micron confidential © 2008 micron technology, inc. all rights reserved. products are warranted only...
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MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 1Apr 18, 2023
Source Reduction Efforts at MTVChristopher M. Dott, EHSS Manager
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 2Apr 18, 2023
History• Changes in manufacturing operations correspond
directly to the type and amount of waste generated
• Increase in wafer size and number of layers deposited on wafers contributes to increase in waste creation
• MTV has undergone cost cutting activities and source reduction is a viable way to help the business help the environment.
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 3Apr 18, 2023
Do you know where “it” goes?
• Chemical Input-Chemical Output• Process Flow-Chemical Pathway• BYPRODUCTS of production• Where are toxics being lost?• Is there an opportunity for recovery, elimination or reduction?• Is there an opportunity for reuse?
Forget about treating it, focus on reducing or eliminating it at the source
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 4Apr 18, 2023
Source Reduction Activities-Wastewater
• Installation of recirculation filters in cleaning and etching baths to extend bath life
• Use of dry plasma etch to eliminate the use of aqueous hazardous materials for etch and the use of DI water for rinse
• Install spray tools to replace wet sinks
• Identify water trickle purges that are unnecessary and possible diversion valves that have been left in the open position
• Identify and correct piping leaks
• Reduce slurry dispense rate for
polish and pad conditioning
• Reverse Osmosis / Recycle loops
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 5Apr 18, 2023
Source Reduction Activities-Solvents
• Switch to positive photoresist
• Reduce CUP rinsing activities
• Extend number of lots that can be run
through a solvent bath
• Optimize spin coating process by installing more precise pumps
• Automate as many processes as possible for efficiency
• Identify any water sources that make up solvent waste stream to minimize water content
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 6Apr 18, 2023
Source Reduction Activities-Corrosive Liquids
• Modify bath change-out schedules and procedures
• Re-circulate baths through filters• Check bath concentrations to identify
when a more dilute bath can be utilized without affecting quality
• Replace ammonium fluoride, hydrofluoric, acetic acid mixtures with an all dry single step operation using a reactive ion etcher
• Identify waste in polishing operations and replace with more updated systems and equipment
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 7Apr 18, 2023
Source Reduction Activities-Contaminated Debris
• Replace glass chemical bottles with NOW Packs• Increase # of wafers polished per pad • Employee training on segregation of non-contaminated debris from hazardous waste• Eliminate IPA in many wipe down operations
by using DI water• Adjust cleaning schedules to minimize wipe downs• Limit locations and amount of wipes used where cleaning
takes place• Optimize maintenance activities to minimize waste materials
and debris
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 8Apr 18, 2023
Other Source Reduction Opportunities
• Implement a Chemical management System
• Install efficient processes
• Minimize water contamination of solvents and acidic wastes– Code requirements? Understanding of constituents?
• Segregate photoresist strippers
• Spin dry instead of using IPA
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 9Apr 18, 2023
Characterizing and Analyzing Processes
• Gather and organize detailed and comprehensive information
• Choose process/waste stream for focused examination
• Create Process Flow Diagram and/or Chemical Pathway Analyses
• Estimate total byproducts with materials accounting• Conduct a Mass Balance
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 10Apr 18, 2023
Case in Point = Ammonia• MTV has a effluent ammonia wastewater limit that
did not correspond to our manufacturing need.
• MTV has undergone a massive ammonia reduction process that has reduced up to 150 gallons of proposed ammonia hydroxide usage through efficiencies and recipe changes, without affecting product quality.
• MTV was successful in negotiating a load limit for ammonia equivalent to our permit levels which also allows us to recycle more water through RO systems
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 11Apr 18, 2023
Brainstorming• Product Reformulation
• Input Substitution– Can any raw material be replaced with a less toxic
substitute?
• Process Redesign– Are there alternative ways of processing that would cut down on the use of
toxics or byproduct generation?
• Process Modernization– Are there ways to alter, adjust, modify or replace existing procedures or
equipment to cut toxics use or byproduct generation?
• Improved Operations and Maintenance– How might we reduce the needless waste of the toxic substances we store,
transport, handle and use?
• In Process Recycling and Reuse– Can any of the toxic materials be recycled or reused without leaving the process
MICRON CONFIDENTIAL
© 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
Company Confidential | © 2008 Micron Technology, Inc. | 12Apr 18, 2023
Low Hanging Fruit
• Using TOO MANY wipes when cleaning• Placing non-hazardous trash in with hazardous waste• Placing general trash in with non-hazardous trash• Misjudging when to change a bath• Fixing leaks and ensuring diversion valves are closed • Completely emptying a container of all liquid before
sending for disposal• Implement an inspection checklist to inspect module
debris cans weekly-have waste segregation as part of training procedure