 M human serum albumin antigen (HSA) is flowed through the sensor giving a net phase change of 6lt1gt=2middot 211 (Figure 8b) due to the immunoreaction

6 Conclusions

We have deveoped an evanescent field sensor based on Silicon microelectronics technology It makes use of an integrated MZI configuration fabricated with two different waveguide structures TIR and ARROW The main features of these waveguides must be monomode behaviour and high surface sensitivity To achieve these characteristics for ARROW we employ a modified structure in which lhe core is overcoated with a high refractive index thin ayer To obtain monomode behaviour the parameters oiacute the waveguide must be carefully chosen We have presented experimental results of a MZI sensor based on the two waveguides working as a refractometer For the MZI-ARROW sensor the lower refractive index detection limit is L1nom il = 2middot 10-5

while for the MZI-TIR sensor this limit is a factor 3 lower (L1n omin = 7middot 10-6

) Finally we present a preliminary result of the MZI-ARROW sensor for biochernical applications

References

[1] R P H Kooyman and L M Lechuga Immunosensors middot based on total internal reflectance in Handbook of middot hiosensors and eleclronic loses E Kress-Rogers Ed

New York CRC Press 1997 pp 169-196 [2] K Tiefenthaler W Lukosz Sensitivity of grating

couplers as integrated-optical chemical sensors 1 Opl Soco Am S vol 6 n 2 pp 209-2201989

[3] R Cush 1M Cronin WJ Stewart CH Maule 1 Molloy NJ Godclard The resonant mirror a novel optical biosensor for direct sensing of biomolecular interactions Part 1 principie of operation and associated

middot instrumentation Siosel1 and Sioelectron vol 8 pp 347-353 1993

111 Congreso Iberoamericano de Sensores y Biosensores

I [4] W Lukosz Principies and sensitivities of integrated optical and surface plasmon sensors for direct aftinity sensing and immuno se nsing Biosen Bioleelrol1 vol 6 pp 215-2251991

[5] R Syms J Cozens OJliell gllided 11a1es und deviels Ed McGraw Hil Londres 1992

[6] EF Shipper AM Brugman C Oomiacutenguez LM Lechuga RPH Koo yman J Gre ve Tile realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology Sellsors (llld AelltalOrS B vol 40 pp 147-153 1997

[7] F Priero A Lobera O Jimeacutenez C Oominguez A Calle and LM Lechuga Ocs ign and Analysis 01 Silicon Antiresonant Retlecring Optica l Waveguides for Evanescent Field Sensors1 of Liglzlllale Teehno vol 18 pp 966-972 2000

[81 Moreno M Garceacutes 1 Muiioz J Oomiacutenguez c Calderer J Yilluendas F amp Pelayo J CMOS Comparible ARROW Guides Proc of rhe 8th CIMTECshyWorld Cerami e Congress and Forum on New Material s Advanced Materials in Oprics Electro-Opties and Communieations Technologies Firenza (Italyl pp 465shy472 1995

[9] Ouguay MA Kokubun Y amp Koeh TL Antiresonant Retleeting Optical Waveguides in SiOTSi Mulrilayer Struetures Applied Physies Lerters 22 pp 892 1986

[10) F Prieto LM Lechuga A Calle A Lobera and C Oominguez Optimixed Silieon AntiResonant Retleeting Optieal Waveguides fol Sensing Applieations1 of LighlYiexclave TecllllO January 200 l

[11) GR Quigley RO Harris and 1S Wilkinson Sensitivity enhancement of integrated optical sensors by use of thin high-index lilms Applied Ofilies vol 38 no 28 pp 6036-60391999

(12) C Oomiacutenguez 1 A Rodriacuteguez F 1 Muntildeoz and N Zine Plasma enhanced CYO silicon oxide films fol integrated opti e applications Vacuwll vol 52 pp 395shy400 1999

