multiscale/multiphysics simulation of electronic and ... · university of rome “tor vergata” -...
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University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Multiscale/Multiphysics simulation of electronic and optoelectronic devices
Department of Electronic Engineering,
University of Rome “Tor Vergata”, Italy
Acknowledgments:
EU H2020 Projects (CHIPSCOPE)
Aldo Di Carlo, Matthias Auf der Maur
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Downscaling of MOSFETs
Increasing importance of quantum/non-equilibrium effects
Increasing complexity/breakdown of classical TCAD models
Increasing need for predictive simulation tools
Solution ….. atomistic simulations !
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Coaxially-gated CNT-FET (C-CNTFET)
VGS=0.2V
VDS=0
PotentialCharge
Calculation performed with Density Functional TB + Non Eq. Green Functions
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Gate induced CNT deformation
VGATE = 5 V
Ang.
An
g.
GATE
GATE
Forces
Repulsion forces can locally (under the gate) increase the CNT radius (1-2 %)
New effects appear such as Negative Quantum Capacitance (Latessa Phys.
Rev. B 72, 035455)
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Transport in Carbon Nanotube
We have performed Molecular Dynamics simulations of a reactive collision of a
biased nanotube (V=100mV) and benzyne (C6H4) and we have calculated the
current flowing in the nanotube at each MD step
[Following the NASA MD simulations (J. Han, A. Globus, R. Jaffe, G. Deardorff)]
v = 0.6 Å/ps
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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A
A
BB
CC
DI = 20%
CNT without C6H4
RCN-C6H4 = 10KW
RCN = 8 KW
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Atomistic methods
At the nanoscale “every atom matters!”
Density Functional TB + NEGF + scattering
[PRL 100, 136801 (2008)]
Power dissipated in the C60 molecule is 10 nW
Power calculated as I x V = 10 mW !!!!
- Si dangling bond
- OH passivated dangling bond
H-passivated SiNW with one
A. Pecchia, A. Di Carlo, Rep. Prog. Phys. 67 (2004) 1497
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Micro/macro scale
In a real device also micro and macro scale should
be considered
• Devices should be accessible from a macro scale
• micro/macro scale details are as important as nanoscale features
(temperature distribution, electrostatics, strain, air gap, etc.)
• Number of atoms cannot grow to much in simulations
• 30 years of experience with Drift-diffusion matters !
(M. Stetler Intel)
Nano, micro and macro scale should be
combined in a multiscale/multiphysics
approach
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7The multiscale problem
Circuit level
QM
nm mm mmLength scale
Elementary processesModel structures, short time scale
Few 1000 atoms, max. 10 ps
Nanostructures/processesincreasing technological relevance
Up to 1.000.000 Atoms 100 ns
classical
Force fields MM
Microstructure
Finite elements
Architecture
Circuit Level
Mesoscopic scales -1 billion atoms and more
technologically real processes
Emprical
Semi-empirical
Ab initio
Typical Pentium 4 MOSFET section
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Multiscale methods in material science
Time
Propagation of a shock wave in a crystal- central region is treated at the atomistic level (MM)
- external part are treated in the continuous approx. (FEM)
Atomistic
FEM
FEM
Courtesy of G. Anciaux
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Multiscale simulations: TiberCAD
Circuit simulation Macro-Microscopic description
(Strain, Drift-Diffusion , Heat, etc)
Nanoscale
description
www.tiberlab.com
Synthesis
Analysis
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Multiscale components
Finite Element Method
Atomistic local basis
- FEM is the method in engineering problems
(deformation/strain, heat, Maxwell, etc. etc.)
-Drift-diffusion (DD) like schemes have been
solved with box integration methods.
- DD-FEM have been heavily developed in
the last 20 years in the Math community
(Hecht, Marrocco, Brezzi, Sacco, Chen)
- many FEM library in GPL
- Localized basis approach are very well
suited for device simulations
- Empirical approaches (ETB)
- Aproximate DFT (DFTB)
- Full DFT (Siesta, DMOL, etc.)
