CLEO: 2014 Managementc/o The Optical Society2010 Massachusetts Avenue, NWWashington, DC 20036 USA

NONPROFIT ORG.US Postage

PAIDMERRIFIELD VA

Permit No. 6418

CLEO:APPLICATIONS & TECHNOLOGY

Sponsors:

Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

8-13 June 2014San Jose Convention Center San Jose, CA, USA

8-13 June 2014San Jose Convention Center San Jose, CA, USA

Full conference registration includes 150 in-depth, peer-reviewed presentations, and more than 75 esteemed invited and tutorial speakers covering four core areas:

Biomedical • Environment/Energy

Science, Security & Standards • Industrial

PLUS access to all Science & Innovations, QELS-Fundamental Science technical presentations, networking events, CLEO: Expo and more.

Also Featuring:CLEO: QELS–Fundamental ScienceCLEO: Science & Innovations CLEO: Expo CLEO: Market Focus

Also Featuring:CLEO: QELS–Fundamental ScienceCLEO: Science & Innovations CLEO: Expo CLEO: Market Focus

REGISTER NOW!

CLEO:APPLICATIONS & TECHNOLOGY

8-13 June 2014San Jose Convention Center San Jose, CA, USA Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

8-13 June 2014San Jose Convention Center San Jose, CA, USA Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

Sponsors:Register by 12 May and Save!

Visit www.cleoconference.org/applications

The Application and Technology Conference basically builds on the core strength of CLEO, which is the high scientific content, and explores potential new applications that have the capability to extend into the industrial or commercial domain. So it sits really at the frontier between the science and the application development work.”

CLEO: 2014 is respected worldwide as the premier, peer-reviewed technical conference covering the lasers and photonics industry. CLEO has represented the pinnacle of science and innovation for nearly 40 years. CLEO: Applications & Technology continues to bring CLEO: 2014 full circle by providing the top forum for peer-reviewed applied research, development and commercialization. The Applications & Technology Conference explores new applications capable of extending into the industrial or commercial domain, and builds on the core strength of CLEO and its high-quality, peer-reviewed content.

Discover four full days of sessions presented by distinguished speakers from across the industry and around the world as they gather to discuss the latest optics and photonics applied research, and how it fuels the development of innovative commercial products.

Applications & Technology ConferenceAdmittance to all technical programs• Technical sessions for all three

conferences – QELS-Fundamental Science, Science & Innovations and Applications & Technology

• Plenary sessions • Poster sessions• Special symposia

Admittance to CLEO: Expo and on-floor business programming• 300+ participating companies• Market Focus Business Programming• Technology Transfer Business

Programming• Online Job Fair• Expo Technology Playground

Networking Events• Conference welcome reception• Special professional events

Reference Guides• Conference program book• Postdeadline papers book• Expo 2014 buyers’ guide• Perpetual, early access to conference

papers via Optics InfoBase• Select online recorded sessions

available for only $45

Your full conference registration includes:

Short Courses8-10 JuneAdd a Short Course to your technical

registration. The Short Course program

offers skill-building training for

professionals and students alike. Visit

the website for details.

Iain T. McKinnie

James C. Wyant

Eric Mottay

Iain T. McKinnie; Lockheed Martin, Advanced Technology Center, USA, General Co-Chair James C. Wyant; Univ. of Arizona, College of Optical Sciences, USA, General Co-Chair

Yu Chen; Univ. of Maryland, College Park, USA, Program Co-Chair

Eric Mottay; Amplitude Systemes, France, Program Co-Chair

Call for Postdeadline Research

Submit by 21 April 2014 16:00 GMT

Share late-breaking research with peers and pioneers.

BIOMEDICAL • ENVIRONMENT/ENERGY • SCIENCE, SECURITY & STANDARDS • INDUSTRIAL

Yu Chen

“

Register on or before 12 May and Save Visit www.cleoconference.org/applications

Register on or before 12 May and Save Visit www.cleoconference.org/applications

CLEO: 2014 Managementc/o The Optical Society2010 Massachusetts Avenue, NWWashington, DC 20036 USA

NONPROFIT ORG.US Postage

PAIDMERRIFIELD VA

Permit No. 6418

CLEO:APPLICATIONS & TECHNOLOGY

Sponsors:

Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

8-13 June 2014San Jose Convention Center San Jose, CA, USA

8-13 June 2014San Jose Convention Center San Jose, CA, USA

Full conference registration includes 150 in-depth, peer-reviewed presentations, and more than 75 esteemed invited and tutorial speakers covering four core areas:

Biomedical • Environment/Energy

Science, Security & Standards • Industrial

PLUS access to all Science & Innovations, QELS-Fundamental Science technical presentations, networking events, CLEO: Expo and more.

