vlsi-5 short channel effects.pdf

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    Channel-Length Modulation

    The pinch-off point moves toward the source as VDS

    increases.

    The length of the inversion-layer channel becomes shorter with increasing VDS.

    ID increases (slightly) with increasing VDS in the saturation region of operation.

    satDDSTHGSoxnsatD VVVVL

    WCI ,

    2

    , 12

    1

    is the channel length modulation coefficient.

    L

    L

    LLLIDsat 1

    11

    DSsatDS VVL

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    and L

    The effect of channel-length modulation is less for a long-channel MOSFET than for a short-channel MOSFET.

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    Velocity Saturation

    In state-of-the-art MOSFETs, the channel is very short (

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    Impact of Velocity Saturation

    Recall that

    If VDS > EsatL, the carrier velocity will saturate and hence the

    drain current will saturate:

    ID,sat is proportional to VGSVTH rather than (VGS VTH)2

    ID,sat is not dependent on L

    ID,sat is dependent on W

    )()( yvyWQI invD

    satTHGSoxsatinvsatD vVVWCvWQI ,

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    ID,sat is proportional to VGS-VTH rather than (VGS-VTH)2

    VD,sat is smaller than VGS-VTH

    Channel-length modulation is apparent (?)

    Short-Channel MOSFET ID-VDS

    P. Bai et al. (Intel Corp.),

    Intl Electron Devices Meeting, 2004.

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    In a short-channel MOSFET, the source & drain regions each support

    a significant fraction of the total channel depletion charge QdepWL

    VTH is lower than for a long-channel MOSFET

    As the drain voltage increases, the reverse bias on the body-drain PN

    junction increases, and hence the drain depletion region widens.

    VTH decreases with increasing drain bias.

    (The barrier to carrier diffusion from the source into the channel is reduced.)

    ID increases with increasing drain bias.

    Drain Induced Barrier Lowering (DIBL)

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    NMOSFET in OFF State

    We had previously assumed that there is no channel currentwhen VGS < VTH. This is incorrect!

    As VGS is reduced (toward 0 V) below VTH, the potential barrier to

    carrier diffusion from the source into the channel is increased.

    ID

    becomes limited by carrier diffusion into the channel, rather

    than by carrier drift through the channel.

    (This is similar to the case of a PN junction diode!)

    ID varies exponentially with the potential barrier height at the

    source, which varies directly with the channel potential.

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    Sub-Threshold Leakage Current

    Recall that, in the depletion (sub-threshold) region of operation,

    the channel potential is capacitively coupled to the gate potential.

    A change in gate voltage (VGS) results in a change in channel

    voltage (VCS):

    Therefore, the sub-threshold current (ID,subth) decreases

    exponentially with linearly decreasing VGS/m

    mVCC

    CVV

    GSdepox

    ox

    GSCS

    /

    log (ID)

    VGS

    ID

    VGS

    mV/dec60)10(ln

    )(log1

    10

    T

    GS

    DS

    mVS

    dV

    IdS

    Sub-threshold swing:

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    VTH Design Trade-Off

    Low VTH is desirable for high ON-state current:

    ID,sat (VDD - VTH) 1 < < 2

    But high VTH is needed for low OFF-state current:

    VTH cannot be

    reduced aggressively.

    Low VTH

    High VTH

    IOFF,high VTH

    IOFF,low VTH

    VGS

    log ID

    0