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7TiberCAD structure
LibMesh
Petsc Slepc Pardiso
GMSH
Devise (ISE)Paraview
Techplot
GMV
Modeler and meshPostprocess
Mathematical libraries
Development is done in C++ / C / Fortran in Linux, porting to other
UNIX-like environments and Windows has been achieved
TiberCAD 2.5 is available at www.tiberlab.com
VISIT
Feast
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7TiberCAD: Multiphysics models
– Mechanical deformation with any kind of constrain
– Semiconductor Strain including piezoelectric effect
– Drift-Diffusion transport of electrons / holes / excitons /
Ions (+ Poisson)
– Heat transport (Fourier and Boltzmann related methods)
– Quantum mechanics based with k.p envelope function
approximation
– Atomistic description via Empirical Tight-Binding (sp3d5s*,
or any other basis) and Density Functional TB
– NEGF library
– Classical molecular mechanics
– Maxwell solver
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Multiscale methods
domain 1 domain 2
BRIDGE METHOD • the domains are contiguous
and linked through n-1
dimensional regions.
• each domain providesboundary conditions to
adjacent domains.
domain 2
domain 1
OVERLAP METHOD
• the domains are overlapped
• each domain computes
physical quantities that act as
parameters to the otherdomain.
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Multiscale simulations: BRIDGE method
1) Strain: Continuum elasticity model and
Valence force field
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Continuum Elasticity model (CE)
Whenever we deal with device composed by crystals with different
lattice constant, we have to deal with strain.
Lattice match Lattice mismatch
This PDE is solved with FEM technique
GaN dot in a/AlGaN
nanocolumns
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Valence Force Field (VFF)
We included a Keating model to calculate strain at an atomistic level
The equilibrium position is that one which minimizes U.We use a nonlinear conjugate gradient minimization technique.
Advantages:• Most efficient atomistic technique. • Description beyond effective medium (random alloy)• Include internal strain• More accurate for some classes of nanostructures
2
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Spherical InAs quantum dot in GaAs box16 nm cubic box (200 000 atoms).
Multiscale strain: Mixing VFF and CE
Good agreement a few nanometers outside the dot but CE fails in the Dot
region. VFF is CPU demanding
exx
ezz
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Now atomistic structure is only defined in a smaller box (4nm) with 4000 atoms
Multiscale strain
1) Solve CE everywhere with lattice match boundary condition at the substrate
2) Apply displacement to atoms3) Fix external atoms as a boundary
condition for VFF(bridge method)
4) Solve VFF in the smaller structure5) Join results
CE/VFF approach
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Multiscale simulations: OVERLAP method
Nitride-based Nanorod : Drift-Diffusion, ETB and k.p
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7GaN Nanorods Structures
Diameter and pitch:
< 100nm through > 5µm (both)
Large area (scalability up to 8inch)
Quality requirements (no or few defects)
Facts
A. WaagBraunschweig University of Technology
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Simulation of GaN/alGaN nanowire LED
Atomistic
Continuum
Continuum
M. Auf der Maur et al. IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 58, NO. 5, MAY 2011
Multiscale CE/VFF Strain calculation
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Phase space and overlap Multiscale
Energy
Position
n-AlGaN p-AlGaNGaN
Active region
CB
VBQuantum
density: ETB
Quantum
density: ETB
Classical density
Drift-Diffusion Transport
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Models: Empirical Tight Binding (ETB)
Tight-binding approach: expand wave function in atomic orbitals
,
, )()(j
jj RrCr
Atomic orbital index
Atomic site
jiji HH , jijiS ,
Matrix elements can be calculated by using e.g. density functional theory
(DFT) or used as empirical fitting parameters (Empirical Tight Binding).
We use a transferable sp3d5s* parametrization (Jancu et al. Phys. Rev. B
57, 1998)
Strain (from VFF) is included by means of Harrison scaling:
0
jsite,atomic orbitals,
,,
jjiji CESH
Ci
orbital
atomic site
px
pypz
s
n
d
dVV
0
0,
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7The advent of Graphic Cards
W. Rodriguez et al. Computer Physics Communications 185, 2510 (2014); J.Comp. Electr.
14(2):593–603, (2015).
By using cost effective Graphic Cards (1000 euro) is it possible to have a
High Performing Computing on Personal Workstation. GPU are very
suited also for Atomistic calculations
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7ETB/k.p/Poisson/Drift-Diffusion
The electrostatic potential and current flow lines around the intrinsic part of the
column. Classical and quantum results. The selfconsistent EFA/ETB/drift-diff. results
shows also the contours of the electron and hole densities at half of the mean density
inside the intrinsic region.
Classical Quantum
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Current and radiative recombinations
classical simulations: radiative
recombinations originates from a region very
close to the surface of the column,
quantum simulations: radiative recombination
results to be mainly concentrated at the center
of the quantum disk due to the spatial
confinement of the carriers.