Also Featuring:CLEO: QELS–Fundamental ScienceCLEO: Science & Innovations CLEO: Expo CLEO: Market Focus

Also Featuring:CLEO: QELS–Fundamental ScienceCLEO: Science & Innovations CLEO: Expo CLEO: Market Focus

REGISTER NOW!

CLEO:APPLICATIONS & TECHNOLOGY

8-13 June 2014San Jose Convention Center San Jose, CA, USA Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

8-13 June 2014San Jose Convention Center San Jose, CA, USA Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

Sponsors:Register by 12 May and Save!

Visit www.cleoconference.org/applications

The Application and Technology Conference basically builds on the core strength of CLEO, which is the high scientific content, and explores potential new applications that have the capability to extend into the industrial or commercial domain. So it sits really at the frontier between the science and the application development work.”

CLEO: 2014 is respected worldwide as the premier, peer-reviewed technical conference covering the lasers and photonics industry. CLEO has represented the pinnacle of science and innovation for nearly 40 years. CLEO: Applications & Technology continues to bring CLEO: 2014 full circle by providing the top forum for peer-reviewed applied research, development and commercialization. The Applications & Technology Conference explores new applications capable of extending into the industrial or commercial domain, and builds on the core strength of CLEO and its high-quality, peer-reviewed content.

Discover four full days of sessions presented by distinguished speakers from across the industry and around the world as they gather to discuss the latest optics and photonics applied research, and how it fuels the development of innovative commercial products.

Applications & Technology ConferenceAdmittance to all technical programs• Technical sessions for all three

conferences – QELS-Fundamental Science, Science & Innovations and Applications & Technology

• Plenary sessions • Poster sessions• Special symposia

Admittance to CLEO: Expo and on-floor business programming• 300+ participating companies• Market Focus Business Programming• Technology Transfer Business

Programming• Online Job Fair• Expo Technology Playground

Networking Events• Conference welcome reception• Special professional events

Reference Guides• Conference program book• Postdeadline papers book• Expo 2014 buyers’ guide• Perpetual, early access to conference

papers via Optics InfoBase• Select online recorded sessions

available for only $45

Your full conference registration includes:

Short Courses8-10 JuneAdd a Short Course to your technical

registration. The Short Course program

offers skill-building training for

professionals and students alike. Visit

the website for details.

Iain T. McKinnie

James C. Wyant

Eric Mottay

Iain T. McKinnie; Lockheed Martin, Advanced Technology Center, USA, General Co-Chair James C. Wyant; Univ. of Arizona, College of Optical Sciences, USA, General Co-Chair

Yu Chen; Univ. of Maryland, College Park, USA, Program Co-Chair

Eric Mottay; Amplitude Systemes, France, Program Co-Chair

Call for Postdeadline Research

Submit by 21 April 2014 16:00 GMT

Share late-breaking research with peers and pioneers.

BIOMEDICAL • ENVIRONMENT/ENERGY • SCIENCE, SECURITY & STANDARDS • INDUSTRIAL

Yu Chen

“

Register on or before 12 May and Save Visit www.cleoconference.org/applications

Register on or before 12 May and Save Visit www.cleoconference.org/applications

SUBCOMMITTEE CHAIR Nicusor Iftimia; Physical Sciences Inc., USA

Tutorial SpeakerDaniel Farkas; Cedars-Sinai Medical Center, USA

Invited SpeakersStavros Demos; Lawrence Livermore National Lab, USAAlfredo Dubra; Medical College of Wisconsin, USADaniel Elson; Hamlyn Centre for Robotic Surgery, Imperial College London, UKMelissa Skala; Vanderbilt Univ., USAMelissa Suter; Harvard Medical School, USARobert J. Zawadzki; Univ. of California, Davis, USAHao Zhang; Northwestern Univ., USA

