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The top documents tagged [ebeam lithography slide]
Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating
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Lab report 4 Very important: if you raise the sample to the 10 mm line during pumpdown, the working distance will be approximately 10 mm. (How do you know
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