Classical radiative recombinations Quantum radiative recombinations
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Random Atomistic
Structure
Indium fluctuation and optical properties
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Transition energies are correlated with
the effective mean In concentration, given
by the mean concentration weighted by
the electrons’ ground state
Spatial Probability
Density (SPD). 116 samples In0.1GaN
QD random samples
Ground state SPDs for four
different In0.1GaN QD random
samples
- yellow: electron SPD,
- green: hole SPD,
- red dots: In atoms,
- gray dots: Ga atoms.
Localization of the wavefunction
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Electron-hole transition histogram
Spectrum of cumulative el-hl transitions for 116 samples
Optical emission
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7The Green Gap
Phosphor-free white LEDs based on color mixing with high efficacy needs
in particular high efficacy green LEDs.
peak emission efficiency
green gap
K. A. Bulashevich, et al. Phys. Status Solidi (a) 212, 914 (2015).
D. Schiavon, et al. Phys. Status Solidi (b) 250, 283 (2013).
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Simulation: DriftDiffusion + atomistic
Continuous models are solved in 1D
No in-plane potential fluctuations
10
nm
x 1
0 n
m
su
perc
ell
Model system: 3 nm single quantum well, 15/20/25/30/35% In, p-i-n
structure:
Atomistic models: VFF, ETB
Typical band profile near maximum efficiency:
el-hl overlap is reduced due to QCSE
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Origin of MME scattering
What is the origin of the strong spread in MME?
Ec Ev
vertical
separation
in-plane separation
Both electrons and holes tend to localize in regions where the In
concentration is higher
However, due to QCSE electrons and holes feel Indium fluctuations on different atomic planes of the QW
In
Ga
N
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Simulation results vs. experiment
Assume optimistic case: constant A and C (measured values) how
does the peak IQE vary with wavelength?
Schiavon et al., Phys. Status Solidi B 250, No. 2 (2013)
Non-radiative recombinations
Eg
QCSE
Random
alloy
Random alloy fluctuations explain the missing
contribution to the green gap
M. Auf der Maur, et al. PRL 116, 027401 (2016)
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Other Multiscale/Multiphysics examples
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Organic Solar Cell
e-h generation
rate (from Maxwell solver)
e current (from
Drift-Diffusion solver)
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Core-Shell GaN/InGaN nanorod
We performed semiclassical simulations of relatively low aspect ratio
circular nanorods with 3 QWs based on the drift-diffusion model:
– Calculate strain
– Do a voltage sweep and calculate carrier transport
– Extract current efficiencies for the different recombination
mechanisms
Symmetry
axis
We make use of circular symmetry to
limit computational cost.
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Core-Shell Simulation Results
Influence of strain relaxation / polarization field (for 20% In, vrec = 105 cm/s):
• Strain relaxation towards
top and bottom surfaces• Discontinuity of
polarization at top and
bottom surfaces
Carrier accumulation
With polarization
Psp
+ P
pz
Without polarization
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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Glass
FTO
c-TiO2
TiO2 + Dye + Polymer
Metal electrode
TEM
Tomography
FIB +
=+
TiO2 Hole-conductor
Mesh & CAD
Cate Ducati , Giorgio Divitini (Cambridge)
Henry Snaith (Oxford)
Fabio Di Fonzo, Agnese Abrusci (IIT)
500 nm
Solid State DSC: Real Morphology
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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200 nm !
200nm are not representative of a
several micron size devices.
• Potential profiles, concentration gradients
are on a much larger scale
• Boundary condition are on a micron scale
Micro- and nano-scale should
coexist in the same concurrent
simulation
Photocurrent
Multiscale
simulations
Macro scale
effectivematerial
nano scale
real material
Multiscale approach
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Embedding of a 2D slice into the effective model
Effective material Effective material
TiO2
Hole conductor
3 um
Photoanode Cathode
Light
180 nm
Real morphology
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Effect of trap states on the hole current
Traps screened by the ionic
additives (LiTFSI) Traps at the interface
The effect of trapped electrons is to spatially move the hole current
close to the surface TiO2/hole conductor enhancing recombination.
TiO2
Spiro (HTM)
A.Gagliardi et al. Nanoscale, 2015, 7, 1136
University of Rome “Tor Vergata” - Dep. Electronic Engineering
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7Conclusions
Multiscale/multiphysics is requested in real modern devices
where different length scales models are linked together.
We presented one of the first consistent attempt to answer
this request.
The main effort was related to the connection between
models. The Multiscale infrastructure has been defined.
The Multiscale framework will be used for design nd
analyses of CHIPSCOPE.
Additional details at http://www.tibercad.org