3sect 111 Congreso Iberoamericano de Sensores y Biosensores

Page 5: Integrated Optical Interferometric Biosensors based on

4

42 TIR-MZI sensor The same type of measurements was performed wiacuteth

a MZI sensor fabricated with the TIR structure We selected a sensor with a core thickness of 250 nm and a rib width of 3 nm Results for TM polarization are shown if Figure 7 Sensitivity for the MZI-TIR sensor

dM)(27r) ) ( = 1453) IS a factor 3 higher than for the ( dn TlR

sensor based on the ARROW structure This implies a lower detection limit of L1n om il = 7middot 106 (L1N = 75middot lO

0

~

F~ (J

)

Glt

)

GJ e g1o )

reg

BS

0) ~~~~~~~~~~~~~~~~~

O 20 ~o 40 Time (rnin)

a)

reg reg )

~ (-l

~

C)

-ltl

--- J

GJ

3 e O)

(i)

iexcl~

n 45

Time (min)

b)

Fig 8 Signa response (TE polarisation) of the MZIshyARROW sensor to the antigenantibody (X-HSAlHSA immunoreaction 1) Physical adsorption of the (X-HSA antibody 2) Rinsing with PBS 3) Blocking with BSA 4) Rinsing with PBS 5) Immunoreaction with the antigen HSA 6) Rinsing wilh PBS

5 Biosensor applications

As an example of biosensing appication we ha ve used the sensor for the detection of the immunoreaction antibody-antigen (X-HSNHSA (Human Serul1I Albumin

Sigma A0433) The measurements have been performed with a MZI-ARROW sensor with 3 iexcliexclm of core thic~_ness an interaction length of 15 mm and an overlay thiCkness of 37 nm

Measurements are performed in phosphate buffered saline (PBS) with a pH of 735 at room temperature and maintaining a low flow rate (20 ~Imin) Initially a concentration of 67middot 106 M (Img mr 1

) human serum abumin antibody (X-HSA) is introduced in the sensor mea Figure 8a shows the response of the sensor ro the physical adsorptiacuteon of the antibodiacutees that correspond to a net phase change of 6lt1gt=42middot 211 equivalent to a surface coverage of 18 ng mm2 After rinsing with PBS and bocking with BSA (bovine serum albumin) a concentration of 77middot 10-6 M human serum albumin antigen (HSA) is flowed through the sensor giving a net phase change of 6lt1gt=2middot 211 (Figure 8b) due to the immunoreaction

6 Conclusions

We have deveoped an evanescent field sensor based on Silicon microelectronics technology It makes use of an integrated MZI configuration fabricated with two different waveguide structures TIR and ARROW The main features of these waveguides must be monomode behaviour and high surface sensitivity To achieve these characteristics for ARROW we employ a modified structure in which lhe core is overcoated with a high refractive index thin ayer To obtain monomode behaviour the parameters oiacute the waveguide must be carefully chosen We have presented experimental results of a MZI sensor based on the two waveguides working as a refractometer For the MZI-ARROW sensor the lower refractive index detection limit is L1nom il = 2middot 10-5

while for the MZI-TIR sensor this limit is a factor 3 lower (L1n omin = 7middot 10-6

) Finally we present a preliminary result of the MZI-ARROW sensor for biochernical applications

References

[1] R P H Kooyman and L M Lechuga Immunosensors middot based on total internal reflectance in Handbook of middot hiosensors and eleclronic loses E Kress-Rogers Ed

New York CRC Press 1997 pp 169-196 [2] K Tiefenthaler W Lukosz Sensitivity of grating

couplers as integrated-optical chemical sensors 1 Opl Soco Am S vol 6 n 2 pp 209-2201989

[3] R Cush 1M Cronin WJ Stewart CH Maule 1 Molloy NJ Godclard The resonant mirror a novel optical biosensor for direct sensing of biomolecular interactions Part 1 principie of operation and associated

middot instrumentation Siosel1 and Sioelectron vol 8 pp 347-353 1993

111 Congreso Iberoamericano de Sensores y Biosensores

I [4] W Lukosz Principies and sensitivities of integrated optical and surface plasmon sensors for direct aftinity sensing and immuno se nsing Biosen Bioleelrol1 vol 6 pp 215-2251991

[5] R Syms J Cozens OJliell gllided 11a1es und deviels Ed McGraw Hil Londres 1992