SPECIAL SYMPOSIA SPEAKERSAdvanced Ultrashort Pulse Laser Technologies in Biophotonics and NanobiophotonicsDmitri Lapotko; Rice Univ., USAPaul McKenna; Univ. of Strathclyde, UKFrank Wise; Cornell Univ., USA

Advances in Molecular ImagingMikhail Berezin; Washington Univ. at St. Louis, USA Simon Cherry; Univ. of California, Davis, USASylvain Gioux; Harvard Medical School, USAQuyen Nguyen; Univ. of California, San Diego, USAAlexander Oraevsky; TomoWave Laboratories, Inc., USADipanjan Pan; Univ. of Illinois at Urbana-Champaign, USAJohn Rasmussen; The Univ. of Texas Health Science Center-Houston, USA

Advances in NeurophotonicsTaner Akkin; Univ. of Minnesota, USASolange Brown; Johns Hopkins Univ. School of Medicine, USA

Daniel Cote; Centre de Recherche de l’Institut en Sante Mentale de Quebec, CanadaQingming Luo; Huazhong Univ. of Science and Technology, ChinaSava Sakedzic; MGH, USAVivek Srinivasan; Univ. of California, Davis, USARuikang Wang; Univ. of Washington, USA

Novel Light Sources and Photonic Devices in Optical ImagingBrian Goldberg; Axsun Technologies, USANicholas Sherwood; Tornado Spectral Systems, USAJeff Squier; Colorado School of Mines, USAChris Xu; Applied and Engineering Physics, Cornell Univ., USA

Optofluidics MicrosystemsXudong Fan; Univ. of Michigan, USAKatsuo Kurabayashi; Univ. of Michigan, USAAi-Qun Liu; Nanyang Technological Univ., SingaporeDemetri Psaltis; Ecole Polytechnique Federale de Lausanne, SwitzerlandHolger Schmidt; Univ. of California, Santa Cruz, USA

PROGRAM8-13 June 2014Choose from more than 150 in-depth, peer-reviewed presentations and more than 75 esteemed invited and tutorial speakers covering four core areas: Biomedical; Energy/Environment; Industrial; and Government & National Science, Security and Standards Applications.

SUBCOMMITTEE CHAIR Christian Wetzel; Rensselaer Polytechnic Inst., USA

Invited SpeakersAnna Dyson; Rensselaer Univ., USAGordon Knight; TrojanUV, CanadaThomas Moore; Arizona State Univ., USA

SPECIAL SYMPOSIAHigh Performance OpticsRana Adhikari; California Inst. of Tech., USAXinbin Cheng; Tongji Univ., ChinaPaul Lightsey; Ball Aerospace and Tech. Corp., USAVladimir Pervak; Ludwig Maximilian Univ. of Munich, GermanyRalf Takke; Heraeus Quarzglas GmbH, Germany

Laser-driven Sources of Particles and X-ray BeamsMarco Borghesi; Queen’s Univ. of Belfast, UKSebastian Corde; SLAC - Stanford Univ., USAWim Leemans; Lawrence Berkeley National Lab, USAStuart Mangle; Imperial College, UKThomas Metzger; TRUMPF Scientific Lasers, USAJonathan D. Zuegel; Univ. of Rochester, USA

Environment/EnergyThis conference will focus on photonic technologies and their applications addressing energy efficiency and the environment.

Lisa Barsotti

Sae Woo Nam

Joel Ullum

SUBCOMMITTEE CHAIR Emma Springate; STFC Rutherford Appleton Laboratory, UK

Invited SpeakersLisa Barsotti; MIT, USAPietro Ferraro; Istituto Nazionale di Ottica, ItalySae Woo Nam; NIST, USAJoel Ullum; NIST, USA

SPECIAL SYMPOSIAHigh Performance OpticsRana Adhikari; California Inst. of Tech., USAXinbin Cheng; Tongji Univ., ChinaPaul Lightsey; Ball Aerospace and Tech. Corp., USAVladimir Pervak; Ludwig Maximilian Univ. of Munich, GermanyRalf Takke; Heraeus Quarzglas GmbH, Germany

Laser-driven Sources of Particles and X-ray BeamsMarco Borghesi; Queen’s Univ. of Belfast, UKSebastian Corde; SLAC - Stanford Univ., USAWim Leemans; Lawrence Berkeley National Lab, USAStuart Mangles; Imperial College, UKThomas Metzger; TRUMPF Scientific Lasers, USAJonathan D. Zuegel; Univ. of Rochester, USA

Government & National Science, Security & Standards Applications Wide-spread applications in government and national science, security and standards will be covered, from miniature optical devices to large facility-class laser systems, including advances in performance and in size, weight and power.

