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  • Fraunhofer IZM

    Opportunities and Challenges for FOWLP and FOPLP

    T. Braun, K.-F. Becker, M. Tpper, R. Aschenbrenner, K.-D. Lang

    Dr. Tanja Braun, Fraunhofer IZMGustav-Meyer-Allee 25, 13355 Berlin, Germany

    Email: [email protected]

    mailto:[email protected]

  • Fraunhofer IZM - confidential

    2

    Roadmap Fan-Out Wafer & Panel Level Packaging

    Source: Yole

  • Fraunhofer IZM - confidential

    3

    Roadmap Fan-Out Wafer & Panel Level Packaging

    Source: Yole

  • Fraunhofer IZM - confidential

    4

    PCB via element vertical interconnect element

    through s ilicon v ia die

    laser drilled through via

    laser drilled blind v ia

    Through Mold Via (TMV) TechnologiesDie

    Mold

    DieMold

    Substrate

    TMV

  • Fraunhofer IZM - confidential

    5

    TMV with Vertical Interconnect Element (VIE)

    VIE interconnection stacked packages with VIE

    vertical interconnect element (VIE)

    Planar structured Si or mold wafer with Cu-Lines (single or double sided)

    VIE singulation by wafer dicing

    90 rotated placement on carrier with all other components

    Planar structured Cu-Lines form z-connection

    Wafer grinding opens back side contact of VIE after molding and carrier release

  • Fraunhofer IZM - confidential

    6

    TMV with Through Silicon Via Die

    FOWLP electrical 3D routing with through silicon via die

    2D X-Ray image, 3D routing with silicon via die

    Placement of Si dies with Through Silicon Vias (TSV) on carrier with all other components

    TSV form z-connection

    Electrical connection of overmolded backside TSV contact e.g. by laser drilled blind or wafer grinding into TSV contact

  • Fraunhofer IZM - confidential

    7

    TMV with Laser Drilled Through Via

    Package with laser drilled through via

    sensor stack with laser drilled vias

    laser drilled through via

    Laser drilling of through mold vias, via formation (diameter, pitch, roughness) depends on filler sizes of the epoxy molding compound

    Metallization of vias by Cu plating

    High aspect ration (> 8:1) feasible

    Via plugging possibly needed

  • Fraunhofer IZM - confidential

    8

    Foldable FOWLP *

    wafer dicing layout with cuts for bending (orange) and package singulation (white)

    foldable fan-out wafer level packages

    * patent pending

    Two-step dicing process enables bending/folding of packages

    1st step: bending cuts by dicing only through the molding compound

    2nd step: package singulation by standard dicing through the entire package

  • Fraunhofer IZM - confidential

    9

    Foldable FOWLP (FFOLWP)

    FFOWLP with two dies and straight cuts FFOWLP with multiple dies and straight cuts

    FFOWLP with two dies and V-cuts FFOWLP with multiple dies and straight and V-cuts -> endless folding

  • Fraunhofer IZM - confidential

    10

    Bendable FOWLP

    bended FOWLP

    Two-step dicing process enables also bending of packages

    Bending in two directions possible

    3D conformal surface adaptation

  • Fraunhofer IZM - confidential

    11

    Demonstrator Layout

    Two die package, die size: 5x5 mm

    Daisy chain layout for electrical testing

    Redistribution layer based on polyimide film (25 m) lamination

    Adaptive RDL patterning based on real die position

    -via formation by laser ablation and Cu-line structuring by laser direct imaging (LDI)

    Bending cuts and package separation with standard wafer dicing equipment

    PI adhesive layer (25 m Pyralux) acts as dicing buffer layer)

  • Fraunhofer IZM - confidential

    12

    Demonstrator Manufacturing

    100 m

  • Fraunhofer IZM - confidential

    13

    Demonstrator Results

    X-ray CT image of folded FOWLPEMC

    adhesive

    PI

    adhesive

    EMC

    Cross section folded edge

    Foldable FOWLP Packages could be successfully manufactured

    Overall process flow was proven including 2-step dicing approach

    Folding of packages by 180 is feasible without damaging package or Cu lines

  • Fraunhofer IZM - confidential

    14

    Demonstrator Results

    Cross section folded edge

    Dicing through Epoxy Molding Compound and stopping in the adhesive layer worked well

    No damage or cracks in the PI and Cu layer

  • Fraunhofer IZM - confidential

    15

    Roadmap Fan-Out Wafer & Panel Level Packaging

    Source: Yole

  • Fraunhofer IZM - confidential

    16

    Panel Packaging Process Step Tasks To Solve

    assemblycompress ion

    moldingcarrier

    preparationdebonding

    redistri-bution

    handling, thinning & s ingulation

    Eq

    uip

    me

    nt

    Ma

    teri

    al Carrier

    steel, glass,..? Thermo

    release tape Alternatives?

