se50a-eco 300ss ft-ir metrology tool

Datasheet SE50A-ECO 300SS FT-IR Metrology Tool For Material Characterization Systems Engineering combines the Thermo Fisher Scientific FT-IR measurement technology and JEL's Sorter System to introduce a new generation "FT-IR SE-50 series" semiconductor material characterization tools. Operation Software ▪ Intuitive Graphical User Interface ▪ Easy-to-Use operator and Authorized engineer user levels ▪ Easy to learn and use, giving optimum eﬃciency ▪ Measurement result, display and data logging. Range ▶ 0.1 to 10ppmA ▶ 0.3 to 35 ppmA Precision ▶STD 0.05 ppmA ▶ STD0.08 ppmA Application Speciﬁcations Epitaxial Thickness Range ▶ 0.3 - 750 μm Precision ▶ ± 0.01 μm Carbon & Oxygen in Silicon Carbon Oxygen * Boron & Phosphorus Range ▶ 1 - 10 Wt% ▶ 2 - 12 Wt% Precision ▶ ± 0.05 Wt% ▶ ± 0.05 Wt% Boron Phosphorus Hydrogen in Silicon Nitride Range ▶ 3 - 30 Atom% ▶ 3 - 30 Atom% Precision ▶ ± 0.3 Atom% ▶ ± 0.3 Atom% Si-H N-H Fluorine in SiO 2 Films Thickness ▶ 3000 - 10000Å Fluorine Concentration ▶ STD< 0.2 Fwt% *All carbon and oxygen values reported using ASTM 1979 calculations. Carbon-doped Films Silicon Nitride Silicon Oxide

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Datasheet

SE50A-ECO 300SS FT-IR Metrology Tool

For Material CharacterizationSystems Engineering combines the Thermo Fisher Scientif ic FT-IR measurement technology and JEL's Sorter System to introduce a new generation"FT-IR SE-50 series" semiconductor material characterization tools.

Operation Software

▪ IntuitiveGraphicalUserInterface▪ Easy-to-UseoperatorandAuthorized engineeruserlevels▪ Easytolearnanduse,givingoptimumefficiency▪ Measurementresult,displayanddatalogging.

Range ▶ 0.1to10ppmA ▶0.3to35ppmAPrecision ▶STD0.05ppmA ▶STD0.08ppmA

Application Specifications

Epitaxial ThicknessRange ▶ 0.3-750μmPrecision ▶±0.01μm

Carbon & Oxygen in SiliconCarbon Oxygen*

Boron & Phosphorus

Range ▶ 1 - 10 Wt% ▶ 2 - 12 Wt% Precision ▶ ± 0.05 Wt% ▶ ± 0.05 Wt%

Boron Phosphorus

Hydrogen in Silicon Nitride

Range ▶ 3-30Atom%▶3-30Atom%Precision ▶±0.3Atom%▶±0.3Atom%

Si-H N-H

Fluorine in SiO2 FilmsThickness ▶ 3000 - 10000ÅFluorine Concentration ▶ STD< 0.2 Fwt%

*AllcarbonandoxygenvaluesreportedusingASTM1979calculations.

Carbon-doped FilmsSilicon NitrideSiliconOxide

Page 2: SE50A-ECO 300SS FT-IR Metrology Tool

Specifications

RELIABILITYMTBF > 6 monthsMTTR 48 hoursMTTS 4 hoursUptime >97%

OPTICALSpectralRange 7800 - 350cm-1

SpectralResolution 0.5cm-1

BeamDiameter Standard 8mm (Variable)AnalysisAngle 15°

FACILITY REQUREMENTS Power 100 - 240V (50/60Hz) House Vacuum -61±10kPa(G)

30L/min(ANG) PressurizedGas

CDA (Load Port)

0.52-0.6Mpa(G)30L/min(ANR)

N2 0.1-0.2MPa(G)30L/min(ANR)

20210607

HeadOffice : 1-4-12KoishikawaBunkyo-ku,Tokyo112-0002Japan TEL+81-3-3868-2634FAX+81-3-3868-2633Factory : 3-5-8FunadoItabashi-ku,Tokyo174-0041Japan TEL+81-3-6279-8908FAX+81-3-6279-8907WestBranch : MiyaharaYodogawa-kuOosaka-shi,Oosaka532-0003Japan TEL+81-6-6868-9790FAX+81-6-6868-9796

*Specification and Price are subject to change without notice.

Computer Specifications OperationSystem

Windows 10 64bitMemory16GBHardDiskSSDRAID

Made in Japan

SE50 Product Line

Hardware Product# Model Wafer size Station Handring ECO-02S2 SE50S-ECO_200 2-8inch Single EdgeGrip

ECO-02S3 SE50S-ECO_300 6-12inch Single EdgeGrip

ECO-031 SE50A-ECO_150SS 2-6inch Single Vacuum

ECO-032 SE50A-ECO_150DS 2-6inch Double Vacuum

ECO-041 SE50A-ECO_200SS 4-8inch Single Vacuum

ECO-042 SE50A-ECO_200DS 4-8inch Double Vacuum

ECO-043 SE50A-ECO_200SMIF 8inch SingleSMIF Vacuum