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1 UK users conference, November 9 UK users conference, November 9 th th 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire RF MEMS TECHNOLOGY PLATFORM FOR CELL PHONES RF MEMS TECHNOLOGY PLATFORM FOR CELL PHONES Transient simulation of the closing Transient simulation of the closing of a MEMS switch with air gap of a MEMS switch with air gap modeled by FLUID136 elements modeled by FLUID136 elements Nicolas LORPHELIN Salim TOUATI

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1UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

RF MEMS TECHNOLOGY PLATFORM FOR CELL PHONESRF MEMS TECHNOLOGY PLATFORM FOR CELL PHONES

Transient simulation of the closing Transient simulation of the closing of a MEMS switch with air gap of a MEMS switch with air gap modeled by FLUID136 elementsmodeled by FLUID136 elementsNicolas LORPHELINSalim TOUATI

22UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

OutlineOutline

Presentation of RF MEMS switchesApplicationElectrostatic actuationOhmic / capacitive switches

Delfmems switchfunctioningmodelingprocess flow

Modeling gap closing of FLUID136 elementsDeath of fluidic elementsRough membraneRemaining thin film

Transient simulation of a beam supported on pillars

Transient simulation of delfmems switch

33UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Presentation of MEMSPresentation of MEMS(MicroElectroMechanical Systems)(MicroElectroMechanical Systems)

44UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

RF MEMS switches:RF MEMS switches: applications applications

55UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

RF MEMS switches: RF MEMS switches: Electrostatic actuationElectrostatic actuation

Pull-in

Pull-out

stable domainunstable

domain

Scalar model of a MEMS switch: spring-capacitor system

k g 0−g g tdd 2

−120 S V

2=0Equilibrium equation:

Pull-in voltage: V pi= 8k270S g0 t dd

3

Pull-out voltage: V po=t dd 2k g00S

adapted from G.M. Rebeiz, RF MEMS theory, design and technology, Wiley-Interscience 2003

66UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Example of series ohmic switch

Example of series ohmic relay with metal contact isolated from actuation membrane

1 contact 2 contacts

The contact resistance depends on:- Contact force- Contact materials- Effective surface area in contact (due to roughness)- Power dissipated through the contact

Hyouk Kwon et al, Investigation of the electrical contact behaviors in Au-to-Au thin-film contacts for RF MEMS switches, J. Micromech. Microeng. 18 (2008)

RF MEMS switches: RF MEMS switches: Ohmic switchesOhmic switches

77UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

g0

g1

off state on state

ConCoff

=g0g1

Capacitive switch with air gap

stoppers

Capacitive switch with dielectric

g0

off state on state

ConCoff

=1g0dt d

RF MEMS switches: RF MEMS switches: Capacitive switchCapacitive switch

88UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switchDelfmems switch

Ohmic switch on an interrupted lineAnchorless membrane simply supported by two pillarsTwo pairs of electrodes (internal, external) which ensure two forced statesMechanical stoppers which allow the membrane to move but maintain it in position

Contact location

Mechanical stop units (MSU)

Pillar

Internal electrodes

External electrodes

99UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switchDelfmems switch

Two forced states

OFF state

ON statedielectric layer

Delfmems membrane at ON state Delfmems membrane at OFF state

1010UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:modelingmodeling

Modeling of a quarter of membrane due to symmetry

Modeling pillars with contact/target elements

Modeling RF line by contact/target elements

contact

target

contact

target

Modeling electrostatic actuation by TRANS126 elements

0 5 10 15 20 25 300

50

100

150

200

250

300

350

applied voltage [V]

cont

act f

orce

[µN

]Contact force on bumps

1111UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:Process flowProcess flow

Silicon wafer

Silicon Nitride

Titanium-Tungsten

Gold

Silicon dioxide

Chromium

Burried electrodes and dielectric layer

1212UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:Process flowProcess flow

First sacrificial layer, electroplating moldand electroplating of pillars and RF line

Silicon wafer

Silicon Nitride

Titanium-Tungsten

Gold

Silicon dioxide

Chromium

1313UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:Process flowProcess flow

Second sacrificial layer, contact,dielectric and membrane

Silicon wafer

Silicon Nitride

Titanium-Tungsten

Gold

Silicon dioxide

Chromium

1414UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:Process flowProcess flow

Third sacrificial layer and stopppers patterning

Silicon wafer

Silicon Nitride

Titanium-Tungsten

Gold

Silicon dioxide

Chromium

1515UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:Process flowProcess flow

Realeasing, rinsing and drying

● Only 5 principal materials (excluding sticking layers)● 3 sacrificial layers● No photoresist for sacificial layers : better stability of

process flow

Silicon wafer

Silicon Nitride

Titanium-Tungsten

Gold

Silicon dioxide

Chromium

1616UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Delfmems switch:Delfmems switch:performanceperformance

Low actuation voltage: low gap

Low contact resistance: High contact force

High restoring force: membrane stiffness + external actuation

Low switching time: needs to be simulatedsimulation of impact on contactsimulation of closing of air gap with FLUID136 elements:

feasible since ANSYS release 12challenging due to:

low gap high pressurehigh electrostatic forcevanishing of air between the electrode and the membrane

1717UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Modelling squeeze film:Modelling squeeze film: FLUID136 elements FLUID136 elements

ANSYS release 11Pressure is the only DOF

The pressure change must be small compared to ambient pressure.