    EMC liquid,

    granular, sheet?

    Dielectric polymers

    liquid or film? photosensitive

    or not? Sputter targets Plating

    Handling carrier

    Tape or other material

    Temporary adhesives

    Tape laminator

    Available automatic equipment?

    Pick and Place Accuracy on

    panel size?

    Material application

    Dispensing, sprinkle,

    Molding Uniformity,

    thickness control,

    Debonder Available

    automatic equipment?

    Lithography Stepper, laser

    ablation, LDI Sputtering,

    plating Thickness

    variation, lines & spaces

    Thinning & Dicing

    Available automatic equipment?

  • Fraunhofer IZM - confidential

    17

    Panel Packaging Process Step Tasks To Solve

    assemblycompress ion

    moldingcarrier

    preparationdebonding

    redistri-bution

    handling, thinning & s ingulation

    Eq

    uip

    me

    nt

    Ma

    teri

    al Carrier

    steel, glass ,..?

    Thermorelease tape

    Alternatives?

    EMC liquid,

    granular, sheet?

    Dielectric polymers

    liquid or film? photosensitive

    or not? Sputter targets Plating

    Handling carrier

    Tape or other material

    Temporary adhesives

    Tape laminator

    Available automatic equipment?

    Pick and Place Accuracy on

    panel size?

    Material application

    Dispensing, sprinkle,

    Molding Uniformity,

    thickness control,

    Debonder Available

    automatic equipment?

    Lithography Stepper, laser

    ablation, LDI Sputtering,

    plating Thickness

    variation, lines & spaces

    Thinning & Dicing

    Available automatic equipment?

  • Fraunhofer IZM - confidential

    18

    Panel Assembly Infrastructure - Carrier Selection

    CarrierX Direction

    [mm/mm]standard error

    Y Direction [mm/mm]

    standard error

    steel 8,04 1004 0,261 1004 7,20 1004 0,200 1004

    glass 0,87 1004 0,213 1004 0,65 1004 0,167 1004

    Die Shift Factor Comparison on Waferbetween Glass (6,75 ppm/K by AGC) and Steel (12 ppm/K)

    Die Shift Factor:Linear displacement of dies after molding (CTE EMC = ~7 ppm/K)-> mainly due CTE mismatches and chemical shrinkage of EMC. Die shift on the glass carrier is much lower than on the steel carrier.

    But: Robustness of glass carriers needs improvement

    -100 -80 -60 -40 -20 0 20 40 60 80 100

    -0,10

    -0,08

    -0,06

    -0,04

    -0,02

    0,00

    0,02

    0,04

    0,06

    0,08

    0,10

    X

    [m

    m]

    X [mm]-100 -80 -60 -40 -20 0 20 40 60 80 100

    -0,10

    -0,08

    -0,06

    -0,04

    -0,02

    0,00

    0,02

    0,04

    0,06

    0,08

    0,10

    X

    [m

    m]

    X [mm]

    glass steel

  • Fraunhofer IZM - confidential

    19

    Panel Packaging Process Step Tasks To Solve

    assemblycompress ion

    moldingcarrier

    preparationdebonding

    redistri-bution

    handling, thinning & s ingulation

    Eq

    uip

    me

    nt

    Ma

    teri

    al Carrier

    steel, glass,..? Thermo

    release tape Alternatives?

    EMC liquid,

    granular, sheet?

    Dielectric polymers

    liquid or film? photosensitive

    or not? Sputter targets Plating

    Handling carrier

    Tape or other material

    Temporary adhesives

    Tape laminator

    Available automatic equipment?

    Pick and Place Accuracy on

    panel size?

    Material application

    Dispensing, sprinkle,

    Molding Uniformity,

    thickness control,

    Debonder Available

    automatic equipment?

    Lithography Stepper, laser

    ablation, LDI Sputtering,

    plating Thickness

    variation, lines & spaces

    Thinning & Dicing

    Available automatic equipment?

  • Fraunhofer IZM - confidential

    20

    Cu- Compatibility Low T cure High Breakdown V Low Cost Avoid dry ice for

    shipping and storage

    Si- , Glass -, Organic Interposers and

    FOWLP Low CTE Low stress Low k/loss Panel Level Dry Film

    FC of ULK Young`s

    Modulus

    BoP WLP Tensile

    strength Elongation to

    break

    Next Generation Thin Film Polymers & Processing

    0

    1000

    2000

    3000

    4000

    5000

    6000

    7000

    8000

    2015 2016 2017 2018 2019 2020

    Si Interposer 300mm (thousands ofwafers)

    FO-WLP equiv. 300mm (thousands ofwafers)

    0

    1000

    2000

    3000

    4000

    5000

    6000

    7000

    8000

    2015 2016 2017