SUBCOMMITTEE CHAIR Yves Bellouard; Eindhoven Univ. of Tech., Netherlands

Tutorial SpeakerWolfgang Schulz; Fraunhofer-Institut für Lasertechnik, RWTH Aachen Univ., Germany

Invited SpeakersNils-Agne Feth; Admedes Schuessler GmbH, GermanyGuido Henning; Daetwyler, USA Nicholas Psaila; Heriot-Watt Univ., UKYasuhiko Shimotsuma; Kyoto Univ., Japan

SPECIAL SYMPOSIA SPEAKERSEnabling Photonics Technologies for MiniaturizationEtienne Brasselet; Université de Bordeaux, FranceJesper Glückstad; DTU, DenmarkPeter Kazansky; Univ. of Southampton, UKSenvja Knappe; Univ. of Colorado Boulder, USAL. Kuipers Kobus; Univ. of Twente, NetherlandsShoji Maruo; Yokohama Univ., JapanJunjii Nishii; Hokkaido Univ., JapanHugo Thienpont; Vrij Univ. Brussels, Belgium

Laser Processing for Consumer ElectronicsXinghua Li; Corning Glass, USAKeiji Nomaru; Disco Corp., Japan

Optofluidic MicrosystemsXudong Fan; Univ. of Michigan, USAKatsuo Kurabayashi; Univ. of Michigan, USAAi-Qun Liu; Nanyang Technological Univ., SingaporeDemetri Psaltis; Ecole Polytechnique Federale de Lausanne, SwitzerlandHolger Schmidt; Univ. of California, Santa Cruz, USA

Industrial This meeting highlights experimental and numerical studies that demonstrate the feasibility of laser methods for general commercial processes with an eye toward industrial and consumer applications.

Nils-Agne Feth

Yasuhiko Shimotsuma

Nicholas Psaila

Wolfgang Schulz

BiomedicalThis track focuses on the translation of new applications from the bench-top to the bedside, and on advanced engineering and applied studies.

Daniel Farkas

Stavros Demos

Melissa Suter

Alfredo Dubra

Melissa Skala

Nicusor Iftimia

Anna Dyson

Christian Wetzel

Emma Springate

Yves Bellouard

Hao Zhang

Robert J. Zawadzki

Daniel Elson

Thomas Moore

Pietro Ferraro

Guido Henning

High-powered Lasers

David Payne Univ. of Southampton, UK

Featured Applications & Technology Plenary11 June 2014

Bonus Programming at CLEO: ExpoBenefit from FREE on-floor business programming while visiting the world-renowned CLEO: Expo, which showcases the products and innovations of more than 300 participating companies.

CLEO: 2014 Applications & TechnologyCLEO: 2014 Applications & Technology

Register by 12 May and Save!Visit www.cleoconference.org/applications

For the most current list of sessions, titles, and invited and symposia speakers, visit www.cleoconference.org/applications.

CLEO: Market Focus 10-11 June 2014

The Solid-state Lighting Revolution: How LEDs are Transforming the $75 Billion Lighting Market

Moderator: Robert Steele; Solid-State Lighting, USA

Operational Strategies for the Laser and Photonics Industry

Moderator: Scott Dunbar; AdValue Photonics, USA

Title To Be Announced Moderator: Jason Eichenholz; Open Photonics Inc., USA

For program updates, please visit www.cleoconference.org/marketfocus.

Technology Transfer Program*

10-12 June Tabletop displays during exhibit hours

Thursday 12 June

9:30-10:30 Tutorial: Technology Transfer 101: Technology Licensing and Tech Startups

10:30-12:00 New! Pitch Panel

12:00-12:30 Keynote Speaker

*Schedule subject to change.

Keynote

Becoming an Entrepreneur and Sustaining a Technology Business: What It Takes in Today’s World

Yacov Shamash; Stony Brook University, USA

Dr. Shamash is vice president for economic development and dean of the College of Engineering and Applied Sciences at Stony Brook University.