Displacement amplitudes must be small compared to the film thickness.

Since ANSYS release 12Pressure, UX, UY, UZ are available DOFs (KEYOPT(3)=1 or 2)Large pressure changes can be modeled with compressible nonlinear Reynolds equation (KEYOPT(4)=1)Large pressure changes can be modeled with compressible nonlinear or incompressible linearized Reynolds equation (KEYOPT(4)=1 or 2)

FLUID136 elements are surfacic elements based on Reynolds equation which are adapted to model thin films with high lateral dimensions.Since release 12 it is possible to perform coupled transient fluid/structure simulations with air gap going near zero:

Managing of the closing of air gapIf gap goes below a defined fluid_mingap:

reset it to fluid_mingapThe element is considered “dead” for a fluid standpoint

If gap goes below a defined mech_mingap:The element is considered “dead” for a mechanical standpointApply contact pressure

1818UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Death of fluid elements Death of fluid elements

Test structure: clamped-clamped beam Modeling of fluid mingap

quarter of membraneanchoring

X and Y symmetry

zero pressure on the edge

Options for FLUID136 elements:

KEYOPT(1)=3 High Knudsen number and accomodation factorKEYOPT(2)=0 Four node elementKEYOPT(3)=2 DOF PRES, UX, UY, UZ Implicit treatment of cross-coupling terms.

Adapted for gaps near zeroKEYOPT(4)=1 Compressible nonlinear Reynolds equationKEYOPT(5)=2 If gap becomes lower than fluid_mingap, the element will be considered as “dead”KEYOPT(6)=0 If the gap becomes lower than mech_mingap no contact pressure will be applied

1919UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Death of fluid elements Death of fluid elements

Displacement at the centre of the beam

Length of the beam in contact with the electrodePressure at the centre of the beam

2020UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Death of fluid elements Death of fluid elements

elements dead for a fluid standpoint creation of air pockets

Pressure under the membrane during the creation of air pockets

Displacement at pull-in state

2121UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Death of fluid elements Death of fluid elements

Fluid death of FLUID136 elements is not satisfactory:

Abrupt drop of pressure

Abrupt acceleration of the membrane

Highly dependent on the choice of fluid_mingap

Creation of air pockets

2222UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Roughness Roughness

Creation of a rough surface area (about 50nm) with:Non-uniform air gap for FLUID136 elementsNon uniform electrostatic gap for TRANS126 elements

F

-F

Positive force on top surface for “peak” nodesNegative force on bottom surface for “peak” nodesNegative force on top surface for “valley” nodesPositive force on bottom surface for “valley” nodes

2323UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Roughness Roughness

peak nodes

pass nodes

2424UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Remaining fluid gap Remaining fluid gap

Options for FLUID136 elements:

KEYOPT(5)=1 If gap becomes lower than fluid_mingap, it is reset to fluid_mingap

KEYOPT(6)=0 If the gap becomes lower than mech_mingap no contact pressure will be applied

The membrane is smoothA thin film is assumed to be remaining to model the air remaining due to roughness

2525UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Remaining fluid gap Remaining fluid gap

Displacements on a pass node

Pressure at centrePressure at t=10µs

Pressure at t=20µs

2626UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Simulation of gap closing:Simulation of gap closing:Remaining fluid gap Remaining fluid gap

Modeling the closing of FLUID136 elements with a remaining thin film is more realistic:

The pressure decreases slowly while the air is escaping

The membrane slows down before touching the electrode due to the increase of pressure

The thin film is justified by roughness

The choice of fluid_mingap is directly linked to the value of roughness

The closing of air gap can be modeled accurately by :Fixing a minimal air gap of fluid which remains under the membraneChoosing this fluid mingap as function of roughness

2727UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Modeling contact on pillars Modeling contact on pillars

Model of beam supported of pillars:

contact on pillar

Choice of FKN:

Displacement at the membrane extremity

2828UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Modeling contact on pillars Modeling contact on pillars

t=6µs

t=8µs

t=10µs

t=12µs

t=14µs

t=20µs

2929UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Modeling alternate actuationModeling alternate actuation

Modeling alternate actuation (e.g. OFF state to ON state) needs:

Static analysis with FKN=0.001 to 0.01

Transient analysis with FKN=1

3030UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Transient simulation of the membraneTransient simulation of the membrane

Zero pressure on the edge of the membrane Laser-Doppler measurement of displacement

Comparison of simulated and measured displacement on internal electrode

3131UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

ConclusionConclusion

New features of FLUID136 elements enable to perform transient simulations of pull-in

The fluid death of FLUID136 elements is not adapted to model the closing of the air gap

A thin film of air remains present under the membrane due to roughness

A remaining thin film under the membrane must be modeled to represent the roughness

These settings enable to model accurately the closing of the switch

3232UK users conference, November 9UK users conference, November 9thth 2011, Gaydon, Warwickshire 2011, Gaydon, Warwickshire

Thank you forThank you foryour attentionyour attention

Contact us:DelfmemsBat B, Park Plaza II, 11 rue de l'Harmonie59650 Villeneuve d'AscqFRANCEphone: (+33) 3 20 05 05 [email protected]@delfmems.com

Special thanks to Siebe Bouwstra (MEMS TC) for the expertise he brought on the question