no photon left behind: challenges in oled outcoupling · semla 0 20 40 60 80 100 120 140 0 20 40 60...
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No Photon Left Behind:Challenges in OLED
Outcoupling
Stephen Forrest
Departments of Electrical Engineering and Computer Science, Physics, and Materials Science and Engineering
University of Michigan
Ann Arbor, MI 48109
80% of Light is Trapped in the OLED
❑ ηEQE = ηIQE (~100%) × ηExt ≈ 20%
2
• OLED Loss Channels➢ Substrate mode
➢Waveguide mode
➢ Surface plasmon polariton (SPP)
➢Metal absorption
• Good solutions▪ Inexpensive
▪ Viewing angle & wavelength independent
▪ Independent of OLED structure
• Examples▪ Optical gratings or photonic crystals1
▪ Corrugations or grids embedded in OLED2
▪ Nano-scale scattering centers3
▪ Molecular dipole orientation management
3
1Y .R. Do, et al, Adv. Mater. 15, 1214 (2003).2Y. Sun and S.R. Forrest, Nat Phot. 2, 483 (2008).3Chang, H.-W. et al. J. Appl. Phys. 113, - (2013).
Getting all the light out, or “no photon left behind”
Three solutions explored in SSL
• Sub electrode grids and microlens arrays• Harvests most available photons
• Dielectric diffuser• Efficient and simple
• Ultrathin, roughened substrates• Good for flexible, too.
Substrate Au Ag Mirror on Grid Surface
SiO2IZOOrganicAnti-reflectionlayer
Getting Rid of SPPs Using Sub-Anode Grid + Mirror
Top Emitting OLED
3 Lift-off
Substrate FabricationQu
, et
al. A
CS
Ph
oto
nic
s, 2
01
7
a.Ag
IZO/MoO3 80nm
ETL 60 nm
Substrate
EML 20 nm
HTL 40 nm
IZO/MoO3 80nm
SiO2 65 nm
Ag
IZO/MoO3 80nm
ETL 60 nm
Substrate
EML 20 nm
HTL 40 nm
IZO/MoO3 80nm
SiO2 245 nm
a.Ag
ETL 35 nm
Substrate
EML 15 nm
HTL 30 nm
Ag 15nm
Sub-electrode grid modeling
Variable Waveguide Widths Prevent Mode Propagation
Al OrganicITO
SEMLA
High IndexSpacer layer
Getting All the Light Out: Sub-Electrode Microlens Array (SEMLA)
• Micron-scale lens array between the bottom electrode and the glass substrate
• Flat spacer layer
• High refractive index
• Microlens array imbedded into glass
SEMLA Fabrication
8
HF: surfactant
Photoresist 0.8 μm openings with a 10 μm pitch
10 μm
As nsub/norg goes up, more waveguided light is squeezed out
Structure: 70nm ITO/ 40nm TAPC/ 20nm CBP/ 65nm Bphen/Al
Refractive Index of SEMLA
9
n=1.6 n=1.7 n=1.8nsub/norg nsub/norg
0 20 40 60 80 100 120 1400
20
40
60
80
100
Fra
ction o
f P
ow
er
(%)
ETL thickness (nm)
SPPLoss
WV
SEMLA
0 20 40 60 80 100 120 1400
20
40
60
80
100
Fra
ction
of P
ow
er
(%)
ETL thickness (nm)
SPP
WV
SubAir
Loss
SEMLAs Change the Outcoupling Landscape
0 5 1010
-7
10-3
101
Con
SEMLA
J (
mA
/cm
2)
Voltage (V)
102
103
104
0
20
40
60
80 Con_air Con_IMF
SEMLA_air SEMLA_MLA
SEMLA_IMF Sap_IMF
E
QE (
%)
Brightness (cd/m2)
-90
-60
-300
30
60
90 Lamb. Con
SEMLA MLA SEMLA HS
SEM
LA
SEM
LA+M
LA
SEM
LA+I
MF
Sap
1.0
1.5
2.0
2.5
3.0
3.5
41±3%45±4%
27±3%
20±2% 60±4%65±5%
47±4%
E F
30±3%
SEMLA Performance
Diffuse Reflectors: Low Cost & Simple• Dielectric diffusive reflector
✓ No SPP✓ Small absorption (Reflectance ~98%)✓ No angle dependence✓ Reduced w/g mode
Device Structure
Planarization
Layer
0.0 0.5 1.0 1.5-20
-10
0
10
20
Heig
ht (
m)
Distance (mm)
Surface Roughness of Diffuse Reflector
OLED grown on the substrate
PHOLED
Top contact
(ITO)
Bottom
contact (ITO)
Fabrication Sequence
Device Performance – Efficiency
• External Quantum Efficiency (EQE)➢ Mirror 15 ± 2%
➢ Diffuser 37 ± 4% (×2.5)
• Comparable J-V➢ No influence on device structure
Diffuse (Green)
Mirror (Green)
Diffuse (White)
Mirror (White)
0.01 0.1 1 100
10
20
30
40
50
E
QE
(%
)
Current Density (mA/cm2)
Diffuse
Mirror
0 4 8 12 16 2010
-4
10-3
10-2
10-1
100
101
102
Curr
ent D
ensity
(m
A/c
m2)
Voltage (V)
Device Performance – White Spectrum
• White OLED➢ No spectrum shift
✓ Weak optical micro-cavity by high-index planarization layer
➢ Lambertian light source
✓ Scattering via diffuse reflection
0.5
1.0
1.5
400 500 600 700 8000.0
0.5
1.0
1.5Diffuse
0 Degree
30 Degree
60 Degree
No
rma
lize
d I
nte
nsity
Wavelength (nm)
Mirror
90
60
300
30
60
90 Diffuse
Mirror
Lambertian
Device Area
Device Analysis(I) – Peripheral Emission
Device Analysis– Peripheral Emission
• Light emitted outside the defined active area : Peripheral Emission
• Device area ↑ → peripheral emission ↓
• Planar. layer thickness ↓ → peripheral emission ↓, EQE ↑ (68%, ×3.4 @50um)
Device Analysis– Number of Reflections
• Diffuse reflection➢ Redirect light uniformly➢ RS = 30% → air mode
➢ 5 scattering → ~80% escape
0 1 2 3 4 50
1
2
3
Inte
nsity (
a.u
.)
Number of Reflections
Air mode
Substrate Mode
x10-4
Air Mode
out TA D S = + ηTA : Light power fraction to top surface
ηD : Planarization layer efficiency
ηS : Light power fraction into planarization layer
Ultrathin, Ultra-flexible OLEDs With High Outcoupling
Corrugations by Deposition on Rough Sapphire
450 500 550 600 650 7000.0
0.2
0.4
0.6
0.8
1.0
No
rmalized
In
ten
sit
y
Wavelength (nm)
0o
30o
60o
Ultrathin, Ultra-Flexible OLED Performance
Conclusions
• Substrates can be modified to extract almost all trapped modes in OLED✓Waveguide
✓SPP
✓Substrate
• Best solutions do not interfere with OLED structure✓Wavelength and viewing angle independent
✓Low cost
✓Adaptable to both top and bottom emission
• Practical limit for outcoupling: 70 - 80%
Acknowledgements• Optoelectronic Components and Materials Group @ UM
• Jonchang Kim• Yue Qu• Xiaheng Huang
Acknowledgements• Optoelectronic Components and Materials Group @ UM
• Jonchang Kim• Yue Qu• Xiaheng Huang