[6] EF Shipper AM Brugman C Oomiacutenguez LM Lechuga RPH Koo yman J Gre ve Tile realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology Sellsors (llld AelltalOrS B vol 40 pp 147-153 1997

[7] F Priero A Lobera O Jimeacutenez C Oominguez A Calle and LM Lechuga Ocs ign and Analysis 01 Silicon Antiresonant Retlecring Optica l Waveguides for Evanescent Field Sensors1 of Liglzlllale Teehno vol 18 pp 966-972 2000

[81 Moreno M Garceacutes 1 Muiioz J Oomiacutenguez c Calderer J Yilluendas F amp Pelayo J CMOS Comparible ARROW Guides Proc of rhe 8th CIMTECshyWorld Cerami e Congress and Forum on New Material s Advanced Materials in Oprics Electro-Opties and Communieations Technologies Firenza (Italyl pp 465shy472 1995

[9] Ouguay MA Kokubun Y amp Koeh TL Antiresonant Retleeting Optical Waveguides in SiOTSi Mulrilayer Struetures Applied Physies Lerters 22 pp 892 1986

[10) F Prieto LM Lechuga A Calle A Lobera and C Oominguez Optimixed Silieon AntiResonant Retleeting Optieal Waveguides fol Sensing Applieations1 of LighlYiexclave TecllllO January 200 l

[11) GR Quigley RO Harris and 1S Wilkinson Sensitivity enhancement of integrated optical sensors by use of thin high-index lilms Applied Ofilies vol 38 no 28 pp 6036-60391999

(12) C Oomiacutenguez 1 A Rodriacuteguez F 1 Muntildeoz and N Zine Plasma enhanced CYO silicon oxide films fol integrated opti e applications Vacuwll vol 52 pp 395shy400 1999

3sect 111 Congreso Iberoamericano de Sensores y Biosensores

Page 6: Integrated Optical Interferometric Biosensors based on

I [4] W Lukosz Principies and sensitivities of integrated optical and surface plasmon sensors for direct aftinity sensing and immuno se nsing Biosen Bioleelrol1 vol 6 pp 215-2251991

[5] R Syms J Cozens OJliell gllided 11a1es und deviels Ed McGraw Hil Londres 1992

[6] EF Shipper AM Brugman C Oomiacutenguez LM Lechuga RPH Koo yman J Gre ve Tile realization of an integrated Mach-Zehnder waveguide immunosensor in silicon technology Sellsors (llld AelltalOrS B vol 40 pp 147-153 1997

[7] F Priero A Lobera O Jimeacutenez C Oominguez A Calle and LM Lechuga Ocs ign and Analysis 01 Silicon Antiresonant Retlecring Optica l Waveguides for Evanescent Field Sensors1 of Liglzlllale Teehno vol 18 pp 966-972 2000

[81 Moreno M Garceacutes 1 Muiioz J Oomiacutenguez c Calderer J Yilluendas F amp Pelayo J CMOS Comparible ARROW Guides Proc of rhe 8th CIMTECshyWorld Cerami e Congress and Forum on New Material s Advanced Materials in Oprics Electro-Opties and Communieations Technologies Firenza (Italyl pp 465shy472 1995

[9] Ouguay MA Kokubun Y amp Koeh TL Antiresonant Retleeting Optical Waveguides in SiOTSi Mulrilayer Struetures Applied Physies Lerters 22 pp 892 1986

[10) F Prieto LM Lechuga A Calle A Lobera and C Oominguez Optimixed Silieon AntiResonant Retleeting Optieal Waveguides fol Sensing Applieations1 of LighlYiexclave TecllllO January 200 l

[11) GR Quigley RO Harris and 1S Wilkinson Sensitivity enhancement of integrated optical sensors by use of thin high-index lilms Applied Ofilies vol 38 no 28 pp 6036-60391999

(12) C Oomiacutenguez 1 A Rodriacuteguez F 1 Muntildeoz and N Zine Plasma enhanced CYO silicon oxide films fol integrated opti e applications Vacuwll vol 52 pp 395shy400 1999

3sect 111 Congreso Iberoamericano de Sensores y Biosensores