For the full bio and abstract, please visit www.cleoconference.org/techtransfer.

Gordon Knight

CLEO: 2014 Managementc/o The Optical Society2010 Massachusetts Avenue, NWWashington, DC 20036 USA

NONPROFIT ORG.US Postage

PAIDMERRIFIELD VA

Permit No. 6418

CLEO:APPLICATIONS & TECHNOLOGY

Sponsors:

Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

8-13 June 2014San Jose Convention Center San Jose, CA, USA

8-13 June 2014San Jose Convention Center San Jose, CA, USA

Full conference registration includes 150 in-depth, peer-reviewed presentations, and more than 75 esteemed invited and tutorial speakers covering four core areas:

Biomedical • Environment/Energy

Science, Security & Standards • Industrial

PLUS access to all Science & Innovations, QELS-Fundamental Science technical presentations, networking events, CLEO: Expo and more.

Also Featuring:CLEO: QELS–Fundamental ScienceCLEO: Science & Innovations CLEO: Expo CLEO: Market Focus

Also Featuring:CLEO: QELS–Fundamental ScienceCLEO: Science & Innovations CLEO: Expo CLEO: Market Focus

REGISTER NOW!

CLEO:APPLICATIONS & TECHNOLOGY

8-13 June 2014San Jose Convention Center San Jose, CA, USA Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

8-13 June 2014San Jose Convention Center San Jose, CA, USA Technical Conference: 8-13 June 2014Short Courses: 8-10 June 2014Exposition: 10-12 June 2014

Sponsors:Register by 12 May and Save!

Visit www.cleoconference.org/applications

The Application and Technology Conference basically builds on the core strength of CLEO, which is the high scientific content, and explores potential new applications that have the capability to extend into the industrial or commercial domain. So it sits really at the frontier between the science and the application development work.”

CLEO: 2014 is respected worldwide as the premier, peer-reviewed technical conference covering the lasers and photonics industry. CLEO has represented the pinnacle of science and innovation for nearly 40 years. CLEO: Applications & Technology continues to bring CLEO: 2014 full circle by providing the top forum for peer-reviewed applied research, development and commercialization. The Applications & Technology Conference explores new applications capable of extending into the industrial or commercial domain, and builds on the core strength of CLEO and its high-quality, peer-reviewed content.

Discover four full days of sessions presented by distinguished speakers from across the industry and around the world as they gather to discuss the latest optics and photonics applied research, and how it fuels the development of innovative commercial products.

Applications & Technology ConferenceAdmittance to all technical programs• Technical sessions for all three

conferences – QELS-Fundamental Science, Science & Innovations and Applications & Technology

• Plenary sessions • Poster sessions• Special symposia

Admittance to CLEO: Expo and on-floor business programming• 300+ participating companies• Market Focus Business Programming• Technology Transfer Business

Programming• Online Job Fair• Expo Technology Playground

Networking Events• Conference welcome reception• Special professional events

Reference Guides• Conference program book• Postdeadline papers book• Expo 2014 buyers’ guide• Perpetual, early access to conference

papers via Optics InfoBase• Select online recorded sessions

available for only $45

Your full conference registration includes:

Short Courses8-10 JuneAdd a Short Course to your technical

registration. The Short Course program

offers skill-building training for

professionals and students alike. Visit

the website for details.

Iain T. McKinnie

James C. Wyant

Eric Mottay

Iain T. McKinnie; Lockheed Martin, Advanced Technology Center, USA, General Co-Chair James C. Wyant; Univ. of Arizona, College of Optical Sciences, USA, General Co-Chair

Yu Chen; Univ. of Maryland, College Park, USA, Program Co-Chair

Eric Mottay; Amplitude Systemes, France, Program Co-Chair

Call for Postdeadline Research

Submit by 21 April 2014 16:00 GMT

Share late-breaking research with peers and pioneers.

BIOMEDICAL • ENVIRONMENT/ENERGY • SCIENCE, SECURITY & STANDARDS • INDUSTRIAL

Yu Chen

“

Register on or before 12 May and Save Visit www.cleoconference.org/applications

Register on or before 12 May and Save Visit www.cleoconference.org/applications